The invention discloses a low-water-permeability and low-
oxygen-permeability
photoresist protective film and a preparation method thereof, and relates to the technical field of dry film
photoresist protective films, the protective film comprises an inner layer, a middle layer and an outer layer, the inner layer is prepared from 100 parts of low-density
polyethylene and 0.1-0.3 part of a
release agent, and the middle layer is prepared from 0.1-0.3 part of a curing agent; the middle layer is prepared from 20-80 parts of low-density
polyethylene, 10-40 parts of high-density
polyethylene, 10-30 parts of a binder, 6-12 parts of modified
silicon dioxide and 1-2 parts of an
antistatic agent, and the outer layer is prepared from 10-90 parts of low-density polyethylene, 10-40 parts of
metallocene low-density polyethylene and 0.1-0.5 part of an anti-sticking agent; according to the invention, excellent water and
oxygen double barrier properties are realized, excellent protection can be provided for a dry film
photoresist film, the dry film photoresist film has the characteristics of high
mechanical strength, static resistance, clean stripping and the like, the process stability and the product yield in
chip manufacturing are powerfully guaranteed, and the application value is remarkable.