Ion source position adjustment mechanism and adjustment method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CGN MEDICAL TECH (MIANYANG) CO LTD
- Filing Date
- 2026-04-16
- Publication Date
- 2026-07-10
AI Technical Summary
During the commissioning of the cyclotron, the position of the ion source needs to be adjusted repeatedly, but due to the radiation environment, the commissioning time is prolonged and poses a great health hazard to the staff.
Design an ion source position adjustment mechanism that allows the position of the ion source to be adjusted outside the cyclotron by combining a mounting component and an adjustment component. The mounting component is installed in the magnet valley region, and the adjustment component is arranged radially and penetrates the vacuum cavity wall, enabling the manipulation of the ion source position outside the vacuum cavity.
This technology enables the adjustment of the ion source position outside the vacuum chamber, reducing the harm of radiation to staff, shortening the debugging time, and improving debugging efficiency and safety.
Smart Images
Figure CN122373233A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of cyclotron technology, and in particular to an ion source position adjustment mechanism and its adjustment method. Background Technology
[0002] Medical cyclotrons use magnetic and alternating electric fields to accelerate charged particles (such as protons and deuterons). The ion source is the initiating device for generating and accelerating charged particles, and can be divided into external and internal ion sources. Compared to external ion sources, internal ion sources have a simpler structure and lower manufacturing and maintenance costs, therefore they are widely used in medical cyclotrons, contributing to a more compact overall structure. The positional relationship between the internal ion source and the cyclotron affects the accelerator's performance and typically requires repeated adjustments during commissioning to determine the optimal configuration.
[0003] To meet the position adjustment requirements of the ion source within the cyclotron, a corresponding position adjustment device is required. However, during the cyclotron beam commissioning process, a high radiation dose is generated inside the equipment. Each time the ion source position is adjusted, personnel must wait for the radiation level to drop before entering the equipment to operate, which prolongs the commissioning time, and the staff will still be exposed to a certain degree of radiation. Summary of the Invention
[0004] This application aims to at least solve one of the aforementioned technical problems existing in the prior art. Therefore, the purpose of this application is to provide an ion source position adjustment mechanism that ensures the ion source position adjustment accuracy meets usage requirements while allowing the ion source position adjustment operation to be completed without personnel entering the accelerator, thus ensuring personnel safety and improving debugging efficiency.
[0005] This application also proposes an adjustment method using the aforementioned ion source position adjustment mechanism.
[0006] The ion source position adjustment mechanism according to a first aspect embodiment of this application includes: The mounting assembly is disposed in the magnet valley region of the cyclotron accelerator and is used to mount the ion source. An adjustment component is provided, which is arranged radially along the cyclotron. One end of the adjustment component is connected to the mounting component, and the other end of the adjustment component extends through the vacuum cavity wall of the cyclotron to the outside of the vacuum cavity. The adjustment component can drive the mounting component to move along a first direction and a second direction to adjust the position of the ion source, wherein the first direction and the second direction are perpendicular to each other.
[0007] The ion source position adjustment mechanism according to the embodiments of this application has at least the following beneficial effects: the adjustment component is arranged radially along the cyclotron, and one end of the adjustment component is connected to the mounting component, while the other end extends through the vacuum cavity wall of the cyclotron to the outside of the vacuum cavity. The adjustment component can drive the mounting component to move along mutually perpendicular first and second directions, so that the operator can operate the adjustment component to adjust the position of the ion source outside the vacuum cavity of the cyclotron. This ensures that the ion source position adjustment accuracy meets the usage requirements, while eliminating the need for personnel to enter the accelerator to complete the ion source position adjustment operation, reducing the harm of radiation to the human body, ensuring the personal safety of personnel, avoiding the process of personnel waiting for the radiation level to drop, shortening the cyclotron beam commissioning time, and improving commissioning efficiency.
[0008] According to some embodiments of this application, the mounting assembly includes a mounting base and a first mounting member, the mounting assembly is connected to the cyclotron, and the mounting base is slidably connected to the first mounting member; The adjustment assembly includes a first adjustment rod connected to the mounting base, one end of the first adjustment rod abutting against the first mounting member, and the first adjustment rod is movable along its axial direction to adjust the position of the ion source in the first direction.
