48results about "Radiation applications" patented technology

According to various aspects of the present disclosure, the present disclosure relates to an automated process for the radiosynthesis of [18F]FSPG, a positron emission tracer. The automated optimization process of the present invention enables the centralized and large-scale production of [18F]FSPG for commercial use.

The present invention relates to a photosensitive resin composition, a cured product thereof, a method for forming a pattern, and a method for producing a photosensitive resin composition. Specifically, the present invention relates to a photosensitive resin composition containing a polysilsesquioxane binder and exhibiting excellent storage stability, surface coating properties, and resolution, a cured product thereof, a method for forming a pattern, and a method for producing a photosensitive resin composition.

A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the composition for forming a resist underlayer film. (In formula (1), A1, A2, A3, A4, A5, and A6 each independently represent a hydrogen atom, methyl group, or ethyl group; Q1 represents a divalent organic group; R1 represents a tetravalent organic group; and R2 represents an alkenyl group or alkynyl group having 2-10 carbon atoms.) The film-forming composition contains a solvent and a polymer that has a unit structure given by formula (1).

The present invention relates to a colored photosensitive resin composition, a color filter comprising the same, and an image display device, the colored photosensitive resin composition comprising a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent, the colorant comprising a compound represented by Chemical Formula 1, the alkali-soluble resin is formed by polymerizing a compound represented by a chemical formula 3 and a compound represented by a chemical formula 4. The present invention has the effects of being able to achieve high color reproducibility even at a relatively low weight concentration (PWC) of a colorant and being able to be used as a thin display, being able to be cured at a low temperature and having excellent reliability, and exhibiting excellent sensitivity such that developability and adhesion are improved, and being able to be used as a thin display. The development stain generation is inhibited, and the solvent resistance is further improved.

To provide a composition for forming a resist underlayer film capable of forming a desired resist pattern, a method for producing a resist pattern using the resist underlayer film-forming composition, and a method for producing a semiconductor device.SOLUTION: There is provided a resist underlayer film-forming composition comprising a polymer and a solvent, the composition including, at a terminal of the polymer, a structure represented by formula (103): (in formula (103), Ar represents a C6-40 aromatic ring group which may be substituted, L1 represents a single bond, an ester bond, an ether bond, a C1-10 alkylene group, or a C2-10 alkenylene group, and n represents an integer of 1-3).SELECTED DRAWING: None

To provide a radiolysis apparatus and radiolysis method that can efficiently decompose irradiated materials while keeping the equipment size as small as possible. [Solution] The radiolysis apparatus 100 according to the present invention is characterized by comprising: a radiation source 101 that irradiates with radiation emitted from a sealed radioactive material; a reaction vessel 103 that encloses the material to be irradiated 104; and a heat transfer vessel 102 that covers the radiation source 101 and transfers the heat generated by the decay of the radioactive material to the reaction vessel 103. The radiation source 101 is preferably a radiation source formed from spent nuclear fuel or a vitrified body containing fission products extracted from spent nuclear fuel, a radiation source containing fission products extracted from spent nuclear fuel, a radiation source containing Co-60, a radiation source containing Cs-137, or high-level radioactive waste liquid.

Provided is a radiation decomposition device and a radiation decomposition method that allow efficient decomposition of an irradiated substance while reducing the size of equipment as much as possible. A radiation decomposition device (100) according to the present invention is characterized by including: a radiation source (101) that emits radiation released from a sealed radioactive substance; a reaction tank (103) that contains a to-be-irradiated substance (104); and a heat transfer tank (102) that covers the radiation source (101) and transfers, to the reaction tank (103), heat generated by the decay of the radioactive substance. It is preferable that the radiation source (101) is: a radiation source formed of spent nuclear fuel or vitrified waste containing fission products extracted from spent nuclear fuel; a radiation source containing fission products extracted from spent nuclear fuel; a radiation source containing Co-60; a radiation source containing Cs-137; or a high-level radioactive waste liquid.

