Wafer Edge-Support Manipulator for Scratch-Free Transfer
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing manipulators used in semiconductor processing cause scratches and contact marks on wafers during transfer, especially during back metal processes where wafers tend to curl, increasing contact area and scratch severity.
Innovation Solution
A manipulator with a finger structure and multiple support members arranged at intervals on the same circumference, designed to contact the edge of the wafer rather than its surface, preventing direct contact with the finger structure and reducing friction-induced scratches.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the manipulator uses a conventional finger structure to transfer the wafer, then the wafer can be transferred, but the finger structure contacts the wafer surface causing scratches and contact marks
Solution Approach 1:
The manipulator finger structure is segmented into multiple support members arranged at intervals on the same circumference. Each support member independently contacts only the wafer edge, dividing the contact function into discrete points rather than continuous surface contact, thereby preventing scratches while maintaining transfer capability
Solution Approach 2:
The support members act as intermediary elements between the finger structure and the wafer. These intermediaries are positioned to contact only the wafer edge, mediating the transfer force away from the vulnerable front surface and preventing direct harmful contact between the manipulator and wafer surface
2Adaptability or versatility
If the wafer is processed with back surface facing up (for back metal process), then the back metal deposition can be performed, but the wafer curls up increasing contact area with manipulator and worsening scratches
Solution Approach 1:
The segmented support members are distributed at intervals around the circumference, creating discrete contact points at the wafer edge. This segmentation ensures that even when the wafer curls during back metal processing, only specific edge points contact the support members, minimizing the total contact area and preventing severe scratches
Solution Approach 2:
The support members are specifically designed to contact only the local edge region of the wafer, not the entire surface. This localized contact approach allows the wafer to curl during back metal processing without increasing harmful contact area, as the contact is confined to the edge where curling occurs
Data Source
AI summary
The manipulator of embodiments of the present disclosure is configured to transfer a wafer and includes a finger structure and a plurality of support members. The plurality of support members are arranged at the finger structure and distributed at intervals on a same circumference. Each support member is configured to contact an edge of the wafer to support the wafer to prevent the wafer from contacting the finger structure. With the manipulator of embodiments of the present disclosure, the wafer is prevented from contacting the finger structure to avoid scratches and contact marks generated at the surface of the wafer.


