Display panel and display device

Abstract

Embodiments of the present application provide a display panel and a display device. The display panel comprises: a substrate; a pixel definition layer disposed on the substrate, the pixel definition layer comprising an isolation portion and a pixel opening formed by the isolation portion, and a material of the isolation portion comprising a transparent material; and a support column disposed on a side of the isolation portion away from the substrate, the support column comprising a top surface facing the isolation portion, a top surface away from the isolation portion, and a side surface connecting the top surface and the bottom surface, and the side surface is configured to reflect at least part of incident light rays incident from a display side of the display panel to the isolation portion. In the use process of the display panel, light rays can be incident on the side surface, and the side surface is configured to reflect at least part of the incident light rays into the pixel definition layer, thereby increasing the amount of light obtained by a light sensing component such as a fingerprint recognition component, improving the reduction of light quantity caused by the reflection of incident light rays incident on the pixel electrode, and thereby solving the problem of low under-screen fingerprint recognition rate.

Description

Technical Field

[0001] This application relates to the field of display device technology, and more particularly to a display panel and display device. Background Technology

[0002] Organic light-emitting diodes (OLEDs) are self-emissive display devices. Compared to traditional liquid crystal displays (LCDs), OLED technology does not require a backlight and is self-emissive. OLEDs use a thin layer of organic material and a glass substrate; when current flows through, the organic material emits light. Therefore, OLED display panels can significantly save energy, be made lighter and thinner, withstand a wider range of temperature variations than LCD panels, and have a wider viewing angle. OLED display panels are expected to become the next-generation flat panel display technology after LCDs and are currently one of the most watched technologies in the flat panel display field.

[0003] Currently, in order to increase the screen-to-body ratio, OLED display panels usually use under-display fingerprint recognition to replace the original physical fingerprint recognition. However, under-display fingerprint recognition has drawbacks such as low recognition rate. Summary of the Invention

[0004] This application provides a display panel and display device to solve the problem of low under-display fingerprint recognition rate.

[0005] An embodiment of the first aspect of this application provides a display panel, comprising: a substrate; a pixel definition layer disposed on the substrate, the pixel definition layer including an isolation portion and a pixel opening formed by the isolation portion, the material of the isolation portion including a transmissive material; and a support post disposed on the side of the isolation portion away from the substrate, the support post including a top surface facing the isolation portion, a top surface away from the isolation portion, and a side surface connecting the top surface and the bottom surface, the side surface being configured to reflect at least a portion of incident light incident from the display side of the display panel to the isolation portion.

[0006] According to an embodiment of the first aspect of this application, the support column includes a main body and a light path adjustment layer disposed around at least a portion of the main body. The light path adjustment layer is configured to reflect at least a portion of incident light rays incident from the display side of the display panel to the isolation portion.

[0007] According to any of the foregoing embodiments of the first aspect of this application, the material of the main body includes a light-transmitting material.

[0008] According to any of the foregoing embodiments of the first aspect of this application, the material of the optical path adjustment layer includes a reflective material, and the outer surface of the optical path adjustment layer away from the main body is a side surface and is used to reflect at least a portion of the incident light to the isolation portion.

[0009] According to any of the foregoing embodiments of the first aspect of this application, the reflective material includes a metallic material.

[0010] According to any of the foregoing embodiments of the first aspect of this application, the metallic material includes at least one of copper, aluminum, and silver.

[0011] According to any of the foregoing embodiments of the first aspect of this application, the thickness of the optical path adjustment layer is 100nm to 200nm.

[0012] According to any of the foregoing embodiments of the first aspect of this application, the materials of both the optical path adjustment layer and the main body include light-transmitting materials, and the refractive index of the optical path adjustment layer is greater than that of the main body. The contact interface between the optical path adjustment layer and the main body is a side surface, and the optical path adjustment layer is configured to allow at least a portion of the incident light to undergo total internal reflection at the contact interface before being incident on the isolation portion.

[0013] According to any of the foregoing embodiments of the first aspect of this application, the material of the optical path adjustment layer includes silicon nitride.

[0014] According to any of the foregoing embodiments of the first aspect of this application, the refractive index of the optical path adjustment layer is 1.75 to 1.95, and the refractive index of the main body is 1.5 to 1.7.

[0015] According to any of the foregoing embodiments of the first aspect of this application, the thickness of the optical path adjustment layer is 450nm to 550nm.

[0016] According to any of the foregoing embodiments of the first aspect of this application, the isolation portion has a first surface on the side away from the substrate, and at least a portion of the side surface or the angle between the cross section of the side surface and the first surface is less than 90 degrees.

[0017] According to any of the foregoing embodiments of the first aspect of this application, the side surface is a plane or a curved surface.

[0018] According to any of the foregoing embodiments of the first aspect of this application, the orthographic projection of the bottom surface onto the substrate lies within the orthographic projection of the top surface onto the substrate.