To provide a colored photosensitive resin composition which can achieve a fine colored pattern excellent in pattern adhesion and residue characteristics in light exposure using an ultrashort-wavelength exposing device of 300 nm or less and has high resolution.SOLUTION: A colored photosensitive resin composition is provided, including a coloring agent, alkali-soluble resin, a photopolymerization initiator, a photopolymerizable compound, and a solvent, wherein the photopolymerization initiator includes a compound represented by a specific chemical formula.SELECTED DRAWING: None

Provided are a pattern formation method and a method for producing an electronic device, with which long-period undulation of a formed pattern is suppressed. The pattern formation method includes: a step 1 for producing a laminate having a substrate, a resist layer, an intermediate layer and a conductive layer in that order; a step 2 for irradiating the laminate with an electron beam in the shape of a pattern; and a step 3 for forming a pattern by performing a development process on the laminate irradiated with the electron beam, wherein the thickness of the resist layer is 150 nm or less.

To provide a positive photosensitive resin composition that features alkali solubility and photosensitizer affinity, characteristics not found in traditional positive photosensitive resin compositions, while also exhibiting low-temperature curability and low volumetric contraction when in a resist film form.SOLUTION: A positive photosensitive resin composition includes the following components (A)-(D). (A) A novolac phenolic resin including an m-cresol-derived structural unit (a1), a benzaldehyde-derived structural unit (a2), and a salicylaldehyde-derived structural unit (a3), with the molar ratio [(a1):(a2):(a3)] being 1.0:0.3-0.8:0.3-0.8. (B) A photosensitizer. (C) A heat crosslinker. (D) An organic solvent.SELECTED DRAWING: None

Disclosed herein is an anion exchanger, a method for manufacturing an anion exchanger, anion exchange devices, and a system comprising the anion exchanger, wherein the anion exchanger comprises a polyDADMAC polymer, and wherein the anion exchanger is suitable for purifying and concentrating [18F]fluoride.

Provided are a photosensitive resin composition including an alkali soluble resin; a photopolymerizable compound; a photoinitiator; and a solvent, wherein the alkali soluble resin includes a polymer including a structural unit represented by Chemical Formula 1 and a polymer including a structural unit represented by Chemical Formula 2, and the polymer including a structural unit represented by Chemical Formula 1 and the polymer including a structural unit represented by Chemical Formula 2 are included in a weight ratio of about 1:1 to about 1:2, a photosensitive resin layer manufactured using the same, and a semiconductor device including the photosensitive resin layer. In Chemical Formula 1 and Chemical Formula 2, each substituent is the same as defined in the detailed description.

The purpose of the present invention is to provide: a method for manufacturing a semiconductor substrate using a composition from which a film having excellent etching resistance, heat resistance, and bending resistance can be formed; a composition; a polymer; and a method for producing a polymer. This method for manufacturing a semiconductor substrate comprises: a step for applying a resist underlayer film-forming composition directly or indirectly to a substrate; a step for forming resist patterns directly or indirectly on the resist underlayer film formed in the application step; and a step for performing etching using the resist patterns as masks, wherein the resist underlayer film-forming composition contains a solvent and a polymer having a repeating unit represented by formula (1). (In formula (1), Ar1 is a divalent group having an aromatic ring with 5-40 membered rings. R0 is a group represented by formula (1-1) or (1-2).) (In formula (1-1) or (1-2), X1 and X2 are each independently a group represented by formula (i), (ii), (iii), or (iv). * is a dangling bond to the carbon atom in formula (1). Ar2, Ar3, and Ar4 are each independently a substituted or unsubstituted aromatic ring with 6-20 membered rings, which forms a condensed ring structure together with adjacent two carbon atoms in formulae (1-1) and (1-2).) (In formula (i), R1 and R2 are each independently a hydrogen atom or a C1-C20 monovalent organic group.　In formula (ii), R3 is a hydrogen atom or a C1-C20 monovalent organic group. R4 is a C1-C20 monovalent organic group.　In formula (iii), R5 is a C1-C20 monovalent organic group.　In formula (iv), R6 is a hydrogen atom or a C1-C20 monovalent organic group.)

A novel composition for forming a resist underlayer film contains: a polymer (X) which includes structural units the same as or different from each other and having a hydroxymethyl group and a ROCH2— group (R being a monovalent organic group, or a mixture of these), and a linking group linking the aforementioned structural units; and a solvent.

