Wafer Exchanger Blades for Parallel Transfer in CMP Tools
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Solution Overview
Problem
Wafer processing tools, such as CMP systems, experience delays due to the transfer of wafers between different processing stations, as robots wait to access wafers before and after various processes, leading to time-consuming operations.
Innovation Solution
A wafer processing device with a wafer exchanger featuring rotatable blades and a vertically movable load cup, allowing for efficient transfer of wafers between blades and robot access locations, reducing processing times by enabling parallel processing and faster cycle times.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Extent of automation
If a robot is used to transfer wafers between processing stations, then wafer transfer can be automated, but the robot becomes a bottleneck that increases processing time
Solution Approach 1:
The wafer transfer system is segmented into multiple independent blades that can operate simultaneously. Each blade can load or unload wafers independently, allowing parallel operations that eliminate the sequential bottleneck of a single robot arm.
Solution Approach 2:
Wafers are pre-positioned on the wafer exchanger blades in advance. The load cup prepares wafers for transfer by positioning them on blades before the actual transfer operation, so that when transfer is needed, wafers are already ready and no waiting time is required.
2Ease of operation
If wafers are transferred sequentially between stations, then transfer operations are simple to control, but processing delays occur as robots wait for access
Solution Approach 1:
The wafer exchanger enables continuous wafer transfer operations by maintaining a ready supply of wafers on multiple blades. While one blade is being transferred, other blades can be loaded or prepared, ensuring that the transfer operation never stops and productivity is maximized.
Solution Approach 2:
The wafer exchanger acts as an intermediary device between the robot and processing stations. It buffers and manages wafer storage, allowing the robot to operate at its own pace while maintaining a steady supply of wafers, thus decoupling the robot's operation from the processing station's requirements.
3Reliability
If the robot waits for wafer access before and after processes, then precise control is maintained, but time-consuming delays are introduced
Solution Approach 1:
Wafers are pre-positioned on the wafer exchanger blades and in the load cup before the robot needs to access them. This preliminary preparation eliminates waiting time while maintaining control, as the system knows exactly where each wafer is located and when it will be needed.
Solution Approach 2:
The wafer exchanger is designed to automatically present wafers to the robot at the appropriate times without requiring the robot to wait or search. The system self-manages wafer positioning and presentation, reducing idle time while maintaining reliable process control.
Data Source
AI summary
A wafer processing device may include a wafer exchanger including two or more blades, each of the two or more blades may be configured to receive a wafer, the two or more blades may be rotatable about an axis on a single horizontal plane, and the two or more blades may be movable between at least a load cup and a robot access location; wherein the load cup may include a wafer station that is vertically moveable relative a blade located in the load cup and may be configured to remove a wafer from a blade located in the load cup and place a wafer on a blade located in the load cup. Other devices, load cups and methods are also disclosed herein.