[0019] According to any of the foregoing embodiments of the first aspect of this application, the display panel includes a photosensitive display area and a main display area, and the support column includes a first support column located in the photosensitive display area and a second support column located in the main display area. The side surface of the first support column is configured to reflect at least a portion of the incident light at the side surface before it is incident on the isolation portion.

[0020] According to any of the foregoing embodiments of the first aspect of this application, the pixel opening includes a first pixel opening and a second pixel opening disposed adjacent to each other. The distance between the center of the first pixel opening in the orthographic projection of the substrate and the center of the photosensitive display area is less than the distance between the center of the second pixel opening in the orthographic projection of the substrate and the photosensitive display area. The minimum distance between the first support post located between the first pixel opening and the second pixel opening and the first pixel opening is greater than the minimum distance between the first support post and the second pixel opening.

[0021] According to any of the foregoing embodiments of the first aspect of this application, the support post includes a first segment and a second segment sequentially distributed in a direction away from the isolation portion, and a side surface is disposed on the first segment and / or the second segment, wherein the orthographic projection of the first segment onto the substrate lies within the orthographic projection of the second segment onto the substrate. According to any of the foregoing embodiments of the first aspect of this application, the side surface includes a first portion located on the first segment and a second portion located on the second segment, wherein the first portion is located on the side of the second portion away from the pixel opening.

[0022] According to any of the foregoing embodiments of the first aspect of this application, the first portion is inclined, and the angle between the first portion and the first surface of the isolation portion facing the support column is less than 90 degrees.

[0023] According to any of the foregoing embodiments of the first aspect of this application, the second part is inclined and the angle between the second part and the reference plane is less than 90 degrees, and the reference plane is parallel to the first surface of the isolation part facing the support column.

[0024] According to any of the foregoing embodiments of the first aspect of this application, the height of the support column is 1.5 μm to 1.7 μm.

[0025] According to any of the foregoing embodiments of the first aspect of this application, the material of the support column includes polyimide.

[0026] The second aspect of this application also provides a display device, including a display panel of any of the first aspects of the above embodiments; a photosensitive component disposed on a side of a substrate away from the pixel definition layer, the side surface being configured to reflect at least a portion of incident light at the side surface and then incident on the photosensitive component via an isolation portion.

[0027] The display panel provided in this application includes a substrate and a pixel definition layer, a support pillar, and a light path adjustment layer disposed on the substrate. The pixel definition layer includes an isolation portion and a pixel opening formed by the isolation portion. The pixel opening is used to set light-emitting units to realize the display of the display panel. The support pillar is disposed on the isolation portion to support the cover plate, and the side surface of the support pillar can reflect incident light to the backlight side of the display panel. During the use of the display panel, when the display panel performs photosensitive functions such as fingerprint recognition, light may be incident on the side surface. The side surface is configured to reflect at least a portion of these incident light into the isolation portion. The material of the isolation portion includes a light-transmitting material, so this portion of light can pass through the isolation portion and be incident on the photosensitive component. This can improve the problem of light incident on the pixel electrode in the pixel opening being reflected off the display side of the display panel, thereby increasing the amount of light obtained by the photosensitive component such as fingerprint recognition, improving the reduction in light amount caused by the incident light being reflected from the pixel electrode, and thus solving the problem of low under-display fingerprint recognition rate. Attached Figure Description

[0028] Other features, objects, and advantages of this application will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings, wherein the same or similar reference numerals denote the same or similar features.

[0029] Figure 1 This is a schematic diagram of the structure of a display panel provided in an embodiment of this application;

[0030] Figure 2 This application Figure 1 A partial sectional view;

[0031] Figure 3 In another embodiment Figure 1 A partial sectional view;

[0032] Figures 4 to 12 yes Figure 3 Schematic diagrams of partially enlarged structures in different embodiments.

[0033] Explanation of reference numerals in the attached figures:

[0034] 10. Display panel; 20. Photosensitive component;

[0035] 100. Substrate;

[0036] 200, Pixel definition layer; 210, Isolation section; 211, First surface; 220, Pixel opening; 221, First pixel opening; 222, Second pixel opening;

[0037] 300, Support column; 300a, First support column; 301, Main body; 302, Optical path adjustment layer; 310, Top surface; 320, Bottom surface; 330, Side surface; 331, First part; 332, Second part; 340, First segment; 350, Second segment;

[0038] 500, pixel electrode;

[0039] 600, First inorganic layer; 610, Packaging section;

[0040] AA1, photosensitive display area; AA2, main display area. Detailed Implementation

[0041] The features and exemplary embodiments of various aspects of this application will now be described in detail. Numerous specific details are set forth in the following detailed description to provide a comprehensive understanding of this application. However, it will be apparent to those skilled in the art that this application can be implemented without requiring some of these specific details. The following description of embodiments is merely intended to provide a better understanding of this application by illustrating examples. In the accompanying drawings and the following description, at least some well-known structures and techniques are not shown to avoid unnecessarily obscuring the application; and, for clarity, the dimensions of some structures may be exaggerated. Furthermore, the features, structures, or characteristics described below can be combined in any suitable manner in one or more embodiments.

