Wafer Transfer Robot Finger Layout for Aligner Clearance

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Solution Overview

Problem

Existing wafer transfer apparatuses face challenges in achieving high transfer throughput due to limited operation ranges of robot arms, particularly when the length of the robot arm is longer than half the depth dimension of the transfer space.

Innovation Solution

The proposed wafer transfer apparatus includes a wafer transfer robot with an arm body having two rotationally connected arms, a finger for holding the wafer, an arm body drive mechanism, a finger drive mechanism, and an elevating mechanism. The separation dimension between the wafer holding rods is larger than the width dimension of the aligner, allowing the finger to move below the aligner and simplify the transfer operation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If the robot arm length is increased to reach distant positions, then the transfer range is improved, but the operational complexity and time increase

Engineering Contradiction:
Improvetransfer rangeVSAvoidoperational time
Core Design Contradiction:
Adaptability or versatilityVSLoss of time

Solution Approach 1:

The patent introduces a vertical dimension to the robot's operation by adding an elevating mechanism. Instead of only moving horizontally with long arms, the robot can now move vertically below the aligner body, creating a three-dimensional workspace that reduces the need for excessively long horizontal arms and simplifies the transfer path.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Adaptability or versatility

If the robot arm length is increased to reach distant positions, then the transfer range is improved, but the device complexity increases

Engineering Contradiction:
Improvetransfer rangeVSAvoidmechanism complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

By adding vertical movement capability through the elevating mechanism, the system achieves extended reach without proportionally increasing horizontal arm length. This dimensional approach simplifies the overall mechanism compared to using only longer horizontal arms to achieve the same transfer range.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Manufacturing precision

If the finger operates close to the aligner body, then the transfer precision is improved, but the operational freedom is reduced

Engineering Contradiction:
Improvetransfer precisionVSAvoidoperational freedom
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent enables the finger to operate in the vertical dimension below the aligner body, separating the horizontal positioning function from the vertical approach. This allows the finger to achieve precise transfers near the aligner while maintaining operational freedom through the additional vertical degree of freedom.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

4Productivity

If the wafer transfer robot operates independently of the aligner position, then the throughput is improved, but the coordination complexity increases

Engineering Contradiction:
ImprovethroughputVSAvoidcontrol complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

By positioning the finger below the aligner body through vertical movement, the robot can independently perform transfer operations without being constrained by the aligner's horizontal position. This spatial separation enables parallel operations and improved throughput while the control system manages coordination through the added vertical dimension.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS12275601B2Wafer transfer apparatus and wafer transfer method
Publication Date: 2025.04.15 RORZE CORP
  • US12275601B2 patent drawing
  • US12275601B2 patent drawing
  • US12275601B2 patent drawing

AI summary

An object of the invention is to realize a high transfer throughput in a wafer transfer apparatus in which a wafer transfer robot transfers a wafer via an aligner. A wafer transfer apparatus includes a wafer transfer robot, and a separation dimension between a pair of wafer holding rods forming a finger of the wafer transfer robot is set to be larger than a dimension of a body portion of an aligner in a width direction provided in the wafer transfer apparatus. In addition, an elevating mechanism provided in the wafer transfer apparatus is configured to be able to move the finger to below the body portion of the aligner, thereby achieving the object of the invention.