CMP Notch-Finding Station With Liquid Column Optics

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Solution Overview

Problem

Existing chemical mechanical polishing (CMP) systems face inaccuracies in detecting substrate notches due to light scattering from liquid droplets with different refractive indices in wet environments, leading to inconsistent substrate orientation and increased manufacturing costs.

Innovation Solution

A polishing apparatus with a notch-finding station that uses a liquid column to direct a light beam through a uniform medium towards the substrate, enabling precise notch detection without removing the substrate from the carrier, and incorporating a controller to manage liquid flow rates for enhanced accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a light beam is used to detect substrate notch in a wet environment, then notch detection can be performed, but light scattering from liquid droplets causes measurement inaccuracies

Engineering Contradiction:
Improvenotch detection accuracyVSAvoidlight scattering from liquid droplets
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

A liquid column is introduced as an intermediary medium between the light source and the substrate. This liquid column provides a uniform refractive index environment that eliminates light scattering from liquid droplets, thereby improving notch detection accuracy while maintaining the wet polishing environment

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The refractive index of the medium through which light travels is changed from variable (liquid droplets in air) to uniform (continuous liquid column). This parameter change eliminates light scattering and improves measurement precision

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If the substrate is removed from the carrier for notch detection, then detection accuracy may improve, but processing time increases and operational complexity increases

Engineering Contradiction:
Improvenotch detection accuracyVSAvoidsubstrate handling time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The liquid column-based detection system is designed to work with the substrate remaining on the carrier, making the detection process universal and compatible with the existing carrier-based polishing workflow. This eliminates the need for additional substrate handling steps

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Reliability

If liquid flow rate is increased to maintain liquid column stability, then detection reliability improves, but liquid consumption increases

Engineering Contradiction:
Improveliquid column stabilityVSAvoidliquid consumption
Core Design Contradiction:
ReliabilityVSLoss of substance

Solution Approach 1:

The liquid flow rate is made dynamically adjustable rather than fixed. The system can optimize flow rate based on operational conditions, maintaining liquid column stability during detection while reducing liquid consumption during idle periods

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The liquid flow rate parameter is optimized to the minimum value required to maintain liquid column stability. This reduces liquid consumption while preserving detection reliability

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution provides high-precision notch detection in wet environments, reducing manufacturing costs by maintaining substrate orientation consistency and enhancing the reliability of polishing operations.

Implementation Method 1

an optical fiber extending through a floor of the housing and positioned to direct a light beam through the liquid column onto the substrate when held by the carrier at the notch finding station and to receive reflections of the light beam from the substrate

Methodology Applied
Scientific EffectLight reflection: Reflection

Implementation Method 2

light scattering from liquid droplets with different refractive indices in wet environments

Methodology Applied
Scientific EffectRefraction: Refraction

Data Source

PatentUS20260061554A1Finding substrate notch on substrate in a chemical mechanical polishing system
Publication Date: 2026.03.05 APPLIED MATERIALS INC
  • US20260061554A1 patent drawing
  • US20260061554A1 patent drawing
  • US20260061554A1 patent drawing

AI summary

A polishing apparatus has a polishing station, a notch finding station, and a substrate handling system to move a substrate therebetween. The notch finding station includes a housing having an internal volume that provides forms a reservoir with a floor, a ceiling, and first sidewalls that extend from the floor to the ceiling. An aperture extends through the ceiling of the reservoir and a side-passage extends laterally from a region of the reservoir below the aperture to an entry port such that a liquid injected through the entry port flows emerges from the aperture to form a liquid column. An optical fiber extends through a floor of the reservoir and is positioned to direct a light beam through the aperture and through the liquid column onto a substrate when held at the notch finding station and to receive reflections of the light beam from the substrate.