Standard Cell Height Layout Using Virtual Grids for Smaller ICs

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

In integrated circuit design, standard cells with cell heights that are integral multiples of the nominal minimum pitch T limit flexibility and increase die size, as designers must enlarge cell size to meet integral multiple requirements, which can be inefficient and wasteful.

Innovation Solution

Designing standard cells with non-integral multiples of the nominal minimum pitch T cell heights, such as 7.5T, allows for more flexibility and reduces overall die size by enabling the use of virtual grid lines for routing metal lines, thereby optimizing the placement and routing of standard cells within the integrated circuit layout.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If standard cells are designed with cell heights that are integral multiples of the nominal minimum pitch T, then manufacturing compatibility is improved, but design flexibility deteriorates and die size increases

Engineering Contradiction:
Improvemanufacturing compatibilityVSAvoiddesign flexibility
Core Design Contradiction:
Ease of manufactureVSAdaptability or versatility

Solution Approach 1:

The patent divides the standard cell structure into modular components that can be independently designed and then assembled. By segmenting the cell into functional blocks with standardized interfaces, the design achieves both manufacturing compatibility through modular assembly and design flexibility through varied internal configurations of the segments.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent changes the critical parameter from fixed integral multiples of pitch T to a range of acceptable heights including non-integral multiples. This parameter change enables continuous optimization of cell height for specific functional requirements while maintaining compatibility with manufacturing processes through established pitch guidelines.

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If standard cells are enlarged to meet integral multiple pitch requirements, then manufacturing compatibility is improved, but die size increases

Engineering Contradiction:
Improvemanufacturing compatibilityVSAvoiddie size
Core Design Contradiction:
Ease of manufactureVSArea of stationary object

Solution Approach 1:

The patent applies partial adherence to pitch multiples rather than requiring full integral multiples. By using pitch T as a guideline rather than a strict constraint, the design achieves sufficient manufacturing compatibility without the excessive cell enlargement that would be required to force non-optimal dimensions, thereby reducing overall die size.

Inventive Principle:
Principle #16Partial or excessive action

3Adaptability or versatility

If standard cells are designed with non-integral multiple pitch heights, then design flexibility and die size optimization are improved, but manufacturing complexity increases

Engineering Contradiction:
Improvedesign flexibilityVSAvoidmanufacturing complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent performs preliminary planning and coordination during the design phase to anticipate manufacturing requirements. By pre-coordinating cell placements and routing strategies to work with non-integral heights, the design achieves flexibility without transferring excessive complexity to the manufacturing process.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent introduces virtual grid lines as an intermediary concept that bridges design flexibility and manufacturing requirements. These virtual grids provide a reference framework for routing and placement that accommodates non-integral cell heights while maintaining systematic organization that simplifies manufacturing processes.

Inventive Principle:
Principle #24Intermediary (Mediator)

Data Source

PatentUS12153868B2Integrated circuit having non-integral multiple pitch
Publication Date: 2024.11.26 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12153868B2 patent drawing
  • US12153868B2 patent drawing
  • US12153868B2 patent drawing

AI summary

An integrated circuit includes a plurality of metal lines extending along a first direction, the plurality of metal lines being separated, in a second direction perpendicular to the first direction, by integral multiples of a nominal minimum pitch. The integrated circuit further includes a plurality of standard cells, at least one of the plurality of standard cells having a cell height along the second direction being a non-integral multiple of the nominal minimum pitch.