A method for regenerating a MoNb alloy target

Abstract

The application relates to a MoNb alloy target material regeneration method, which comprises the following steps: (1) a MoNb alloy waste target is subjected to surface pretreatment to obtain a pretreated waste target; (2) the pretreated waste target obtained in step (1) is subjected to electron beam melting treatment, and the obtained MoNb alloy ingot material is subjected to plasma spheroidization treatment to obtain a MoNb alloy powder; (3) the MoNb alloy powder obtained in step (2) is sequentially subjected to filling and vibration compaction treatment, degassing treatment, hot isostatic pressing treatment and machining to obtain the MoNb alloy target material. The MoNb alloy waste target is recycled and reused by combining electron beam melting with plasma spheroidization process, the prepared MoNb alloy target material has high density, and can meet the high performance requirements of the flat panel display industry.

Description

Technical Field

[0001] This invention relates to the field of target material recycling technology, and specifically to a method for regenerating MoNb alloy targets. Background Technology

[0002] MoNb alloy sputtering targets are primarily used in the flat panel display industry. Compared to pure molybdenum sputtering targets, MoNb alloy sputtering targets can more than double or double the pixel count of liquid crystal displays, resulting in higher clarity, information capacity, and resolution for large displays with long electrodes. Furthermore, MoNb alloy sputtering targets also possess excellent electrical conductivity, oxidation resistance, and low coating stress, making them widely used as a key material in flat panel displays.

[0003] With the continuous development of industries such as LCD TVs, tablet computers, and mobile phones, the demand for high-performance MoNb alloys is increasing daily, making research on the preparation process of high-performance MoNb alloy sputtering targets particularly important. Currently, the production of MoNb alloy sputtering targets is relatively mature and can be well verified by end-users. However, there is currently no good method to recycle and reuse the scrap or residual targets generated during the manufacturing process. They are typically sold to the steel industry as additives, resulting in low utilization of MoNb materials.

[0004] Currently, research on the recycling and reuse of MoNb alloy materials is extremely limited. CN 114395700A discloses a molybdenum billet and its preparation method and application. The preparation method includes the following steps: cleaning the target material scrap sequentially and performing at least two vacuum electron beam melting processes to obtain the molybdenum billet. The purity of the molybdenum billet is ≥99.95%. This invention's preparation method effectively processes molybdenum scrap from the target material by organically combining cleaning and vacuum electron beam melting processes, realizing the utilization value of molybdenum scrap and achieving the recycling of molybdenum resources. However, the size of the obtained molybdenum billet cannot directly meet the size requirements of the target material.

[0005] CN 114087875A discloses a molybdenum alloy smelting and recycling equipment and a vacuum degassing and impurity removal smelting furnace, including a main support frame and a vacuum degassing and impurity removal smelting furnace mounting frame. A vacuum refining furnace is mounted on the main support frame, and the vacuum degassing and impurity removal smelting furnace is installed inside the mounting frame. The vacuum refining furnace is located directly below the vacuum degassing and impurity removal smelting furnace, and a crystallization device and a billet pulling device are arranged sequentially below the vacuum refining furnace. This invention also provides a molybdenum alloy smelting and recycling method, which includes four steps: preparing consumable electrodes, vacuum degassing and impurity removal, refining, and preparing recycled molybdenum alloy blocks. However, the equipment requires high manufacturing costs, and the recycling method is complex, which is not conducive to large-scale industrial production.

[0006] In addition, there are other methods for recycling waste targets. CN 110498443A discloses a method for reproducing ITO powder from waste ITO targets. This method involves dissolving the waste ITO target powder under hydrothermal conditions with concentrated hydrochloric acid, adjusting the pH of the solution, filtering, adding nitrate to the filtrate to obtain a mixed solution, using the mixed solution as the electrolyte, and performing constant voltage electrolysis using an electrochemical workstation and a three-electrode system. Insoluble matter on the working electrode and in the solution is collected, washed, and dried to obtain an ITO precursor. The precursor is then calcined at high temperature to obtain ITO powder. However, this process is lengthy, requires a large amount of chemical reagents, increases the risk of impurity introduction, and further preparation is needed to obtain the finished target material.

