42 results about "Metrology" patented technology

According to the metering detection calibration method and system, the dynamic waiting time is determined on the basis of the characteristic relaxation time of the instrument to be calibrated, and data is recorded after output is stable, so that the problems that the traditional fixed waiting time cannot adapt to the relaxation characteristic of the instrument, and data instability or low efficiency is easily caused are solved; the instrument is ensured to be fully stable so as to improve data reliability, and waiting time redundancy is avoided; and meanwhile, the equivalent effective times are calculated by combining the actual retention time after the output value is stabilized and the characteristic relaxation time of the instrument to be calibrated, and a final calibration result is obtained by adopting a statistical method for dynamically quantifying the data contribution degree, so that the problems that the existing equal weighting or manual weighting mode is strong in subjectivity and is difficult to reflect the real reliability of the data are solved. And the accuracy and objectivity of the calibration result are improved.

An acquisition method and system of an addressing pattern, a measurement method, and related devices; the acquisition method of the addressing pattern includes: acquiring a positioning field of view region corresponding to a target pattern, the positioning field of view region having the target pattern; dividing the positioning field of view region into a plurality of first unit regions; acquiring a pattern density of each first unit region; and acquiring a position of an addressing pattern located around the target pattern in the positioning field of view region according to a plurality of first unit regions having the largest difference in pattern density with adjacent first unit regions. The acquisition method of the addressing pattern of the embodiment is advantageous in improving the uniqueness of the selected addressing pattern, reducing the probability of the addressing pattern being similar to the patterns of other regions, thereby being advantageous in accurately positioning the addressing pattern, and further being capable of accurately positioning the target pattern based on the addressing pattern, and accordingly being advantageous in improving the process reliability, for example, improving the accuracy of the measurement result of the target pattern in the process of measuring the target pattern.

The utility model relates to the technical field of metering devices, and discloses a metering device convenient to read metering data, which comprises a metering assembly, the lower end of the metering assembly is provided with a base, the upper end of the base is also provided with a washing assembly, a starting motor, a matching rotating shaft, a shaft rod and a synchronous belt drive a turntable to rotate, and at the moment, a lifting piece and the washing assembly synchronously rotate; the flushing assembly is located on the metering cylinder, then the air cylinder part is started reversely, the connecting base and the flushing box can be driven to move downwards until the blocking cover makes contact with the metering cylinder, then the micro pump body is started, water can be pumped out and discharged through the flushing pipe, water can be sprayed into the metering cylinder, and the water slides along the inner wall of the metering cylinder; meanwhile, an electric push rod is started, a cleaning plate can be pushed to move downwards, the inner wall of the metering cylinder is cleaned, liquid can be discharged from a guide pipe, the interior of the metering cylinder is clean, residual liquid is reduced, and the accuracy of the metering result is guaranteed.

The invention relates to the technical field of metering, and discloses a metering monitoring method and a metering monitoring system.The method comprises the steps that a handover mode is determined according to a service identifier of a handover service and a mapping table, and the mapping table comprises the corresponding relation between the service identifier and the handover mode; according to a handover mode corresponding to the handover service, determining a to-be-collected actual data item, a standard data item and a fluctuation range of the handover service; collecting actual data items of the handover service; determining an actual handover amount according to the actual data item of the handover service, and determining a standard handover amount according to the standard data item; and determining whether the handover service is abnormal or not according to whether the comparison result of the actual handover amount and the standard handover amount exceeds the corresponding fluctuation range or not. According to the invention, the structured and automatic processing of the metering data is realized, the accuracy and reliability of the metering data are improved, the abnormity of handover data is found in time, and the automation level of metering management is greatly improved.

