140results about "Radiation applications" patented technology

The present application relates to a patterning material, a patterning composition, and a pattern forming method. The patterning material of the present application includes a metal-oxygen cluster framework, a radiation-sensitive organic ligand, and a second ligand. The radiation-sensitive organic ligand is coordinated to a metal M through a coordination atom. The coordination atom is at least one of an oxygen atom, a sulfur atom, a selenium atom, a nitrogen atom, and a phosphorus atom. The radiation-sensitive organic ligand is a monodentate ligand or a polydentate ligand having two or more dentates. The second ligand is an inorganic ion or a coordination group.

The present invention relates to PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING A PHOTORESIST COMPOSITION. Disclosed is a photoresist composition including an organometallic compound including a ring including a metal, a first heteroatom coordinated to the metal, and a second heteroatom covalently bonded to the metal, and an aromatic ring substituted or fused to the ring; and a solvent.

To provide a resist underlayer that does not cause resist pattern collapse even in a fine patterning process and has improved sensitivity to an exposure light source, thereby improving patterning performance and energy efficiency.SOLUTION: The present invention provides a composition for a resist underlayer film comprising a polymer containing a specific structural unit and a solvent, and a pattern forming method using the composition for a resist underlayer film.SELECTED DRAWING: Figure 1

Disclosed is a calibrator device designed to measure the activity of a radio element, including: an ionization chamber, intended to receive the radio element; and electronic / computer system for controlling the operation of the calibrator device. The electronic / computer system includes voice control, which include: at least one microphone capable of capturing a voice instruction emitted by the operator; a recognition module designed to convert the voice instruction into a request that can be executed by the electronic / computer system; and a control module designed to control the execution of the request by the electronic / computer system.

To provide a positive-type photosensitive resin composition which has high i-ray permeability and can provide a resist film having excellent developability and heat resistance.SOLUTION: A positive-type photosensitive resin composition comprises the following components, (A) to (C): (A) a novolac-type phenol resin, comprising a phenolic structural unit (a1) derived from m-cresol and / or o-cresol and an aldehyde structural unit (a2) derived from salicylaldehyde (however, not containing an aldehyde structural unit derived from formaldehyde) and having an acetal group-based protective group; (B) a photo-acid generator; and (C) a solvent.SELECTED DRAWING: None

To provide a resist composition and a pattern forming method using the resist composition.SOLUTION: There are provided: a resist composition containing a first organometallic compound of a specific structure and a second organometallic compound of a specific structure different from the first organometallic compound; and a pattern production method using the resist composition.SELECTED DRAWING: Figure 1

The present invention concerns an apparatus for irradiating goods with a radiation (11x) selected from X-rays or electron beam, comprising • a source (11) of radiation (11x) configured for emitting the radiation (11x) along an irradiation volume (Xv) centred on an irradiation axis (X), • a conveyor (3) configured for driving the goods loaded in two or more transport units (1.i) of unit height (h1i) measured along a vertical axis (Z) through the irradiation volume such as to expose a first portion of the goods to the radiation, wherein, the transport units (1.i) are loaded in totes (5) of tote height, and wherein the conveyor (3) is configured for driving the totes (5) carrying N transport units (1.i) loaded with the goods, such that a tote (5) holds N transport units, with N∈N and N ≥ 1, arranged on top of one another extending over a total height (ht) and wherein, each transport unit (1.i) is held in place in a tote (5) by one or more support elements (5s), such that ∘ The total height (ht) is comprised between 40% and 100% of the tote height (h5) (i.e., 40% h5 ≤ ht ≤ h5), ∘ The N transport units (1.1-1.N) loaded in a tote span over at least 70%, preferably at least 80% of the total height (ht) (i.e., ∑i=1Nh1.i≥70%ht), ∘ The total height (ht) is centred relative to the tote height (h5) within ±20% (i.e., (Ht1 - ½ ht) = ½ h5 ± 20%)..

Provided are a resist composition and a pattern formation method using the same. The resist composition may include an organometallic compound represented by one of Formulae 1-1 to 1-4, and an additive represented by Formula 2:wherein M11, L11 to L14, a11 to a14, R11 to R14, b11 to b14, Y11 to Y13, X11 to X13, Y21, Y22, L21, and a21 in Formulae 1-1 to 1-4 and 2 are described in the specification.