[0007] In view of the shortcomings of existing technologies, there is an urgent need to provide a regeneration method that is low in cost, produces high-density MoNb alloy targets, and is suitable for large-scale production. Summary of the Invention

[0008] The purpose of this invention is to provide a method for regenerating MoNb alloy targets. By subjecting waste MoNb alloy targets to electron beam melting and plasma spheroidization, MoNb alloy powder with good flowability and uniformity is obtained. Further, through filling and compaction, degassing, and hot isostatic pressing, large-size MoNb alloy targets that meet the requirements are obtained. This method is low in cost and produces high-quality finished products.

[0009] To achieve this objective, the present invention adopts the following technical solution:

[0010] This invention provides a method for regenerating MoNb alloy targets, the method comprising the following steps:

[0011] (1) The MoNb alloy waste target is pretreated to obtain a pretreated waste target;

[0012] (2) The pretreated waste target obtained in step (1) is subjected to electron beam melting treatment, and the resulting MoNb alloy ingot is subjected to plasma spheroidizing treatment to obtain MoNb alloy powder.

[0013] (3) The MoNb alloy powder obtained in step (2) is subjected to filling and compaction treatment, degassing treatment, hot isostatic pressing treatment and machining in sequence to obtain the MoNb alloy target.

[0014] The method for regenerating MoNb alloy targets provided by this invention combines electron beam melting with plasma spheroidization, enabling the recycling and reuse of scrap materials and / or used residual targets generated during the production of MoNb alloy targets. The purity, flowability, and tap density of the resulting MoNb alloy powder meet the requirements for use. Furthermore, by controlling reasonable process parameters through filling and tapping treatment, degassing treatment, and hot isostatic pressing treatment, the resulting MoNb alloy targets can meet the high-performance requirements of the flat panel display industry.

[0015] Preferably, the MoNb alloy waste target in step (1) includes residual targets generated after sputtering coating and / or scraps generated during the production of MoNb alloy targets.

[0016] Preferably, the surface pretreatment in step (1) includes an alkaline washing treatment and a steaming treatment performed sequentially.

[0017] The alkaline washing and boiling treatments can remove dirt from the surface of the MoNb alloy waste target and avoid introducing impurities.

[0018] Preferably, the pH value of the alkaline solution used in the alkaline washing treatment is 8-10, for example, it can be 8, 8.5, 9, 9.5 or 10, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0019] Preferably, the alkaline solution comprises a sodium hydroxide solution.

[0020] Preferably, the temperature of the pure water used in the cooking process is 70-100℃, for example, it can be 70℃, 75℃, 80℃, 90℃ or 100℃, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0021] Preferably, the temperature of the electron beam melting process in step (2) is ≥2600℃, for example, it can be 2600℃, 2650℃, 2700℃, 2750℃ or 2800℃, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0022] Preferably, the vacuum degree of the electron beam melting process in step (2) is ≥1×10⁻⁶. -2 Pa, for example, could be 1×10 - 2 Pa, 1.5 × 10 -2 Pa, 2×10 -2 Pa, 2.5 × 10 -2 Pa or 3×10 -2 Pa, but not limited to the listed values, applies to other unlisted values ​​within the range as well.

[0023] Preferably, the ratio of melting power to melting speed in the electron beam melting process of step (2) is ≥4, for example, it can be 4, 4.5, 5, 5.5 or 6, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0024] Preferably, the cooling water temperature for the electron beam melting process in step (2) is 20-30°C, for example, it can be 20°C, 22°C, 25°C, 28°C or 30°C, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0025] The electron beam melting process can volatilize impurities in the MoNb alloy, and the purity of the resulting MoNb alloy ingot is not lower than that of the original target material.

[0026] Preferably, the working carrier gas for the plasma spheroidization process in step (2) includes hydrogen.

[0027] Preferably, the flow rate of the working carrier gas is 4-8 slpm, for example, it can be 4 slpm, 5 slpm, 6 slpm, 7 slpm or 8 slpm, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0028] Preferably, the edge gas in the plasma spheroidizing treatment in step (2) includes hydrogen and / or argon.

