Wafer Transport Vacuum Chamber Alignment Device
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Solution Overview
Problem
In semiconductor processing systems, frame assemblies with varying diameters often become translationally or rotationally offset during transfer, leading to misalignment issues when returning to loading ports, which existing alignment methods struggle to address efficiently under vacuum conditions while minimizing tool footprint and cost.
Innovation Solution
A transport vacuum chamber with an alignment device featuring guide members that adjust from an expanded to a contracted configuration to precisely align frame assemblies translational and rotationally, using a positioning assembly and actuating mechanism to engage with the frame assembly and adjust its position within a tolerance of ±1 mm and ±1°, allowing accurate transfer between modules and load locks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a slow spinning table and optics are used to determine frame assembly position, then alignment precision is improved, but device complexity and tool footprint increase
Solution Approach 1:
The patent replaces the mechanical slow spinning table and optical measurement system with a purely mechanical alignment device comprising guide members that physically guide the frame assembly into correct alignment. This substitution eliminates complex optics and spinning mechanisms while achieving the same alignment function through simpler mechanical guidance.
Solution Approach 2:
The guide members act as intermediaries between the frame assembly and the loading port, providing a mechanical pathway that passively guides the frame assembly into correct alignment without requiring active measurement or complex control systems.
2Measurement precision
If a slow spinning table and optics are used to determine frame assembly position, then alignment precision is improved, but tool footprint increases
Solution Approach 1:
The patent replaces the mechanical slow spinning table and optical measurement system with a purely mechanical alignment device comprising guide members that physically guide the frame assembly into correct alignment. This substitution eliminates complex optics and spinning mechanisms while achieving the same alignment function through simpler mechanical guidance.
3Productivity
If the robot transfers frame assembly without alignment control, then transfer speed is improved, but misalignment occurs leading to mishandling events
Solution Approach 1:
The alignment device performs preliminary alignment of the frame assembly during the transfer process itself, rather than requiring separate alignment steps before or after transfer. The guide members are positioned to provide alignment guidance throughout the robot's transfer path, ensuring correct alignment is maintained during high-speed operation.
Solution Approach 2:
The guide members act as intermediaries between the frame assembly and the loading port, providing a mechanical pathway that passively guides the frame assembly into correct alignment without requiring active measurement or complex control systems.
Data Source
AI summary
A wafer processing system has a transport vacuum chamber for handling a frame assembly under vacuum conditions, at least one vacuum cassette elevator load lock for housing a cassette and adjusting a vertical position of the cassette under vacuum conditions, and at least one wafer processing module in vacuum communication with the transport vacuum chamber. An actuating assembly changes guide members from an expanded configuration to a contracted configuration to reduce a first cross-sectional dimension of a frame assembly receiving area and to reduce a second cross-sectional dimension of the frame assembly receiving area that is perpendicular to the first cross-sectional dimension.