[0009] According to some embodiments of this application, the top of the mounting base is provided with a first slide rail, the bottom of the first mounting member is provided with a first slide groove, and the first slide rail is slidably connected to the first slide groove.
[0010] According to some embodiments of this application, the mounting base is provided with a first mounting portion, and a first elastic member is provided between the first mounting portion and the first mounting member. The first elastic member provides an elastic force to the first mounting member so that the first mounting portion abuts against the first adjusting rod.
[0011] According to some embodiments of this application, the mounting assembly further includes a second mounting member, which is slidably connected to the first mounting member, and the ion source is connected to the second mounting member; The adjustment assembly includes a second adjustment rod connected to the mounting base. One end of the second adjustment rod abuts against the second mounting member. The second adjustment rod is movable along its axial direction to adjust the position of the ion source in the second direction.
[0012] According to some embodiments of this application, the top of the first mounting component is provided with a second slide rail, and the bottom of the second mounting component is provided with a second slide groove, wherein the second slide rail and the second slide groove are slidably connected.
[0013] According to some embodiments of this application, the first mounting member is provided with a second mounting portion, and a second elastic member is provided between the second mounting portion and the second mounting member. The second elastic member provides an elastic force to the second mounting member so that the second mounting portion abuts against the second adjusting rod.
[0014] According to some embodiments of this application, the mounting base is provided with a third mounting portion, and both the first adjusting rod and the second adjusting rod are threadedly connected to the third mounting portion.
[0015] According to some embodiments of this application, the first adjusting rod and the second adjusting rod are arranged in parallel, the first adjusting rod is arranged at a certain angle to the first mounting member, and the second adjusting rod is arranged at a certain angle to the second mounting member.
[0016] According to some embodiments of this application, the first adjusting rod has a first arc-shaped surface at one end near the first mounting member, and the second adjusting rod has a second arc-shaped surface at one end near the second mounting member.
[0017] According to some embodiments of this application, the ion source position adjustment mechanism further includes a connecting component, which includes a connecting seat and a sealing cover. The connecting seat is connected to the vacuum cavity wall of the cyclotron, and one end of the adjustment component passes through the connecting seat and is connected to the sealing cover.
[0018] The adjustment method according to the second aspect embodiment of this application, using the ion source position adjustment mechanism of the first aspect embodiment of this application, includes the following steps: The mounting assembly is installed in the magnet valley region of the cyclotron; The adjustment assembly is installed radially in the vacuum chamber of the cyclotron; Connect the ion source to the mounting assembly; Adjust one end of the adjustment component that protrudes from the vacuum cavity of the cyclotron accelerator to adjust the position of the ion source in the first direction and the second direction; The beam intensity of the cyclotron is measured, and the position of the ion source in the first direction and the second direction is repeatedly adjusted until the beam intensity of the cyclotron reaches its maximum value, thus completing the position adjustment of the ion source.
[0019] The adjustment method according to the embodiments of this application has at least the following beneficial effects: by controlling the adjustment component from outside the cyclotron vacuum cavity, the position of the ion source installed in the magnet valley region can be adjusted in the first and second directions, without the need for personnel to enter the vacuum cavity to operate, reducing the health hazards of the radiation environment to personnel during the debugging process, and reducing the debugging interruption time caused by waiting for radiation decay, thereby improving the efficiency and safety of cyclotron beam debugging.
[0020] Additional aspects and advantages of this application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of this application. Attached Figure Description
[0021] The present application will be further described below with reference to the accompanying drawings and embodiments, wherein: Figure 1 This is a schematic diagram illustrating the application of the ion source position adjustment mechanism and the cyclotron accelerator in an embodiment of this application. Figure 2 for Figure 1 Enlarged view of section A; Figure 3 This is a schematic diagram of the ion source position adjustment mechanism according to an embodiment of this application; Figure 4 This is a partial structural schematic diagram of the ion source position adjustment mechanism in an embodiment of this application; Figure 5 This is a partial exploded view of the ion source position adjustment mechanism in an embodiment of this application.