Provided is a composition for forming a silicon-containing resist underlayer film, the composition containing: a component [A] of a polysiloxane; a component [B] of at least one selected from a sulfonic acid compound and an acid having a pKa of -15.0 to 1.2; and a component [C] of a solvent.

To provide a chemically amplified positive resist composition that exhibits a very high isolated-space resolution and forms a pattern with reduced LER, superior rectangularity, minimized influences of development loading and residue defects, and to provide a resist pattern forming process using the chemically amplified positive resist composition.SOLUTION: A chemically amplified positive resist composition for electron beam lithography comprises (A) a base polymer, (B) a photoacid generator, and (C) a quencher. The base polymer (A) contains a polymer comprising predetermined phenolic hydroxy group-containing units, predetermined aromatic ring-containing units, and predetermined phenolic hydroxy group-containing units. The repeating units of the polymer contained in the base polymer are all repeating units with an aromatic ring skeleton. The content ratio of the (B) acid generator to the (C) quencher ((B) / (C)) is less than 3 in mass ratio.SELECTED DRAWING: None

To provide a system for production of radioisotopes by bremsstrahlung comprising a curved converter.SOLUTION: There is provided a system for converting an electron beam into photons, comprising: an electron accelerator 1 configured to generate an electron beam 10 of accelerated electrons along an irradiation axis Z; a scanning unit 2; a focusing unit 3 for forming a focused beam 10f converging towards a first focusing point; a conversion unit 4 arranged between the focusing unit 3 and the first focusing point and comprising bremsstrahlung converters 4.1 to 4.n configured to convert the focused beam into a photon beam 11x; and a target holder 5h configured for holding a target 5, wherein the bremsstrahlung converters are curved such that the focused beam intersects each of the bremsstrahlung converters with an intersecting angle α comprised between 65° and 115° at all points, preferably between 75° and 105° at all points.SELECTED DRAWING: Figure 1a-1c

A reactor block to extract hydrogen from water includes a plurality of reactor plates bonded to one another and a plurality of channels formed on at least one side of each reactor plate. Each channel is coupled to a first opening and a second opening disposed on opposite first and second edges of the reactor plate, and a radioactive coating is applied to each channel. The first opening is configured to receive gasified water and the second opening is configured to eject hydrogen generated by radiolysis of at least a portion of the gasified water as the gasified water is passed through the channel couped to the second opening.

The purpose of the present invention is to provide a multilayer body which comprises a cured resin that has high liquid repellency after a UV ozone treatment, and which exhibits high durability if used in a display device.　In order to achieve the above-described purpose, a multilayer body according to the present invention is obtained by sequentially stacking a substrate, a patterned first electrode on the substrate and a cured resin, while having an opening in at least a part of the cured resin that is positioned on the first electrode; and this multilayer body is characterized in that the analysis of the cured resin by means of X-ray photoelectron spectroscopy (XPS) satisfies specific characteristics.

To provide a hardmask composition that can be effectively applied to a hardmask layer.SOLUTION: The present invention provides: a hard mask composition that comprises a polymer with a structural unit represented by the following formula 1, and a solvent; a hard mask layer comprising a cured product of the hard mask composition; and a pattern formation method using the hard mask composition. The definition of the formula 1 is as set forth in the specification.SELECTED DRAWING: None

An object of the present application is to provide a compound which can form a color filter having excellent luminance. The above object is achieved by a compound represented by formula (I). [In formula (I), T 1 represents a divalent aromatic hydrocarbon group which can have a substituent, T 2 represents a divalent aromatic hydrocarbon group which can have a substituent or a divalent aromatic heterocyclic group which can have a substituent, L 1 represents an a-valent aliphatic hydrocarbon group having 1 to 12 carbon atoms which can have a substituent or a group represented by formula (i), and a represents an integer of 2 or more.][In formula (i), T 3 represents an a-valent aromatic hydrocarbon group which can have a substituent or an a-valent aromatic heterocyclic group which can have a substituent, L 2 represents a divalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which can have a substituent.

The present invention relates to UV / VIS photopolymerizable compositions and to elements produced therefrom and to their use. It specifically relates to recording materials for optical elements with refractive index modulation, in particular holograms.

