Transparent Reactor Heaters for Uniform Window Temperature
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Solution Overview
Problem
The existing temperature control of transmissive members within semiconductor processing chambers is uneven, leading to unpredictable film deposition and reduced etch rates due to non-uniform heating, which affects the efficiency of epitaxial deposition processes.
Innovation Solution
The implementation of transparent heaters on the outer surfaces of transmissive windows within the chamber, which are flexible, optically transparent, and capable of withstanding high temperatures, allowing for precise temperature control and uniform heating of these members.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If conventional heating methods are used for transmissive members, then the chamber can be heated, but temperature uniformity deteriorates leading to uneven film deposition
Solution Approach 1:
The heating system is segmented into multiple independently controllable heating zones along the gas flow path. Each zone can be heated to different temperatures to compensate for heat loss variations, ensuring uniform overall temperature distribution across the transmissive member.
Solution Approach 2:
Different sections of the transmissive member are provided with different heating characteristics. The heating power is locally adjusted based on the specific heat loss conditions of each zone, applying more heat to areas that lose heat faster to achieve uniform temperature distribution.
2Temperature
If higher heating power is applied to compensate for heat loss, then temperature control improves, but energy consumption increases
Solution Approach 1:
The heating power of each zone is dynamically adjusted based on real-time temperature feedback and process conditions. The system adapts heating levels to actual needs rather than using constant high power, optimizing the balance between temperature control and energy consumption.
Solution Approach 2:
The system changes heating parameters (power levels, duty cycles) based on operating conditions such as gas flow rate, ambient temperature, and process requirements. This allows the system to maintain temperature control precision while minimizing energy consumption under varying operational scenarios.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution reduces undesired film deposition while improving etch efficiency by maintaining temperature uniformity across transmissive members, enhancing the predictability and effectiveness of epitaxial deposition processes.
Implementation Method 1
heating of transparent surfaces on an outer surface of a reactor body of an epitaxial deposition process chamber using one or more resistive heating elements
Data Source
AI summary
A method and apparatus for heating a transparent component within a semiconductor processing chamber is described. The transparent component is heated using a transparent heater coupled to the transparent component. The transparent heater includes a support base, an electrode layer, and a capping layer. The electrode layer is a heating element. The transparent heater has an optical transparency of greater than about 80% at a wavelength which is emitted by one or more radiation sources within the processing chamber. The transparent heater is a flexible transparent heater or is formed of a plurality of sub-heaters.