A ground water vapor mixed gas preparation device

Abstract

The present application relates to the field of vacuum measurement technology, and more specifically, to a ground water vapor mixed gas preparation device, including a test hood, an air supply system, a water vapor supply system, and an insulated box, wherein: the test hood includes an upper vacuum chamber and a lower vacuum chamber, and a perforated partition is provided between the upper vacuum chamber and the lower vacuum chamber; the air supply system is provided in multiple groups, and each group of the air supply system is connected to the upper vacuum chamber through a gas flow meter; the water vapor supply system is provided in an insulated box, and is connected to the upper vacuum chamber through a gas flow meter. The present application has a simple structure and is easy to operate. The proportion of gas components can be adjusted arbitrarily, so as to complete the preparation of standard mixed gases with different percentage contents of different types of gases and water vapor. It can be used in vacuum calibration measurement fields such as mass spectrometers, micro pumps, and small-hole conductance to achieve stable distribution of water vapor and realize 10 ‑7 ‑10 5 Measurements in the Pa pressure range.

Description

Technical Field

[0001] The present application relates to the field of vacuum measurement technology, and in particular to a ground water vapor mixed gas preparation device. Background Art

[0002] At present, there is no consensus on whether there is water on the moon. In order to provide a theoretical basis for lunar exploration of the existence of water, it is necessary to provide conditions on the ground that are as close to those on the moon as possible.

[0003] Some existing water vapor preparation devices, such as the partial splitting method, do not serve the vacuum field. Although they can achieve high preparation accuracy, they are not suitable for experiments in low vacuum or high vacuum environments. Therefore, in order to achieve an environment and measurement samples as close to the theoretical lunar surface as possible, a ground water vapor mixture gas preparation device is needed, and the device needs to complete the configuration of different gases and different proportions. Summary of the invention

[0004] The present application provides a ground water vapor mixed gas preparation device, which can adjust the proportion of different types of gases as needed to prepare mixed gases of different types of gases.

[0005] In order to achieve the above-mentioned purpose, the present application provides a ground water vapor mixed gas preparation device, including a test hood, an air supply system, a water vapor supply system and an insulated box, wherein: the test hood includes an upper vacuum chamber and a lower vacuum chamber, and a perforated partition is arranged between the upper vacuum chamber and the lower vacuum chamber; the air supply system is arranged into multiple groups, and each group of the air supply system is connected to the upper vacuum chamber through a gas flow meter; the water vapor supply system is arranged in the insulated box, and is connected to the upper vacuum chamber through a gas flow meter.

[0006] Furthermore, each gas flow meter includes a pressure stabilizing chamber and a small hole, and the diameter of the small hole is in the micron order.

[0007] Furthermore, each gas supply system is provided with a vacuum gauge, a pure gas cylinder, a mechanical pump and a molecular pump, wherein: the vacuum gauge is connected to the pressure stabilizing chamber; the pure gas cylinder is connected to the pressure stabilizing chamber; the mechanical pump is connected to the molecular pump, and the molecular pump is connected to the pressure stabilizing chamber.

[0008] Furthermore, the water vapor supply system includes a vacuum gauge, a water vapor storage tank, a mechanical pump and a molecular pump, wherein: the vacuum gauge is connected to the pressure stabilizing chamber; the water vapor storage tank is connected to the pressure stabilizing chamber; the mechanical pump is connected to the molecular pump, and the molecular pump is connected to the pressure stabilizing chamber.

[0009] Furthermore, it also includes a standard chamber, which is arranged between a certain gas supply system and the upper vacuum chamber, one end of the standard chamber is connected to the pressure stabilizing chamber, and the other end is connected to the upper vacuum chamber, and a vacuum gauge is also connected to the standard chamber.

[0010] Furthermore, the upper vacuum chamber is connected to a vacuum gauge, the lower vacuum chamber is connected to the vacuum gauge and a molecular pump, and the molecular pump is connected to a mechanical pump.

[0011] Furthermore, it also includes a high vacuum valve. Each connecting gas line is provided with a high vacuum valve, and the high vacuum valve is used to control the opening and closing of the corresponding gas line.

