Wafer Storage Gas Charging for Contamination Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Semiconductor wafers are prone to contamination due to residual gases and moisture during manufacturing processes, which existing storage solutions fail to effectively manage.
Innovation Solution
A wafer storage apparatus with a gas charging portion that includes gas supply blocks, pipes, and a humidity sensor, controlled by a driving unit to maintain optimal humidity levels by injecting and expelling gases, preventing contamination by ensuring a controlled environment for wafer storage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If wafers are stored in an open or conventional storage structure, then accessibility and ease of operation are improved, but wafer contamination from residual gas and moisture increases
Solution Approach 1:
The patent applies the inert atmosphere principle by introducing a gas charging portion that supplies inert gas (such as nitrogen) into the wafer storage apparatus. The gas supply blocks are positioned to distribute gas uniformly across the storage space, creating an inert environment that prevents wafer contamination from residual gases and moisture while maintaining an enclosed yet accessible storage structure.
Solution Approach 2:
The patent applies segmentation by dividing the gas supply function into multiple gas supply blocks distributed within the storage apparatus. Each block contains multiple gas supply holes that segment the gas delivery across different zones of the storage space, ensuring uniform inert atmosphere distribution while maintaining structural organization and wafer accessibility.
2Object-affected harmful factors
If the storage apparatus is enclosed to prevent contamination, then wafer protection is improved, but gas flow control and moisture removal become more difficult
Solution Approach 1:
The patent applies local quality by positioning gas supply blocks at specific locations within the storage apparatus to create localized zones of inert gas flow. The blocks are strategically placed to ensure gas distribution reaches all areas where wafers are stored, providing targeted protection without requiring a complex system-wide gas control mechanism.
Solution Approach 2:
The patent applies self-service through the automatic operation of the gas supply system controlled by a control unit that monitors and adjusts gas flow based on stored wafer information. The system automatically manages gas charging and venting operations without requiring manual intervention, simplifying the control mechanism while maintaining effective wafer protection.
3Object-affected harmful factors
If gas is continuously supplied to maintain low humidity, then wafer protection is improved, but energy consumption increases
Solution Approach 1:
The patent applies periodic action by controlling the gas supply to operate in cycles rather than continuously. The control unit manages gas charging operations based on stored wafer information, supplying inert gas when needed to maintain low humidity and venting the gas afterward. This periodic operation maintains effective humidity control while significantly reducing energy consumption compared to continuous gas supply.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively reduces wafer contamination by maintaining low humidity and removing residual gases, thereby protecting wafers from environmental pollutants during semiconductor manufacturing.
Implementation Method 1
Each of the gas spraying units may include a plurality of spraying holes to spray gas in a plurality of directions
Implementation Method 2
The wafer storage apparatus may include a humidity sensor disposed within the wafer stacking portion
Implementation Method 3
a gas charging portion that includes a plurality of gas supply blocks disposed on the inner side of the rear cover portion, a plurality of gas supply pipes connected to the gas supply blocks via through holes in the rear cover portion, and a gas supply unit connected to the gas supply pipes
Data Source
AI summary
A wafer storage apparatus includes a wafer stacking portion that encloses an internal space with an open front side for receiving a plurality of wafers; a rear cover portion disposed on the back side of the wafer stacking portion; and a gas charging portion that includes a plurality of gas supply blocks disposed on the inner side of the rear cover portion, a plurality of gas supply pipes connected to the gas supply blocks via through holes in the rear cover portion, and a gas supply unit connected to the gas supply pipes.