Process for preparing tantalum powder with high specific surface area through cooperation of microwave-assisted magnesium reduction and graded oxidation

Through the coordinated preparation process of microwave-assisted magnesium reduction and graded oxidation, the problems of ultrafine particle size and low oxygen content in the preparation of existing tantalum powder are solved, and tantalum powder with high specific surface area and porosity are achieved, which is suitable for high-performance tantalum capacitors and 3D printing materials.

CN120502701APending Publication Date: 2025-08-19ZHENGZHOU UNIV
0 Cites 0 Cited by

Patent Information

Application Number
CN202510658911.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-05-21
Publication Date
2025-08-19

AI Technical Summary

Technical Problem

The existing tantalum powder preparation process is difficult to take into account both ultra-fine particle size and low oxygen content, and has low porosity, making it difficult to meet the needs of porous tantalum powder for biomedical purposes. The existing technology has problems such as cumbersome process, high cost and low porosity, which limits the application of tantalum powder in the biomedical field.

Method used

The microwave-assisted magnesium reduction and graded oxidation collaborative preparation process is adopted, and selectively rapid overall heating is used to form a porous structure through microwave heating, combining graded oxidation and acid etching, controlling the thickness and porosity of the oxide film, and preparing high specific surface area tantalum powder.

Benefits of technology

It realizes the ultra-fine particle size and high porosity of tantalum powder, improves the specific surface area and porosity, and is suitable for high-performance tantalum capacitors and 3D printing materials, meeting the needs of porous tantalum powder for biomedical purposes.

✦ Generated by Eureka AI based on patent content.
Patent Text Reader

Abstract

The invention relates to the technical field of tantalum powder preparation, in particular to a process for preparing tantalum powder with a high specific surface area through cooperation of microwave-assisted magnesium reduction and graded oxidation. The process comprises the following steps that S1, tantalum pentoxide and magnesium are proportioned as raw materials and subjected to ball milling and mixing under argon protection; s2, the mixed raw materials are pressed and molded into raw material briquettes; s3, carrying out microwave heating on the raw material briquette, and reducing to obtain primary tantalum powder; s4, performing oxidation reaction on the primary tantalum powder in a relatively low-temperature and low-oxygen atmosphere to generate a tantalum oxide film on the surface; s5, performing acid pickling treatment with an HCl solution to obtain impurity-removed tantalum powder; s6, carrying out etching treatment on the impurity-removed tantalum powder by using HF + HNO3 mixed acid liquor, dissolving the tantalum oxide film on the surface to form porous tantalum powder, and carrying out water washing and suction filtration to obtain pure tantalum powder; s7, graded oxidation pore forming; S4-S6 circulation is carried out for more than three times, and finally the tantalum powder with the high specific surface area is obtained. According to the process, selective and rapid overall heating can be achieved, the temperature rise efficiency is high, rapid formation of nanometer tantalum cores is promoted, growth of tantalum particles is inhibited, and generation of superfine tantalum powder is facilitated.
Need to check novelty before this filing date? Find Prior Art