X-ray Sensor Fabrication Reducing Patterning Steps
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Solution Overview
Problem
Conventional X-ray sensor fabrication involves high production costs and complex processes due to the need for multiple patterning steps, which complicates the production capacity and yield rate.
Innovation Solution
A method for fabricating a top gate TFT device using a reduced number of patterning processes, specifically forming patterns of source and drain electrodes, ohmic layers, active layers, gate insulating layers, and gate electrodes in sequential steps, thereby simplifying the production process and reducing the number of masks required.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If multiple patterning processes (9-11 steps) are used to form multi-layer X-ray sensor, then the sensor structure complexity is achieved, but the fabrication cost increases and production capacity decreases
Solution Approach 1:
The patent combines multiple patterning operations into fewer steps by using a single patterning process to simultaneously define multiple layers. The method forms the gate electrode pattern, source/drain electrode patterns, and other structural patterns in integrated steps, reducing the total number of patterning processes from 9-11 to significantly fewer steps while maintaining the complex multi-layer sensor structure.
Solution Approach 2:
The patent segments the fabrication process into distinct functional stages: first forming the base structure with source/drain electrodes and photodiode, then adding the gate structure separately. This segmentation allows each stage to be optimized independently and enables parallel processing of different regions, improving overall production capacity while achieving the required structural complexity.
2Device complexity
If multiple patterning processes (9-11 steps) are used to form multi-layer X-ray sensor, then the sensor structure complexity is achieved, but the fabrication cost increases
Solution Approach 1:
The patent merges multiple patterning operations into fewer integrated steps, reducing the number of masks and processing stages required. By combining the formation of gate electrode, source/drain electrodes, and other patterns into streamlined processes, the method reduces material consumption, equipment usage time, and labor costs while maintaining the complex multi-layer sensor structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces production costs, simplifies the fabrication process, and enhances the production capacity and yield rate by minimizing the number of patterning steps from 9 to 11 to 5 or 6, leading to a more efficient and cost-effective sensor manufacturing process.
Implementation Method 1
the photocurrent signal generated by the photodiode 13
Data Source
AI summary
A method for fabricating a sensor includes: forming, on a base substrate, a pattern of a source electrode and a drain electrode, a pattern of a data line, a pattern of a receiving electrode, a pattern of a photodiode, and a pattern of a transparent electrode disposed by using a first patterning process; forming a pattern of an ohmic layer by using a second patterning process; forming a pattern of an active layer by using a third patterning process; forming a pattern of a gate insulating layer by using a fourth patterning process, wherein the gate insulating layer has a via hole above the transparent electrode; and forming a pattern of a gate electrode, a pattern of a gate line, and a pattern of a bias line connected to the transparent electrode via the via hole above the transparent electrode by using a fifth patterning process.