[0029] Preferably, the flow rate of the side gas is 40-60 slpm, for example, it can be 40 slpm, 45 slpm, 50 slpm, 55 slpm or 60 slpm, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0030] Preferably, the feeding rate of the plasma spheroidizing process in step (2) is 1-5 mm / min, for example, it can be 1 mm / min, 2 mm / min, 3 mm / min, 4 mm / min or 5 mm / min, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0031] Preferably, the output power of the plasma spheroidizing device in step (2) is 80-120kW, for example, it can be 80kW, 90kW, 100kW, 110kW or 120kW, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0032] Preferably, the temperature of the plasma spheroidizing treatment in step (2) is 2600-3000℃, for example, it can be 2600℃, 2700℃, 2800℃, 2900℃ or 3000℃, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0033] The plasma spheroidization treatment temperature, within a reasonable range, ensures effective melting of the MoNb alloy. The molten MoNb alloy is then atomized using high-purity argon gas to form spherical MoNb alloy powder. Excessively high or low plasma spheroidization temperatures will adversely affect the sphericity and flowability of the MoNb alloy powder.

[0034] Preferably, the average particle size of the MoNb alloy powder in step (2) is 30-100 μm, for example, it can be 30 μm, 50 μm, 70 μm, 85 μm or 100 μm, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0035] Preferably, the vibration time of the filling and compaction process in step (3) is 5-10 min, for example, it can be 5 min, 6 min, 7 min, 8 min or 10 min, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0036] The filling and compaction process involves preparing a stainless steel square casing according to the size requirements of the target LCD target material, then loading MoNb alloy powder into it and vibrating it for 5-10 minutes at a time of 49.8-50.2 kg of powder to ensure that the MoNb alloy powder is fully filled into the casing.

[0037] Preferably, step (3) includes a sleeve welding process after the filling and compaction treatment and before the degassing treatment.

[0038] Preferably, the temperature of the degassing treatment in step (3) is 450-700℃, for example, it can be 450℃, 500℃, 550℃, 600℃ or 700℃, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0039] Preferably, the endpoint of the degassing process in step (3) is a vacuum degree < 0.003 Pa, for example, it can be 0.0028 Pa, 0.0025 Pa, 0.0022 Pa, 0.002 Pa or 0.0018 Pa, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0040] After the cladding is welded, a degassing tube with a hole in the middle connects the inside and outside of the cladding. The welded stainless steel cladding is placed in an electric resistance furnace and connected to a molecular pump through the degassing tube. After the degassing process reaches its end point, the valve is closed and the heat preservation is stopped. Then, the degassing tube is sealed by argon arc welding, so that the inside of the cladding is in a high vacuum state.

[0041] Preferably, the temperature of the hot isostatic pressing process in step (3) is 800-1000℃, for example, it can be 800℃, 850℃, 900℃, 950℃ or 1000℃, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0042] Preferably, the pressure of the hot isostatic pressing process in step (3) is 160-200 MPa, for example, it can be 160 MPa, 170 MPa, 180 MPa, 190 MPa or 200 MPa, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0043] Preferably, the heat preservation and pressure holding time of the hot isostatic pressing treatment in step (3) is 4-6 hours, for example, it can be 4 hours, 4.5 hours, 5 hours, 5.5 hours or 6 hours, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable.

[0044] Preferably, after the hot isostatic pressing treatment in step (3), the temperature and pressure are reduced until the conditions for unloading from the furnace are met.

[0045] The hot isostatic pressing (HIP) process differs from the conventional HIP process for MoNb alloys. Since the MoNb alloy powder in this invention is already an alloyed powder, the HIP process only needs to ensure the effective density of the MoNb alloy target material, without the need to alloy it at a higher temperature, thus further saving equipment energy consumption.

[0046] The machining in step (3) involves cutting the MoNb target material obtained by hot isostatic pressing into pieces using a sawing machine, and then machining it into the target size using a gantry milling machine to obtain the MoNb alloy target material.

