205results about How to "Increase the angle of incidence" patented technology

In a lithographic projection apparatus, a space between an optical element of a projection system is filled with a first fluid and a second fluid separated by a translucent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided in a space between a substrate and the translucent plate and preferably has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided in a space between the translucent plate and the optical element and preferably has an index of refraction similar to the index of refraction of the optical element. The translucent plate has a third index of refraction between the first and second indices of refraction. The third index of refraction may be equal to the first index of refraction or the second index of refraction. A device manufacturing method includes filling a space between the optical element and the substrate with at least two fluids having different indices of refraction.

Hybrid metrology apparatus (1000, 1100, 1200, 1300, 1400) measures a structure (T) manufactured by lithography. An EUV metrology apparatus (244, IL1/DET1) irradiates the structure with EUV radiation and detects a first spectrum from the structure. Another metrology apparatus (240, IL2/DET2) irradiates the structure with second radiation comprising EUV radiation or longer-wavelength radiation and detects a second spectrum. Using the detected first spectrum and the detected second spectrum together, a processor (MPU) determines a property (CD/OV) of the structure. The spectra can be combined in various ways. For example, the first detected spectrum can be used to control one or more parameters of illumination and/or detection used to capture the second spectrum, or vice versa. The first spectrum can be used to distinguish properties of different layers (T1, T2) in the structure. First and second radiation sources (SRC1, SRC2) may share a common drive laser (LAS).

An imaging lens is essentially constituted by seven lenses, including: a positive first lens having a convex surface toward the object side; a second lens, of which at least one surface is of an aspherical shape; a third lens, of which at least one surface is of an aspherical shape; a fourth lens, of which at least one surface is of an aspherical shape; a positive fifth lens of a meniscus shape with a convex surface toward the image side; a sixth lens, of which at least one surface is of an aspherical shape; and a negative seventh lens having a concave surface toward the image side, provided in this order from the object side. The imaging lens satisfies a predetermined conditional formula.

A turbocharger turbine housing with at least two volutes utilizing multiple nozzle rings to optimize the turbocharger's proficiency per application, and a valve to control the exhaust flow to selected volutes in the turbine housing.

A skylight having an arched main body, an apex, a base, and corrugations is described. The main body has two lengths, the first being at substantially the apex and the second at the base wherein the first length is less than the second length. The skylight also has a first end portion and a second end portion at opposing ends of the main body, each of which has a top and bottom section. The distance between the top sections define the first length and the distance between the bottom sections defines the second length. The corrugations disposed on the main body vary by orientation, method of manufacture, number, and shape.

An LED backlight device is provided. A light guide plate has opposing edges of a width direction at a side thereof extended into a pair of opposing walls and a recess formed therebetween. A light emitting diode (LED) light source is accommodated in the recess to project light into the light guide plate. In this fashion, the light guide plate has the recess formed at one side of the light guide plate to seat the LED package therein. This minimizes loss of light incident from the LED package into the light guide plate and allows the LED package to be aligned securely with the light guide plate.

Disclosed are a super-hydrophobic anti-reflection substrate and its manufacturing method. The super-hydrophobic anti-reflection substrate comprises: a basement, an antireflective film positioned on the surface of the basement and a low surface energy coating positioned on the surface of the antireflective film, wherein the antireflective film has a moth eye structure. The manufacturing method of the super-hydrophobic anti-reflection substrate comprises the following steps of: providing the basement; forming the antireflective film having the moth eye structure on the surface of the basement; and forming the low surface energy coating on the surface of the antireflective film. Light transmittance of the antireflective film can be further raised through formation of the low surface energy coating on the surface of the antireflective film.

The invention refers to an X-ray beam device for X-ray analytical applications, comprising an X-ray source designed such as to emit a divergent beam of X-rays; and an optical assembly designed such as to focus said beam onto a focal spot, wherein said optical assembly comprises a first reflecting optical element, a monochromator device and a second reflecting optical element sequentially arranged between said source and said focal spot, wherein said first optical element is designed such as to collimate said beam in two dimensions towards said monochromator device, and wherein said second optical element is designed such as to focus the beam coming from said monochromator device in two dimensions onto said focal spot.

