Variable Resistance Transparent Electrode for Micro LED Mask Reduction
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Solution Overview
Problem
The existing manufacturing process for array-driven micro LEDs requires five complex and time-consuming mask processes, leading to high production costs and reduced productivity.
Innovation Solution
A method involving the use of a variable resistance material as a transparent electrode, where a conductive filament is formed by applying a voltage greater than a threshold voltage to a protective layer, reducing the need for multiple mask processes and enabling the formation of a transparent electrode without exposing the second semiconductor layer directly.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If five mask processes are performed in the existing micro LED manufacturing process, then the electrical and optical properties are maintained, but the production cost increases and productivity decreases
Solution Approach 1:
The patent combines the protective layer formation and transparent electrode formation into a single mask process. The protective layer material is deposited to cover both the n-electrode region and the active layer region, and then a single etching process creates openings in both areas simultaneously, eliminating the need for separate mask processes while maintaining electrical isolation and optical transparency functions
Solution Approach 2:
The protective layer material serves multiple functions: it acts as a protective layer to prevent electrical connection between n-electrode and p-electrode, and simultaneously serves as a transparent electrode material when etched to expose the active layer. This multi-functionality reduces the number of separate processes needed
2Reliability
If five mask processes are performed in the existing micro LED manufacturing process, then the electrical and optical properties are maintained, but the manufacturing cost increases
Solution Approach 1:
The patent combines the protective layer formation and transparent electrode formation into a single mask process. The protective layer material is deposited to cover both the n-electrode region and the active layer region, and then a single etching process creates openings in both areas simultaneously, eliminating the need for separate mask processes while maintaining electrical isolation and optical transparency functions
Solution Approach 2:
The protective layer material serves multiple functions: it acts as a protective layer to prevent electrical connection between n-electrode and p-electrode, and simultaneously serves as a transparent electrode material when etched to expose the active layer. This multi-functionality reduces the number of separate processes needed
3Reliability
If five mask processes are performed in the existing micro LED manufacturing process, then the electrical isolation between n-electrode and p-electrode is ensured, but the manufacturing time increases
Solution Approach 1:
The patent combines the protective layer formation and transparent electrode formation into a single mask process. The protective layer material is deposited to cover both the n-electrode region and the active layer region, and then a single etching process creates openings in both areas simultaneously, eliminating the need for separate mask processes while maintaining electrical isolation and optical transparency functions
Solution Approach 2:
The protective layer material is deposited in advance to cover both the n-electrode and active layer regions before any etching processes. This preliminary deposition ensures that electrical isolation is established early in the process, and subsequent single-step etching creates both the electrical isolation structure and transparent electrode structure simultaneously
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach minimizes the number of mask processes, lowering production costs and improving productivity while maintaining the electrical and optical properties of micro LEDs.
Implementation Method 1
depositing a variable resistance material that is a transparent material on the substrate to form a protective layer on the first electrodes and the second semiconductor layer of the plurality of micro LED cells and applying a voltage to each of protective layer regions formed above the second semiconductor layer to form a conductive filament, thereby forming a transparent electrode on the second semiconductor layer
Data Source
AI summary
Provided are a micro LED and a method for manufacturing the same. When the micro LED is manufactured, an n-electrode and a protective layer formed on the micro LED is made of a variable resistance material that is a transparent material, and a voltage greater than a unique threshold voltage of the variable resistance material is applied to the variable resistance material on an area of the protective layer formed on the p-type semiconductor layer to form a conductive filament in the variable resistance material, thereby forming a transparent electrode. Thus, the micro LED according to the present invention may be produced with lower cost and higher productivity by omitting the mask process for forming the transparent electrode in the prior art.