Wafer Composite with Sacrificial Separation Layer

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Solution Overview

Problem

There is a need for cost-effective methods to produce high-quality monocrystalline semiconductor layers for manufacturing semiconductor components, as existing methods are inefficient in achieving high crystal quality.

Innovation Solution

A method involving a wafer composite with a donor substrate, an auxiliary substrate, and a separation layer with a support structure and sacrificial material, where the auxiliary substrate is separated from the donor substrate by selective removal of the sacrificial material, facilitating the growth of epitaxial layers and the formation of semiconductor components with minimal impairment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional methods are used to produce monocrystalline semiconductor layers, then crystal quality can be achieved, but the production cost is high and efficiency is low

Engineering Contradiction:
Improvecrystal qualityVSAvoidproduction efficiency
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The invention segments the substrate system into three distinct components: a donor substrate containing the monocrystalline seed layer, an auxiliary substrate providing mechanical support, and a separation layer with sacrificial material enabling their dissociation. This segmentation allows the monocrystalline layer to be grown on a stable donor substrate while the auxiliary substrate provides structural integrity during processing, resolving the contradiction between achieving high crystal quality and maintaining production efficiency

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The separation layer with sacrificial material acts as an intermediary between the donor substrate and auxiliary substrate. It enables temporary bonding during the epitaxial growth process to ensure mechanical stability and crystal quality, then allows clean separation afterward to enable efficient production cycles. This intermediary mechanism resolves the contradiction by providing both stability during growth and efficiency during production

Inventive Principle:
Principle #24Intermediary (Mediator)

2Strength

If the auxiliary substrate is used to support the donor substrate, then mechanical stability is improved, but separation and processing complexity increases

Engineering Contradiction:
Improvemechanical stabilityVSAvoidseparation complexity
Core Design Contradiction:
StrengthVSDevice complexity

Solution Approach 1:

The invention extracts the mechanical support function from the donor substrate itself and places it in a separate auxiliary substrate. This allows the donor substrate to focus on providing high-quality monocrystalline growth while the auxiliary substrate provides pure mechanical support. The separation layer with sacrificial material enables clean extraction of the auxiliary substrate after processing, resolving the contradiction between mechanical stability and separation complexity

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The separation layer with sacrificial material is designed as a disposable component that facilitates the separation process and is then removed. This disposable approach simplifies the overall separation complexity by providing a dedicated, easy-to-remove bonding mechanism between the auxiliary and donor substrates, resolving the contradiction between mechanical stability during processing and ease of separation

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method enables the production of high-quality semiconductor components with improved mechanical stability and integrity, allowing for efficient processing and separation of functional elements, thereby addressing the challenge of achieving high crystal quality at a lower cost.

Implementation Method 1

the separation includes a selective removal of the sacrificial material in relation to the support structure

Methodology Applied
Scientific EffectSelective removal:

Data Source

PatentUS10651072B2Wafer composite and method for producing semiconductor components
Publication Date: 2020.05.12 INFINEON TECHNOLOGIES AG
  • US10651072B2 patent drawing
  • US10651072B2 patent drawing
  • US10651072B2 patent drawing

AI summary

This application relates to a method for producing a semiconductor component, in which a wafer composite is provided. The wafer composite includes a donor substrate, an auxiliary substrate and a separation layer arranged between the auxiliary substrate and the donor substrate. The separation layer has a support structure and sacrificial material, which is formed laterally between elements of the support structure. The auxiliary substrate is separated from the donor substrate. The separation includes a selective removal of the sacrificial material in relation to the support structure.