Upper Electrode Shielding for Plasma Processing
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Solution Overview
Problem
In plasma processing apparatuses, radicals or gases from the gas discharge hole can infiltrate into the gap between the electrode and the gas plate, potentially corroding and abrading the electrostatic attraction part, leading to its consumption and affecting the accuracy of temperature adjustment and plasma processing.
Innovation Solution
The introduction of a shield, which can be a connector or a separate component, physically shields the radicals or gases moving from the gas discharge hole to the gap between the electrode and the gas plate, and the use of a passivation layer at the contact point between the gas plate and the electrode to prevent deterioration, along with an exhaust device or shielding gas to further mitigate these issues.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the electrostatic attraction part is interposed between the electrode and gas plate, then the electrode can be attracted to the gas plate for temperature adjustment, but radicals or gases can infiltrate into the gap and corrode/abrade the electrostatic attraction part
Solution Approach 1:
A shield member is introduced as an intermediary component between the gas discharge hole and the electrostatic attraction part. This shield blocks the path of radicals and gases, preventing them from reaching and damaging the electrostatic attraction part while allowing the temperature adjustment function to continue operating effectively.
Solution Approach 2:
The shield member utilizes the gas flow path to redirect processing gas in a way that creates a protective barrier. The gas flow that would otherwise carry radicals toward the electrostatic attraction part is channeled through the shield structure, converting a potentially harmful flow into a protective mechanism.
2Duration of action of stationary object
If a shield is added to protect the electrostatic attraction part, then consumption is reduced, but device complexity increases
Solution Approach 1:
The shield member is integrated with existing components of the upper electrode structure, such as being formed as part of the electrode assembly or gas plate structure. This merging approach adds the protective function without requiring a completely separate, complex subsystem.
Solution Approach 2:
The shield member is designed as a thin-walled structure that provides effective blocking of radicals and gases while minimizing material usage and structural complexity. The thin-film approach maintains structural integrity sufficient for protection without adding significant complexity to the overall device.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively shields the electrostatic attraction part from radicals and gases, reducing its consumption and maintaining the accuracy of temperature adjustment and plasma processing, while also preventing deterioration and wear due to thermal expansion differences.
Implementation Method 1
an electrostatic attraction part interposed between the electrode and the gas plate and having a contact surface that is in contact with a lower surface of the gas plate and an attraction surface that attracts an upper surface of the electrode
Data Source
AI summary
An upper electrode for a plasma processing apparatus, includes an electrode having a gas discharge hole, a gas plate having a gas flow path formed at a position facing the gas discharge hole to supply a processing gas to the gas discharge hole, an electrostatic attraction part interposed between the electrode and the gas plate and having a contact surface that is in contact with a lower surface of the gas plate and an attraction surface that attracts an upper surface of the electrode, and a shield that shields radicals or gas moving from the gas discharge hole to a gap between the electrode and the gas plate.