[0042] In the description of this application, it should be noted that, unless otherwise stated, "a plurality of" means two or more; the terms "upper," "lower," "left," "right," "inner," "outer," etc., indicating orientation or positional relationships are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0043] The directional terms appearing in the following description refer to the directions shown in the figures and are not intended to limit the specific structure of the embodiments of this application. It should also be noted in the description of this application that, unless otherwise explicitly specified and limited, the terms "installation" and "connection" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0044] To better understand this application, the following will be combined with... Figures 1 to 9The display panel and display device according to the embodiments of this application will be described in detail.

[0045] Figure 1 This is a top view of a display panel 10 provided in an embodiment of this application. Figure 2 yes Figure 1 A partial sectional view.

[0046] like Figure 1 and Figure 2 As shown, the display panel 10 provided in this application includes: a substrate 100 and a pixel definition layer 200 and a support post 300 disposed on the substrate 100; the pixel definition layer 200 is disposed on the substrate 100, and the pixel definition layer 200 includes an isolation portion 210 and a pixel opening 220 formed by the isolation portion 210, the material of the isolation portion 210 includes a light-transmitting material; the support post 300 is disposed on the side of the isolation portion 210 away from the substrate 100, the support post 300 includes a top surface 310 facing the isolation portion 210, a top surface 310 away from the isolation portion 210 and a side surface 330 connecting the top surface 310 and the bottom surface 320, the side surface 330 is configured to reflect at least a portion of the incident light incident from the display side of the display panel 10 to the isolation portion 210.

[0047] Figure 2 The diagram only illustrates the structure of one of the support columns 300. In other embodiments, there may be multiple support columns 300, which are distributed at intervals. Figure 2 The arrows in the middle indicate the incident light and the reflective line reflected by the side surface 330 of the support column 300.

[0048] In the display panel 10 provided in this application, the display panel 10 includes a substrate 100 and a pixel definition layer 200 and a support pillar 300 disposed on the substrate 100. The pixel definition layer 200 includes an isolation portion 210 and a pixel opening 220 formed by the isolation portion 210. The pixel opening 220 is used to dispose of light-emitting units to realize the display of the display panel 10. The support pillar 300 is disposed on the isolation portion 210 to support the cover plate. The side surface 330 of the support pillar 300 can reflect incident light to the backlight side of the display panel 10. That is, the side surface 330 can reflect incident light to the side where the pixel definition layer 200 is located.

[0049] During the use of the display panel 10, such as Figure 2 As shown, the photosensitive component 20 is disposed on the side of the isolation portion 210 facing the substrate 100. There are various ways in which the photosensitive component 20 can be disposed; this application uses a fingerprint recognition sensor as an example for illustration. Figure 2The image illustrates the location of the user's finger, with incident light entering from the finger's location and reaching the side surface 330. In other embodiments, the photosensitive component 20 can also be a camera or other similar component. To more clearly illustrate the path of the light, Figure 2 The diagram illustrates the relative positions of the photosensitive component 20 and the display panel 10.

[0050] In the display panel 10 provided in this application embodiment, when the display panel 10 performs light-sensing functions such as fingerprint recognition, light may be incident on the side surface 330. The side surface 330 is configured to reflect at least a portion of these incident light rays into the isolation portion 210. The material of the isolation portion 210 includes a light-transmitting material. Therefore, this portion of light can pass through the isolation portion 210 and be incident on the photosensitive component 20. This can improve the problem that light incident on the pixel electrode in the pixel opening 220 is reflected out of the display panel display side, thereby increasing the amount of light obtained by the photosensitive component 20 for fingerprint recognition and improving the reduction in light amount caused by the incident light being reflected from the pixel electrode 500, thereby solving the problem of low under-display fingerprint recognition rate.

[0051] There are several ways to configure the substrate 100. Optionally, the substrate 100 can be an array substrate, including a substrate and a driving circuit, a planarization layer, and pixel electrodes 500 disposed on the substrate. The pixel electrodes 500 are exposed through pixel openings 220. Optionally, a light-emitting unit is disposed within the pixel openings 220, and the light-emitting unit is in contact with the pixel electrodes 500 so that the pixel electrodes 500 can drive the light-emitting unit to emit light. Optionally, the display panel 10 also includes a common electrode located on the side of the isolation portion 210, the light-emitting unit, and the support pillar 300 away from the substrate 100. The common electrode and the pixel electrodes 500 jointly drive the light-emitting unit to emit light.

[0052] There are multiple ways to set the pixel definition layer 200. The optional material of the pixel definition layer 200 includes a light-transmitting material to improve the light transmittance of the isolation part 210, so that light can be emitted from the side of the isolation part 210 away from the support column 300.

