Photosensitive dry film protective film and preparation method thereof

The three-layer structure of the photosensitive dry film protective film uses low-density polyethylene and nano-silica combined with specific antioxidants to solve the problems of large-sized crystal points and antioxidant migration, achieving high light transmittance uniformity and stability, and is suitable for high-end electronic manufacturing.

CN120686543APending Publication Date: 2025-09-23AMCO TECH R&D CO LTD +1
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Patent Information

Application Number
CN202510846152.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-06-24
Publication Date
2025-09-23

AI Technical Summary

Technical Problem

Traditional photosensitive dry film protective films have large-sized crystal point distribution that affects the transmittance and transmittance uniformity, and high-concentration antioxidants are easy to migrate, affecting stability and reliability.

Method used

A three-layer photosensitive dry film protective film is used, including an anti-sticking layer, an intermediate layer and a release layer. Low-density polyethylene and linear low-density polyethylene are combined with nano-silica as nucleating agents, and hindered phenols and phosphite antioxidants are compounded to control the crystal point, delay material aging, and avoid antioxidant migration.

Benefits of technology

It improves the light transmittance uniformity and stability of the photosensitive dry film, reduces the risk of antioxidant contamination of the photosensitive dry film, and meets the stringent requirements of high-end electronic manufacturing.

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Abstract

The invention belongs to the technical field of protective films, and discloses a photosensitive dry film protective film and a preparation method thereof. The photosensitive dry film protection film comprises an anti-sticking layer, a middle layer and a release layer, the anti-sticking layer is made of first low-density polyethylene, and the haze of the first low-density polyethylene is 10%-30%; the release layer comprises first linear low-density polyethylene and a release agent; the middle layer comprises second low-density polyethylene, second linear low-density polyethylene, nano silicon dioxide and an antioxidant, the antioxidant is obtained by compounding a hindered phenol antioxidant and a phosphite antioxidant, and the content of the antioxidant is smaller than or equal to 200 ppm. Common polyethylene is used as a main raw material, and nano silicon dioxide is used as a nucleating agent to realize crystal point control; the content of the antioxidant is strictly controlled, the influence of the antioxidant on the photosensitive dry film is reduced, and long-acting oxidation resistance is achieved through a specific hindered phenol antioxidant and phosphite ester antioxidant compound system under the low-content condition.
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