31392results about "Vacuum evaporation coating" patented technology

Vacuum-integrated photoresist-less methods and apparatuses for forming metal hardmasks can provide sub-30 nm patterning resolution. A metal-containing (e.g., metal salt or organometallic compound) film that is sensitive to a patterning agent is deposited on a semiconductor substrate. The metal-containing film is then patterned directly (i.e., without the use of a photoresist) by exposure to the patterning agent in a vacuum ambient to form the metal mask. For example, the metal-containing film is photosensitive and the patterning is conducted using sub-30 nm wavelength optical lithography, such as EUV lithography.

To provide: a transistor with favorable electrical characteristics; a transistor with a high on-state current; a transistor with low parasitic capacitance; or a transistor, a semiconductor device, or a memory device which can be miniaturized or highly integrated.SOLUTION: There is provided a transistor including an oxide semiconductor layer, a semiconductor device, or a memory device. The oxide semiconductor layer includes a first region, a second region over the first region, and a third region over the second region. The first region is located in a range from a surface on which the oxide semiconductor layer is to be formed to greater than or equal to 0 nm to less than or equal to 3 nm in a direction substantially perpendicular to the surface. In cross-sectional observation of the oxide semiconductor layer using a transmission electron microscope, bright spots arranged in a layered manner in a direction parallel to the surface on which the oxide semiconductor layer is to be formed are observed in each of the first region, the second region, and the third region.SELECTED DRAWING: Figure 1

The invention provides an artificial intelligence-based optical coating quality monitoring method, which comprises the following steps of: 1, acquiring visual image data of the surface of a coating substrate in real time by using a common industrial camera in an optical coating process; 2, preprocessing the collected image data, and extracting visual feature information representing the state of the film layer; 3, inputting the extracted feature information into a pre-trained artificial intelligence analysis model for simulating artificial experience judgment; step 4, outputting an evaluation result of the current coating quality by the artificial intelligence analysis model, wherein the evaluation result comprises identification of film layer uniformity, thickness trend and potential defects; and 5, generating a process adjusting instruction according to the evaluation result, feeding back the process adjusting instruction to a control system of the coating equipment, and dynamically adjusting process parameters to realize closed-loop optimization control.

The invention provides an Al-Mg alloy negative electrode current collector, a preparation method thereof and a negative-electrode-free sodium metal battery, and relates to the field of batteries. The preparation method of the Al-Mg alloy negative electrode current collector comprises the following steps: sputtering magnesium on the surface of an aluminum foil by adopting a magnetron sputtering mode, and forming a magnesium coating on the aluminum foil; and calcining the aluminum foil with the magnesium plating layer to obtain the Al-Mg alloy negative electrode current collector, and the Al-Mg alloy negative electrode current collector comprises an aluminum substrate layer and an Al-Mg alloy layer located on the aluminum substrate layer. According to the present invention, the Al-Mg alloy with characteristics of high sodium affinity and stable three-dimensional structure is introduced into the negative electrode current collector so as to induce the uniform deposition of sodium, inhibit the growth of sodium dendrites, reduce the loss of active sodium, and prolong the cycle life of the battery; the negative electrode current collector can be used in a sodium metal battery without a negative electrode. In addition, the method has the advantages of being easy to operate and low in raw material cost, and large-scale application and popularization are facilitated.

A multi-sheet bag includes an inner sheet having a film side defining an interior surface of the multi-sheet bag; an outer sheet coupled to the inner sheet on a side opposite the film side; at least one void disposed between the inner sheet and the outer sheet defined by an adhesive pattern deposited between the inner sheet and the outer sheet.

A multi-ply bag includes an inner sheet assembly having a film side defining an interior surface of the multi-sheet bag, the inner sheet assembly having an another side opposite the film side; an outer sheet coupled to the opposite side; and at least one void disposed between the inner sheet and the outer sheet.

