A method for beam window processing
By combining additive manufacturing with laser remelting, the secondary electron emission coefficient, surface roughness, and cooling performance of the beam window are optimized, solving the problems of long processing cycle, high cost, and poor performance of existing beam windows, and achieving simplified process and efficient electron cloud suppression effect.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- XI AN JIAOTONG UNIV
- Filing Date
- 2022-08-03
- Publication Date
- 2026-06-16
AI Technical Summary
Existing methods for processing beam windows suffer from problems such as long manufacturing cycles, high costs, complicated processes, and poor secondary electronic and heat transfer properties, making it difficult to effectively suppress the formation of electron clouds.
By combining additive manufacturing and laser remelting, an objective function is constructed by optimizing the secondary electron emission coefficient, surface roughness, cooling performance, and exhaust port area. A beam window is then prepared, and laser parameters are optimized using multiphysics simulation to obtain excellent secondary electron performance and heat transfer performance.
This method achieves short processing cycle, low cost, and simple process for beam windows, effectively suppresses the formation of electron clouds, and improves the secondary electronic performance and heat transfer performance of beam windows.
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Figure CN115274016B_ABST