Provided are a resist composition and a pattern forming method using the same. The resist composition includes a first organometallic compound represented by one of Formulae 1-1 to 1-4 and a second organometallic compound represented by Formula 2: wherein M11, M21, L11 to L14, L21 to L24, a11 to a14, a21 to a24, R11 to R14, R21 to R24, b11 to b14, b21 to b24, Y11 to Y13, and X11 to X13 in Formulae 1-1 to 1-4 and 2 are as described in the specification. # imgabs 0 # formula 2 # imgabs 1 #

To provide a composition for forming a resist underlayer film capable of forming a desired resist pattern, a resist pattern production method using the resist underlayer film forming composition and a method for manufacturing a semiconductor device.SOLUTION: There is provided a resist underlayer film forming composition which comprises a polymer represented by the following formula (P1): (in the formula (P1), A1, A2, A3, A4, A5 and A6 each independently represent a hydrogen atom, a methyl group or an ethyl group, Q1 represents a divalent organic group, T2 and T3 each independently represent a single bond, an ester bond or an ether bond, L2 and L3 each independently represent a single bond, an alkylene group having a carbon number of 1 to 10 which may be substituted or an alkenylene group having a carbon number of 2 to 10 which may be substituted, U represents a nitro group, D represents an aromatic ring or a heterocyclic ring having a carbon number of 6 to 40, n represents an integer of 0 to 3.) and a solvent.SELECTED DRAWING: None

To provide simple method of manufacturing a material activation member capable of reducing friction resistance.SOLUTION: A method of manufacturing a material activation member for reducing friction resistance is provided, the method comprising: a material activation material forming step of forming a fluidic material activation material by mixing and agitating powder of a natural mineral containing a radioactive substance, powder of an electron-generating material that generates electrons when subjected to alpha rays emitted from the natural mineral, and a fluid binder; and a material activation member filling step of filling a cylindrical magnet having an N-pole at one end and an S-pole on the other end with the material activation material. The powder of the electron-generating material comprises titanium dioxide powder, magnesium metal powder, silicon metal powder, black silica powder, lanthanum hexaboride powder, and copper powder.SELECTED DRAWING: None

To provide an electron-generating material and electron-generating member, which can reduce a friction coefficient.SOLUTION: An electron-generating material capable of reducing a friction coefficient is provided, the material comprising powder of a natural mineral containing a radioactive substance and powder of an electron-generating material that generates electrons when subjected to alpha rays emitted from the natural mineral, where the powder of the electron-generating material comprises titanium dioxide powder, lanthanum hexaboride, and silicon metal.SELECTED DRAWING: None

To provide a composition for the production of a resist underlayer that does not cause resist pattern collapse even in a fine patterning process and has improved sensitivity to an exposure light source, thereby improving patterning performance and energy efficiency.SOLUTION: A composition for a resist underlayer film comprises: a polymer containing a structural unit represented by the following chemical formula, a specific structural unit, or a combination thereof; a radical initiator having a bond dissociation energy of 0 to 60 kcal / mol; and a solvent.SELECTED DRAWING: Figure 1

According to various aspects of the present disclosure, the present disclosure relates to an automated process for the radiosynthesis of [18F]FSPG, a positron emission tracer. The automated optimization process of the present invention enables the centralized and large-scale production of [18F]FSPG for commercial use.

To provide an electron-generating member capable of reducing a friction coefficient.SOLUTION: An electron-generating member capable of reducing a friction coefficient is provided, the member comprising: an electron-generating portion made of an electron-generating material comprising powder of a natural mineral containing a radioactive substance and powder of an electron-generating substance that generates electrons when subjected to alpha rays emitted from the natural mineral; and a magnet laminated on the electron-generating portion.SELECTED DRAWING: Figure 1

The present invention relates to a photosensitive resin composition, a cured product thereof, a method for forming a pattern, and a method for producing a photosensitive resin composition. Specifically, the present invention relates to a photosensitive resin composition containing a polysilsesquioxane binder and exhibiting excellent storage stability, surface coating properties, and resolution, a cured product thereof, a method for forming a pattern, and a method for producing a photosensitive resin composition.