[0022] Reference numerals: 100, mounting component; 110, mounting base; 111, first slide rail; 112, first mounting part; 113, third mounting part; 120, first mounting member; 121, first slide groove; 122, second slide rail; 123, second mounting part; 130, first elastic element; 140, second mounting member; 141, second slide groove; 150, second elastic element; 200. Adjustment component; 210. First adjustment rod; 211. First arc-shaped surface; 220. Second adjustment rod; 221. Second arc-shaped surface; 300. Cyclotron; 310. Magnet Valley Region; 320. Vacuum Chamber; 400, Ion source; 410, Conductive wire; 500. Connecting assembly; 510. Connecting base; 520. Sealing cover; 600, First connector; 700, Second connector; 800, Third connector. Detailed Implementation
[0023] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.
[0024] In the description of this application, it should be understood that the orientation descriptions, such as up, down, front, back, left, right, etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.
[0025] In the description of this application, "several" means one or more, "multiple" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. The use of "first" and "second" in the description is merely for distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features, or implicitly indicating the order of the indicated technical features.
[0026] In the description of this application, unless otherwise expressly defined, terms such as "setup," "installation," and "connection" should be interpreted broadly, and those skilled in the art can reasonably determine the specific meaning of the above terms in this application in conjunction with the specific content of the technical solution.
[0027] In the description of this application, the terms "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.
[0028] Reference Figures 1 to 3The first aspect of this application provides an ion source position adjustment mechanism, including a mounting assembly 100 and an adjustment assembly 200. The mounting assembly 100 is disposed in the magnet valley region 310 of a cyclotron 300 and is used to mount an ion source 400. The adjustment assembly 200 is arranged radially along the cyclotron 300. One end of the adjustment assembly 200 is connected to the mounting assembly 100, and the other end of the adjustment assembly 200 extends through the vacuum chamber wall of the cyclotron 300 to the outside of the vacuum chamber 320 of the cyclotron 300. The adjustment assembly 200 can drive the mounting assembly 100 to move along a first direction and a second direction to adjust the position of the ion source 400, wherein the first direction and the second direction are perpendicular to each other.
[0029] Reference Figure 1 , Figure 4 It should be noted that the first direction is parallel to the plane of the ion source 400's extraction port, and the second direction is perpendicular to the plane of the ion source 400's extraction port. The first direction is ±Y, and the second direction is ±X. By adjusting the first and second directions, the position of the ion source 400 in the XY plane can be adjusted.
[0030] Specifically, the adjustment component 200 is arranged radially along the cyclotron 300, with one end connected to the mounting component 100 and the other end extending through the vacuum chamber wall of the cyclotron 300 to the outside of the vacuum chamber 320. The adjustment component 200 can drive the mounting component 100 to move along mutually perpendicular first and second directions, allowing operators to control the adjustment component 200 to adjust the position of the ion source 400 from outside the vacuum chamber 320 of the cyclotron 300. This ensures that the position adjustment accuracy of the ion source 400 meets the usage requirements, while allowing the position adjustment operation of the ion source 400 to be completed without the need for personnel to enter the accelerator. This reduces the harm of radiation to the human body, ensures the personal safety of personnel, avoids the process of personnel waiting for the radiation level to decrease, shortens the beam commissioning time of the cyclotron 300, and improves commissioning efficiency.
[0031] It should be noted that adjusting the position of the ion source 400 via the ion source position adjustment mechanism is necessary to maximize the beam intensity of the cyclotron 300, thereby meeting the usage requirements of the medical cyclotron 300. Furthermore, the beam intensity of the cyclotron 300 can be measured using components such as radial probes inside the cyclotron 300. This part is prior art, and this application has not made any improvements to this part; therefore, its structure and principle will not be described in detail.
[0032] Reference Figures 3 to 5In some embodiments, the mounting assembly 100 includes a mounting base 110 and a first mounting member 120. The mounting assembly 100 is connected to the cyclotron 300, and the mounting base 110 and the first mounting member 120 are slidably connected. The adjustment assembly 200 includes a first adjustment rod 210, which is connected to the mounting base 110. One end of the first adjustment rod 210 abuts against the first mounting member 120, and the first adjustment rod 210 is axially movable to adjust the position of the ion source 400 in a first direction. Specifically, the first adjustment rod 210 moves in a direction close to the first mounting member 120, thereby causing the first mounting member 120 to move the ion source 400 in the -Y direction; similarly, the first adjustment rod 210 moves in a direction away from the first mounting member 120, thereby causing the first mounting member 120 to move the ion source 400 in the +Y direction. The mounting base 110 is slidably connected to the first mounting component 120, and moves along its own axis in conjunction with the first adjusting rod 210 to realize the position adjustment of the ion source 400 in the first direction, which can improve the convenience of adjustment.