[0047] As a preferred embodiment of the regeneration method of the present invention, the regeneration method includes the following steps:

[0048] (1) The MoNb alloy waste targets were successively subjected to alkaline washing with alkaline solution with a pH of 8-10 and boiling with pure water at 70-100℃ to obtain pretreated waste targets.

[0049] (2) The pretreated waste target obtained in step (1) is subjected to a temperature of ≥2600℃ and ≥1×10⁻⁶℃. -2 Electron beam melting was carried out under the conditions of Pa and a melting power to melting speed ratio ≥4, and the cooling water temperature was 20-30℃. The resulting MoNb alloy ingots were subjected to plasma spheroidization treatment at 2600-3000℃ to obtain MoNb alloy powder with an average particle size of 30-100μm.

[0050] The working carrier gas for the plasma spheroidizing process includes hydrogen with a flow rate of 4-8 slpm, and the side gas includes hydrogen and / or argon with a flow rate of 40-60 slpm; the feeding rate for the plasma spheroidizing process is 1-5 mm / min, and the equipment output power is 80-120 kW.

[0051] (3) The MoNb alloy powder obtained in step (2) is subjected to filling and compaction treatment for 5-10 min, cladding welding treatment, degassing treatment at 450-700℃ until the vacuum degree <0.003Pa, and then hot isostatic pressing treatment at 800-1000℃ and 160-200MPa for 4-6 h, followed by cooling and depressurization to meet the furnace conditions, and then machining to obtain the MoNb alloy target material.

[0052] Compared with the prior art, the present invention has the following beneficial effects:

[0053] The method for regenerating MoNb alloy targets provided by this invention combines electron beam melting with plasma spheroidization, enabling the recycling and reuse of scrap materials and / or used residual targets generated during the production of MoNb alloy targets. The purity, flowability, and tap density of the resulting MoNb alloy powder meet the requirements for use. Furthermore, by controlling reasonable process parameters through filling and tapping treatment, degassing treatment, and hot isostatic pressing treatment, the density of the resulting MoNb alloy target can reach 100%, meeting the high-performance requirements of the flat panel display industry. Attached Figure Description

[0054] Figure 1 This is a SEM image of the MoNb alloy powder provided in Example 1 of the present invention. Detailed Implementation

[0055] The technical solution of the present invention will be further illustrated below through specific embodiments. Those skilled in the art should understand that the embodiments described are merely illustrative of the present invention and should not be construed as limiting the invention in any way.

[0056] Example 1

[0057] This embodiment provides a method for regenerating MoNb alloy sputtering targets, the method comprising the following steps:

[0058] (1) The residual target generated after sputtering coating is successively treated with sodium hydroxide solution with pH value of 9 and boiled with pure water at 80℃ to obtain pretreated waste target;

[0059] (2) The pretreated waste target obtained in step (1) is subjected to 2700℃ and 2×10 -2Electron beam melting was performed under conditions of Pa and a melting power-to-melting speed ratio of 5, with a cooling water temperature of 25°C. The resulting MoNb alloy ingots were then subjected to plasma spheroidization treatment at 2800°C to obtain MoNb alloy powder with an average particle size of 85 μm. Figure 1 As shown, the MoNb alloy powder has good sphericity and strong fluidity, which is beneficial for subsequent filling and compaction processes.

[0060] The working carrier gas for the plasma spheroidizing process is hydrogen with a flow rate of 6 slpm, and the side gas is argon with a flow rate of 50 slpm; the feeding rate for the plasma spheroidizing process is 3 mm / min, and the equipment output power is 100 kW.

[0061] (3) The MoNb alloy powder obtained in step (2) is subjected to filling and vibration treatment for 7 min, cladding welding treatment, and degassing treatment at 550℃ to a vacuum degree of 0.0022 Pa. Then, it is subjected to hot isostatic pressing treatment at 900℃ and 180MPa for 5 h, and then cooled and depressurized to meet the furnace conditions. The MoNb alloy target is obtained by machining.

