70results about "Radiation applications" patented technology

Disclosed is a calibrator device designed to measure the activity of a radio element, including: an ionization chamber, intended to receive the radio element; and electronic / computer system for controlling the operation of the calibrator device. The electronic / computer system includes voice control, which include: at least one microphone capable of capturing a voice instruction emitted by the operator; a recognition module designed to convert the voice instruction into a request that can be executed by the electronic / computer system; and a control module designed to control the execution of the request by the electronic / computer system.

To provide an electron-generating material and electron-generating member, which can reduce a friction coefficient.SOLUTION: An electron-generating material capable of reducing a friction coefficient is provided, the material comprising powder of a natural mineral containing a radioactive substance and powder of an electron-generating material that generates electrons when subjected to alpha rays emitted from the natural mineral, where the powder of the electron-generating material comprises titanium dioxide powder, lanthanum hexaboride, and silicon metal.SELECTED DRAWING: None

According to various aspects of the present disclosure, the present disclosure relates to an automated process for the radiosynthesis of [18F]FSPG, a positron emission tracer. The automated optimization process of the present invention enables the centralized and large-scale production of [18F]FSPG for commercial use.

To provide an electron-generating member capable of reducing a friction coefficient.SOLUTION: An electron-generating member capable of reducing a friction coefficient is provided, the member comprising: an electron-generating portion made of an electron-generating material comprising powder of a natural mineral containing a radioactive substance and powder of an electron-generating substance that generates electrons when subjected to alpha rays emitted from the natural mineral; and a magnet laminated on the electron-generating portion.SELECTED DRAWING: Figure 1

The present invention relates to a photosensitive resin composition, a cured product thereof, a method for forming a pattern, and a method for producing a photosensitive resin composition. Specifically, the present invention relates to a photosensitive resin composition containing a polysilsesquioxane binder and exhibiting excellent storage stability, surface coating properties, and resolution, a cured product thereof, a method for forming a pattern, and a method for producing a photosensitive resin composition.

A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the composition for forming a resist underlayer film. (In formula (1), A1, A2, A3, A4, A5, and A6 each independently represent a hydrogen atom, methyl group, or ethyl group; Q1 represents a divalent organic group; R1 represents a tetravalent organic group; and R2 represents an alkenyl group or alkynyl group having 2-10 carbon atoms.) The film-forming composition contains a solvent and a polymer that has a unit structure given by formula (1).

The present invention relates to a colored photosensitive resin composition, a color filter comprising the same, and an image display device, the colored photosensitive resin composition comprising a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent, the colorant comprising a compound represented by Chemical Formula 1, the alkali-soluble resin is formed by polymerizing a compound represented by a chemical formula 3 and a compound represented by a chemical formula 4. The present invention has the effects of being able to achieve high color reproducibility even at a relatively low weight concentration (PWC) of a colorant and being able to be used as a thin display, being able to be cured at a low temperature and having excellent reliability, and exhibiting excellent sensitivity such that developability and adhesion are improved, and being able to be used as a thin display. The development stain generation is inhibited, and the solvent resistance is further improved.

To provide a composition for forming a resist underlayer film capable of forming a desired resist pattern, a method for producing a resist pattern using the resist underlayer film-forming composition, and a method for producing a semiconductor device.SOLUTION: There is provided a resist underlayer film-forming composition comprising a polymer and a solvent, the composition including, at a terminal of the polymer, a structure represented by formula (103): (in formula (103), Ar represents a C6-40 aromatic ring group which may be substituted, L1 represents a single bond, an ester bond, an ether bond, a C1-10 alkylene group, or a C2-10 alkenylene group, and n represents an integer of 1-3).SELECTED DRAWING: None

The present invention relates to a composition for forming a metal oxide film, a pattern forming method, and a metal oxide film forming method. The present invention provides a composition for forming a metal oxide film having excellent coating properties and taking into account high-level filling / flattening characteristics, a pattern forming method using the same, and a metal oxide film forming method. A composition for forming a metal oxide film, comprising (A) an organic-inorganic composite material and (B) a solvent, characterized in that: the aforementioned (A) organic-inorganic composite material is a reaction product of a metal source (I) and an organic source (II), the aforementioned metal source (I) contains a metal compound represented by the following general formula (I-1), a hydrolyzate of a metal compound represented by the general formula (I-1), and one or more compounds of a hydrolysis-condensation product of a metal compound represented by the general formula (I-1), and the aforementioned organic source (II) contains a constituent unit represented by the following general formula (II-1) and a compound of a cardo structure.