[0053] As described above, the material of the isolation portion 210 includes a light-transmitting material, and the light transmittance of the isolation portion 210 may be greater than 15%, or greater than 50%, or even greater than 85%, so that more light can pass through the isolation portion 210 to reach the photosensitive component 20.

[0054] There are multiple ways to set the support column 300. The material of the support column 300 includes reflective materials, such as metal, so that the side surface 330 of the support column 300 has a reflective function and can reflect the incident light to the isolation part 210.

[0055] In other alternative embodiments, please continue to refer to Figure 1 and Figure 3 The support column 300 includes a main body 301 and a light path adjustment layer 302 surrounding at least a portion of the main body 301; the light path adjustment layer 302 is configured to reflect at least a portion of the incident light rays incident from the display side of the display panel 10 to the isolation portion 210.

[0056] In these alternative embodiments, by dividing the support column 300 into a main body 301 and an optical path adjustment layer 302, different materials can be selected to prepare the main body 301 and the optical path adjustment layer 302. For example, by reasonably setting the material of the optical path adjustment layer 302, the optical path adjustment layer 302 can reflect at least part of the incident light to the isolation column 210.

[0057] Optionally, the optical path adjustment layer 302 is set to the same thickness, that is, the thickness of the optical path adjustment layer 302 located at different positions of the main body 301 is consistent within the manufacturing error range, so that the ability of the optical path adjustment layer 302 to adjust light is consistent at different positions.

[0058] Optionally, the material of the main body 301 may include a light-transmitting material to increase the light transmittance at the location of the main body 301, so that more light can be directly incident on the photosensitive component 20 through the main body 301 and the isolation part 210, thereby further improving the fingerprint recognition rate.

[0059] There are several ways in which the optical path adjustment layer 302 reflects incident light. For example, the material of the optical path adjustment layer 302 may include a reflective material, so that the incident light is directly reflected at the outer surface of the optical path adjustment layer 302 away from the main body 301. In this case, the side surface 330 of the support column 300 is the outer surface of the optical path adjustment layer 302 away from the main body 301. Alternatively, the refractive index of the optical path adjustment layer 302 may be different from that of the main body 301, so that the incident light undergoes total internal reflection at the contact interface between the optical path adjustment layer 302 and the main body 301. In this case, the side surface 330 of the support column 300 is the contact interface between the optical path adjustment layer 302 and the main body 301.

[0060] In some alternative embodiments, such as Figure 3 and Figure 4 As shown, the material of the optical path adjustment layer 302 includes a reflective material. The outer surface of the optical path adjustment layer 302 facing away from the main body 301 is a side surface 330, which is used to reflect at least a portion of the incident light to the isolation portion 210. In these optional embodiments, the material of the optical path adjustment layer 302 includes a reflective material, and the incident light can be directly reflected at the outer surface of the optical path adjustment layer 302 and enter the isolation portion 210.

[0061] The reflective material is, for example, a metallic material, which enables the reflective material to better reflect the incident light into the isolation section 210. The metallic material may include, for example, at least one of copper, aluminum, and silver, which have advantages such as high reflectivity and ease of fabrication.

[0062] When the material of the optical path adjustment layer 302 includes a reflective material, the thickness of the optical path adjustment layer 302 can be 100nm to 200nm. This can improve the situation where the transmittance of the optical path adjustment layer 302 is too high due to the thinness of the optical path adjustment layer 302, thus affecting its reflectivity, and can also improve the situation where the thickness of the optical path adjustment layer 302 is too large, resulting in material waste.

[0063] In some other alternative embodiments, such as Figure 3 and Figure 5 As shown, the materials of both the optical path adjustment layer 302 and the main body 301 include light-transmitting materials, and the refractive index of the optical path adjustment layer 302 is greater than that of the main body 301. The contact interface between the optical path adjustment layer 302 and the main body 301 is the side surface 330. The optical path adjustment layer 302 is configured to allow at least a portion of the incident light to undergo total internal reflection at the contact interface before being incident on the isolation portion 210.

[0064] In these optional embodiments, both the light path adjustment layer 302 and the main body 301 are made of light-transmitting materials, which can improve the overall light transmittance of the display surface, allowing more light to pass through the main body 301, the light path adjustment layer 302, and the isolation portion 210 and enter the photosensitive component 20. Furthermore, the refractive index of the light path adjustment layer 302 is greater than that of the support pillar 300, causing at least a portion of the incident light to undergo total internal reflection at the contact interface (i.e., the side surface 330) between the light path adjustment layer 302 and the main body 301. After total internal reflection, at least a portion of this light enters the isolation portion 210 and then enters the photosensitive component 20, increasing the amount of light acquired by the photosensitive component 20 and thus improving the fingerprint recognition rate.

[0065] When the material of the optical path adjustment layer 302 includes a light-transmitting material, optionally, the material of the optical path adjustment layer 302 includes silicon nitride, so that the optical path adjustment layer 302 has good light transmittance and high refractive index.

