Vapor Deposition Mask Alignment for Large Substrates
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Solution Overview
Problem
Conventional scanning vapor deposition devices are not applicable to large substrates due to alignment precision issues and thermal drift, which affects the accuracy of film formation during the manufacturing of organic electroluminescence (EL) elements.
Innovation Solution
A vapor deposition device with a novel alignment mechanism that includes a mask with multiple openings, a substrate tray with a guide portion, and distance meters and drivers that allow for precise alignment of the mask relative to the substrate during transportation, enabling high-precision alignment in the X-axis and θ directions without the need for a large alignment stage or drivers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a large alignment stage and large drivers are used to align the mask for large substrates, then the alignment coverage is improved, but the device complexity and thermal influence increase
Solution Approach 1:
The patent replaces the mechanical alignment stage and drivers with an optical measurement system. Distance meters measure the positions of multiple marks on the substrate and mask, and a control unit calculates alignment corrections based on these measurements. This substitution eliminates the need for large mechanical components while achieving high-precision alignment for large substrates.
Solution Approach 2:
The patent introduces multiple marks (first marks on the substrate, second marks on the mask, and third marks on the alignment stage) as intermediary reference points. These marks serve as mediators that enable indirect measurement of alignment status through distance measurements, avoiding the need for direct mechanical contact or large alignment mechanisms.
2Ease of operation
If the mask and substrate are aligned using conventional methods, then the alignment process is simple, but thermal drift causes misalignment during vapor deposition
Solution Approach 1:
The patent implements a feedback-based alignment system where distance meters continuously measure the positions of marks on the substrate and mask during the vapor deposition process. The control unit processes these measurements and adjusts the mask position in real-time to compensate for thermal drift, ensuring consistent alignment precision throughout the deposition process.
Solution Approach 2:
The patent performs preliminary alignment by measuring the positions of multiple marks before vapor deposition begins. The control unit calculates the required alignment corrections in advance and positions the mask accordingly. This preliminary action ensures that alignment is established before thermal effects begin, providing a stable reference for the deposition process.
3Measurement precision
If multiple CCD cameras are used to measure distances between marks, then measurement precision is improved, but the device complexity and cost increase
Solution Approach 1:
The patent replaces multiple CCD cameras with distance meters that directly measure distances between marks. This substitution simplifies the measurement system while maintaining or improving precision, as distance meters provide direct numerical measurements without requiring complex image processing and coordinate transformation.
Solution Approach 2:
The patent extracts only the essential measurement function from the CCD camera system. Instead of using cameras to capture images and computationally determine distances, the system uses distance meters that directly measure distances between marks. This extraction eliminates unnecessary components while preserving the core measurement capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for accurate vapor deposition on large substrates, reducing thermal influence and adhesion-related misalignment, thereby improving the precision and efficiency of film formation for organic EL elements.
Implementation Method 1
organic EL layers are generally formed by vacuum vapor deposition utilizing a vacuum thin-film-forming technique
Data Source
AI summary
The present invention provides a vapor deposition device including a novel alignment mechanism applicable to a large substrate, a vapor deposition method, and a method for manufacturing an organic electroluminescence element. The vapor deposition device of the present invention is a vapor deposition device for performing vapor deposition while transporting a substrate in a first direction, and includes: a mask; a substrate tray including a substrate-holding portion and a guide portion protruding from the substrate-holding portion to the mask side and disposed along the first direction; at least one distance meter disposed on a first end which is one end of the mask or the guide portion; and at least one driver coupled with a second end which is the other end of the mask. The at least one distance meter is configured to measure a distance between the at least one distance meter and the guide portion or the first end when the guide portion faces the first end. The at least one driver is capable of driving the mask in a second direction perpendicular to the first direction based on the measured value of the at least one distance meter.