Wafer Cleaning Bath Structure for Alkaline Leak Containment
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Solution Overview
Problem
Existing wafer cleaning devices face challenges in preventing strong alkaline cleaning solutions from leaking outside, particularly due to decrepitude or degradation, which compromises safety and reduces production efficiency as the process is halted to visually identify and correct leaks.
Innovation Solution
A wafer cleaning device design featuring a tray detachable from the external water bath's inner bottom surface to collect and guide the cleaning solution to a drain hole, along with non-metallic guide portions to prevent leakage and facilitate quick response to any spills, ensuring the cleaning solution does not leak outside and allowing for rapid resumption of the cleaning process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If a metal material is used for the external water bath, then structural strength is improved, but the cleaning solution leaks due to decrepitude or degradation
Solution Approach 1:
The patent divides the external water bath into two separate structures: a metal outer bath providing structural strength and a non-metallic inner bath containing the cleaning solution. This segmentation allows each material to perform its optimal function - the metal provides strength while the non-metallic material prevents degradation and leakage of the alkaline cleaning solution.
Solution Approach 2:
The non-metallic inner bath acts as an intermediary between the cleaning solution and the metal outer bath. It protects the metal structure from direct contact with the corrosive alkaline solution, preventing degradation while maintaining structural integrity through the combination of both materials.
2Ease of repair
If the cleaning process is stopped to visually sense and weld the leaking portion, then leak correction is achieved, but production efficiency is lowered
Solution Approach 1:
The non-metallic inner bath is installed in advance within the metal outer bath, creating a pre-configured containment system. This preliminary action prevents leaks before they occur by using a degradation-resistant material that is inherently suitable for containing alkaline cleaning solutions, eliminating the need for corrective repairs.
Solution Approach 2:
The dual-bath structure provides beforehand cushioning against potential leaks by using a non-metallic inner bath that is resistant to alkaline degradation. This preventive design cushions against the harmful effects of leakage, ensuring continuous operation without production interruptions.
3Ease of operation
If the cleaning solution is drained through a drain hole in the external water bath, then overflow is managed, but the cleaning solution leaks to the outside
Solution Approach 1:
The patent segments the drainage function from the containment function by providing separate drain holes in both the inner and outer baths. The inner bath's drain hole manages overflow internally, while the outer bath's drain hole provides a controlled drainage path, preventing uncontrolled leakage to the outside environment.
Solution Approach 2:
The non-metallic inner bath serves as an intermediary containment layer that manages cleaning solution overflow through its own drain hole before the solution can reach the outer bath. This intermediate drainage system prevents harmful leakage by controlling the flow path of the cleaning solution.
Data Source
AI summary
The present invention relates to a wafer cleaning device which can prevent a cleaning solution from leaking and enables prompt treatment. The present invention provides a wafer cleaning device comprising: a cleaning bath which receives a cleaning solution and from which the cleaning solution overflows according to the dipping of wafers; a plurality of lift parts arranged at the outside of the cleaning bath and dipping the cassette into the cleaning solution in the cleaning bath; an external water tank having the cleaning bath and the lift parts received therein and including a drain hole through which the cleaning solution is drained; and a tray which can be detachably attached to the inner bottom surface of the external water tank and collects the cleaning solution to guide same to the drain hole.