The invention relates to a multi-layer composite black film and a preparation method thereof. The multi-layer composite black film is formed by sequentially stacking a base material layer, a multi-layer film system and a top covering layer, the multi-layer film system is formed by alternately stacking a plurality of absorption layers and a plurality of oxide layers, the number of the layers is 7-30, an initial layer is an oxide layer, the refractive indexes of the oxide layers are the same (1.4-1.5), the thickness ratio of the oxide layers to the absorption layers is larger than 2, and the thickness ratio of the top covering layer to the absorption layers is larger than 1. And the thicknesses of the two layers are increased and then reduced from the substrate layer to the top covering layer. A buffer layer with gradually changed oxygen content is arranged between the oxide layer and the absorption layer, and both the oxide layer and the top covering layer are made of silicon dioxide. The preparation method comprises the following steps: providing the substrate layer, alternately depositing the absorption layer and the oxide layer by using a magnetron sputtering or electron beam evaporation process to form a multilayer film system, then forming the top covering layer, controlling parameters such as vacuum degree, power, temperature and the like during deposition, and forming the buffer layer in the same cavity. The multilayer composite black film has the inner surface reflectivity of less than 1% and the appearance surface reflectivity of less than 5%, and is simple in structure and low in preparation cost.

A repulpable container defines a cavity and a cavity opening at a top end of the repulpable container, both the cavity and the opening defined by a film layer, the film layer disposed on a first paper layer, the film layer configured to reduce heat transfer between the cavity and the first paper layer, the first paper layer arranged proximate to a second paper layer with at least one void therebetween.

The invention discloses a component real-time control method and system for vacuum glow coating, and relates to the technical field of vacuum coating, firstly, in a holographic component collection stage, a sensor and monitoring equipment are used for collecting multi-dimensional data in a coating process in real time, and secondly, in a self-adaptive component adjustment stage, a chromium-nitrogen component prediction value in a vacuum cavity is calculated to obtain a chromium-nitrogen component prediction value; the concentration is compared with the target concentration to judge whether component adjustment is needed or not, then in the real-time strategy adjustment stage, when the components deviate from the target value, the nitrogen flow, bias voltage and target current are automatically adjusted through the equipment management platform to ensure the stability of the coating process, and finally, in the real-time film quality correction stage, the film quality is corrected. The film layer quality is quantified through an innovative calculation formula, the stability and consistency of chromium-nitrogen film coating are improved through closed-loop control, and the film coating process can be dynamically optimized so as to ensure that the final film layer quality meets the design requirement.

The invention discloses a titanium base material bipolar plate corrosion-resistant and hydrogen embrittlement-resistant composite coating and a preparation method thereof. The surface of a titanium base material is sequentially coated with a titanium transition layer, a titanium black hydrogen resistance layer, a titanium hole sealing layer and a precious metal conducting layer; the titanium transition layer is an elemental titanium layer, and the thickness of the titanium transition layer is 10-30 nm; the material of the titanium black hydrogen blocking layer is Magneli-phase titanium black with the molecular formula of TinO2n-1, wherein n is greater than or equal to 4 and less than or equal to 10, and the thickness is 100-150nm; the titanium hole sealing layer is an elemental titanium layer, and the thickness of the titanium hole sealing layer is 10-50nm; the precious metal conducting layer is made of at least one of platinum, gold, ruthenium and iridium, and the thickness of the precious metal conducting layer is 20-50 nm. The corrosion-resistant and hydrogen embrittlement-resistant composite coating disclosed by the invention can effectively block diffusion and permeation of hydrogen in a cathode environment of a PEM water electrolyser while ensuring corrosion-resistant and conductive performance, so that the hydrogen embrittlement-resistant performance of the cathode side of the bipolar plate is greatly improved, and the processing cost and the process complexity of the coating are reduced.

The invention relates to the technical field of PVD coating, in particular to a PVD coating design quality control method based on machine learning. The method comprises the following steps: obtaining a coating substrate object, carrying out PVD coating design, and carrying out substrate PVD coating simulation based on the design to obtain related simulation data; analyzing mechanical property parameters by using the PVD coating simulation data of the base material, evaluating the mechanical property of the coating material in combination with the mechanical data, and generating dynamic stress response data of the coating layer through a stability test; evaluating based on the chemical stability of the base material coating film, and predicting the failure condition of the coating film layer by combining the dynamic stress response data of the coating film layer; and through comprehensive analysis of dynamic stress response data and failure data of the coating layer, the coating design is further optimized. According to the invention, through the quality control of PVD coating, the quality of the PVD coating is more perfect.