The present invention relates to a resist composition in which an acid is generated by exposure and solubility in a developer is changed by the action of the acid. The resist composition comprises: a base material component (A) of which the solubility in a developer changes due to the action of an acid; and an acid generator component (B) that generates an acid by exposure. The acid generator component (B) includes a compound (B1) represented by formula (b1), a compound (B2) represented by formula (b2), and a compound (B3) represented by formula (b3) in the description.

A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the composition for forming a resist underlayer film. (In formula (1), A1, A2, A3, A4, A5, and A6 each independently represent a hydrogen atom, methyl group, or ethyl group; Q1 represents a divalent organic group; R1 represents a tetravalent organic group; and R2 represents an alkenyl group or alkynyl group having 2-10 carbon atoms.) The film-forming composition contains a solvent and a polymer that has a unit structure given by formula (1).

The present invention relates to a colored photosensitive resin composition, a color filter comprising the same, and an image display device, the colored photosensitive resin composition comprising a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent, the colorant comprising a compound represented by Chemical Formula 1, the alkali-soluble resin is formed by polymerizing a compound represented by a chemical formula 3 and a compound represented by a chemical formula 4. The present invention has the effects of being able to achieve high color reproducibility even at a relatively low weight concentration (PWC) of a colorant and being able to be used as a thin display, being able to be cured at a low temperature and having excellent reliability, and exhibiting excellent sensitivity such that developability and adhesion are improved, and being able to be used as a thin display. The development stain generation is inhibited, and the solvent resistance is further improved.

To provide a composition for forming a resist underlayer film capable of forming a desired resist pattern, a method for producing a resist pattern using the resist underlayer film-forming composition, and a method for producing a semiconductor device.SOLUTION: There is provided a resist underlayer film-forming composition comprising a polymer and a solvent, the composition including, at a terminal of the polymer, a structure represented by formula (103): (in formula (103), Ar represents a C6-40 aromatic ring group which may be substituted, L1 represents a single bond, an ester bond, an ether bond, a C1-10 alkylene group, or a C2-10 alkenylene group, and n represents an integer of 1-3).SELECTED DRAWING: None

The present invention relates to a composition for forming a metal oxide film, a pattern forming method, and a metal oxide film forming method. The present invention provides a composition for forming a metal oxide film having excellent coating properties and taking into account high-level filling / flattening characteristics, a pattern forming method using the same, and a metal oxide film forming method. A composition for forming a metal oxide film, comprising (A) an organic-inorganic composite material and (B) a solvent, characterized in that: the aforementioned (A) organic-inorganic composite material is a reaction product of a metal source (I) and an organic source (II), the aforementioned metal source (I) contains a metal compound represented by the following general formula (I-1), a hydrolyzate of a metal compound represented by the general formula (I-1), and one or more compounds of a hydrolysis-condensation product of a metal compound represented by the general formula (I-1), and the aforementioned organic source (II) contains a constituent unit represented by the following general formula (II-1) and a compound of a cardo structure.

Provided is a photosensitive resin composition having excellent patterning property and providing excellent pressure resistance (elastic modulus) of a cured product. This photosensitive resin composition contains (A) a polyimide, (B) a cationic polymerizable compound, (C) a photocationic polymerization initiator, and (D) crystalline silica and has negative photosensitivity.

To provide a radiolysis apparatus and radiolysis method that can efficiently decompose irradiated materials while keeping the equipment size as small as possible. [Solution] The radiolysis apparatus 100 according to the present invention is characterized by comprising: a radiation source 101 that irradiates with radiation emitted from a sealed radioactive material; a reaction vessel 103 that encloses the material to be irradiated 104; and a heat transfer vessel 102 that covers the radiation source 101 and transfers the heat generated by the decay of the radioactive material to the reaction vessel 103. The radiation source 101 is preferably a radiation source formed from spent nuclear fuel or a vitrified body containing fission products extracted from spent nuclear fuel, a radiation source containing fission products extracted from spent nuclear fuel, a radiation source containing Co-60, a radiation source containing Cs-137, or high-level radioactive waste liquid.