Provided is a photosensitive resin composition having excellent patterning property and providing excellent pressure resistance (elastic modulus) of a cured product. This photosensitive resin composition contains (A) a polyimide, (B) a cationic polymerizable compound, (C) a photocationic polymerization initiator, and (D) crystalline silica and has negative photosensitivity.

To provide a radiolysis apparatus and radiolysis method that can efficiently decompose irradiated materials while keeping the equipment size as small as possible. [Solution] The radiolysis apparatus 100 according to the present invention is characterized by comprising: a radiation source 101 that irradiates with radiation emitted from a sealed radioactive material; a reaction vessel 103 that encloses the material to be irradiated 104; and a heat transfer vessel 102 that covers the radiation source 101 and transfers the heat generated by the decay of the radioactive material to the reaction vessel 103. The radiation source 101 is preferably a radiation source formed from spent nuclear fuel or a vitrified body containing fission products extracted from spent nuclear fuel, a radiation source containing fission products extracted from spent nuclear fuel, a radiation source containing Co-60, a radiation source containing Cs-137, or high-level radioactive waste liquid.

Provided is a radiation decomposition device and a radiation decomposition method that allow efficient decomposition of an irradiated substance while reducing the size of equipment as much as possible. A radiation decomposition device (100) according to the present invention is characterized by including: a radiation source (101) that emits radiation released from a sealed radioactive substance; a reaction tank (103) that contains a to-be-irradiated substance (104); and a heat transfer tank (102) that covers the radiation source (101) and transfers, to the reaction tank (103), heat generated by the decay of the radioactive substance. It is preferable that the radiation source (101) is: a radiation source formed of spent nuclear fuel or vitrified waste containing fission products extracted from spent nuclear fuel; a radiation source containing fission products extracted from spent nuclear fuel; a radiation source containing Co-60; a radiation source containing Cs-137; or a high-level radioactive waste liquid.

To provide a colored photosensitive resin composition which can achieve a fine colored pattern excellent in pattern adhesion and residue characteristics in light exposure using an ultrashort-wavelength exposing device of 300 nm or less and has high resolution.SOLUTION: A colored photosensitive resin composition is provided, including a coloring agent, alkali-soluble resin, a photopolymerization initiator, a photopolymerizable compound, and a solvent, wherein the photopolymerization initiator includes a compound represented by a specific chemical formula.SELECTED DRAWING: None

Provided are a pattern formation method and a method for producing an electronic device, with which long-period undulation of a formed pattern is suppressed. The pattern formation method includes: a step 1 for producing a laminate having a substrate, a resist layer, an intermediate layer and a conductive layer in that order; a step 2 for irradiating the laminate with an electron beam in the shape of a pattern; and a step 3 for forming a pattern by performing a development process on the laminate irradiated with the electron beam, wherein the thickness of the resist layer is 150 nm or less.

The present application relates to a kind of patterning material, patterning composition and pattern forming method.The patterning material of the present application has metal oxygen cluster skeleton, radiation-sensitive organic ligand and second ligand, the radiation-sensitive organic ligand is coordinated with metal M via coordination atom, the coordination atom is at least one selected from oxygen atom, sulfur atom, selenium atom, nitrogen atom, phosphorus atom, and the radiation-sensitive organic ligand is monodentate ligand or is two or more ligands;The second ligand is inorganic ion or coordination group.

To provide a positive photosensitive resin composition that features alkali solubility and photosensitizer affinity, characteristics not found in traditional positive photosensitive resin compositions, while also exhibiting low-temperature curability and low volumetric contraction when in a resist film form.SOLUTION: A positive photosensitive resin composition includes the following components (A)-(D). (A) A novolac phenolic resin including an m-cresol-derived structural unit (a1), a benzaldehyde-derived structural unit (a2), and a salicylaldehyde-derived structural unit (a3), with the molar ratio [(a1):(a2):(a3)] being 1.0:0.3-0.8:0.3-0.8. (B) A photosensitizer. (C) A heat crosslinker. (D) An organic solvent.SELECTED DRAWING: None

Disclosed herein is an anion exchanger, a method for manufacturing an anion exchanger, anion exchange devices, and a system comprising the anion exchanger, wherein the anion exchanger comprises a polyDADMAC polymer, and wherein the anion exchanger is suitable for purifying and concentrating [18F]fluoride.