The invention relates to the technical field of high polymer materials and preparation thereof, and discloses a wet anti-slip bionic friction pad on a glass surface, which is inspired by a micro-nano structure of toe pads of organisms such as tree frogs and long-horned grasshoppers with wet friction increasing characteristics, and a bulge array is added on the surface of a high-friction material, so that the friction coefficient of the friction pad is increased; the microstructure arrays can discharge a water film on the surface of the friction pad under the capillary action in a wet environment, and the effective contact area between solids is increased, so that the friction pad and a friction surface are always kept in a dry friction state, and stable friction force is ensured. The friction pad comprises a connecting layer, a supporting layer and a tail end protruding straight column array, a tail end contact layer is in a hexagonal straight column shape, the diameter of an inscribed circle of a hexagonal micro-column structure ranges from 5 micrometers to 5000 micrometers, column bodies are densely arranged in a hexagonal mode, the height of the column bodies ranges from 10 micrometers to 1500 micrometers, the tail ends of the column bodies are planes, the interval between every two column bodies ranges from 2 micrometers to 600 micrometers, and tight drainage grooves are formed.

A blank includes an inner sheet having at least a base layer having a first side and a second side opposite the first side, the inner sheet including a film coupled to the first side of the base layer, and an outer sheet coupled to the second side of the base layer by an adhesive deposited between the outer sheet and the base layer such that a plurality of voids are formed between the outer sheet and the inner sheet, wherein the blank is configured to be folded into a multi-ply bag such that the film defines the inner cavity of the multi-ply bag.

The invention relates to the technical field of composite copper foils, in particular to a production process of a multifunctional composite copper foil, the composite copper foil and application of the composite copper foil. The invention provides a production process of a multifunctional composite copper foil. The production process comprises the following steps: S1, baking a carrier layer; s2, performing surface treatment through plasma treatment; s3, coating a film on the baked carrier layer through magnetron sputtering to form a bottom layer; s4, evaporating a vacuum evaporation layer on the base layer through vacuum evaporation; s5, plating a copper layer on the vacuum evaporation layer through water electroplating; and S6, slitting the sample. According to the production process, by optimizing the baking conditions, the sputtering technology and the evaporation parameters and introducing the plasma surface treatment technology, the binding force of the copper film and the base material is improved, the pinhole rate is reduced, the production efficiency and the coating uniformity are remarkably improved, and the product quality is improved. The problems that in the existing composite copper foil production process, the binding force between a copper film and a base material is poor, the pinhole rate of the copper film is high, the deposition speed is low, and the coating uniformity is poor are solved.

The invention discloses a rolling and annealing treatment process for a copper-steel composite strip, and relates to the technical field of material rolling, the process comprises the following steps: selecting a high-purity copper plate and a stainless steel plate, and depositing a nano nickel / graphene composite transition layer through a magnetron sputtering technology; the stainless steel layer is promoted to deform through front-section low-speed high-pressure rolling, and the copper layer interface bonding force is improved through rear-section high-speed low-pressure rolling; performing short-time local annealing by using a high-frequency induction coil; honeycomb-shaped micro-pits are formed in the stainless steel surface through the laser micro-texture technology, and the interface bonding force is improved in combination with the nano-nickel / graphene layer. Copper layer hardening is eliminated through low-temperature annealing, stainless steel recrystallization is promoted through medium-temperature annealing, and a nanometer precipitated phase is fixed through rapid water cooling; the heating rate is controlled, and nitrogen-hydrogen mixed gas is used for preventing oxidation; the rolling process and the annealing process are seamlessly connected, and the temperature, the stress and the atmosphere are detected in real time through an online monitoring system. The mechanical property, the corrosion resistance and the machining stability of the copper-steel composite strip are remarkably improved.