[0062] Example 2

[0063] This embodiment provides a method for regenerating MoNb alloy sputtering targets, the method comprising the following steps:

[0064] (1) The scraps generated during the production of MoNb alloy targets were successively treated with alkaline washing of sodium hydroxide solution with a pH of 8 and boiling in pure water at 100°C to obtain pretreated waste targets.

[0065] (2) The pretreated waste target obtained in step (1) is subjected to 2600℃ and 3×10 -2 Electron beam melting was performed under the conditions of Pa and a melting power to melting speed ratio of 4, with a cooling water temperature of 20℃. The resulting MoNb alloy ingots were then subjected to plasma spheroidization treatment at 2600℃ to obtain MoNb alloy powder with an average particle size of 100μm.

[0066] The working carrier gas for the plasma spheroidizing process is hydrogen with a flow rate of 4 slpm, and the side gas is argon with a flow rate of 40 slpm; the feeding rate for the plasma spheroidizing process is 1 mm / min, and the equipment output power is 80 kW.

[0067] (3) The MoNb alloy powder obtained in step (2) is subjected to filling and vibration treatment for 5 min, cladding welding treatment, degassing treatment at 450℃ to a vacuum degree of 0.0028 Pa, and then hot isostatic pressing treatment at 800℃ and 200MPa for 4 h, followed by cooling and depressurization to meet the furnace conditions, and then machining to obtain the MoNb alloy target.

[0068] Example 3

[0069] This embodiment provides a method for regenerating MoNb alloy sputtering targets, the method comprising the following steps:

[0070] (1) The residual target generated after sputtering coating is successively treated with alkaline washing of sodium hydroxide solution with pH value of 10 and boiling treatment of pure water at 70℃ to obtain pretreated waste target;

[0071] (2) The pretreated waste target obtained in step (1) is subjected to 2800℃ and 1×10 -2 Electron beam melting was performed under the conditions of Pa and a melting power to melting speed ratio of 6, with a cooling water temperature of 30℃. The resulting MoNb alloy ingots were then subjected to plasma spheroidization treatment at 3000℃ to obtain MoNb alloy powder with an average particle size of 30μm.

[0072] The working carrier gas for the plasma spheroidizing process is hydrogen with a flow rate of 8 slpm, and the side gas is argon with a flow rate of 60 slpm; the feeding rate for the plasma spheroidizing process is 5 mm / min, and the equipment output power is 120 kW.

[0073] (3) The MoNb alloy powder obtained in step (2) is subjected to filling and vibration treatment for 10 min, cladding welding treatment, and degassing treatment at 700℃ to a vacuum degree of 0.0018 Pa. Then, it is subjected to hot isostatic pressing treatment at 1000℃ and 160MPa for 6 h, and then cooled and depressurized to meet the furnace conditions. The MoNb alloy target material is obtained by machining.

[0074] Example 4

[0075] This embodiment provides a method for regenerating MoNb alloy targets. The difference from Embodiment 1 is that the alkaline washing and boiling treatment described in step (1) are omitted, while the rest are the same as in Embodiment 1.

[0076] Example 5

[0077] This embodiment provides a method for regenerating MoNb alloy targets. The difference from Embodiment 1 is that the temperature of the plasma spheroidization treatment in step (2) is adjusted to 2500℃, while the rest is the same as in Embodiment 1.

[0078] Example 6

[0079] This embodiment provides a method for regenerating MoNb alloy targets. The difference from Embodiment 1 is that the temperature of the plasma spheroidization treatment in step (2) is adjusted to 3100℃, while the rest is the same as in Embodiment 1.

[0080] Example 7

[0081] This embodiment provides a method for regenerating MoNb alloy targets. The difference from Embodiment 1 is that the temperature of the hot isostatic pressing treatment in step (3) is adjusted to 750°C and the pressure is adjusted to 150MPa. All other aspects are the same as in Embodiment 1.

[0082] Example 8

[0083] This embodiment provides a method for regenerating MoNb alloy targets. The difference from Embodiment 1 is that the temperature of the hot isostatic pressing treatment in step (3) is adjusted to 1050°C and the pressure is adjusted to 210MPa. The rest are the same as in Embodiment 1.

