X-Ray Source Beam Deflection for Target Thermal Stability
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Solution Overview
Problem
Existing X-ray sources face challenges in reducing the thermal load on the target element during brief interruptions or standby operations, leading to potential cooling and thermal drift issues.
Innovation Solution
An X-ray source with a deflection device that intermittently deflects the electron beam outside the center or impact region of the target element, and a catching device to redirect and convert the electron beam's energy, reducing the target element's load and preventing cooling.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If the electron beam is continuously directed at the target element during standby operation, then the target element remains thermally loaded and temperature is maintained, but the thermal drift of the target element occurs and the load on the target material increases
Solution Approach 1:
The patent segments the target element into multiple regions with different target materials arranged in different spatial locations. The electron beam can be selectively directed to different regions, allowing the beam to move between impact points rather than continuously loading a single center region. This spatial segmentation enables thermal management by distributing the thermal load across multiple areas.
Solution Approach 2:
The patent implements periodic deflection of the electron beam using deflection devices that intermittently redirect the beam away from the target element's center region. During standby operation, the beam is periodically deflected to trace patterns (such as Archimedean spirals) or directed to peripheral regions, creating a periodic on-off loading pattern that maintains average temperature while preventing localized thermal drift.
2Object-affected harmful factors
If the electron beam is deflected outside the target element during interruptions, then the load on the target material is reduced, but the electron beam energy needs to be managed to prevent glass body loading and ensure thermal coupling
Solution Approach 1:
The patent introduces a catching device as an intermediary component positioned outside the target element to intercept the deflected electron beam. This catching device serves as a mediator that safely absorbs the electron beam energy when the beam is redirected away from the target during standby or interruption periods, preventing the energy from damaging the glass body while maintaining thermal coupling through conduction to the anode body.
Solution Approach 2:
The patent converts the potentially harmful deflected electron beam (which would otherwise damage the glass body) into a beneficial thermal source for the anode body. The catching device captures the beam energy and transfers it as heat to the anode body through thermal conduction, transforming what would be wasted or harmful energy into useful thermal energy that helps maintain system temperature.
3Adaptability or versatility
If multiple target materials are used in different regions, then different types of X-radiation can be generated, but the device complexity increases
Solution Approach 1:
The patent creates a universal target element structure that can generate multiple types of X-radiation by incorporating different target materials (such as tungsten, molybdenum, rhodium, or chromium) in different regions of the same target element. This multi-functional design allows a single target element to serve multiple purposes, enabling the generation of different X-ray spectra and characteristics without requiring separate target elements for each application.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration minimizes thermal drift and maintains the target element's temperature, allowing for efficient operation during interruptions and standby modes while reducing the load on the target material.
Implementation Method 1
an electron source for providing electrons in the form of an electron beam
Implementation Method 2
at least one deflection device through which the electron beam can be deflected from a direction of propagation generated by the electron source
Implementation Method 3
a target element which can be impinged upon with the electrons of the electron beam
Data Source
AI summary
The invention relates to an x-ray source (100; 100a; 100b; 100c), comprising an electron source (110) for providing electrons (e) in the form of an electron beam (es) and a target element (120), on which the electrons (e) of the electron beam (es) of the electron source (110) are able to impinge, and at least one deflection device (140) enabling the electron beam (es) to be deflected from a propagation direction produced by the electron source (110), wherein the at least one deflection device (140) is configured to deflect the electron beam (es) at least intermittently with a trajectory (180) incident on the target element (120), but outside a center of the target element (120) or a region (150) of the target element (120) on which the electron beam (es) is incident in the case of a propagation direction without deflection, or wherein the at least one deflection device (140) is configured to deflect the electron beam (es) at least intermittently in such a way that the electron beam (es) is not incident on the target element (120).