[0066] Optionally, the refractive index of the optical path adjustment layer 302 is 1.75 to 1.95, and the refractive index of the main body 301 is 1.5 to 1.7, so that light can easily undergo total internal reflection at the side surface 330.

[0067] When the material of the light path adjustment layer 302 includes a light-transmitting material, the thickness of the light path adjustment layer 302 can optionally be 450nm to 550nm. This can improve the situation where the light is affected by total internal reflection at the side surface 330 due to the light path adjustment layer 302 being too thin, and can also improve the situation where the light path adjustment layer 302 is too thick, resulting in material waste or affecting the display effect.

[0068] There are several options for setting the side surface 330; please refer to [link / reference]. Figure 6 and Figure 7 , Figure 6 and Figure 7 The example is illustrated by using a side surface 330, which reflects incident light, as the contact interface between the main body 301 and the light path adjustment layer 302, where both the main body 301 and the light path adjustment layer 302 are made of light-transmitting materials. In other embodiments, the side surface 330 may also be the outer surface of the light path adjustment layer 302 that faces away from the main body 301.

[0069] As shown in the figure Figure 6 and Figure 7 As shown, the isolation section 210 includes a first surface 211 facing the support column 300. The angle between the side surface 330 and the first surface 211 can be less than, greater than or equal to 90 degrees, as long as the optical path adjustment layer 302 provided on at least part of the side surface 330 can reflect the incident light into the isolation section 210.

[0070] In some optional embodiments, the angle between at least a portion of the side surface 330 or the cross-section of the side surface 330 and the first surface 211 is less than 90 degrees. In these optional embodiments, the angle between at least a portion of the side surface 330 or the cross-section of the side surface 330 and the first surface 211 is an acute angle, and the side surface 330 is inclined. The acute angle between the side surface 330 or the cross-section of the side surface 330 and the first surface 211 allows more incident light to be reflected through the side surface 330 into the isolation portion 210, further increasing the amount of light acquired by the photosensitive component 20.

[0071] Optional, such as Figure 6 As shown, the side surface 330 can be curved, for example, the side surface 330 is bent and deformed toward the center of the support column 300. At this time, the angle between the cross section of at least part of the side surface 330 and the first surface 211 is less than 90 degrees, so as to further increase the amount of light reflected into the isolation part 210 through the side surface 330 and improve the fingerprint recognition rate.

[0072] Optional, such as Figure 7 As shown, the side surface 330 can also be a plane. In this case, the angle between the side surface 330 and the first surface 211 is less than 90 degrees, so as to simplify the structure of the support column 300 and improve the manufacturing efficiency of the support column 300.

[0073] Optionally, the orthographic projection of the bottom surface 320 onto the substrate 100 is located within the orthographic projection of the top surface 310 onto the substrate 100, that is, the size of the bottom surface 320 is smaller than the size of the top surface 310, which can form an inclined side surface 330, thereby increasing the amount of light reflected into the isolation portion 210 via the optical path adjustment layer 302 and improving the fingerprint recognition rate.

[0074] Optionally, the support column 300 has a trapezoidal cross-sectional shape along the thickness direction of the display panel 10, and the two waists of the trapezoid are formed by the side surface 330. The top surface 310 of the support column 300 forms the top of the trapezoid, and the bottom surface 320 of the support column 300 forms the bottom of the trapezoid, making the shape of the support column 300 simpler and easier to manufacture.

[0075] Optionally, the support column 300 is frustum-shaped. The support column 300 can be frustum-shaped or truncated pyramid, and the size of the top surface 310 of the support column 300 is larger than the size of its bottom surface 320.

[0076] In the above embodiments, please refer to Figure 8 When the first inorganic layer 600 of the encapsulation layer is subsequently prepared, since the support pillar 300 has a structure that is larger at the top and smaller at the bottom than the isolation part 210, the inorganic material is prone to breakage near the edge of the support pillar 300 to form an independent encapsulation part 610, which can block at least part of the transmission of water and oxygen in the first inorganic layer 600, thereby improving the encapsulation effect of the encapsulation layer.

[0077] In some alternative embodiments, please continue to refer to Figures 1 to 7 The display panel 10 includes a photosensitive display area AA1 and a main display area AA2. The support pillar 300 includes a first support pillar 300a located in the photosensitive display area AA1 and a second support pillar (not shown) located in the main display area AA2. The side surface 330 of the first support pillar 300a is configured to reflect at least a portion of the incident light rays before they enter the isolation portion 210. When the first support pillar 300a includes a main body portion 301 and a light path adjustment layer 302, the light path adjustment layer 302 of the first support pillar 300a is configured to reflect at least a portion of the incident light rays before they enter the isolation portion 210.