[0012] Furthermore, a heating device is provided in the heat preservation box, and the temperature change in the heat preservation box is less than 0.05°C.

[0013] The present invention provides a ground water vapor mixed gas preparation device, which has the following beneficial effects:

[0014] The present invention has a simple structure and is easy to operate. The ratio of gas components can be adjusted arbitrarily, thereby completing the preparation of standard mixed gases with different percentages of different types of gases and water vapor. It can be used in vacuum calibration measurement fields such as mass spectrometers, micro pumps, and small hole conductance to achieve stable water vapor distribution and achieve 10 -7 -10 5 Measurements in the Pa pressure range. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The drawings constituting a part of this application are used to provide a further understanding of this application, so that other features, purposes and advantages of this application become more obvious. The schematic embodiment drawings and their descriptions of this application are used to explain this application and do not constitute an improper limitation on this application. In the drawings:

[0016] Figure 1 is a schematic diagram of a ground water vapor mixed gas preparation device provided according to an embodiment of the present application;

[0017] Figure 2 is a schematic diagram of a test cover of a ground water vapor mixed gas preparation device provided in an embodiment of the present application;

[0018] In the figure: 1-test cover, 11-upper vacuum chamber, 12-lower vacuum chamber, 13-perforated partition, 14-sixth vacuum gauge, 15-seventh vacuum gauge, 16-fifth molecular pump, 17-fifth mechanical pump, 2-first gas supply system, 21-first pressure stabilizing chamber, 22-first small hole, 23-first vacuum gauge, 24-first pure gas cylinder, 25-first mechanical pump, 26-first molecular pump, 3-second gas supply system, 31-second pressure stabilizing chamber, 32-second small hole, 33-second vacuum gauge, 34-second pure gas Gas cylinder, 35-second mechanical pump, 36-second molecular pump, 4-third gas supply system, 41-third pressure stabilizing chamber, 42-third small hole, 43-third vacuum gauge, 44-third pure gas cylinder, 45-third mechanical pump, 46-third molecular pump, 5-water vapor supply system, 51-fourth pressure stabilizing chamber, 52-fourth small hole, 53-fourth vacuum gauge, 54-water vapor storage tank, 55-fourth mechanical pump, 56-fourth molecular pump, 6-insulation box, 7-standard chamber, 71-fifth vacuum gauge, 8-high vacuum valve. DETAILED DESCRIPTION

[0019] In order to enable those skilled in the art to better understand the solution of the present application, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present application.

[0020] It should be noted that the terms "first", "second", etc. in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequential order. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present application described here. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device comprising a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0021] In the present application, the terms "upper", "lower", "left", "right", "front", "back", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation.

[0022] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to specific circumstances.

[0023] In addition, the term "plurality" shall mean two or more.

[0024] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0025] like Figure 1-Figure 2 As shown, the present application provides a ground water vapor mixed gas preparation device, including a test hood 1, an air supply system, a water vapor supply system 5 and an insulated box 6, wherein: the test hood 1 includes an upper vacuum chamber 11 and a lower vacuum chamber 12, and a perforated partition 13 is arranged between the upper vacuum chamber 11 and the lower vacuum chamber 12; the air supply system is arranged into multiple groups, and each group of the air supply system is connected to the upper vacuum chamber 11 through a gas flow meter; the water vapor supply system 5 is arranged in the insulated box 6, and is connected to the upper vacuum chamber 11 through a gas flow meter.

