Wafer Centering Device Pneumatic Pusher Alignment

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Solution Overview

Problem

Wafer centering errors during measurement lead to high error rates and reduced operation efficiency in CMP equipment, as wafers often fail to be properly aligned with measuring apparatuses.

Innovation Solution

A wafer centering device comprising a body unit, guide unit with a support part and through-hole, and a displacement unit with actuators and a returning member, which uses air flow to move a pusher within the through-hole to center the wafer, ensuring accurate alignment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If wafers are processed without a centering device, then the device complexity is reduced, but the measurement precision deteriorates due to centering errors

Engineering Contradiction:
Improvewafer centering accuracyVSAvoidcentering device structure
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

A pusher component is introduced as an intermediary element between the actuator and the wafer. The pusher translates the actuator's linear motion into precise wafer positioning, mediating the interaction between the driving mechanism and the measured object to achieve accurate centering without complex direct coupling

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The manual or complex mechanical centering adjustment is replaced with a pneumatic actuator system. Compressed air drives the piston-rod mechanism, substituting intricate mechanical linkages with a simpler pneumatic-driven system that achieves the same centering function with fewer moving parts

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Measurement precision

If a complex centering mechanism is used, then the measurement precision is improved, but the device complexity increases

Engineering Contradiction:
Improvewafer alignment accuracyVSAvoidcentering mechanism structure
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The centering function is extracted as a separate, modular displacement unit with independent actuator, pusher, and returning member components. This extracted module can be independently designed, adjusted, and maintained without affecting the main measuring apparatus, simplifying the overall system while maintaining precision

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The system uses adjustable parameters including air pressure control for the actuator, spring pre-load for the returning member, and geometric parameters of the guide holes to fine-tune the centering precision. By changing these parameters rather than redesigning the mechanism, optimal performance is achieved without increasing structural complexity

Inventive Principle:
Principle #35Parameter changes

3Productivity

If manual centering adjustment is used, then the device complexity is reduced, but the productivity decreases due to high error rates

Engineering Contradiction:
Improveoperation rate of CMP equipmentVSAvoidautomated centering system
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The centering system performs self-centering automatically through the actuator-pusher-spring mechanism without requiring external manual intervention. The wafer is inserted and the system autonomously positions it correctly, then automatically resets via the returning member, enabling continuous operation and improving productivity

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The centering action is performed preliminarily before the measurement process begins. The actuator positions the wafer in the correct centered location in advance, ensuring that the subsequent measurement operation can proceed immediately without adjustment delays, thereby improving overall operation rate

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances the operation rate of CMP equipment by effectively centering wafers, reducing measurement errors and improving the precision of wafer width measurement.

Implementation Method 1

a returning member which allows the actuators to be elastically supported with respect to the body unit such that the actuators after operation thereof may return to an initial position

Methodology Applied
Scientific EffectElasticity: Elasticity

Implementation Method 2

a piston which is arranged in the cylinder and moves in the cylinder by the air

Methodology Applied
Scientific EffectPneumatics: Pressure Gradient

Data Source

PatentUS10818533B2Wafer centering device for measurement apparatus
Publication Date: 2020.10.27 SEMICON ENERGY LAB CO LTD
  • US10818533B2 patent drawing
  • US10818533B2 patent drawing

AI summary

The present invention provides a wafer centering device for a measurement apparatus, the device comprising: a body unit; a guide unit which is installed in the body unit, has a support part for supporting a wafer, and has a through-hole and; and a displacement unit which is formed to be moved in the through-hole and has a pusher for moving the wafer on the support part.