[0078] Optionally, the light transmittance of the photosensitive display area AA1 is greater than that of the main display area AA2, so that the display panel 10 can integrate the photosensitive component 20 on the back of the photosensitive display area AA1, realizing the under-screen integration of the photosensitive component 20 of components such as fingerprint recognition and camera. At the same time, the photosensitive display area AA1 can display the image, increasing the display area of ​​the display panel 10 and realizing the full-screen design of the display device.

[0079] Optionally, the light transmittance of the photosensitive display area AA1 is greater than or equal to 15%. To ensure that the light transmittance of the photosensitive display area AA1 is greater than 15%, or even greater than 40%, or even higher, in this embodiment, the light transmittance of each functional film layer of the display panel 10 in the photosensitive display area AA1 is greater than 80%, and at least some functional film layers have a light transmittance of greater than 90% in the photosensitive display area AA1.

[0080] In these alternative embodiments, the photosensitive component 20 mainly obtains light through the photosensitive display area AA1, and the side surface 300 for reflecting light is disposed on the first support column 300a located in the photosensitive display area AA1, which can simplify the structure of the entire display panel 10.

[0081] In other embodiments, the side surface 330 for reflecting incident light can also be provided on the second support column.

[0082] Optional, such as Figure 7 As shown, the pixel opening 220 includes a first pixel opening 221 and a second pixel opening 222 arranged adjacent to each other. The distance between the center of the first pixel opening 221 in the orthographic projection of the substrate 100 and the center of the photosensitive display area AA1 is smaller than the distance between the center of the second pixel opening 222 in the orthographic projection of the substrate 100 and the center of the photosensitive display area AA1. That is, the first pixel opening 221 is arranged closer to the center of the photosensitive display area AA1. The first pixel opening 221 and the second pixel opening 222 can be arranged in various positions. The first pixel opening 221 and the second pixel opening 222 can both be located in the photosensitive display area AA1, or the first pixel opening 221 and the second pixel opening 222 can both be located in the main display area AA2, or the first pixel opening 221 is located in the photosensitive display area AA1 and the second pixel opening 222 is located in the main display area AA2. If one of two adjacent pixel openings 220 is closer to the center of the photosensitive display area AA1 and the other is farther from the center of the photosensitive display area AA1, then the one closer to the center of the photosensitive display area AA1 can be considered as the first pixel opening 221, and the one farther from the center of the photosensitive display area AA1 can be considered as the second pixel opening 222.

[0083] Optionally, the minimum distance between the first support post 300a located between the first pixel opening 221 and the second pixel opening 222 and the first pixel opening 221 is greater than the minimum distance between the first support post 300a and the second pixel opening 222. That is, the distance between the first support post 300a located between the first pixel opening 221 and the second pixel opening 222 is closer, and the distance between the first support post 300a and the first pixel opening 221 is farther. A larger isolation portion 210 is left between the first support post 300a and the first pixel opening 221, so that the side surface 330 of the first support post 300a can reflect more light into the isolation portion 210, further increasing the amount of light obtained by the photosensitive component 20 and improving the fingerprint recognition rate.

[0084] In some alternative embodiments, when the display panel 10 is a full-screen fingerprint recognition device, or when the display panel 10 is a full-screen photosensitive component 20 recognition device, the support post 300 is equidistant from the pixel openings 220 located on both sides of it, that is, the support post 300 is located between two adjacent pixel openings 220, so that the amount of light reflected by the side surface 330 of the support post 300 in all directions is similar, thereby increasing the amount of light obtained by the photosensitive component 20 at different positions and thus improving the fingerprint recognition rate.

[0085] In any of the above embodiments, the main body 301 of the support column 300 can be integrally formed.

[0086] In other embodiments, please refer to Figure 9 and Figure 10 The support column 300 can also be configured separately. The support column 300 includes a first segment 340 and a second segment 350 distributed sequentially in a direction away from the isolation part 210. The side surface 330 is provided at least in the first segment 340. The orthographic projection of the first segment 340 on the substrate 100 is located within the orthographic projection of the second segment 350 on the substrate 100.

[0087] In these alternative embodiments, the support column 300 is divided into a first segment 340 and a second segment 350. The orthographic projection of the first segment 340 onto the substrate 100 is located within the orthographic projection of the second segment 350 onto the substrate 100. That is, the second segment 350 on the support column 300 that is farther from the isolation portion 210 has a larger size, such that at least a portion of the first segment 340 is below the second segment 350, so that the side surface 330 disposed on the first segment 340 can reflect at least a portion of the light into the isolation portion 210.

[0088] Furthermore, the support column 300 is roughly T-shaped. On one hand, the support column 300 is designed as a two-layer structure, making it easier to fabricate a structure that is larger at the top and smaller at the bottom. On the other hand, please refer to... Figure 8When the first inorganic layer 600 of the encapsulation layer is subsequently prepared, the first inorganic layer 600 is prone to breakage near the support pillar 300 to form an independent encapsulation part 610, which can improve the transport of at least part of the water and oxygen in the first inorganic layer 600 and improve the encapsulation effect.