The invention discloses an on-line swing type adjustable magnetic rod for magnetron sputtering. The on-line swing type adjustable magnetic rod comprises a shell assembly, a magnet yoke assembly and an adjusting assembly. The shell assembly is provided with a containing cavity, and the magnet yoke assembly is located below the shell assembly. The adjusting assemblies are independently controlled, are arranged in the length direction of the magnet yoke assembly and are arranged in the containing cavity. The output end of each adjusting assembly is perpendicular to the magnet yoke assembly to do linear reciprocating motion, penetrates out of the side wall of the containing cavity towards the side where the magnet yoke assembly is located and is hinged to the magnet yoke assembly so as to drive the magnet yoke assembly to partially or completely change the distance between the magnet yoke assembly and the surface of the sputtering target. The multiple adjusting assemblies are arranged, the adjusting assemblies and the magnet yoke assemblies are provided with the multiple connecting point positions, the output ends of the adjusting assemblies act to drive the magnet yoke assemblies at the corresponding point positions to locally change the distance between the magnet yoke assemblies and the surface of the sputtering target (close to or away from the surface of the sputtering target), and then the local magnetic field intensity is adjusted; the real-time online control on the coating thickness of the surface of the sputtering target is realized, so that the coating thickness of a coating product tends to be consistent.

The invention relates to an optical fiber hydrogen sensor based on a silver film-nanowire hole array structure and a preparation method thereof in the field of photochemical sensors. The optical fiber hydrogen sensor comprises a multimode optical fiber, and a sensing area is formed on the multimode optical fiber; the sensing area is formed by stripping a coating layer with a preset length from the multimode optical fiber, thinning the optical fiber in the area, plating a silver film on the surface of the thinned optical fiber, and adsorbing a nanowire hole array structure which is sequentially and vertically arranged on the surface of the silver film in a liquid level self-assembly manner; the nanowire hole array is of a metal-medium-metal (MIM) structure, a gold-palladium nanowire array is arranged at the bottom, an intermediate medium layer is made of aluminum oxide, and a silver film with a hole array in any shape is arranged at the top. When light is transmitted to a sensing area from a fiber core of the multimode optical fiber, the light and a metal silver film can excite a surface plasmon resonance (SPR) effect, meanwhile, an MIM structure formed by a gold-palladium nanowire, an aluminum oxide dielectric layer and a porous silver film serves as an optical coupling antenna through a local surface plasmon resonance (LSPR) effect at the edge of a top hole, and the optical coupling antenna is used for transmitting the light to the sensing area. Light energy is efficiently converged and excited in an extremely bound gap plasmon (Gap Plasmon) in an aluminum oxide dielectric layer, so that far-unconventional electromagnetic field enhancement is generated in a sensing core area, and the sensitivity of the sensor is greatly improved.

The invention relates to the technical field of evaporation process monitoring, and discloses an evaporation process monitoring method and system based on data analysis and a medium. The method comprises the following steps: acquiring data of a sensor in an evaporation cavity, and performing filtering standardization treatment to obtain process parameter data; performing time-frequency analysis and correlation calculation on the process parameter data, and extracting key parameter features; setting a dynamic threshold based on the key parameter characteristics, and calculating a deviation degree to obtain an abnormal index; and adjusting the radio frequency power and the substrate temperature in real time according to the abnormal index, and generating a control scheme. According to the method, the complex incidence relation among the multi-source sensing data can be analyzed in real time, the abnormal mode can be recognized in time, potential problems can be predicted before the abnormal condition is obviously expressed, the technological parameters are automatically adjusted through the intelligent control strategy, and therefore the technical defects that in the prior art, response of a monitoring system is lagged, and the technological parameters cannot be adjusted in real time are overcome; and the stability of the evaporation process and the product quality consistency are improved.

