Wire Grid Polarizer Fabrication via Block Copolymer Self-Assembly
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Solution Overview
Problem
Film-type polarizers in liquid crystal display devices degrade under high humidity and temperature conditions, necessitating a more reliable polarizing solution.
Innovation Solution
A wire grid polarizer is fabricated using a method involving a conductive layer, guide layers, and a surface treatment protection layer, with a block copolymer and transfer layer to form conductive wire patterns and reflective films on a substrate, enhancing alignment and reducing defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If film-type polarizers are used in liquid crystal display devices, then linearly polarized light can be produced, but performance degrades under high humidity and temperature conditions
Solution Approach 1:
The patent changes the material composition parameters by using metal nanowires (e.g., aluminum, silver, copper) with specific thickness ranges (10-100 nm) and spacing (50-200 nm) to replace organic film materials, achieving stable optical performance across varying humidity and temperature conditions
Solution Approach 2:
The patent employs composite structures combining metal nanowires with dielectric materials (such as silicon dioxide, silicon nitride) and polymer matrices to create wire grid polarizers that maintain structural integrity and optical performance under harsh environmental conditions
2Reliability
If nanowire grid polarizer with metal pattern is used, then performance under humidity and temperature is improved, but manufacturing complexity increases
Solution Approach 1:
The patent replaces complex mechanical lithography and etching processes with self-assembly mechanisms, where block copolymers spontaneously form nanoscale patterns through phase separation, eliminating the need for sophisticated cleanroom equipment and multi-step alignment processes
Solution Approach 2:
The block copolymer system performs self-patterning through thermally-induced phase separation, automatically forming the required nanowire spacing and geometry without external guidance, thereby simplifying the manufacturing process and reducing production costs
3Manufacturing precision
If block copolymer with different etch rates is used, then alignment precision is improved, but process complexity increases
Solution Approach 1:
The patent designs block copolymers with distinct local properties where different monomer blocks exhibit selective etch rates, allowing one block to be removed while preserving the other, thereby enabling precise pattern transfer and alignment control during fabrication
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method results in a wire grid polarizer with high yield and superior polarizing efficiency, high transmittance, and wide view angle, utilizing metal for high reflectivity and recycling light to achieve improved optical efficiency.
Implementation Method 1
providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns
Implementation Method 2
a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns
Implementation Method 3
forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns
Implementation Method 4
utilizing metal for high reflectivity and recycling light to achieve improved optical efficiency
Data Source
AI summary
A method of fabricating a wire grid polarizer includes sequentially forming a conductive layer, a guide layer, and a surface treatment protection layer on a substrate, patterning the surface treatment protection layer and the guide layer, forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns, removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.