Acid generator, resist composition and resist pattern manufacturing method, as well as salt and resin
The incorporation of a salt and acid-unstable group in the resist composition improves line edge roughness of resist patterns.
JP2026136095APending Publication Date: 2026-08-25SUMITOMO CHEM CO LTD
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Patent Information
- Application Number
- JP2026020884
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-02-13
- Filing Date
- 2026-02-12
- Publication Date
- 2026-08-25
AI Technical Summary
Technical Problem
Existing technologies face challenges in manufacturing resist patterns with good line edge roughness (LER).
Method used
Incorporation of a salt represented by formula (I) or a structural unit derived from a salt represented by formula (I) in an acid generator and resist composition, along with a resin containing an acid-unstable group, to improve line edge roughness.
Benefits of technology
The solution enables the manufacturing of resist patterns with improved line edge roughness.
✦ Generated by Eureka AI based on patent content.
Abstract
Line edge roughness (LER) produces a good resist pattern. [Solution] An acid generator containing a salt represented by formula (I) or a structural unit derived from a salt represented by formula (I). JPEG2026136095000188.jpg58170
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