The invention relates to the field of electronic detectors, and discloses an ultrafast and efficient electronic detector based on nano polycrystalline boron nitride, which comprises a nano polycrystalline boron nitride scintillator, a light guide and a photomultiplier, and is characterized in that the nano polycrystalline boron nitride scintillator and the photomultiplier are respectively connected with the front end and the rear end of the light guide, a nano polycrystalline boron nitride material of the nano polycrystalline boron nitride scintillator is prepared by taking a sapphire single crystal wafer as a substrate, using NH3 and BCl3 or NH3 and BF3 as raw material gases and adopting a chemical vapor deposition furnace for epitaxial growth. In the invention, the nano polycrystalline boron nitride scintillator has short electron decay time and high scintillation light yield, and can realize ultrafast and efficient electron radiation detection when being applied to an electron detector. The electron detector can be applied to secondary electron and backscattered electron detection in an electron beam detection system, and a new choice is provided for the electron beam detection technology.

The invention discloses a laser film structure and a preparation method thereof. Wherein the thin film structure comprises a first dielectric layer, a metal layer, a second dielectric layer and a base material layer, and the second dielectric layer is formed by alternately depositing a dielectric material with a low refractive index and a dielectric material with a high refractive index; the structural expression of the second dielectric layer is H (LH) s, H represents a high-refractive-index dielectric material with the optical thickness of lambda / 4, L represents a low-refractive-index dielectric material with the optical thickness of lambda / 4, and s represents the number of cycles of the film system. According to the invention, the camouflage capability is improved, and the excellent laser protection performance is ensured.

The invention relates to the technical field of vacuum coating, in particular to a vacuum coating machine capable of improving coating purity, which comprises a bearing frame and a coating cavity mounted in the bearing frame, and the coating cavity is of an inverted conical structure; a rotary driving rod is mounted in the middle of the upper part of the coating cavity in a penetrating manner, and a non-contact transmission assembly is mounted above a main mounting rod, so that friction caused by contact is avoided; the interior of the lower portion of the bearing frame is connected with the evaporation source carrying table through a rotary lifting control mechanism. According to the vacuum coating machine capable of improving the coating purity, the cleanliness of a coating area can be improved through the non-contact transmission assembly, so that the coating purity and the product performance can be further improved, airflow generated by pressure difference can be reduced through the arrangement of the hollow interlayer groove, and the situation that the purity and the adhesive force of a formed film are affected due to the fact that tiny dust particles are raised is avoided; therefore, the cleanliness of the coating area can be further improved, and the coating purity is further improved.

The invention discloses a gradually-changed Si-Al alloy coating diamond / aluminum-based composite material and a preparation method and application thereof, and the gradually-changed Si-Al alloy coating diamond / aluminum-based composite material is composed of an aluminum matrix and modified diamond evenly dispersed in the aluminum matrix. The modified diamond comprises diamond particles and a gradually-changed Si-Al alloy coating wrapping the surfaces of the diamond particles, in the gradually-changed Si-Al alloy coating, the mass fraction of Si is linearly decreased from 100% to 0% from inside to outside, and the mass fraction of Al is linearly increased from 0% to 100% from 0%. According to the method, the Si-Al alloy coating with gradually-changed and controllable components is constructed on the surface of the diamond, so that a SiC transition layer with strong binding force can be formed with the diamond, the gradient gradient coating is formed from inside to outside, internal stress can be released, good metallurgical bonding with an aluminum matrix can be achieved, formation of an Al4C3 phase is inhibited, and therefore the performance of the composite material is remarkably improved.

The invention relates to a preparation method of a high-purity manganese target material, which belongs to the technical field of metallurgy, and comprises the following steps: firstly, drying manganese powder, then pouring the manganese powder into a graphite mold, and putting the graphite mold into a Joule hot sintering furnace for sintering, during sintering, a strategy of two-stage prepressing and four-stage gradient pressing of prepressing forming, low-pressure degassing, medium-pressure densification and high-pressure sintering is implemented, and low-temperature sintering is realized; through two-stage cooling after sintering, stress and cracking in the cooling process are avoided; by accurately controlling the temperature and time of each stage, the defects that high heating temperature and long heat preservation time are needed are overcome. The production process is integrally simplified, the internal stress is controlled to be effectively and gradually released at different temperatures, the porosity is reduced, and sintering cracking is avoided; by optimizing the sintering atmosphere of each stage, the influence of impurities such as oxygen in the air on the purity of the sintered manganese target material is avoided, and the purpose of preparing the high-purity manganese target material with low energy consumption, high efficiency and high quality is achieved.

