Vacuum Pump Buffer Space for Pressure Stabilization
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Solution Overview
Problem
Vacuum pumps in substrate processing apparatuses face instability due to pressure variations in the exhaust system, which can lead to operational issues and potential damage, especially when exhausting up to atmospheric pressure.
Innovation Solution
The implementation of a buffer space upstream of the processing space and the strategic use of inert gases to manage pressure, including the supply of inert gases between the vacuum pumps and valves to prevent backflow and maintain stable operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a vacuum pump is used to exhaust the processing space, then the processing can be performed under vacuum conditions, but pressure variations on the downstream side can cause gas backflow and operational instability
Solution Approach 1:
A buffer space is introduced as an intermediary component between the processing space and the vacuum pump. This buffer space absorbs pressure variations and prevents direct transmission of pressure fluctuations to the vacuum pump, thereby maintaining stable pump operation while still enabling vacuum processing.
Solution Approach 2:
The buffer space acts as a cushioning element that anticipates and absorbs pressure variations before they reach the vacuum pump. By providing this protective buffer in advance, the system prevents gas backflow and operational instability without requiring active control mechanisms.
2Reliability
If a buffer space is introduced to stabilize pressure, then vacuum pump operation becomes stable, but the system complexity increases
Solution Approach 1:
The exhaust system is segmented into distinct functional zones: the processing space, the buffer space, and the vacuum pump section. This segmentation allows each component to perform its specific function independently, with the buffer space dedicated to pressure stabilization and the vacuum pump dedicated to vacuum generation, simplifying the overall system architecture despite the added component.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach stabilizes the operation of vacuum pumps by controlling pressure variations, reducing the likelihood of operational instability and equipment damage, thereby ensuring consistent performance in substrate processing.
Implementation Method 1
exhausting a transfer space of the substrate by a first vacuum pump
Implementation Method 2
supplying an inert gas, with a valve disposed at an upstream side of the first vacuum pump at the one of the plurality of exhaust pipes closed, into the first vacuum pump by an inert gas supply unit
Data Source
AI summary
A method of manufacturing a semiconductor device by processing a substrate by supplying a processing space with a gas dispersed in a buffer space disposed at an upstream side of the processing space is provided. The method includes (a) transferring the substrate into the processing space while exhausting a transfer space of the substrate by a first vacuum pump; (b) closing a first valve disposed at a downstream side of the first vacuum pump; (c) supplying the gas into the processing space via the buffer space; and (d) exhausting the buffer space through an exhaust pipe connected to a downstream side of the first valve.