Wet Processing Cell Flow Field for Planar Workpiece Support
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Solution Overview
Problem
Existing wet processing technologies struggle to maintain relatively thin and flexible workpieces in a single plane during processing, leading to issues such as undulations, uneven coatings, and potential damage from contact with electrodes.
Innovation Solution
A device with channels through the walls that introduce pressurized liquid at multiple locations, forming a flow field that keeps the workpiece in a central plane by accelerating liquid flow towards discharge openings, using apertures and nozzles to create a tangential flow field without direct contact supports.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If wheels are used to convey the material, then the material can be transported through the treatment chamber, but the wheels contact the material which may cause damage to vulnerable materials covered by photomask
Solution Approach 1:
The patent replaces the mechanical wheel-based conveying system with a liquid flow-based support system. Pressurized liquid flows through channels in the walls and apertures to support and convey the material through the treatment chamber, eliminating direct mechanical contact that could damage vulnerable photomasked surfaces.
Solution Approach 2:
The patent uses pressurized liquid flow (hydraulic principle) to support and transport the material. Liquid is pumped through channels in the walls and discharged through apertures to create a fluid support field that carries the material through the treatment chamber without mechanical contact.
2Reliability
If wheels contact the material along the entire width, then the material is supported during transport, but this causes damage to vulnerable areas covered by photomask
Solution Approach 1:
The patent uses pressurized liquid flow to support the material instead of mechanical wheels. The liquid is discharged through multiple apertures distributed across the treatment chamber, providing continuous support along the material width without concentrated contact points that could damage photomasked areas.
Solution Approach 2:
The patent divides the material support function into multiple discrete liquid discharge points (apertures) distributed across the treatment chamber. This segmentation of the support system eliminates concentrated mechanical contact while maintaining continuous support through distributed liquid flow.
3Object-affected harmful factors
If the distance between anodes and material is increased to prevent contact, then material damage is reduced, but undulations in the material cause uneven coating due to distance variations
Solution Approach 1:
The patent uses pressurized liquid flow to actively support and flatten the material against the anodes, maintaining consistent spacing without requiring large gaps. The liquid pressure counteracts material undulations, ensuring uniform distance between the material surface and anodes for even coating deposition.
Solution Approach 2:
The patent changes the physical state of support from mechanical (wheels) to fluid (pressurized liquid). The liquid flow parameters (pressure, flow rate) are adjusted to maintain optimal spacing between material and anodes, compensating for material undulations and ensuring uniform coating thickness.
4Reliability
If squeeze rollers are used to seal the liquid treatment chamber, then liquid containment is improved, but the rollers may damage vulnerable material surfaces
Solution Approach 1:
The patent replaces mechanical squeeze rollers with pressurized liquid flow for both sealing and material support functions. The liquid pressure creates effective sealing at the chamber boundaries while simultaneously supporting the material, eliminating the need for mechanical rollers that could damage sensitive surfaces.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device effectively maintains thin workpieces in a central plane, preventing undulations and electrode contact, ensuring uniform processing and reducing the risk of damage, while allowing for efficient and compact apparatus design.
Implementation Method 1
pressurised liquid between the first and second walls are provided on opposite sides of the central plane and facing the central plane
Implementation Method 2
using apertures and nozzles to create a tangential flow field without direct contact supports
Data Source
AI summary
A device for a cell of an apparatus for wet processing of a planar workpiece, comprises a structure comprising first and second walls. The workpiece is movable in a central plane through a space between the first and second walls in a first direction (y). Apertures for introducing pressurised liquid between the first and second walls are on opposite sides of the central plane and facing the central plane. The apertures are distributed in the first direction (y) and in a second direction (x) transverse to the first direction (y). Discharge openings for the liquid to leave the space are on opposite sides, in the second direction (x), along the space in the first direction (y). The first and second walls form barriers to liquid flow from the space in a direction (z) perpendicular to the central plane. Channels through the walls are arranged to conduct liquid to respective one of the apertures.