According to the plastic surface deep scene vacuum plating manufacturing process, UV primer is sprayed to the back face of a plastic product, and a mirror surface primer layer is formed; the mirror surface primer layer is placed in vacuum electroplating equipment, vacuumizing is conducted till the vacuum degree is 5 * 10 <-3 > Pa or below, 99.99% of high-purity aluminum materials are subjected to vacuum evaporation, and a mirror surface electroplated aluminum layer is obtained; engraving a required pattern on the mirror surface electroplated aluminum layer by adopting laser engraving equipment; spraying UV finish paint on the surface of the carved pattern to form a protective layer; spraying the UV finish paint on the front surface of the plastic product to form a mirror paint layer on the front surface; placing the front mirror surface paint layer in vacuum electroplating equipment, vacuumizing to below 5 * 10 <-3 > Pa, and carrying out vacuum evaporation on 99.99% high-purity indium material or zinc sulfide to obtain a semi-permeable mirror surface electroplated layer; the electroplated layers on the front and back surfaces mutually reflect to form a deep scene (multi-layer scene) effect; the pattern has a three-dimensional and multi-layer visual effect when viewed from the front side, UV gloss oil is sprayed on the surface of the semi-permeable mirror surface electroplated layer, and the formed surface protective layer is excellent in wear resistance; and the attractiveness and durability of the product are obviously enhanced.

The invention relates to the technical field of aluminum-based thin film preparation, and discloses an aluminum-based thin film uniform deposition system based on magnetron sputtering. The system comprises a substrate state detection module, a magnetic field dynamic regulation and control module, a sputtering power regulation module, a deposition process monitoring module and a central control terminal. The substrate state detection module collects and transmits surface flatness data of the substrate in real time, and the central control terminal carries out visual display. The magnetic field dynamic regulation and control module obtains magnetic field intensity correction through a magnetic field gradient algorithm according to the deviation value of the real-time flatness parameter and the standard parameter and sends the magnetic field intensity correction to the sputtering power regulation module. And the sputtering power adjusting module adjusts the sputtering rate of the target material accordingly. The deposition process monitoring module tracks the adjusting process, evaluates the dynamic response performance, generates a stable or fluctuation signal and sends the stable or fluctuation signal to the central control terminal, and the central control terminal triggers sound-light alarm when receiving the fluctuation signal. The system can improve the deposition uniformity and process stability of the aluminum-based thin film.

The invention discloses a Janus structure photo-thermal fabric with adjustable wettability and a preparation method and application thereof, and belongs to the technical field of solar interface water evaporation. According to the wettability-adjustable Janus structure photo-thermal fabric, a hydrophobic carbon fiber fabric serves as a substrate, a hydrophilic layer is arranged on one side of the hydrophobic carbon fiber fabric, a hydrophobic layer is arranged on the other side of the hydrophobic carbon fiber fabric, the hydrophilic layer is a deposited CuS layer, and the hydrophobic layer is a non-deposited CuS layer. And the hydrophilic layer with radial pores is formed by connecting CuS nanosheets grown on the surface of the hydrophobic carbon fiber fabric in a staggered manner. The problems that in the evaporation process of an existing two-dimensional evaporator, due to water energy imbalance, heat loss and evaporator surface salt deposition are caused, and due to the fact that light absorption and water transmission of the evaporator coexist in the same space, inevitable mutual influence is caused can be solved, and the efficient and long-term stability of the evaporator is improved.

