Wafer Developing Apparatus With Semipermeable Drop Barrier
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Solution Overview
Problem
The issue with conventional developing apparatuses in photolithography is that developer mist rebounds from the wafer surface, leading to liquid drops forming on the apparatus housing and falling back onto the wafer, causing defects in the photoresist and reducing semiconductor yield.
Innovation Solution
A developing apparatus with a semipermeable diaphragm that separates the housing into upper and lower chambers, allowing moisture to pass from the lower to the upper chamber while preventing larger liquid drops from moving back to the wafer, using a semipermeable material like polypropylene to manage moisture transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If continuous spray development is used, then development speed is improved, but liquid drops rebound from wafer surface and fall onto wafer causing defects
Solution Approach 1:
The housing is segmented into upper and lower chambers by a semipermeable diaphragm, separating the space where liquid drops can form from the wafer area, allowing moisture to pass through while preventing liquid drops from falling onto the wafer
Solution Approach 2:
A semipermeable diaphragm is introduced as an intermediary component between the lower chamber (where developer is sprayed) and the upper chamber, allowing moisture vapor to pass through while blocking liquid drops from reaching the wafer
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively prevents liquid drops from forming on the wafer, reducing defects and improving semiconductor yield by ensuring uniform developer application and preventing contamination.
Implementation Method 1
a semipermeable diaphragm disposed within the housing and separating the housing into an upper housing defining an upper chamber and a lower housing defining a low chamber, wherein the semipermeable diaphragm is semipermeable to moisture such that moisture is allowed to move from the lower chamber to the upper chamber, but liquid drops formed from the moisture are prohibited to move from the upper chamber to the lower chamber
Data Source
AI summary
The present application relates to a developing apparatus. The developing apparatus comprises a housing; a wafer support disposed within the housing and for holding a wafer; a semipermeable diaphragm disposed within the housing and separating the housing into an upper housing defining an upper chamber and a lower housing defining a low chamber, wherein the semipermeable diaphragm is semipermeable to moisture such that moisture is allowed to move from the lower chamber to the upper chamber, but liquid drops are prohibited to move from the upper chamber to the lower chamber; and a nozzle assembly disposed above the wafer support and for spraying at least developer to the wafer support.