[0033] Reference Figures 3 to 5 In some embodiments, the top of the mounting base 110 is provided with a first slide rail 111, and the bottom of the first mounting member 120 is provided with a first slide groove 121. The first slide rail 111 and the first slide groove 121 are slidably connected, making the relative movement of the mounting base 110 and the first mounting member 120 more directional. This restricts the sliding direction and prevents the first mounting member 120 from shifting or getting stuck during the movement of the first adjusting rod 210, ensuring that the ion source 400 moves along a preset first direction and improving the adjustment accuracy of the ion source 400 in the first direction. In addition, the transmission resistance of the first slide rail 111 and the first slide groove 121 is small, which can improve the smoothness of the sliding process, reduce mechanical wear during the adjustment process, extend the service life of the ion source 400 position adjustment device, and reduce the force required to adjust the first adjusting rod 210, making the adjustment operation more effortless and convenient.
[0034] Reference Figures 3 to 5In some embodiments, the mounting base 110 is provided with a first mounting portion 112, and a first elastic member 130 is provided between the first mounting portion 112 and the first mounting member 120. The first elastic member 130 provides an elastic force to the first mounting member 120 so that the first mounting portion 112 abuts against the first adjusting rod 210. Specifically, the first mounting portion 112 is located on one side of the first mounting member 120 along a first direction, and the first adjusting rod 210 abuts against the first mounting member 120 on the other side along the first direction. The first elastic member 130 provides a force to the first mounting member 120 so that the first mounting portion 112 always abuts against the first adjusting rod 210, thereby improving the adjustment accuracy of the ion source 400 in the first direction. When the first adjusting rod 210 moves in the direction close to the first mounting member 120, the first mounting member 120 drives the ion source 400 to move in the -Y direction, and the first elastic member 130 is compressed; when the first adjusting rod 210 moves in the direction away from the first mounting member 120, the first elastic member 130 recovers, so that the first mounting member 120 drives the ion source 400 to move in the +Y direction.
[0035] In some embodiments, the first mounting member 120 is provided with a first mounting hole, and at least a portion of the first elastic member 130 is disposed in the first mounting hole. The first mounting hole constrains the first elastic member 130, preventing the first elastic member 130 from shifting laterally or tipping over during compression or recovery deformation. This ensures that the first elastic member 130 always provides elastic force to the first mounting member 120 along the first direction, and ensures that the first mounting member 120 abuts against the first adjusting rod 210.
[0036] In some embodiments, the first elastic element 130 is configured as a spring. Of course, in actual design, the structure of the first elastic element 130 can be designed according to actual needs.
[0037] Reference Figures 3 to 5In some embodiments, the mounting assembly 100 further includes a second mounting member 140, which is slidably connected to the first mounting member 120, and the ion source 400 is connected to the second mounting member 140. The adjustment assembly 200 includes a second adjustment rod 220, which is connected to the mounting base 110. One end of the second adjustment rod 220 abuts against the second mounting member 140, and the second adjustment rod 220 is movable along its axial direction to adjust the position of the ion source 400 in the second direction. Specifically, the second adjustment rod 220 moves in a direction close to the second mounting member 140, thereby causing the second mounting member 140 to drive the ion source 400 to move in the +X direction; similarly, the second adjustment rod 220 moves in a direction away from the second mounting member 140, thereby causing the second mounting member 140 to drive the ion source 400 to move in the -X direction. The slidable connection between the second mounting member 140 and the first mounting member 120, combined with the axial movement of the second adjustment rod 220, enables the adjustment of the position of the ion source 400 in the second direction, improving the convenience of adjustment.
[0038] Reference Figures 3 to 5 In some embodiments, the top of the first mounting member 120 is provided with a second slide rail 122, and the bottom of the second mounting member 140 is provided with a second slide groove 141. The second slide rail 122 and the second slide groove 141 are slidably connected, making the relative movement of the second mounting member 140 and the first mounting member 120 more directional. This restricts the sliding direction and prevents the second mounting member 140 from shifting or getting stuck during the movement of the second adjusting rod 220, ensuring that the ion source 400 moves along a preset second direction and improving the adjustment accuracy of the ion source 400 in the second direction. In addition, the transmission resistance of the cooperation between the second slide rail 122 and the second slide groove 141 is small, which can improve the smoothness of the sliding process, reduce mechanical wear during the adjustment process, extend the service life of the ion source 400 position adjustment device, and at the same time reduce the force required to adjust the second adjusting rod 220, making the adjustment operation more effortless and convenient.