[0084] Comparative Example 1

[0085] This comparative example provides a method for regenerating MoNb alloy targets. The difference from Example 1 is that the electron beam melting treatment described in step (2) is omitted, while the rest is the same as in Example 1.

[0086] Comparative Example 2

[0087] This comparative example provides a method for regenerating MoNb alloy targets, wherein the regeneration method adopts the preparation method disclosed in CN114395700A to regenerate MoNb alloy targets.

[0088] The purity of the MoNb alloy powders provided in Examples 1-8 and Comparative Examples 1 and 2 was tested by glow discharge mass spectrometry, and the sphericity was tested by scanning electron microscopy. The density of the MoNb alloy targets provided in Examples 1-8 and Comparative Examples 1 and 2 was tested by a densitometer. The results are shown in Table 1.

[0089] Table 1

[0090] purity(%) sphericity Density (%) Example 1 99.995 99 100 Example 2 99.995 98 99.4 Example 3 99.99 98 100 Example 4 99.8 85 100 Example 5 99.95 60 85 Example 6 99.995 80 99 Example 7 99.995 99 90 Example 8 99.995 99 93 Comparative Example 1 99.5 97 99.3 Comparative Example 2 99.9955 20 85

[0091] As can be seen from Table 1, the method for regenerating MoNb alloy targets provided by the present invention, through electron beam melting and plasma spheroidizing treatment, processes waste MoNb alloy targets to obtain MoNb alloy powder with high purity and good sphericity, and can further produce MoNb alloy targets with high density and meeting size requirements.

[0092] A comparison of Examples 1 and 4 shows that without surface pretreatment, the risk of impurity introduction increases, leading to a decrease in the purity of the alloy powder. A comparison of Examples 1 and Examples 5 and 6 shows that excessively high or low temperatures in plasma spheroidization treatment have an adverse effect on the sphericity of the MoNb alloy powder. A comparison of Examples 1 and Examples 7 and 8 shows that excessively high or low temperatures and pressures in hot isostatic pressing treatment significantly reduce the density of the obtained MoNb alloy target.

[0093] As can be seen from the comparison between Example 1 and Comparative Example 1, without electron beam melting treatment, impurities in the MoNb alloy waste target cannot be effectively removed, resulting in a decrease in the purity of the MoNb alloy powder. As can be seen from the comparison between Example 1 and Comparative Example 2, the MoNb alloy target material prepared by using the coupled electron beam melting treatment and plasma spheroidization treatment process provided by the present invention has a higher density.

[0094] In summary, the MoNb alloy target regeneration method provided by this invention combines electron beam melting with plasma spheroidization, enabling the recycling and reuse of scrap materials and / or used residual targets generated during the production of MoNb alloy targets. The purity, flowability, and tap density of the obtained MoNb alloy powder all meet the requirements for use. Furthermore, by controlling reasonable process parameters through filling and tapping treatment, degassing treatment, and hot isostatic pressing treatment, the density of the obtained MoNb alloy target can reach 100%, which can meet the high-performance requirements of the flat panel display industry.

[0095] The above description is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present invention fall within the protection and disclosure scope of the present invention.

Claims

1. A method for regenerating MoNb alloy sputtering targets, characterized in that, The regeneration method includes the following steps: (1) The MoNb alloy waste target is pretreated to obtain a pretreated waste target; the MoNb alloy waste target includes residual targets generated after sputtering coating and / or scraps generated during the production of MoNb alloy target material; (2) The pretreated waste target obtained in step (1) is subjected to electron beam melting treatment, and the resulting MoNb alloy ingot is subjected to plasma spheroidizing treatment to obtain MoNb alloy powder; the temperature of the plasma spheroidizing treatment is 2600-3000℃. (3) The MoNb alloy powder obtained in step (2) is subjected to filling and compaction treatment, degassing treatment, hot isostatic pressing treatment and machining in sequence to obtain the MoNb alloy target.

2. The regeneration method according to claim 1, characterized in that, The surface pretreatment in step (1) includes an alkaline washing treatment and a steaming treatment performed sequentially.