Provided are a photosensitive resin composition including an alkali soluble resin; a photopolymerizable compound; a photoinitiator; and a solvent, wherein the alkali soluble resin includes a polymer including a structural unit represented by Chemical Formula 1 and a polymer including a structural unit represented by Chemical Formula 2, and the polymer including a structural unit represented by Chemical Formula 1 and the polymer including a structural unit represented by Chemical Formula 2 are included in a weight ratio of about 1:1 to about 1:2, a photosensitive resin layer manufactured using the same, and a semiconductor device including the photosensitive resin layer. In Chemical Formula 1 and Chemical Formula 2, each substituent is the same as defined in the detailed description.

The purpose of the present invention is to provide: a method for manufacturing a semiconductor substrate using a composition from which a film having excellent etching resistance, heat resistance, and bending resistance can be formed; a composition; a polymer; and a method for producing a polymer. This method for manufacturing a semiconductor substrate comprises: a step for applying a resist underlayer film-forming composition directly or indirectly to a substrate; a step for forming resist patterns directly or indirectly on the resist underlayer film formed in the application step; and a step for performing etching using the resist patterns as masks, wherein the resist underlayer film-forming composition contains a solvent and a polymer having a repeating unit represented by formula (1). (In formula (1), Ar1 is a divalent group having an aromatic ring with 5-40 membered rings. R0 is a group represented by formula (1-1) or (1-2).) (In formula (1-1) or (1-2), X1 and X2 are each independently a group represented by formula (i), (ii), (iii), or (iv). * is a dangling bond to the carbon atom in formula (1). Ar2, Ar3, and Ar4 are each independently a substituted or unsubstituted aromatic ring with 6-20 membered rings, which forms a condensed ring structure together with adjacent two carbon atoms in formulae (1-1) and (1-2).) (In formula (i), R1 and R2 are each independently a hydrogen atom or a C1-C20 monovalent organic group.　In formula (ii), R3 is a hydrogen atom or a C1-C20 monovalent organic group. R4 is a C1-C20 monovalent organic group.　In formula (iii), R5 is a C1-C20 monovalent organic group.　In formula (iv), R6 is a hydrogen atom or a C1-C20 monovalent organic group.)

To provide an electron generator which can efficiently emit electrons to achieve a greater activation effect, and to provide a method for manufacturing the same.SOLUTION: An electron generator designed to be installed on an elongate electron supply target is provided, the electron generator comprising a cover and a cylindrically formed electron generating member provided inside the cover, and being configured to allow the electron supply target to be inserted into the cylindrical electron generating member.SELECTED DRAWING: Figure 1

A novel composition for forming a resist underlayer film contains: a polymer (X) which includes structural units the same as or different from each other and having a hydroxymethyl group and a ROCH2— group (R being a monovalent organic group, or a mixture of these), and a linking group linking the aforementioned structural units; and a solvent.

Provided is a composition for forming a silicon-containing resist underlayer film, the composition containing: a component [A] of a polysiloxane; a component [B] of at least one selected from a sulfonic acid compound and an acid having a pKa of -15.0 to 1.2; and a component [C] of a solvent.

To provide a chemically amplified positive resist composition that exhibits a very high isolated-space resolution and forms a pattern with reduced LER, superior rectangularity, minimized influences of development loading and residue defects, and to provide a resist pattern forming process using the chemically amplified positive resist composition.SOLUTION: A chemically amplified positive resist composition for electron beam lithography comprises (A) a base polymer, (B) a photoacid generator, and (C) a quencher. The base polymer (A) contains a polymer comprising predetermined phenolic hydroxy group-containing units, predetermined aromatic ring-containing units, and predetermined phenolic hydroxy group-containing units. The repeating units of the polymer contained in the base polymer are all repeating units with an aromatic ring skeleton. The content ratio of the (B) acid generator to the (C) quencher ((B) / (C)) is less than 3 in mass ratio.SELECTED DRAWING: None