[0039] Reference Figures 3 to 5In some embodiments, the first mounting member 120 is provided with a second mounting portion 123, and a second elastic member 150 is provided between the second mounting portion 123 and the second mounting member 140. The second elastic member 150 provides an elastic force to the second mounting member 140 so that the second mounting portion 123 abuts against the second adjusting rod 220. Specifically, the second mounting portion 123 is located on one side of the second mounting member 140 along the second direction, and the second adjusting rod 220 abuts against the other side of the second mounting member 140 along the second direction. The second elastic member 150 provides a force to the second mounting member 140 so that the second mounting portion 123 always abuts against the second adjusting rod 220, thereby improving the adjustment accuracy of the ion source 400 in the second direction. When the second adjusting rod 220 moves in the direction close to the second mounting member 140, the second mounting member 140 drives the ion source 400 to move in the +X direction, and the second elastic member 150 is compressed; when the second adjusting rod 220 moves in the direction away from the second mounting member 140, the second elastic member 150 recovers, so that the second mounting member 140 drives the ion source 400 to move in the -X direction.
[0040] In some embodiments, the second mounting member 140 is provided with a second mounting hole, and at least a portion of the second elastic member 150 is disposed in the second mounting hole. The second mounting hole constrains the second elastic member 150, preventing the second elastic member 150 from shifting laterally or tipping over during compression or recovery deformation. This ensures that the second elastic member 150 always provides elastic force to the second mounting member 140 along the second direction, and ensures that the second mounting member 140 abuts against the second adjusting rod 220.
[0041] In some embodiments, the second elastic element 150 is configured as a spring. Of course, in actual design, the structure of the second elastic element 150 can be designed according to actual needs.
[0042] Reference Figures 3 to 5In some embodiments, the mounting base 110 is provided with a third mounting portion 113. The first adjusting rod 210 and the second adjusting rod 220 are both threadedly connected to the third mounting portion 113. This prevents unexpected displacement of the first adjusting rod 210 or the second adjusting rod 220 due to external disturbances during adjustment, ensuring the positional stability of the ion source 400 after adjustment in the first and second directions. It eliminates the need for additional locking mechanisms to maintain a fixed position, simplifying the overall structural design of the adjustment assembly 200 and reducing manufacturing and assembly complexity. Specifically, the third mounting portion 113 is provided with a first threaded hole and a second threaded hole. Both the first adjusting rod 210 and the second adjusting rod 220 are provided with external threads. The first adjusting rod 210 is threadedly connected to the first threaded hole, and the second adjusting rod 220 is threadedly connected to the second threaded hole. Rotating the first adjusting rod 210 outside the vacuum chamber 320 of the cyclotron accelerator 300 causes it to move axially, thereby moving the first mounting component 120 along the first direction and adjusting the position of the ion source 400 in the first direction. Similarly, rotating the second adjusting rod 220 outside the vacuum chamber 320 of the cyclotron 300 causes the second adjusting rod 220 to move along its axial direction, thereby driving the second mounting member 140 to move along the second direction, and thus adjusting the position of the ion source 400 in the second direction.
[0043] In some embodiments, the rotation of the first adjusting rod 210 and the second adjusting rod 220 can be achieved manually or by motor-driven rotation. Manual rotation is less expensive, simpler, and easier to maintain, while motor-driven rotation offers higher debugging efficiency. In actual design, the rotation method of the first adjusting rod 210 and the second adjusting rod 220 can be designed according to actual needs.
[0044] Reference Figures 3 to 5 In some embodiments, the first adjusting rod 210 and the second adjusting rod 220 are arranged parallel to each other. The first adjusting rod 210 is set at a certain angle to the first mounting member 120, and the second adjusting rod 220 is set at a certain angle to the second mounting member 140. Along the height direction of the third mounting portion 113, the first adjusting rod 210 and the second adjusting rod 220 have a height difference, which can fully utilize the spatial shape of the magnet valley region 310 of the cyclotron 300. This facilitates the installation assembly 100 being placed within the limited space of the magnet valley region 310 of the cyclotron 300, meeting the structural design requirements of the cyclotron 300. Simultaneously, the threaded connection between the first adjusting rod 210, the second adjusting rod 220, and the third mounting portion 113 allows the ion source 400 to be stably maintained at the target position after position adjustment in the first and second directions, achieving position fixation without the need for an additional locking mechanism, thus simplifying the overall structure of the adjusting assembly 200.