3. The regeneration method according to claim 2, characterized in that, The pH value of the alkaline solution used in the alkaline washing treatment is 8-10.

4. The regeneration method according to claim 2, characterized in that, The temperature of the pure water used in the cooking process is 70-100℃.

5. The regeneration method according to claim 1, characterized in that, The temperature of the electron beam melting process in step (2) is ≥2600℃.

6. The regeneration method according to claim 1, characterized in that, The vacuum degree of the electron beam melting process in step (2) is ≥1×10 -2 Pa.

7. The regeneration method according to claim 1, characterized in that, The ratio of melting power to melting speed in step (2) electron beam melting process is ≥4.

8. The regeneration method according to claim 1, characterized in that, The cooling water temperature for the electron beam melting process in step (2) is 20-30℃.

9. The regeneration method according to claim 1, characterized in that, The working carrier gas for the plasma spheroidization process in step (2) includes hydrogen.

10. The regeneration method according to claim 9, characterized in that, The flow rate of the working carrier gas is 4-8 slpm.

11. The regeneration method according to claim 1, characterized in that, The edge gas in step (2) of plasma spheroidization treatment includes hydrogen and / or argon.

12. The regeneration method according to claim 11, characterized in that, The flow rate of the gas at the edge is 40-60 slpm.

13. The regeneration method according to claim 1, characterized in that, The feeding rate of the plasma spheroidizing process in step (2) is 1-5 mm / min.

14. The regeneration method according to claim 1, characterized in that, The plasma spheroidizing process described in step (2) has an output power of 80-120kW.

15. The regeneration method according to claim 1, characterized in that, The average particle size of the MoNb alloy powder in step (2) is 30-100 μm.

16. The regeneration method according to claim 1, characterized in that, The vibration time for the filling and compaction process in step (3) is 5-10 minutes.

17. The regeneration method according to claim 1, characterized in that, Step (3) includes a cladding welding process after the filling and compaction treatment and before the degassing treatment.

18. The regeneration method according to claim 1, characterized in that, The degassing temperature in step (3) is 450-700℃.

19. The regeneration method according to claim 1, characterized in that, The endpoint of the degassing process in step (3) is a vacuum degree < 0.003 Pa.

20. The regeneration method according to claim 1, characterized in that, The temperature of the hot isostatic pressing process in step (3) is 800-1000℃.

21. The regeneration method according to claim 1, characterized in that, The pressure of the hot isostatic pressing process in step (3) is 160-200 MPa.

22. The regeneration method according to claim 1, characterized in that, The heat preservation and pressure holding time for the hot isostatic pressing treatment in step (3) is 4-6 hours.

23. The regeneration method according to claim 1, characterized in that, The regeneration method includes the following steps: (1) The MoNb alloy waste targets were successively treated with alkaline washing with alkaline solution with pH value of 8-10 and boiling with pure water at 70-100℃ to obtain pretreated waste targets. (2) The pretreated waste target obtained in step (1) is subjected to a temperature of ≥2600℃ and ≥1×10⁻⁶℃. -2 Electron beam melting was carried out under the conditions of Pa and a melting power to melting speed ratio ≥4, and the cooling water temperature was 20-30℃. The resulting MoNb alloy ingots were subjected to plasma spheroidization treatment at 2600-3000℃ to obtain MoNb alloy powder with an average particle size of 30-100μm. The working carrier gas for the plasma spheroidizing process includes hydrogen with a flow rate of 4-8 slpm, and the side gas includes hydrogen and / or argon with a flow rate of 40-60 slpm; the feeding rate for the plasma spheroidizing process is 1-5 mm / min, and the equipment output power is 80-120 kW. (3) The MoNb alloy powder obtained in step (2) is subjected to filling and compaction treatment for 5-10 min, cladding welding treatment, degassing treatment at 450-700℃ until the vacuum degree <0.003Pa, and then hot isostatic pressing treatment at 800-1000℃ and 160-200MPa for 4-6 h. After machining, the MoNb alloy target material is obtained.

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