Provided are a photosensitive resin composition, a photosensitive resin layer manufactured using the photosensitive resin composition, and a semiconductor device comprising the photosensitive resin layer, the photosensitive resin composition comprising: an alkali-soluble resin; a photopolymerizable compound; a photoinitiator; and a solvent, in which the alkali-soluble resin includes a polymer including a structural unit represented by Chemical Formula 1 and a polymer including a structural unit represented by Chemical Formula 2, and includes the polymer including the structural unit represented by Chemical Formula 1 and the polymer including the structural unit represented by Chemical Formula 2 in a weight ratio of about 1: 1 to about 1: 2. In Chemical Formula 1 and Chemical Formula 2, each substituent is as defined in the detailed description. Chemical formula 1 and chemical formula 2

The present invention relates to a radiopharmaceutical 99m The present invention relates to a method for imaging endometriosis sites using Tc-malaciclactide. The technetium-99m radiopharmaceutical is suitably prepared from a non-radioactive kit containing the RGD peptide malaciclactide. Also described is a method for diagnosing endometriosis, selecting treatment and monitoring treatment using the drug. The present invention also includes the use of the kit and / or gamma camera or gamma detector in the method of the present invention.

The present disclosure relates to methods for the large scale synthesis of radionuclide complex solutions having high radioactivity for diagnostic and / or therapeutic purposes, their use in the commercial manufacture of radiopharmaceutical substances, and to the respective solutions and containers containing said solutions.

A measurement apparatus 1 measures thickness of an object to be measured using radiation. The measurement apparatus 1 includes a blocker 10 able to block radiation emitted by a radiation source, controllers 30a and 30b that control unblocking and blocking of radiation by opening and closing the blocker 10, and detectors 60 that detect intruders at a boundary of a defined area including the radiation source. The controllers 30a and 30b close the blocker 10 to block radiation when the detectors 60 detect an intruder at the boundary of the defined area.

Provided are: a coloring composition with which low illuminance dependence is achieved with respect to the obtained line width of pixels and superior temporal stability is achieved with respect to the sensitivity; a film; a color filter; and a solid-state imaging device. The present invention provides a coloring composition containing a colorant, a resin, a polymerizable compound, a photopolymerization initiator, a UV absorber, and a solvent, wherein the colorant contains an unsubstituted copper phthalocyanine pigment and a halogenated copper phthalocyanine pigment, the unsubstituted copper phthalocyanine pigment content in the total mass of the colorant is equal to or greater than 10 mass%, and the halogenated copper phthalocyanine pigment content therein is equal to or greater than 40 mass%.

The present invention relates to a resist composition capable of generating an acid by exposure to light and capable of changing the solubility in a developing solution by the action of the acid, the resist composition contains a base material component (A) of which the solubility in a developing solution can be changed by the action of an acid, and an acid generator component (B) capable of generating an acid by exposure, wherein the acid generator component (B) contains a compound (B1) represented by formula (b1) described in the specification, a compound (B2) represented by formula (b2), and a compound (B3) represented by formula (b3).

[Problem] To provide a composition for forming a silicon-containing underlayer film, said composition being for forming a silicon-containing resist underlayer film such that it is possible to obtain a good resist pattern without pattern collapse even if the resist underlayer film has a thinner thickness compared to conventional products, such as a film thickness of 10 nm or less. [Solution] This composition for forming a silicon-containing resist underlayer film contains: [A] a polysiloxane whose weight-average molecular weight obtained with polystyrene conversion via gel permeation chromatography (GPC) analysis is 1,800 or less, and whose ratio of molecular weights greater than 2,500 in an integral molecular weight distribution curve obtained with polystyrene conversion via gel permeation chromatography (GPC) analysis is less than 20%; and [B] a solvent.

The present invention provides: a composition for forming a resist underlayer film that enables the formation of a desired resist pattern; a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the composition for forming a resist underlayer film. This composition for forming a resist underlayer film contains a polymer and a solvent, said polymer comprising a unit structure (A) represented by formula (1) [in formula (1): R1 represents a hydrogen atom or an alkyl group having 1-6 carbon atoms; and L1 represents an optionally substituted aliphatic ring, an aryl group having 6-40 carbon atoms or a hetero ring] and a unit structure (B) that contains an aliphatic ring in a side chain and that is different from the unit structure (A).