[0045] Reference Figure 4 , Figure 5 In some embodiments, the end of the first adjusting rod 210 near the first mounting member 120 is provided with a first arc-shaped surface 211, which can reduce the frictional resistance and local stress concentration during the contact process between the first adjusting rod 210 and the first mounting member 120, and prevent the first adjusting rod 210 from moving axially and driving the first mounting member 120 due to excessive contact stress, thereby extending the service life of the first adjusting rod 210 and the first mounting member 120. Furthermore, the end of the second adjusting rod 220 near the second mounting member 140 is provided with a second arc-shaped surface 221, which can reduce the frictional resistance and local stress concentration during the contact process between the second adjusting rod 220 and the second mounting member 140, and prevent the second adjusting rod 220 from moving axially and driving the second mounting member 140 due to excessive contact stress, thereby extending the service life of the second adjusting rod 220 and the second mounting member 140.
[0046] Reference Figure 1 , Figure 3 In some embodiments, the ion source 400 position adjustment mechanism further includes a connection component 500, which includes a connection seat 510 and a sealing cover 520. The connection seat 510 is connected to the vacuum chamber wall of the cyclotron 300 to provide mounting support for the adjustment component 200. One end of the adjustment component 200 passes through the connection seat 510 and is connected to the sealing cover 520. Specifically, a first sealing ring (not shown in the figure) is provided on the outer side of the connecting seat 510, that is, a sealing ring is provided at the connection between the connecting seat 510 and the vacuum chamber wall of the cyclotron accelerator 300, and a second sealing ring is provided on the outer side of the first adjusting rod 210 and the second adjusting rod 220, that is, a second sealing ring (not shown in the figure) is provided between the first adjusting rod 210 and the sealing cover 520, and between the second adjusting rod 220 and the sealing cover 520. This can form a sealing structure between the vacuum chamber wall of the cyclotron accelerator 300 and the adjusting component 200, blocking the gas flow between the inside of the vacuum chamber 320 and the external environment, ensuring the high vacuum environment required by the vacuum chamber 320 during the operation of the cyclotron accelerator 300, avoiding the decrease in vacuum due to the infiltration of external gas, which would affect the beam quality and the stability of the accelerator operation, and providing vacuum conditions for the normal operation of the ion source 400 and beam debugging.
[0047] Reference Figure 1 , Figure 3 In some embodiments, the vacuum chamber wall of the cyclotron 300 is provided with a first connecting hole, and the connecting seat 510 is provided with a second connecting hole. The first connecting member 600 passes through the second connecting hole and mates with the first connecting hole, thereby assembling the connecting seat 510 with the vacuum chamber wall of the cyclotron 300. Furthermore, the first connecting member 600 can be a screw; of course, in actual design, the structure of the first connecting member 600 can be designed according to actual needs.
[0048] Reference Figure 3 , Figure 4 In some embodiments, the second mounting member 140 is provided with a third connecting hole, and the ion source 400 is provided with a fourth connecting hole. The second connector 700 passes through the fourth connecting hole and mates with the third connecting hole, thereby assembling the ion source 400 with the second mounting member 140, facilitating the adjustment of the position of the ion source 400. Furthermore, the second connector 700 can be a screw; of course, in actual design, the structure of the second connector 700 can be designed according to actual needs.
[0049] Reference Figure 3 , Figure 4 In some embodiments, the ion source 400 is connected to the connector 510 via a conductive wire 410, ensuring the continuity between the ion source 400 and the external circuit, and guaranteeing the stable transmission of electrical energy or signals required for the operation of the ion source 400. Furthermore, the conductive wire 410 is provided with a bent section. When the ion source 400 moves along the first or second direction with the mounting assembly 100, the length is compensated by the extension or bending of the bent section, preventing the conductive wire 410 from being stretched or excessively taut due to the movement of the ion source 400, preventing the conductive wire 410 from breaking under stress or the connection point from falling off, extending the service life of the conductive wire 410, and ensuring the continuity and stability of the circuit connection.
