Lithography apparatus and lithography system
By using programmable and rewritable digital lithography masks in lithography technology, and using signal generation modules and mask drive modules to program mask patterns in real time, the problem of difficult changes and high costs in existing lithography technologies is solved, and low-cost and low-latency lithography production is achieved.
Patent Information
- Application Number
- CN202210373960.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-04-11
- Publication Date
- 2025-03-25
- Estimated Expiration
- 2042-04-11
AI Technical Summary
In the existing lithography technology, the mask plate is difficult to change, has defects and is costly, which leads to an increase in lithography costs, especially in small batch chip production.
A programmable and rewritable digital lithography mask is adopted, and the signal generation module and the mask drive module are used to generate the mask pattern according to the chip layout, and the light transmittance state of the pixel area is changed through the control electrode and the electrolytic reaction layer to realize real-time programming and rewrittening of the mask.
It significantly reduces the cost of chip manufacturing and mask defect monitoring and repair, solves the problem of difficult to allocate mask costs in small batch chip production, and realizes low-cost and low-latency lithography production.