Apparatuses and methods for limiting the angle of incidence (AOI) of light reaching a dichroic filter. The apparatus may include an AOI filter element and the dichroic filter. The apparatus may be a sensor and may include a photodetector. The dichroic filter may be configured to prevent light having a wavelength outside a band pass region from reaching the photodetector and to pass light having a wavelength within the band pass. Physical limitations of the dichroic filter may preclude the dichroic filter from preventing high AOI light having a wavelength outside a band pass region from reaching the photodetector. The AOI filter element may be configured to prevent light having a high AOI from reaching the dichroic band pass filter and to propagate light having a low AOI to the dichroic band pass filter. The AOI filter element may be a fiber optic bundle comprising a plurality of optical fibers.

An optical element includes an optical base material and a light blocking portion. The optical base material transmits light therethrough. The light blocking portion is formed on part of a surface of the optical base material. The light blocking portion includes a light blocking layer and an antireflection layer that is formed on a non-adhesion surface with the optical base material in the light blocking layer. A refractive index of the antireflection layer is lower than a refractive index of the light blocking layer.

A projector includes: a projection unit that projects projection light toward an illuminated surface; a housing that houses the projection unit and has an opening that allows the projection light to exit outward; and a cover portion that blocks the opening and transmits the projection light, wherein a plurality of areas is set in the cover portion relative to the projection unit, and a process of changing the reflectance of the light-incident surface of the cover portion at which the projection light is reflected is performed on each of the areas.

An engine that has, in axial flow series, booster compressor, core compressor, combustion equipment, core turbine, and low-pressure turbine. Core turbine drives core compressor via an interconnecting high-pressure shaft. Low-pressure turbine drives booster compressor via an interconnecting low-pressure shaft. Low-pressure turbine also drives external load having a defined speed characteristic that dictates speed of the low-pressure turbine and booster compressor. Booster compressor has one or more rows of variable stator vanes. The method includes: scheduling variation in the angle of variable stator vanes as a function of speed of the booster compressor wherein the vanes open as booster compressor speed increases; measuring or setting one or more operational parameters which are determinative of temperature at entry to core turbine; and biasing scheduling of angle variation of variable stator vanes as a function of operational parameter(s) to reduce variation in temperature at entry to core turbine.

The invention discloses a photovoltaic array maximum power point tracking servo system comprising a clock circuit, a double-shaft mechanical tracking and locating system and a photovoltaic detecting device respectively connected with a singlechip control system. The double-shaft mechanical tracking and locating system comprises a first tracking component and a second tracking component connected with a battery panel bracket. A battery panel and the photovoltaic detecting device are provided on the battery panel bracket. The singlechip control system respectively controls and drives the first tracking component and the second tracking component to drive the battery panel and the photovoltaic detecting device to move in the vertical direction and the horizontal direction. The driving system adopted by the invention is a double-shaft active solar servo system which can realize the sun tracking under all weather conditions, has high precision, can always align the solar battery panel to the sun and maintain the maximum generating efficiency. Furthermore, the invention also discloses a control method of the system.

The invention discloses a production method for a sapphire pattern substrate, comprising the following particular steps of (1) depositing a layer of thin film on the upper surface of a sapphire which has a low refractive index material and 1AA-999AA thickness; (2) preparing a mask pattern on the thin film with photoresistance; (3) transferring the pattern masked with photoresist to the thin film through etching to obtain a protuberance with the 1AA-999AA thickness, wherein the lower substrate of the pattern of the protuberance has a width of 0.5-3 mu m and a gap of 0.5-3 mu m; and (4) cleaning the sapphire to remove the residual photoresistance. The invention has the advantages that PSS cost can be greatly reduced and total reflection angles are increased for light, thereby being more favorable for emergent light, improving emergent light efficiency, being favor of laser peeling and increasing excellent rate of the finished product LED chip.