[0050] Reference Figure 3 , Figure 4 In some embodiments, the mounting base 110 is provided with a fifth connecting hole, and the cyclotron 300 is provided with a sixth connecting hole. The third connector 800 passes through the fifth connecting hole and engages with the sixth connecting hole, thereby mounting the mounting base 110 within the magnet valley region 310 of the cyclotron 300. Furthermore, the third connector 800 can be a screw; of course, in actual design, the structure of the third connector 800 can be designed according to actual needs.
[0051] A second aspect of this application provides an adjustment method using the ion source position adjustment mechanism of the first aspect of this application, comprising the following steps: S100, Install the mounting component 100 in the magnet valley region 310 of the cyclotron 300.
[0052] Step S100 includes the following steps: S110. The third connector 800 is passed through the fifth connecting hole of the mounting base 110 and engaged with the sixth connecting hole of the cyclotron 300, thereby installing the mounting base 110 into the vacuum chamber 320 of the cyclotron 300.
[0053] S120, assemble the first slide groove 121 of the first mounting member 120 with the first slide rail 111 of the mounting base 110, and assemble the second slide groove 141 of the second mounting member 140 with the second slide rail 122 of the first mounting member 120.
[0054] S130, the first elastic member 130 is positioned between the first mounting portion 112 and the first mounting member 120, and the second elastic member 150 is positioned between the second mounting portion 123 and the second mounting member 140.
[0055] S200, The adjustment component 200 is installed radially in the vacuum chamber 320 of the cyclotron 300.
[0056] Step S200 includes the following steps: S210, the first connector 600 is passed through the second connecting hole of the connector 510 and engaged with the first connecting hole of the vacuum chamber wall of the cyclotron 300, thereby assembling the connector 510 with the vacuum chamber wall of the cyclotron 300.
[0057] S220, connect the first adjusting rod 210 and the second adjusting rod 220 to the third mounting part 113 on the connecting seat 510 and the mounting seat 110 respectively, so that the first adjusting rod 210 abuts against the first mounting member 120 and the second adjusting rod 220 abuts against the second mounting member 140.
[0058] S300, Connect the ion source 400 to the mounting assembly 100.
[0059] Step S300 includes the following steps: S310. The second connector 700 is passed through the fourth connection hole of the ion source 400 and mates with the third connection hole of the second mounting member 140, thereby assembling the ion source 400 and the second mounting member 140.
[0060] S320. Connect the ion source 400 to the connector 510 via the conductive wire 410 to ensure that the ion source 400 is connected to the external circuit.
[0061] S400, the adjustment component 200 protrudes from one end of the vacuum chamber 320 of the cyclotron accelerator 300 to adjust the position of the ion source 400 in the first and second directions.
[0062] In step S400, the first adjusting rod 210 is rotated counterclockwise, causing the first adjusting rod 210 to move in a direction closer to the first mounting member 120, thereby causing the first mounting member 120 to drive the ion source 400 to move in the -Y direction; similarly, the first adjusting rod 210 is rotated clockwise, causing the first adjusting rod 210 to move in a direction away from the first mounting member 120, thereby causing the first mounting member 120 to drive the ion source 400 to move in the +Y direction.
[0063] In step S400, the second adjusting rod 220 is rotated counterclockwise, causing it to move closer to the second mounting member 140, thereby causing the second mounting member 140 to drive the ion source 400 to move in the +X direction; similarly, the second adjusting rod 220 is rotated clockwise, causing it to move further away from the second mounting member 140, thereby causing the second mounting member 140 to drive the ion source 400 to move in the -X direction.
[0064] S500: Measure the beam intensity of the cyclotron 300, and repeatedly adjust the position of the ion source 400 in the first and second directions until the beam intensity of the cyclotron 300 reaches its maximum value, thus completing the position adjustment of the ion source 400.
[0065] In step S500, the position of the ion source 400 is repeatedly adjusted, and the beam intensity of the cyclotron 300 is measured through the internal components of the cyclotron 300 until the beam intensity of the cyclotron 300 reaches its maximum value, thus completing the position adjustment of the ion source 400.