[0026] Specifically, the ground water vapor mixed gas preparation device provided in the embodiment of the present application is mainly used for the preparation of mixed gases of different types of gases and the preparation of the mixer and water vapor in a simulated vacuum environment in ground tests. During the preparation process, the proportions of different types of gases can be adjusted, and the proportion and content of water vapor can also be adjusted. Among them, the test hood 1 is mainly used for the mixing of different gases. The test hood 1 is a vacuum environment, and the vacuum degree can be adjusted according to actual conditions. The upper vacuum chamber 11 is mainly used for the mixed preparation of various types of gases and water vapor, and the lower vacuum chamber 12 is mainly used for the storage of mixed gases. The mixed gas can be supplied to other equipment later through the gas supply device; the gas supply system is provided with multiple groups, which are mainly used to input different types of pure gases into the upper vacuum chamber 11. The number of gas supply systems is determined according to the actual type of mixed gas. The use of multiple gas supply systems for the preparation of mixed gases can effectively avoid the mass discrimination effect; the gas flow The gas flow meter is mainly used to adjust the gas flow rate. By setting the gas flow meter, the air intake amount of each gas supply system to the upper vacuum chamber 11 can be realized, thereby realizing the supply of gas in different proportions; the water vapor supply system 5 is mainly used to supply water vapor to the upper vacuum chamber 11. During the preparation process, when water vapor needs to be added to the mixed gas, the gas flow meter can be used to control the proportion and content of water vapor entering the upper vacuum chamber 11 to realize the mixed preparation of various types of gases and water vapor; the heat preservation box 6 is mainly used to provide a constant temperature environment when the water vapor supply system 5 supplies gas, thereby reducing the change of water vapor pressure caused by temperature change.

[0027] More specifically, in the embodiment of the present application, three gas supply systems are preferably provided, including a first gas supply system 2, a second gas supply system 3 and a third gas supply system 4, wherein the first gas supply system 2 is connected to the upper vacuum chamber 11 through a first gas flow meter, the second gas supply system 3 is connected to the upper vacuum chamber 11 through a second gas flow meter, the third gas supply system 4 is connected to the upper vacuum chamber 11 through a third gas flow meter, and the water vapor supply system 5 is connected to the upper vacuum chamber 11 through a fourth gas flow meter.

[0028] Furthermore, each gas flow meter includes a stabilizing chamber and a small hole, and the diameter of the small hole is in the micrometer range. The gas flow meter is mainly used to control the long-term stable passage of pure gas into the test cover 1, the stabilizing chamber is used for temporary storage of gas, and the small hole is used to adjust the flow rate of each gas supply system gas into the upper vacuum chamber 11. Before preparation, it is necessary to calibrate the small hole of each gas flow meter to obtain the flow conductance of each small hole. The gas flow rate of each group of gas supply systems can be calculated by the fixed flow conductance method, thereby obtaining the percentage of a certain type of gas introduced.

[0029] Specifically, in the embodiment of the present application, the first gas flow meter includes a first pressure stabilizing chamber 21 and a first small hole 22, the second gas flow meter includes a second pressure stabilizing chamber 31 and a second small hole 32, the third gas flow meter includes a third pressure stabilizing chamber 41 and a third small hole 42, and the fourth gas flow meter includes a fourth pressure stabilizing chamber 51 and a fourth small hole 52.

[0030] Furthermore, each gas supply system is provided with a vacuum gauge, a pure gas cylinder, a mechanical pump and a molecular pump, wherein: the vacuum gauge is connected to the pressure stabilizing chamber; the pure gas cylinder is connected to the pressure stabilizing chamber; the mechanical pump is connected to the molecular pump, and the molecular pump is connected to the pressure stabilizing chamber. The vacuum gauge is used to measure the pressure value in the pressure stabilizing chamber, preferably a thin film vacuum gauge. Under the action of the mechanical pump and the molecular pump, the gas in the pure gas cylinder will be drawn into the pressure stabilizing chamber for temporary storage, and then enter the upper vacuum chamber 11 through a small hole for mixing and preparation. The interior of the pure gas cylinder is used to store various types of original gases.

[0031] Specifically, in the embodiment of the present application, the first gas supply system 2 includes a first vacuum gauge 23, a first pure gas cylinder 24, a first mechanical pump 25 and a first molecular pump 26, wherein the first vacuum gauge 23 and the first pure gas cylinder 24 are connected to the first pressure stabilizing chamber 21, the first mechanical pump 25 is connected to the first molecular pump 26, and the first molecular pump 26 is connected to the first pressure stabilizing chamber 21; the second gas supply system 3 includes a second vacuum gauge 33, a second pure gas cylinder 34, a second mechanical pump 35 and a second molecular pump 36, wherein the second The vacuum gauge 33 and the second pure gas cylinder 34 are both connected to the second pressure stabilizing chamber 31, the second mechanical pump 35 is connected to the second molecular pump 36, and the second molecular pump 36 is connected to the second pressure stabilizing chamber 31; the third gas supply system 4 includes a third vacuum gauge 43, a third pure gas cylinder 44, a third mechanical pump 45 and a third molecular pump 46, wherein the third vacuum gauge 43 and the third pure gas cylinder 44 are both connected to the third pressure stabilizing chamber 41, the third mechanical pump 45 is connected to the third molecular pump 46, and the third molecular pump 46 is connected to the third pressure stabilizing chamber 41.