To provide a method of manufacturing an electron-generating material capable of reducing the friction coefficient, and a method of manufacturing an electron-generating member.SOLUTION: A method of manufacturing an electron-generating material capable of reducing the friction coefficient is provided, the method involving forming a fluidic electron-generating material by mixing and agitating powder of a natural mineral containing a radioactive substance, powder of an electron-generating substance that generates electrons when subjected to alpha rays emitted from the natural mineral, and a dry fluid binder. The powder of the electron-generating substance comprises titanium dioxide powder and at least one type of powder selected from powder of lanthanum hexaboride, silicon metal, and molybdenum disulfide.SELECTED DRAWING: None

To provide an electron-generating member capable of reducing a friction coefficient.SOLUTION: An electron-generating member capable of reducing a friction coefficient is provided, the member comprising: an electron-generating portion made of an electron-generating material comprising powder of a natural mineral containing a radioactive substance and powder of an electron-generating substance that generates electrons when subjected to alpha rays emitted from the natural mineral; and a magnet laminated on the electron-generating portion.SELECTED DRAWING: Figure 1

To provide a composition for forming a resist underlayer film capable of forming a desired resist pattern, a method for producing a resist pattern using the resist underlayer film-forming composition, and a method for producing a semiconductor device.SOLUTION: There is provided a resist underlayer film-forming composition comprising a polymer and a solvent, the composition including, at a terminal of the polymer, a structure represented by formula (103): (in formula (103), Ar represents a C6-40 aromatic ring group which may be substituted, L1 represents a single bond, an ester bond, an ether bond, a C1-10 alkylene group, or a C2-10 alkenylene group, and n represents an integer of 1-3).SELECTED DRAWING: None

To provide a system for production of radioisotopes by bremsstrahlung comprising a curved converter.SOLUTION: There is provided a system for converting an electron beam into photons, comprising: an electron accelerator 1 configured to generate an electron beam 10 of accelerated electrons along an irradiation axis Z; a scanning unit 2; a focusing unit 3 for forming a focused beam 10f converging towards a first focusing point; a conversion unit 4 arranged between the focusing unit 3 and the first focusing point and comprising bremsstrahlung converters 4.1 to 4.n configured to convert the focused beam into a photon beam 11x; and a target holder 5h configured for holding a target 5, wherein the bremsstrahlung converters are curved such that the focused beam intersects each of the bremsstrahlung converters with an intersecting angle α comprised between 65° and 115° at all points, preferably between 75° and 105° at all points.SELECTED DRAWING: Figure 1a-1c

To provide: a composition for forming an adhesion film which provides an adhesion film which can obtain a good pattern shape, has high adhesiveness with a resist upper layer film and prevents the collapse of a fine pattern in a fine patterning process in a semiconductor device manufacturing process; a pattern forming method using the composition; and a method for forming an adhesion film.SOLUTION: There is provided a composition for forming an adhesion film to form an adhesion film directly under a resist upper layer film, which comprises (A) a polymer compound containing a repeating unit represented by the following general formula (1) and a repeating unit represented by the following general formula (2) and (B) an organic solvent.SELECTED DRAWING: Figure 1

Provided are a material for activating a substance and a member for activating a substance capable of exhibiting a greater substance activation effect. A material for activating a substance including a powder of a natural mineral containing a radioactive substance, and a powder of an electron-generating substance that generates electrons by using alpha rays emitted from the natural mineral.

To provide a chemically amplified resist composition that offers high sensitivity and high contrast, improved line width roughness (LWR) and critical dimension uniformity (CDU) of holes, and excellent etch resistance after patterning, as well as to provide a patterning method using the same.SOLUTION: A chemically amplified resist composition comprises (A) a polymer, which exhibits increased solubility in alkaline solutions due to the action of acid, comprising a repeating unit represented by formula (A1) and a specific repeating unit having phenol, excluding a repeating unit that generates acid due to exposure to light; and a specific photoacid generator that generates sulfonic acid due to the action of KrF and ArF excimer lasers, electron beams, or extreme ultraviolet radiation.SELECTED DRAWING: None