Carboxylic acid generator, carboxylate, resist composition, and method for producing resist pattern

A carboxylic acid generator with a specific carboxylic acid salt and resin improves CD uniformity in resist patterns, enhancing the quality of resist compositions.

JP2025178233APending Publication Date: 2025-12-05SUMITOMO CHEM CO LTD
1 Cites 0 Cited by

Patent Information

Application Number
JP2025086883
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-05-24
Filing Date
2025-05-26
Publication Date
2025-12-05

AI Technical Summary

Technical Problem

Existing resist compositions using carboxylate salts do not achieve satisfactory CD uniformity in resist patterns.

Method used

A carboxylic acid generator containing a carboxylic acid salt represented by a specific formula, along with a resin having acid labile groups and optional additional acid generators, is used to form a resist composition that improves CD uniformity.

Benefits of technology

The resist composition produces resist patterns with enhanced CD uniformity, addressing the limitations of existing compositions.

✦ Generated by Eureka AI based on patent content.
Patent Text Reader

Abstract

To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having good CD uniformity to be produced.SOLUTION: There are provided: a carboxylic acid generator containing a carboxylate represented by formula (I); and a resist composition. [In the formula, W1 represents a substituted / unsubstituted cyclic hydrocarbon group; L1 represents a single bond or a substituted / unsubstituted hydrocarbon group, L2 represents a substituted / unsubstituted hydrocarbon group, and -CH2- in the groups may be substituted with -O-, -S-, -SO2-, -NR11-, -CO- or the like; R1 and R11 each represent a hydrogen atom or an alkyl group; L3 represents a single bond or an alkanediyl group, and -CH2- in the group may be substituted with -O- or -CO-; R5 represents -X51-R10 or -X52-L11-X51-R10, X51 and X52 each represent -CO-O-, -O-CO- or the like, L11 represents a substituted / unsubstituted hydrocarbon group, and R10 represents an acid-labile group; and Z+ represents an organic cation.]SELECTED DRAWING: None
Need to check novelty before this filing date? Find Prior Art