[0032] Furthermore, the water vapor supply system 5 includes a vacuum gauge, a water vapor storage tank 54, a mechanical pump and a molecular pump, wherein: the vacuum gauge is connected to the pressure stabilizing chamber; the water vapor storage tank 54 is connected to the pressure stabilizing chamber; the mechanical pump is connected to the molecular pump, and the molecular pump is connected to the pressure stabilizing chamber. Similarly, the vacuum gauge is used to measure the pressure value in the pressure stabilizing chamber. Under the action of the mechanical pump and the molecular pump, the gas in the water vapor storage tank 54 will be drawn into the pressure stabilizing chamber for temporary storage, and then enter the upper vacuum chamber 11 through a small hole for mixing and preparation. The interior of the water vapor storage tank 54 is used to store frozen water. The sublimation rate of ice is slow, and it is more convenient to discharge excess other gases. During the gas supply process, the gas is pumped to the background through the mechanical pump and the molecular pump.

[0033] Specifically, in the embodiment of the present application, the water vapor supply system 5 includes a fourth vacuum gauge 53, a fourth mechanical pump 55 and a fourth molecular pump 56, wherein the fourth vacuum gauge 53 is connected to the fourth pressure stabilizing chamber 51, the water vapor storage tank 54 is connected to the fourth pressure stabilizing chamber 51, the fourth mechanical pump 55 is connected to the fourth molecular pump 56, and the fourth molecular pump 56 is connected to the fourth pressure stabilizing chamber 51.

[0034] Furthermore, it also includes a standard chamber 7, which is arranged between a certain group of gas supply systems and the upper vacuum chamber 11, one end of the standard chamber 7 is connected to the pressure stabilizing chamber, and the other end is connected to the upper vacuum chamber 11, and a vacuum gauge is also connected to the standard chamber 7. The standard chamber 7 is arranged between a certain group of gas supply systems and the upper vacuum chamber 11 according to actual conditions, and is mainly used to calibrate the volume of the test cover 1 by the expansion method, and then obtain the flow conductance of each small hole by the pressure rise method according to the volume of the test cover 1. In the embodiment of the present application, the standard chamber 7 is arranged between the first pressure stabilizing chamber 21 of the first gas supply system 2 and the upper vacuum chamber 11, and a fifth vacuum gauge 71 is connected to the standard chamber 7.

[0035] Further, such as Figure 2 As shown, the upper vacuum chamber 11 is connected to a vacuum gauge, the lower vacuum chamber 12 is connected to a vacuum gauge and a molecular pump, and the molecular pump is connected to a mechanical pump. The vacuum gauge is mainly used to measure the pressure value in the upper and lower vacuum chambers 12. The mechanical pump and the molecular pump are used to evacuate the upper and lower vacuum chambers 12 before preparation, and to extract various types of gases during the preparation process. Before preparation, the pressure in the test cover 1 can reach 10 -7 Pa, during the preparation process, the mechanical pump and the molecular pump evacuate the upper vacuum chamber 11 through the partition hole between the upper vacuum chamber 11 and the lower vacuum chamber 12 at a constant pumping speed, thereby achieving uniform mixing of various gases and water vapor.

[0036] Specifically, in the embodiment of the present application, the upper vacuum chamber 11 is connected to the sixth vacuum gauge 14 , the lower vacuum chamber 12 is connected to the seventh vacuum gauge 15 and the fifth molecular pump 16 , and the fifth molecular pump 16 is connected to the fifth mechanical pump 17 .

