Semiconductor Wafer Probe Contact Parameter Setting via Coordinate Graph

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Solution Overview

Problem

Conventional methods for setting contact parameters for electrical property tests on semiconductor wafers are limited by the amount of information that can be displayed on a testing apparatus screen, requiring multiple screen changes and making it difficult to visualize and understand the entire contact process between electrode pads and probes.

Innovation Solution

A method using a coordinate graph on a computer display screen to set contact parameters by specifying points for movement positions and times, displaying a broken-line graph to simulate the contact process, allowing for visual checking and simplifying the setting of contact parameters.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If contact parameters are set by inputting values through the testing apparatus screen, then the contact operation can be controlled, but the amount of information that can be displayed is limited and multiple screen changes are required

Engineering Contradiction:
Improvecontact parameter settingVSAvoidcontact process information
Core Design Contradiction:
Ease of operationVSLoss of information

Solution Approach 1:

The patent transforms the one-dimensional sequential screen navigation into a two-dimensional graphical interface where the vertical axis represents movement distance and the horizontal axis represents time. This dimensional change allows all contact parameters and the entire contact process to be visualized simultaneously on a single screen through coordinate graphs and broken-line graphs, eliminating the need for multiple screen changes while preserving complete information.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Quantity of substance

If multiple screen changes are required to set contact parameters, then all parameters can be entered, but it becomes difficult to check relationships between parameters and understand the entire contact process

Engineering Contradiction:
Improvecontact parametersVSAvoidcontact process understanding
Core Design Contradiction:
Quantity of substanceVSDifficulty of detecting and measuring

Solution Approach 1:

The patent merges multiple separate parameter settings and the entire contact process into a single integrated graphical display. By combining movement distance, time, and contact process visualization into one coordinate graph system, users can see all contact parameters and their relationships simultaneously, making it easy to check parameter relationships and understand the complete contact process without switching between multiple screens.

Inventive Principle:
Principle #5Merging (Combining)

3Ease of manufacture

If conventional screen-based parameter setting is used, then contact parameters can be input, but the setting process requires many steps and is not efficient

Engineering Contradiction:
Improveparameter setting processVSAvoidparameter setting time
Core Design Contradiction:
Ease of manufactureVSLoss of time

Solution Approach 1:

The patent uses graphical copying and visualization where the contact process is represented as a broken-line graph that can be directly manipulated. Instead of manually inputting each parameter value through multiple screens, the system allows users to set parameters by interacting with the graphical representation, significantly reducing the number of steps required and accelerating the parameter setting process while maintaining accuracy.

Inventive Principle:
Principle #26Copying

Data Source

PatentUS8395401B2Method for setting contact parameter and recording medium having program for setting contact parameter recorded thereon
Publication Date: 2013.03.12 TOKYO ELECTRON LTD
  • US8395401B2 patent drawing
  • US8395401B2 patent drawing
  • US8395401B2 patent drawing

AI summary

Disclosed is a method to set contact parameters, which can simulate the entire contact process of devices of a semiconductor wafer with probes while visually checking the contact parameters. The method includes preparing a coordinate graph including a time axis and a height axis, and setting contact parameters of the semiconductor wafer by specifying a plurality of points on the coordinate graph by a plurality of upward/downward movement positions of the semiconductor wafer during electrical contact of the electrode pads of the semiconductor wafer with the plurality of probes or separation of the electrode pads of the semiconductor wafer from the plurality of probes, and time required for the semiconductor wafer to move until reaching the upward/downward movement positions, respectively, and displaying a broken-line graph through connecting the specified points with straight-lines.