Provided is a radiation decomposition device and a radiation decomposition method that allow efficient decomposition of an irradiated substance while reducing the size of equipment as much as possible. A radiation decomposition device (100) according to the present invention is characterized by including: a radiation source (101) that emits radiation released from a sealed radioactive substance; a reaction tank (103) that contains a to-be-irradiated substance (104); and a heat transfer tank (102) that covers the radiation source (101) and transfers, to the reaction tank (103), heat generated by the decay of the radioactive substance. It is preferable that the radiation source (101) is: a radiation source formed of spent nuclear fuel or vitrified waste containing fission products extracted from spent nuclear fuel; a radiation source containing fission products extracted from spent nuclear fuel; a radiation source containing Co-60; a radiation source containing Cs-137; or a high-level radioactive waste liquid.

To provide a colored photosensitive resin composition which can achieve a fine colored pattern excellent in pattern adhesion and residue characteristics in light exposure using an ultrashort-wavelength exposing device of 300 nm or less and has high resolution.SOLUTION: A colored photosensitive resin composition is provided, including a coloring agent, alkali-soluble resin, a photopolymerization initiator, a photopolymerizable compound, and a solvent, wherein the photopolymerization initiator includes a compound represented by a specific chemical formula.SELECTED DRAWING: None

The present invention relates to: a colored photosensitive resin composition; and a color filter and an image display device, comprising same, the colored photosensitive resin composition comprising a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent, wherein the colorant includes a compound represented by chemical formula 1, and the alkali-soluble resin is polymerized by including a compound represented by chemical formula 3 and a compound represented by chemical formula 4. High color reproduction is achieved even at a relatively low pigment weight concentration (PWC), and thus a thin display can be provided. At the same time, low-temperature curing is achieved to give excellent reliability, excellent sensitivity is exhibited so that development and adhesion properties are improved, the occurrence of development stains is suppressed, and solvent resistance is further improved.

Provided are a pattern formation method and a method for producing an electronic device, with which long-period undulation of a formed pattern is suppressed. The pattern formation method includes: a step 1 for producing a laminate having a substrate, a resist layer, an intermediate layer and a conductive layer in that order; a step 2 for irradiating the laminate with an electron beam in the shape of a pattern; and a step 3 for forming a pattern by performing a development process on the laminate irradiated with the electron beam, wherein the thickness of the resist layer is 150 nm or less.

To provide a composition for forming a resist underlayer film capable of forming a desired resist pattern, a resist pattern production method using the resist underlayer film forming composition and a method for manufacturing a semiconductor device.SOLUTION: There is provided a resist underlayer film forming composition which comprises a polymer represented by the following formula (P1): (in the formula (P1), A1, A2, A3, A4, A5 and A6 each independently represent a hydrogen atom, a methyl group or an ethyl group, Q1 represents a divalent organic group, T2 and T3 each independently represent a single bond, an ester bond or an ether bond, L2 and L3 each independently represent a single bond, an alkylene group having a carbon number of 1 to 10 which may be substituted or an alkenylene group having a carbon number of 2 to 10 which may be substituted, U represents a nitro group, D represents an aromatic ring or a heterocyclic ring having a carbon number of 6 to 40, n represents an integer of 0 to 3.) and a solvent.SELECTED DRAWING: None

The present application relates to a kind of patterning material, patterning composition and pattern forming method.The patterning material of the present application has metal oxygen cluster skeleton, radiation-sensitive organic ligand and second ligand, the radiation-sensitive organic ligand is coordinated with metal M via coordination atom, the coordination atom is at least one selected from oxygen atom, sulfur atom, selenium atom, nitrogen atom, phosphorus atom, and the radiation-sensitive organic ligand is monodentate ligand or is two or more ligands;The second ligand is inorganic ion or coordination group.

To provide a positive photosensitive resin composition that features alkali solubility and photosensitizer affinity, characteristics not found in traditional positive photosensitive resin compositions, while also exhibiting low-temperature curability and low volumetric contraction when in a resist film form.SOLUTION: A positive photosensitive resin composition includes the following components (A)-(D). (A) A novolac phenolic resin including an m-cresol-derived structural unit (a1), a benzaldehyde-derived structural unit (a2), and a salicylaldehyde-derived structural unit (a3), with the molar ratio [(a1):(a2):(a3)] being 1.0:0.3-0.8:0.3-0.8. (B) A photosensitizer. (C) A heat crosslinker. (D) An organic solvent.SELECTED DRAWING: None