[0066] By controlling the adjustment component 200 from outside the vacuum chamber 320 of the cyclotron 300, the position of the ion source 400 installed in the magnet valley region 310 can be adjusted in the first and second directions. This eliminates the need for personnel to enter the vacuum chamber 320 for operation, reducing the health hazards of the radiation environment to personnel during the commissioning process. It also reduces the commissioning interruption time caused by waiting for radiation decay, thereby improving the efficiency and safety of the cyclotron 300 beam commissioning.
[0067] The embodiments of this application have been described in detail above with reference to the accompanying drawings. However, this application is not limited to the above embodiments. Within the scope of knowledge possessed by those skilled in the art, various changes can be made without departing from the spirit of this application. Furthermore, unless otherwise specified, the embodiments and features described in the embodiments of this application can be combined with each other.
Claims
1. An ion source position adjustment mechanism, characterized in that, include: The mounting assembly is disposed in the magnet valley region of the cyclotron accelerator and is used to mount the ion source. An adjustment component is provided, which is arranged radially along the cyclotron. One end of the adjustment component is connected to the mounting component, and the other end of the adjustment component extends through the vacuum cavity wall of the cyclotron to the outside of the vacuum cavity. The adjustment component can drive the mounting component to move along a first direction and a second direction to adjust the position of the ion source, wherein the first direction and the second direction are perpendicular to each other.
2. The ion source position adjustment mechanism according to claim 1, characterized in that, The mounting assembly includes a mounting base and a first mounting component. The mounting assembly is connected to the cyclotron, and the mounting base is slidably connected to the first mounting component. The adjustment assembly includes a first adjustment rod connected to the mounting base, one end of the first adjustment rod abutting against the first mounting member, and the first adjustment rod is movable along its axial direction to adjust the position of the ion source in the first direction.
3. The ion source position adjustment mechanism according to claim 2, characterized in that, The mounting base is provided with a first mounting part, and a first elastic member is provided between the first mounting part and the first mounting component. The first elastic member provides an elastic force to the first mounting component so that the first mounting part abuts against the first adjusting rod.
4. The ion source position adjustment mechanism according to claim 2, characterized in that, The mounting assembly further includes a second mounting component, which is slidably connected to the first mounting component, and the ion source is connected to the second mounting component. The adjustment assembly includes a second adjustment rod connected to the mounting base. One end of the second adjustment rod abuts against the second mounting member. The second adjustment rod is movable along its axial direction to adjust the position of the ion source in the second direction.
5. The ion source position adjustment mechanism according to claim 4, characterized in that, The first mounting member is provided with a second mounting part, and a second elastic member is provided between the second mounting part and the second mounting member. The second elastic member provides an elastic force to the second mounting member so that the second mounting part abuts against the second adjusting rod.
6. The ion source position adjustment mechanism according to claim 4, characterized in that, The mounting base is provided with a third mounting part, and both the first adjusting rod and the second adjusting rod are threadedly connected to the third mounting part.
7. The ion source position adjustment mechanism according to claim 4, characterized in that, The first adjusting rod and the second adjusting rod are arranged parallel to each other, the first adjusting rod is arranged at a certain angle to the first mounting part, and the second adjusting rod is arranged at a certain angle to the second mounting part.
8. The ion source position adjustment mechanism according to claim 4, characterized in that, The first adjusting rod has a first arc-shaped surface at the end near the first mounting member, and the second adjusting rod has a second arc-shaped surface at the end near the second mounting member.
9. The ion source position adjustment mechanism according to claim 1, characterized in that, The ion source position adjustment mechanism further includes a connecting component, which includes a connecting seat and a sealing cover. The connecting seat is connected to the vacuum cavity wall of the cyclotron, and one end of the adjustment component passes through the connecting seat and is connected to the sealing cover.
10. An adjustment method based on the ion source position adjustment mechanism according to any one of claims 1 to 9, characterized in that, Includes the following steps: The mounting assembly is installed in the magnet valley region of the cyclotron; The adjustment assembly is installed radially in the vacuum chamber of the cyclotron; Connect the ion source to the mounting assembly; Adjust one end of the adjustment component that protrudes from the vacuum cavity of the cyclotron accelerator to adjust the position of the ion source in the first direction and the second direction; The beam intensity of the cyclotron is measured, and the position of the ion source in the first direction and the second direction is repeatedly adjusted until the beam intensity of the cyclotron reaches its maximum value, thus completing the position adjustment of the ion source.