[0037] Furthermore, it also includes a high vacuum valve 8. Each connecting gas path is provided with a high vacuum valve 8, and the high vacuum valve 8 is used to control the opening and closing of the corresponding gas path.

[0038] Specifically, in the embodiment of the present application, a high vacuum valve 8 is provided on each connecting gas path, which is used to control the on and off of the gas path according to actual conditions, so as to realize the flow of various types of gases and water vapor. Taking the first gas supply system 2 as an example, a high vacuum valve 8 is provided between the first vacuum gauge 23 and the first stabilizing chamber 21, a high vacuum valve 8 is provided between the first pure gas cylinder 24 and the first stabilizing chamber 21, a high vacuum valve 8 is provided between the first mechanical pump 25 and the first molecular pump 26, a high vacuum valve 8 is provided between the first molecular pump 26 and the first stabilizing chamber 21, a high vacuum valve 8 is provided between the first small hole 22 and the first stabilizing chamber 21, and a high vacuum valve 8 is provided between the first small hole 22 and the upper vacuum chamber 11; the position where the high vacuum valve 8 is provided in the second gas supply system 3, the third gas supply system 4 and the water vapor supply system 5 is the same as the position where it is provided in the first gas supply system 2, and no further description is given here. In addition, a high vacuum valve 8 is arranged between the standard chamber 7 and the first pressure-stabilizing chamber 21, a high vacuum valve 8 is arranged between the standard chamber 7 and the upper vacuum chamber 11, and a high altitude valve is arranged between the standard chamber 7 and the fifth vacuum gauge 71; for the test cover 1, a high vacuum valve 8 is arranged between the upper vacuum chamber 11 and the sixth vacuum gauge 14, a high vacuum valve 8 is arranged between the lower vacuum chamber 12 and the seventh vacuum gauge 15, a high vacuum valve 8 is arranged between the lower vacuum chamber 12 and the fifth molecular pump 16, and a high vacuum valve 8 is arranged between the fifth molecular pump 16 and the fifth mechanical pump 17.

[0039] Furthermore, a heating device is provided in the incubator 6, and the temperature change in the incubator 6 is less than 0.05°C. The incubator 6 is mainly used to ensure that the water vapor supply system 5 is in a constant temperature environment. The amount of water vapor intake depends on the pressure in the stabilizing chamber, which is related to the temperature. The temperature determines the upper limit of the water vapor intake. The saturated vapor pressure of water vapor is affected by the temperature. In order to obtain accurate results as much as possible, the temperature fluctuation inside the incubator 6 is less than 0.05°C during the temperature maintenance process, so as to minimize the change of water vapor pressure in the stabilizing chamber caused by temperature changes. In addition, the initial temperature of the incubator 6 is room temperature, and a specific temperature required in the experiment is maintained by a heating system or using liquid nitrogen. Since the saturated vapor pressure of water vapor at room temperature is about 3000Pa, when a larger amount of water vapor intake is required, the fourth stabilizing chamber 51 needs to be appropriately heated to achieve the required intake.

[0040] Specifically, the embodiment of the present application needs to calibrate the conductance of the first small hole 22, the second small hole 32, the third small hole 42 and the fourth small hole 52 before preparation. The standard chamber 7 with a volume of 1L is used to measure the volume of the test cover 1 by the expansion method. After the volume of the test cover 1 is obtained, the pressure rise method is used to calibrate them respectively. The calculation formula is as follows:

[0041] ,

[0042] In the formula, C孔 is the conductance of the flow-limiting orifice, m 3 s -1 ; V 测 is the volume of the test hood, m 3 ; δp is the change in pressure in the test hood, Pa; t is the time required for the pressure in the test hood to change δp, s; P2 is the pressure in the stabilizing chamber.