The purpose of the present invention is to provide: a vapor deposition mask capable of forming a vapor deposition film that has excellent pattern dimensions and suppressing mutual influence between adjacent pixels; and a method for manufacturing an electronic device using the vapor deposition mask. A vapor deposition mask according to the present invention is disposed between a vapor deposition source and a substrate to be subjected to vapor deposition, in order to deposit, through openings therein, a vapor deposition material from the vapor deposition source onto a surface of the substrate to be subjected to vapor deposition, and is characterized in that: the vapor deposition mask has a first surface that faces the substrate to be subjected to vapor deposition and a second surface that is located opposite to the first surface and that faces the vapor deposition source; a plurality of openings penetrating the vapor deposition mask between the first surface and the second surface are formed; the lateral wall surface of each of the openings is inclined such that the opening width becomes narrower from the second surface side to the first surface side; and the opening width defined on the first surface side is more than 3 µm but less than 15 µm.

The invention discloses a preparation method of a lithium niobate film waveguide frequency doubling device based on ferroelectric domain regulation and control. The method comprises the following steps of: spin-coating photoresist on the surface of a lithium niobate film, transferring a pattern by utilizing a photoetching technology, coating a film, stripping to form an electrode, applying high-voltage electric pulse to the electrode, and controlling the size of an electric field in the lithium niobate film and a reversal domain growth process through the material and the thickness of an insulating layer in the electrode, thereby controlling the reversal depth of a ferroelectric domain. And finally, spin-coating the photoresist again, transferring the pattern by photoetching, and performing dry etching to obtain the frequency doubling waveguide device. The frequency multiplication waveguide device preparation method provided by the invention has the characteristics of simple processing method, high device preparation efficiency and low loss, and meets the actual requirements in the fields of nonlinear optics, integrated optics and the like.

The invention discloses an optical lens coating thickness accurate regulation and control and intelligent processing method and system, and belongs to the technical field of automatic process control, and the method comprises the steps: building a technological process digital twin model based on an optical lens three-dimensional model and a target film system structure, carrying out the virtual coating simulation, and generating an ideal thickness growth curve; reflection spectrum data of a plurality of spectrum reflection probes preset in the coating cavity are collected for synchronous inversion calculation, a real-time thickness distribution diagram is generated, and the real-time thickness distribution diagram is compared with an ideal thickness growth curve to generate a film thickness deviation feature vector; and a technological process digital twinborn model is input to carry out compensation strategy deduction to generate a dynamic technological compensation instruction, and a control signal is sent to a coating equipment execution mechanism to regulate and control coating physical parameters. According to the method, the technological process digital twinborn model is combined with closed-loop control of multi-point real-time monitoring, and dynamic compensation and coordinated regulation and control of space distribution and time rate of film thickness growth can be realized, so that the precision and uniformity of film thickness control are improved.

The invention discloses a thermal / environmental barrier coating with high thermal insulation, thermal shock resistance and CMAS corrosion resistance as well as a preparation method and application of the thermal / environmental barrier coating. The SiCf / SiC composite material is prepared on the surface of a SiCf / SiC substrate by adopting a plasma spraying-physical vapor deposition technology, and comprises a Si-HfO2 bonding layer, a double-middle layer of Yb2Si2O7 and Yb2SiO5 and a (Dy0.2 Ho0.2 Er0.2 Tm0.2 Lu0.2) 2Hf2O7 top layer from bottom to top, the molar ratio of Si to HfO2 is 15: 85, and the double-middle layer is composed of Yb2Si2O7 and Yb2SiO5. The Si-HfO2 bonding layer provided by the invention has excellent high-temperature performance while providing good bonding force; the Yb2Si2O7 intermediate layer relieves the problem of thermal expansion mismatch between the upper coating and the lower substrate, and further expansion of cracks is hindered through plastic deformation; the Yb2SiO5 middle layer is excellent in water and oxygen corrosion resistance; the (Dy0. 2Ho0. 2Er0. 2Tm0. 2Lu0. 2) 2Hf2O7 top layer provides excellent CMAS corrosion resistance and is excellent in heat insulation performance, and the service temperature can be further increased. The coating has relatively high density and uniformity, presents good mechanical combination with a matrix, can bear thermal shock performance at 1500 DEG C and resist CMAS corrosion, and can be used as a protective coating of a hot end part of an aero-engine.