W-Si SOT Magnetic Tunnel Junction for Low-Resistance Switching

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current spin-orbit torque (SOT)-based magnetic tunnel junctions face challenges in achieving high spin-orbit torque efficiency at low specific resistance and maintaining perpendicular magnetic anisotropy across various thermal treatment temperatures.

Innovation Solution

A spin-orbit torque-based magnetic tunnel junction incorporating a W—X alloy thin film, where W is tungsten and X includes group IV semiconductors and group III-V semiconductors, with a tungsten-silicon alloy as the spin-orbit active layer, allowing for spin-orbit torque switching and high efficiency, and a method of fabricating this junction by forming the W—X alloy on a substrate and thermally treating it to control switching current and maintain perpendicular magnetic anisotropy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If a conventional spin-orbit active layer is used, then the device structure is simple, but the spin-orbit torque efficiency is low and specific resistance is high

Engineering Contradiction:
Improvespin-orbit torque efficiencyVSAvoidspecific resistance
Core Design Contradiction:
Loss of energyVSQuantity of substance

Solution Approach 1:

The patent uses a W—X alloy composite material where tungsten (W) provides high spin-orbit coupling and group IV or group III-V semiconductors (X) provide low specific resistance. This composite structure achieves both high spin-orbit torque efficiency and low specific resistance simultaneously, resolving the technical contradiction between these two parameters.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent changes the compositional parameters of the spin-orbit active layer by forming a W—X alloy with specific composition ratios. By adjusting the concentration of tungsten and semiconductor elements, the patent optimizes both the spin Hall angle (for torque efficiency) and the electrical resistivity, transforming the material properties to resolve the contradiction.

Inventive Principle:
Principle #35Parameter changes

2Ease of operation

If thermal treatment temperature is increased to control switching current, then switching current decreases, but perpendicular magnetic anisotropy may be lost

Engineering Contradiction:
Improveswitching currentVSAvoidperpendicular magnetic anisotropy
Core Design Contradiction:
Ease of operationVSStability of the object's composition

Solution Approach 1:

The W—X alloy composite structure maintains perpendicular magnetic anisotropy stability at elevated thermal treatment temperatures (300-500°C) while still achieving reduced switching current. The synergistic combination of tungsten and semiconductor elements provides both the desired magnetic properties and electrical characteristics that resolve this contradiction.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent performs thermal treatment at optimized temperature ranges (300-500°C) to adjust the compositional and structural parameters of the W—X alloy. This thermal processing modifies the material properties to achieve lower switching current while preserving perpendicular magnetic anisotropy, resolving the contradiction between operational ease and compositional stability.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables high spin-orbit torque efficiency at low specific resistance and maintains perpendicular magnetic anisotropy across different thermal treatment temperatures, reducing switching current and enhancing magnetic properties.

Implementation Method 1

the spin-orbit torque (SOT) phenomenon that induces switching of a free layer using the spin Hall effect or the Rashba effect occurring when current flows in a parallel direction in a plane of a spin-orbit active layer adjacent to a free layer

Methodology Applied
Scientific EffectSpin Hall Effect: Hall Effect

Implementation Method 2

the spin-orbit torque (SOT) phenomenon that induces switching of a free layer using the spin Hall effect or the Rashba effect occurring when current flows in a parallel direction in a plane of a spin-orbit active layer adjacent to a free layer

Methodology Applied
Scientific EffectRashba effect:

Implementation Method 3

the value of tunneling current passing through a tunnel barrier is changed depending upon the state in which the spin direction of the adjacent free layer and pinned layer are arranged in parallel or antiparallel with the tunnel barrier interposed therebetween

Methodology Applied
Scientific EffectTunneling magnetoresistance: Magnetoresistance

Implementation Method 4

a magnetic tunnel junction must have perpendicular magnetic anisotropy (PMA). PMA means that the magnetization direction of a magnetic layer is perpendicular to a magnetic layer plane

Methodology Applied
Scientific EffectPerpendicular magnetic anisotropy: Anisotropy

Data Source

PatentUS12161051B2Spin-orbit torque (SOT)-based magnetic tunnel junction and method of fabricating the same
Publication Date: 2024.12.03 KOREA UNIV RES & BUSINESS FOUND
  • US12161051B2 patent drawing
  • US12161051B2 patent drawing
  • US12161051B2 patent drawing

AI summary

Disclosed are a spin-orbit torque (SOT)-based magnetic tunnel junction and a method of fabricating the same. More particularly, the SOT-based magnetic tunnel junction includes a spin-orbit torque (SOT)-based magnetic tunnel junction, including: a spin-orbit active layer formed on the substrate; a free layer formed on the spin-orbit active layer; a tunnel barrier layer formed on the free layer; and a pinned layer formed on the tunnel barrier layer, wherein the spin-orbit active layer includes a W—X alloy (where W is tungsten and X includes at least one of group IV semiconductors and group III-V semiconductors).