[0043] The above formula can be used to obtain the conductance C1, C2, C3, and C4 of the four small holes. Then, the flow rates of the first gas flow meter, the second gas flow meter, the third gas flow meter, and the fourth gas flow meter are calculated according to the fixed conductance method. The calculation formula is as follows:

[0044] ,

[0045] In the formula, p is the reading of the corresponding vacuum meter. The flow rates Q1, Q2, Q3, and Q4 of the four gas flow meters can be obtained through the above formula. Then the content of the mixed gas can be calculated through the flow rate. The percentage n1 of the gas entering the test cover 1 through the first gas supply system 2 is: n1=Q1 / (Q1+Q2+Q3+Q4). Similarly, the percentage n2 of the gas in the second gas supply system 3, the percentage n3 of the gas in the third gas supply system 4, and the percentage n4 of the water vapor in the water vapor supply system 5 can be obtained. In addition, in order to achieve the vacuum degree required for measurement or calibration, the total flow required to be provided can be calculated based on the conductance of the partition hole between the upper vacuum chamber 11 and the lower vacuum chamber 12.

[0046] More specifically, in one embodiment of the present application, four small holes are selected with a diameter of 10 microns (the small holes are formed by laser burning), and the flow conductance of these four small holes is 10 -8 m 3 s -1 When preparing a mixed gas of N2, Ar, and H2 containing water vapor, the content of the mixed gas is 10% water vapor, 30% N2, 30% Ar, and 30% H2. The flow rate of different gases required is formed by controlling the pressure of each stabilizing chamber. The flow rate of the first gas supply system 2 is set to 3×10 -6 Pa m 3 s -1 , the flow rate of the second gas supply system 3 is set to 3×10 -6 Pa m 3 s -1 , the flow rate of the third gas supply system 4 is set to 3×10 -6 Pa m 3 s -1 , the flow rate of the steam supply system 5 is set to 10 -6 Pa m 3 s-1 The temperature in the incubator is set to 26.3℃, at which time the saturated vapor pressure of water vapor is 3400 Pa. 100 Pa of water vapor is rushed into the stabilizing chamber. When the gas is actually introduced, the time for the flow and pressure of each gas supply system to reach equilibrium is very short, lasting for 5 minutes, and finally the mixed gas is obtained.

[0047] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A ground water vapor mixed gas preparation device, characterized in that: It includes a test hood, an air supply system, a water vapor supply system and an incubator, wherein: The test cover comprises an upper vacuum chamber and a lower vacuum chamber, and a perforated partition is arranged between the upper vacuum chamber and the lower vacuum chamber; The gas supply system is provided in multiple groups, and each group of the gas supply system is connected to the upper vacuum chamber via a gas flow meter; The water vapor supply system is arranged in the heat preservation box and connected to the upper vacuum chamber through a gas flow meter; Each gas flow meter includes a pressure stabilizing chamber and a small hole, the diameter of which is in the micrometer range; The water vapor supply system includes a vacuum gauge, a water vapor storage tank, a mechanical pump and a molecular pump, wherein: The vacuum gauge is connected to the pressure stabilizing chamber; The water vapor storage tank is connected to the pressure stabilization chamber; The mechanical pump is connected to the molecular pump, and the molecular pump is connected to the pressure stabilizing chamber; It also includes a standard chamber, which is arranged between a certain gas supply system and the upper vacuum chamber, one end of the standard chamber is connected to the pressure stabilizing chamber, and the other end is connected to the upper vacuum chamber, and a vacuum gauge is also connected to the standard chamber; A heating device is provided in the heat preservation box, and the temperature change in the heat preservation box is less than 0.05°C; Before preparation, the conductance of the orifice needs to be calibrated.

2. The ground water vapor mixed gas preparation device according to claim 1, characterized in that: Each gas supply system is equipped with a vacuum gauge, a pure gas cylinder, a mechanical pump and a molecular pump, including: The vacuum gauge is connected to the pressure stabilizing chamber; The pure gas cylinder is connected to the pressure stabilization chamber; The mechanical pump is connected to the molecular pump, and the molecular pump is connected to the pressure stabilizing chamber.

3. The ground water vapor mixed gas preparation device according to claim 1, characterized in that: The upper vacuum chamber is connected to a vacuum gauge, the lower vacuum chamber is connected to the vacuum gauge and a molecular pump, and the molecular pump is connected to a mechanical pump.

4. The ground water vapor mixed gas preparation device according to claim 3, characterized in that: It also includes a high vacuum valve. Each connecting gas line is provided with a high vacuum valve, and the high vacuum valve is used to control the on-off of the corresponding gas line.

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