Vacuum Chamber Impurity Removal via Controlled Gas Ventilation
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Solution Overview
Problem
Vacuum chambers used in manufacturing processes, such as for organic EL elements, are contaminated by impurities like antioxidants from lubricants and sealing materials, which reduce the light-emitting characteristics of the organic EL elements due to diffusion and adsorption during the vacuum procedure.
Innovation Solution
A method involving ventilation of the vacuum chamber by introducing and discharging a gas at a rate of at least 3.3×10−5 mol/(s·L) with a temperature between 15° C. and 80° C., using a pump to reduce internal pressure, and employing inert gases to remove impurities, particularly antioxidants, from the vacuum chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a vacuum procedure is performed to manufacture organic EL elements, then the manufacturing process can proceed, but impurities such as antioxidants from lubricants and sealing materials diffuse and adsorb onto the organic light-emitting layer, reducing light-emitting characteristics
Solution Approach 1:
The patent applies preliminary action by performing a refresh process before the main vacuum procedure. This involves introducing gas into the vacuum chamber and discharging it at a controlled rate (at least 3.3×10^-5 mol/(s·L)) while maintaining temperature between 15-80°C, which removes impurities in advance before they can contaminate the organic light-emitting layer during subsequent manufacturing steps.
Solution Approach 2:
The patent uses inert gas (such as nitrogen or rare gas) to create an inert atmosphere during the refresh process. This inert environment prevents oxidation and other chemical reactions that would otherwise occur with reactive gases, while still enabling the removal of impurities through controlled gas introduction and discharge.
2Object-affected harmful factors
If the vacuum chamber is ventilated by introducing and discharging gas, then impurities can be removed, but the vacuum state must be maintained for longer periods requiring additional control
Solution Approach 1:
The patent applies parameter changes by controlling specific parameters during the refresh process: gas discharge rate (at least 3.3×10^-5 mol/(s·L)) and temperature (15-80°C). By optimizing these parameters, the system achieves effective impurity removal without requiring excessive vacuum control complexity, as the process can be completed within a controlled time frame before vacuum maintenance becomes critical.
Solution Approach 2:
The patent implements continuity of useful action by performing the refresh process continuously or periodically before vacuum deposition. The gas introduction and discharge operate continuously at the specified rate, ensuring constant impurity removal throughout the process, which maintains clean conditions without requiring intermittent complex control interventions.
3Productivity
If gas is discharged at a high rate to remove impurities quickly, then the refresh process is more effective, but energy consumption increases
Solution Approach 1:
The patent optimizes the gas discharge rate parameter to at least 3.3×10^-5 mol/(s·L), which provides the minimum effective rate for impurity removal. This parameter setting balances productivity (effective impurity removal) with energy efficiency, as discharging at exactly this rate rather than higher rates reduces energy consumption while still achieving the required refresh effectiveness.
Solution Approach 2:
The patent uses continuous gas discharge at a controlled rate rather than intermittent high-rate discharge. This continuous action at moderate rates is more energy-efficient than periodic high-rate discharge, as it maintains steady impurity removal without the energy spikes associated with rapid gas evacuation, thereby balancing productivity with energy consumption.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively removes impurities, preventing contamination and maintaining the vacuum state for longer periods, thereby improving the light-emitting characteristics and reducing maintenance costs of organic EL elements.
Implementation Method 1
a discharge rate at which molecules of the gas per unit volume are discharged is at least 3.3×10−5 mol/(s·L)
Implementation Method 2
a pump for reducing the internal pressure of the vacuum chamber
Data Source
AI summary
A method for using a vacuum apparatus that includes a vacuum chamber and a pump, the vacuum chamber housing an object, the pump reducing an internal pressure of the vacuum chamber, the method including: ventilating inside the vacuum chamber by introducing a gas into the vacuum chamber and discharging the gas from the vacuum chamber by causing the pump to reduce the internal pressure of the vacuum chamber. In the ventilating, a discharge rate at which molecules of the gas per unit volume are discharged is at least 3.3×10−5 mol/(s·L), and the temperature in the vacuum chamber is at least 15° C. and at most 80° C.