Wafer Detection Light Calibration for Stable Defect Imaging

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Solution Overview

Problem

The deterioration of light sources in wafer appearance defect detection systems leads to poor image quality, affecting the authenticity of captured images and subsequent AI interpretation, which can result in misjudgment during wafer processing.

Innovation Solution

A method and system that adjusts the luminous power of the light source to maintain image brightness within a standard range, issues alerts when the luminous power exceeds a preset value below the maximum limit, and predicts the replacement time of the light source based on time-dependent data analysis.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the light source is used continuously for wafer image capture, then productivity is improved, but the light source deteriorates over time causing image quality degradation

Engineering Contradiction:

Improvecontinuous operation capabilityVSAvoidimage quality stability

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The system captures images of a standard wafer with known characteristics and measures the actual brightness. This measured brightness is fed back to the processing device, which compares it against expected values and automatically adjusts the light source luminous power to compensate for deterioration, maintaining consistent image quality over continuous operation

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The system dynamically changes the luminous power parameter of the light source based on measured image brightness. By adjusting this physical parameter in response to detected variations, the system compensates for light source deterioration and maintains stable imaging conditions during continuous operation

Inventive Principle:

Principle #35Parameter changes

2Illumination intensity

If the luminous power is increased to compensate for light source deterioration, then image brightness is maintained, but energy consumption increases

Engineering Contradiction:

Improveimage brightnessVSAvoidlight source energy consumption

Core Design Contradiction:

Illumination intensityVSUse of energy by moving object

Solution Approach 1:

The system uses feedback control to adjust luminous power only to the extent necessary to maintain target brightness. By continuously monitoring image brightness and making minimal adjustments, the system avoids excessive energy consumption while maintaining adequate illumination

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

Rather than continuously operating at maximum power, the system applies partial action by adjusting luminous power only when and to the extent needed to compensate for deterioration. This prevents excessive energy consumption while maintaining sufficient brightness

Inventive Principle:

Principle #16Partial or excessive action

3Productivity

If manual inspection is replaced by automated wafer appearance defect detection apparatus, then productivity is improved, but the system becomes vulnerable to light source deterioration affecting detection accuracy

Engineering Contradiction:

Improveautomated defect detection capabilityVSAvoiddefect detection accuracy

Core Design Contradiction:

ProductivityVSMeasurement precision

Solution Approach 1:

The system uses a standard wafer with known characteristics as a reference for feedback control. By measuring the actual brightness of images captured from the standard wafer and comparing against expected values, the system detects light source deterioration and automatically compensates, maintaining measurement precision for defect detection

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The system dynamically adjusts the luminous power parameter to maintain consistent image brightness conditions. This parameter change compensation ensures that defect detection accuracy remains stable even as the light source naturally deteriorates over time

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Ensures stable and authentic image capture by maintaining image brightness within a standard range, preventing misjudgment and allowing timely replacement of the light source, thereby improving the reliability of wafer detection.

Implementation Method 1

the light source has a luminous power with a maximum limit

Methodology Applied

Scientific EffectLuminescence: Luminescence

Implementation Method 2

capturing an image of a standard wafer exposed to a light source, wherein the image of the standard wafer has a standard brightness range

Methodology Applied

Scientific EffectPhotoelectric Effect: Photoelectric Effect

Data Source

PatentUS20250277749A1Wafer detection system and method of monitoring the same

Publication Date: 2025.09.04 NAN YA TECH

AI summary

The present disclosure provides a method of monitoring a wafer detection system. The method includes: capturing an image of a standard wafer exposed to a light source, in which the image of the standard wafer has a standard brightness range, and in which the light source has a luminous power with a maximum limit; adjusting the luminous power of the light source to maintain a brightness of an image of the standard wafer within the standard brightness range as the light source deteriorates; and issuing an alert when the luminous power is equal or greater than a preset value lower than the maximum limit.