The invention relates to a manufacturing method for a broadband THz wave absorber unrelated to wide-angle polarization. The manufacturing method includes that semiconductor silicon with certain doping concentration is selected, a photolithography technique and an ICP (inductively coupled plasma) technique etching or a chemical corrosion technique are adopted on the surface of a silicon wafer to obtain periodically arranged grating layers with reduced reflectivity, and the rest part of the grating layers is a substrate layer with reduced transmissivity. By the arrangement, broadband absorber unrelated to the wide-angle polarization is realized in a THz band. Compared with a conventional metamaterial absorber, the high-doping silicon substrate absorber with the two-dimensional grating structure has the advantages of high absorption frequency band, unrelated to polarization, wide in incident angle and the like; the manufacturing method of the absorber is wide in material taking, simple and efficient, convenient to manufacture and wide in application range; the broadband THz absorber unrelated to the polarization can be manufactured according to actual application scenarios and demands, and absorption rate, absorption frequency band and absorption broadband can be regulated through regulation of structural parameters.

The invention discloses a medium or heavy steel plate morphology detection system based on a controllable symmetrical double-line laser angle, and a method thereof. A sensor cabinet is internally provided with two planar array CMOS cameras in an equal-height plane. Each planar array CMOS camera is provided with a camera lens and furthermore is fixed on a bracket through a mounting device. Two sides of the planar array CMOS camera are respectively provided with a linear laser source. A pulse speed testing velocimeter is fixed at the side of a conveyor belt. The to-be-measured medium or heavy steel plate is placed on the conveyor belt. The to-be-measured medium or heavy steel plate is provided with the laser ray overlapping area of the symmetrical linear laser sources. Correlation is formed between a photoelectric switch transmitter and a photoelectric switch receiver. The sensor cabinet is placed on a bracket. A detecting device is controlled by a control device. According to the medium or heavy steel plate morphology detection system, simple calibration method is realized in detecting by two symmetrical linear laser sources, and furthermore high detection resolution and high precision are realized. The detecting system with two symmetrical linear laser sources is adopted, thereby realizing large incident angle of the linear laser, preventing detection inflection point failure, reducing drift and ensuring accurate and reliable result.

The invention puts forward a method and device for a blast furnace to blow coal powder. Characterized by employment of several short spray guns, a large incidence angle, accurate positioning of spray guns, small heat radiation and long life of blowpipes, and adoption of ceramic nozzles, the new method and new device of the invention aims to eliminate various defects in prior art, such as small coal powder incidence angle, restriction by high speed hot airflow, inadequate mixing with hot air, long length and long service life of spray guns, large heat radiation and short service life of blowpipes, and hard use of oxygen-coal lances, etc. According to the invention, on the blowpipes of each air ports, each short spray gun is inserted into each installation seat, and coal powder blown into a blast furnace enters from blowing inlets positioned on a lateral side of each installation seat, then reaches the inside of each short spray gun through coal spraying holes that are disposed on tube walls of the short spray guns and are over against the blowing inlets, and is finally blown into the furnace through each short spray gun. The device of the invention at least comprises: a blowpipe with a coal powder precombustion function, short spray guns, installation seats, ball valves, locking devices, coal conveying branch pipes, a distributor, a small ball valve, a coal conveying pipe, and an inlet connecting piece.

A pellicle for use in microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the pellicle (34; 134; 234). This ensures smaller variations of the transmittance over a broad range of angles of incidence, as it occurs in very high numerical aperture projection lenses.

The present invention provides an applicator comprising:

• • a handle member;
  • a stem connected via a hinge to the handle member; and
  • an applicator element disposed at a first end of the stem and configured to apply makeup on keratinous fibers;
  • the stem including a maneuverable portion enabling the direction in which it points relative to the handle member to be modified, the maneuverable portion extending at least in part between the hinge and a second end of the stem opposite from its first end.