Vertical Transfer Gate Layout to Reduce Image Sensor GIDL

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Solution Overview

Problem

The integration of image sensors leads to increased leakage current due to gate-induced drain leakage (GIDL) between the floating diffusion region and the dual vertical transfer gate, degrading image quality and reliability.

Innovation Solution

Incorporating a concave portion in the electrode pad portion of the vertical transfer gate to create a sufficient distance from the floating diffusion region, reducing GIDL and read noise.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If the electrode pad portion is positioned close to the floating diffusion region to reduce device area, then area is reduced, but gate-induced drain leakage current increases

Engineering Contradiction:
Improvedevice areaVSAvoidleakage current
Core Design Contradiction:
Area of stationary objectVSObject-generated harmful factors

Solution Approach 1:

The electrode pad portion is extended in the vertical direction (depth dimension) to form a recessed structure. This dimensional change allows the pad to maintain sufficient horizontal distance from the floating diffusion region while occupying minimal planar area, thus reducing GIDL without increasing device footprint.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The electrode pad portion is nested within the vertical transfer gate structure, forming a recessed region. This nesting arrangement allows the pad to be positioned close to the floating diffusion region in the planar view while maintaining vertical separation, effectively reducing both area and leakage current.

Inventive Principle:
Principle #7Nested doll (Nesting)

2Productivity

If the vertical transfer gate is positioned close to the floating diffusion region to improve charge transfer efficiency, then transfer efficiency is improved, but gate-induced drain leakage current increases

Engineering Contradiction:
Improvecharge transfer efficiencyVSAvoidleakage current
Core Design Contradiction:
ProductivityVSObject-generated harmful factors

Solution Approach 1:

The vertical transfer gate is extended in the vertical direction to form a deeper structure that reaches closer to the photoelectric conversion region. This dimensional extension improves charge transfer efficiency by reducing the transfer distance while the recessed electrode pad portion maintains sufficient horizontal separation from the floating diffusion region to minimize GIDL.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Reliability

If the electrode pad portion is extended horizontally to reduce contact resistance, then electrical connection is improved, but distance to floating diffusion region decreases increasing leakage

Engineering Contradiction:
Improveelectrical connectionVSAvoidleakage current
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

Instead of extending the electrode pad horizontally, the pad is extended in the vertical direction to form a recessed structure. This allows the pad to maintain good electrical contact with the vertical transfer gate through the recessed region while keeping sufficient horizontal distance from the floating diffusion region, thus reducing leakage current while maintaining low contact resistance.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design effectively minimizes leakage current and enhances the reliability and quality of the image sensor by securing a gap between the vertical transfer gate and the floating diffusion region.

Implementation Method 1

a photoelectric conversion region (e.g., photodiode) receiving incident light and converting the light into an electrical signal

Methodology Applied
Scientific EffectPhotoelectric conversion: Photoelectric Effect

Data Source

PatentUS20240234453A9Image sensor
Publication Date: 2024.07.11 SAMSUNG ELECTRONICS CO LTD
  • US20240234453A9 patent drawing
  • US20240234453A9 patent drawing
  • US20240234453A9 patent drawing

AI summary

An image sensor, comprising a semiconductor substrate having first and second surfaces opposed to each other, a photoelectric conversion region in the semiconductor substrate, a floating diffusion region adjacent to the first surface in the semiconductor substrate, and a vertical transfer gate on the first surface of the semiconductor substrate, and extending in a direction perpendicular to the first surface and connected to the photoelectric conversion region. The vertical transfer gate may transfer photocharges collected in the photoelectric conversion region to the floating diffusion region. The vertical transfer gate includes a first vertical electrode portion and a second vertical electrode portion extending from the first surface of the semiconductor substrate in the vertical direction, and connected to the photoelectric conversion region, respectively.