[0089] Optionally, when the support column 300 includes a main body 301 and an optical path adjustment layer, the optical path adjustment layer 302 is at least disposed in the first segment 340 to form a side surface 330 at least disposed in the first segment 340, so that the optical path adjustment layer 302 can better reflect at least part of the light into the isolation portion 210.

[0090] Optionally, the side surface 330 includes a first portion 331 located in the first segment 340, the first portion 331 being used to reflect at least a portion of the incident light to the isolation portion 210. For example, when the main body 301 includes a first segment 350 and a second segment 360, the optical path adjustment layer 302 is disposed in the first segment 340.

[0091] Or, such as Figure 10 As shown, the side surface 330 includes a first portion 331 located in the first segment 340 and a second portion 332 located in the second segment 350. The first portion 331 is located on the side of the second portion 332 away from the pixel opening 220, that is, the first portion 331 is located on the side of the second portion 332 closer to the central axis of the support post 300. The support post 300 is approximately T-shaped. Optionally, when the support post 300 includes the first segment 350 and the second segment 360, the optical path adjustment layer 302 is disposed in the first segment 350 and the second segment 360, so that the support post 300 can reflect more incident light into the isolation portion 210.

[0092] Alternatively, in some other alternative embodiments, such as Figure 11 As shown, the side surface 330 includes only the second portion 332 located in the second segment 350. For example, when the support column 300 includes a first segment 350 and a second segment 360, the optical path adjustment layer 302 is disposed in the second segment 360.

[0093] Please see Figure 12 , Figure 12 yes Figure 2 A partially enlarged structural diagram in another embodiment.

[0094] In some alternative embodiments, such as Figure 12 As shown, the first portion 331 is inclined, and the angle between the first portion 331 and the first surface 211 of the isolation portion 210 facing the support column 300 is less than 90 degrees. Optionally, as described above, the optical path adjustment layer 302 is disposed on the first segment 340 to form the first portion 331.

[0095] In these optional embodiments, the first portion 331 is a slope, and the angle between the first portion 331 and the first surface 211 is less than 90 degrees. The first portion 331 can reflect more light into the isolation portion 210, further increasing the amount of light acquired by the photosensitive component 20 and improving the fingerprint recognition rate.

[0096] Optionally, the first segment 340 has a trapezoidal cross-section along its thickness direction. The first segment 340 may be frustum-shaped, for example, the first segment 340 may be a frustum-shaped cone or a frustum-shaped pyramid.

[0097] In some alternative embodiments, such as Figure 12 As shown, the second portion 332 is inclined, and the angle between the second portion 332 and the reference plane is less than 90 degrees. The reference plane is parallel to the first surface 211 of the isolation portion 210 facing the support column 300. For example, the optical path adjustment layer 302 is provided with a second segment 350 to form the second portion 332.

[0098] In these optional embodiments, the second portion 332 is an inclined plane, and the angle between the second portion 332 and the reference plane is less than 90 degrees. The second portion 332 can reflect more light into the isolation portion 210, further increasing the amount of light acquired by the photosensitive component 20 and improving the fingerprint recognition rate.

[0099] Optionally, the cross-section of the second segment 350 along the thickness direction is trapezoidal. The second segment 350 can be frustum-shaped, for example, the second segment 350 can be a frustum-shaped cone or a frustum-shaped pyramid.

[0100] Optionally, the material of the first segment 340 may include a metallic material, and the outer surface of the first segment 340, namely the first part 331, can directly reflect the incident light to the isolation part 210.

[0101] Optionally, when the material of the first segment 340 includes a metallic material, the common electrode includes multiple sub-electrodes, and adjacent sub-electrodes are interconnected through the first segment 340 to form a surface electrode.

[0102] In any of the above embodiments, the height of the support column 300 can be 1.5 μm to 1.7 μm. The height of the support column 300 refers to the extension dimension of the support column 300 along the thickness direction. When the height of the support column 300 is within the above range, it can improve both the insufficient support capacity of the support column 300 due to its low height and the insufficient structural strength of the support column 300 due to its high height.

[0103] Optionally, in any of the above embodiments, the material of the support column 300 may include polyimide.

[0104] The second aspect of this application also provides a display device, including a display panel 10 of any of the first aspect embodiments described above and a photosensitive component. The photosensitive component is disposed on a side of the substrate away from the pixel definition layer, and the side surface is configured to reflect at least a portion of the incident light at the side surface before it enters the photosensitive component via an isolation portion. Since the display device provided by the second aspect embodiment of this application includes the display panel 10 of any of the first aspect embodiments described above, the display device provided by the second aspect embodiment of this application has the beneficial effects of the display panel 10 of any of the first aspect embodiments described above, which will not be repeated here.

[0105] The display devices in this application include, but are not limited to, mobile phones, personal digital assistants (PDAs), tablet computers, e-books, televisions, access control systems, smart landline phones, control consoles, and other devices with display functions.

