Vertical Substrate Treatment Line for Faster Multi-Chamber Transfer
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Solution Overview
Problem
Semiconductor manufacturing processes face inefficiencies due to the presence of contaminants on substrates, which require extensive substrate treatment processes that consume significant time for loading and unloading between multiple treatment chambers.
Innovation Solution
A substrate treatment line featuring a vertical return robot with multiple gripping portions for simultaneous vertical transfer and loading/unloading of substrates, combined with a horizontal return robot for horizontal transfer between chamber portions, allowing for efficient and rapid treatment of multiple substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If substrates are transferred sequentially between multiple treatment chambers, then each substrate can be treated properly, but the treatment process consumes tremendous amount of time
Solution Approach 1:
The treatment chamber is divided into multiple independent treatment chambers (first treatment chamber, second treatment chamber, third treatment chamber) that can operate simultaneously. Each chamber handles one substrate at a time, allowing parallel processing of multiple substrates, thereby reducing total transfer time while maintaining treatment completeness.
Solution Approach 2:
The patent introduces a vertical stacking arrangement of treatment chambers in the vertical direction, transforming the traditional horizontal sequential arrangement into a three-dimensional structure. This vertical dimension enables simultaneous access to multiple chambers by the return robot, allowing parallel operations and reducing the time required for substrate transfer and treatment.
2Productivity
If a parallel structure is used to clean or dry multiple substrates simultaneously, then productivity increases, but device complexity increases
Solution Approach 1:
The return robot is designed with multiple gripping portions that can simultaneously grip and transfer multiple substrates. This multi-functional capability allows a single robot to perform the work of multiple sequential robots, increasing productivity while avoiding the need for separate transfer mechanisms for each chamber.
Solution Approach 2:
Multiple treatment chambers are merged into a single integrated chamber portion with shared access points. The return robot serves all chambers from common loading and unloading points, consolidating what would otherwise require separate transfer systems. This merging reduces overall system complexity while enabling parallel processing.
3Productivity
If multiple gripping portions are used for simultaneous vertical transfer, then substrate transfer efficiency increases, but robot structure complexity increases
Solution Approach 1:
The return robot employs movable gripping portions that can dynamically adjust their positions and engage with substrates at different heights. This dynamic capability allows the robot to simultaneously access multiple vertically stacked chambers and transfer substrates in parallel, achieving high productivity without requiring a rigid, overly complex mechanical structure.
Data Source
AI summary
A substrate treatment line is disclosed. The substrate treatment line may include a chamber portion including a plurality of treatment chambers stacked in a vertical direction, and a vertical return robot, including a plurality of gripping portions, to transfer a plurality of substrates in a vertical direction simultaneously and load or unload the substrates to the treatment chambers.