Tungsten Hexafluoride Reclamation Using Silicon Reaction Chambers

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Solution Overview

Problem

The existing semiconductor manufacturing processes generate waste byproducts such as unused tungsten hexafluoride, which contribute to environmental pollution and waste management issues.

Innovation Solution

A semiconductor manufacture reclamation system is developed, which includes a chemical vapor deposition system that reacts waste tungsten hexafluoride with silicon to produce solid tungsten compounds, thereby reducing waste and enabling the reuse of tungsten.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If waste tungsten hexafluoride is vented through a waste gas vent, then the chemical vapor deposition system can continue operation, but environmental pollution and waste management issues occur

Engineering Contradiction:
Improvecontinuous operation of chemical vapor deposition systemVSAvoidenvironmental pollution from waste tungsten hexafluoride
Core Design Contradiction:
ProductivityVSObject-generated harmful factors

Solution Approach 1:

The patent converts the harmful waste gas (tungsten hexafluoride) into a beneficial product (solid tungsten compound) by introducing it to a reaction chamber containing silicon. The waste gas reacts with silicon to produce solid tungsten compounds that can be collected and reused, transforming an environmental hazard into a valuable resource while maintaining continuous CVD operation

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

2Loss of substance

If waste tungsten hexafluoride is reacted with silicon to produce solid tungsten compounds, then tungsten can be recovered and reused, but additional equipment and process complexity are required

Engineering Contradiction:
Improverecovery of tungsten metalVSAvoidadditional reaction chamber and process steps
Core Design Contradiction:
Loss of substanceVSDevice complexity

Solution Approach 1:

The patent merges the waste gas treatment function with the tungsten recovery function into a single integrated reaction chamber. The reaction chamber simultaneously serves to neutralize the harmful waste gas and produce recoverable solid tungsten compounds, combining what could be separate processes into one unified operation that reduces overall system complexity

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

Silicon serves as an intermediary substance that facilitates the conversion of waste tungsten hexafluoride gas into solid tungsten compounds. The silicon reacts with the waste gas to form intermediate products that ultimately yield recoverable solid tungsten, acting as a mediator that enables the transformation from harmful gas to useful solid material

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system effectively reduces the amount of waste gas, allows for the recovery of valuable tungsten metal, and minimizes environmental impact by converting hazardous waste into reusable materials.

Implementation Method 1

a chemical vapor deposition system that reacts waste tungsten hexafluoride with silicon to produce solid tungsten compounds

Methodology Applied
Scientific EffectChemical vapor deposition: Chemical Vapour Deposition

Implementation Method 2

reacts waste tungsten hexafluoride with silicon to produce solid tungsten compounds

Methodology Applied
Scientific EffectChemical reaction: Chemical Bonding

Data Source

PatentUS20250066910A1System and method for reclaiming tungsten compounds
Publication Date: 2025.02.27 MICRON TECHNOLOGY INC
  • US20250066910A1 patent drawing
  • US20250066910A1 patent drawing
  • US20250066910A1 patent drawing

AI summary

A semiconductor manufacture reclamation system and associated methods are shows. Example systems and methods include semiconductor processing machinery and a reaction chamber coupled along a path of a waste gas vent. Systems and methods are shown that include an amount of silicon to react with a waste gas including tungsten.