[0106] Although this application has been described with reference to preferred embodiments, various modifications can be made thereto and components can be replaced with equivalents without departing from the scope of this application. In particular, the technical features mentioned in the various embodiments can be combined in any manner, provided there is no structural conflict. This application is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims

1. A display panel, characterized in that, include: substrate; A pixel definition layer is disposed on the substrate. The pixel definition layer includes an isolation portion and a pixel opening formed by the isolation portion. The material of the isolation portion includes a light-transmitting material. The isolation portion has a first surface facing away from the substrate. A support column is connected to the first surface. The support column includes a bottom surface facing the isolation portion, a top surface facing away from the isolation portion, and a side surface connecting the top surface and the bottom surface. The side surface is configured to reflect at least a portion of the incident light rays incident from the display side of the display panel to the isolation portion, such that at least a portion of the incident light rays pass through the isolation portion and reach a photosensitive component located on the side of the display panel facing away from the light-emitting side. Wherein, at least a portion of the side surface or the cross section of the side surface and the first surface form an angle of less than 90 degrees.

2. The display panel according to claim 1, characterized in that, The support column includes a main body and a light path adjustment layer disposed around at least a portion of the main body, the light path adjustment layer being configured to reflect at least a portion of the incident light rays incident from the display side of the display panel to the isolation portion.

3. The display panel according to claim 2, characterized in that, The material of the main body includes a light-transmitting material.

4. The display panel according to claim 2, characterized in that, The material of the optical path adjustment layer includes a reflective material, and the outer surface of the optical path adjustment layer opposite to the main body is the side surface, which is used to reflect at least a portion of the incident light to the isolation portion.

5. The display panel according to claim 4, characterized in that, The reflective material includes metallic materials.

6. The display panel according to claim 5, characterized in that, The metallic material includes at least one of copper, aluminum, and silver.

7. The display panel according to claim 5, characterized in that, The thickness of the optical path adjustment layer is 100nm~200nm.

8. The display panel according to claim 2, characterized in that, Both the optical path adjustment layer and the main body are made of light-transmitting materials, and the refractive index of the optical path adjustment layer is greater than that of the main body. The contact interface between the optical path adjustment layer and the main body is the side surface. The optical path adjustment layer is configured to allow at least a portion of the incident light to undergo total internal reflection at the contact interface before being incident on the isolation portion.

9. The display panel according to claim 2, characterized in that, The material of the optical path adjustment layer includes silicon nitride.

10. The display panel according to claim 8, characterized in that, The refractive index of the optical path adjustment layer is 1.75~1.95, and the refractive index of the main body is 1.5~1.

7.

11. The display panel according to claim 8, characterized in that, The thickness of the optical path adjustment layer is 450nm~550nm.

12. The display panel according to claim 1, characterized in that, The side surface can be a plane or a curved surface.

13. The display panel according to claim 12, characterized in that, The bottom surface is projected onto the substrate in a way that the top surface is projected onto the substrate in a way that is also in a way that is ...

14. The display panel according to claim 1, characterized in that, The display panel includes a photosensitive display area and a main display area. The support column includes a first support column located in the photosensitive display area and a second support column located in the main display area. The side surface of the first support column is configured to reflect at least a portion of the incident light rays at the side surface before they are incident on the isolation portion.

15. The display panel according to claim 14, characterized in that, The pixel opening includes a first pixel opening and a second pixel opening arranged adjacent to each other. The distance between the first pixel opening and the center of the photosensitive display area in the orthographic projection of the substrate is less than the distance between the second pixel opening and the center of the photosensitive display area in the orthographic projection of the substrate. The minimum distance between the first support post located between the first pixel opening and the second pixel opening and the first pixel opening is greater than the minimum distance between the first support post and the second pixel opening.

16. The display panel according to claim 1, characterized in that, The support column includes a first segment and a second segment distributed sequentially in a direction away from the isolation portion. The side surface is provided at least in the first segment and / or the second segment. The orthographic projection of the first segment on the substrate is located within the orthographic projection of the second segment on the substrate.

17. The display panel according to claim 16, characterized in that, The side surface includes a first portion located in the first segment and a second portion located in the second segment, the first portion being located on the side of the second portion away from the pixel opening.

18. The display panel according to claim 17, characterized in that, The first part is inclined, and the angle between the first part and the first surface of the isolation part facing the support column is less than 90 degrees; And / or, the second part is inclined, and the angle between the second part and the reference plane is less than 90 degrees, the reference plane being parallel to the first surface of the isolation part facing the support column.

19. The display panel according to claim 1, characterized in that, The height of the support column is 1.5μm~1.7μm; And / or, the material of the support column includes polyimide.

20. A display device, characterized in that, Includes the display panel as described in any one of claims 1-19; A photosensitive component is disposed on the side of the substrate opposite to the pixel definition layer, and the side surface is configured to reflect at least a portion of the incident light rays at the side surface and then incident on the photosensitive component via the isolation portion.

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