The invention relates to the technical field of measurement switch calibration, and discloses a measurement switch calibration device and calibration method. Parameter initialization is completed by determining a measurement input voltage range, a quantization resolution, a maximum allowable error threshold and an initial segmentation boundary, initial segments are divided based on the current boundary, sampling points of all the segments are calculated, and actual output measurement is carried out to obtain an input and output corresponding relation. Then, constructing a quadratic polynomial fitting function of each section according to a sampling result, and setting a check point in each section to verify an interpolation error so as to evaluate fitting precision; and if the error exceeds the limit, performing adaptive subdivision on the interval until the requirement is met. After all the segments meet the precision requirement, a global calibration mapping function is integrated and constructed, a boundary index structure is established, and finally a result is deployed into a measurement device, so that a corresponding segment function can be called according to the real-time input voltage during online operation for precise calibration.

The invention relates to a scattering measurement-based metrology system and method. The measurement model is trained from raw scatterometry data collected by a scatterometry-based overlay metrology system from an experimentally designed DOE wafer. Each measurement site includes one or more metrology targets fabricated with programmed overlay variations and known process variations. Each measurement site is measured with a known metrology system variation. In this manner, the measurement model is trained to separate the actual overlay from process variations and metrology system variations that affect overlay measurements. Thus, estimation of the actual overlay from the training measurement model is robust to process variations and metrology system variations. The measurement model is trained based on scatter measurement data collected from the same metrology system used to perform measurements. Thus, the measurement model is insensitive to system errors, asymmetry, and the like.

A metrology system including a measurement sub-system to collect zero-order double diffraction from a metrology target in response to an illumination beam, where the metrology target includes one or more grating-over-grating structures, having common pitches on two sample layers. The system may further include a controller to generate an after-develop inspection (ADI) metrology measurement of the metrology target at an ADI process step, generate an after-etch inspection (AEI) metrology measurement of the metrology target at an AEI process step, determine a non-zero offset (NZO) measurement based on a difference of the ADI metrology measurement and the AEI metrology measurement, and control one or more process tools based on at least one of the ADI metrology measurement, the AEI metrology measurement, or the NZO measurement.

The present application relates to the technical field of metrology automation calibration and testing, and provides an automatic metrology calibration data processing method, device, equipment, storage medium and program product, comprising: acquiring sampling parameters, and starting real-time monitoring of environmental influence quantity information; controlling a metrology standard device and a measured device to perform independent repeated observation according to the sampling parameters, so as to collect a measurement data sequence; associating each measurement data in the measurement data sequence with corresponding sampling time information and the monitored environmental influence quantity information, so as to generate a measurement data original record; and calculating a calibration result according to the measurement data original record, and automatically evaluating uncertainty. The present application realizes fine management and control of measurement whole-process data and automatic evaluation of uncertainty by establishing one-to-one corresponding association records of the measurement data of independent repeated observation and real-time environmental influence quantity and time information, and has the advantages of high calibration efficiency, complete data traceability chain and objective and accurate results.

A modeled correction may be generated based on metrology measurements and a weighting map. Residuals between the modeled correction and the metrology measurements may be weighted according to the weighting map. The modeled correction may be weighed via the weighting map according to a position at which the metrology measurements were generated on a sample. The modeled correction may include dose, focus, and overlay. A process tool may be controlled based on the modeled correction to control the dose, focus, and overlay.

A system for target centering detection may be configured receive one or more acquisition images of a sample from an overlay metrology sub-system and determine, using a machine learning-based centering model, one or more stage correctables based on the received one or more acquisition images. The system may be configured to cause a sample stage of the overlay metrology sub-system to adjust a stage position based on the determined one or more stage correctables and receive one or more measurement images of the sample from the overlay metrology sub-system based on the adjusted stage position of the sample stage. The system may then be configured to determine one or more overlay measurements based on the received one or more measurement images.

The application provides an automatic detection method and device for measuring switches, and relates to the technical field of electric power measurement and detection. The specific steps comprise: synchronously collecting power data of an electric energy meter and each measuring switch in real time, comparing and judging whether the power error is excessive, and marking the time when the error is excessive as a first time; taking the first time as a starting point, adaptively determining an integral time window according to the power fluctuation characteristics, dynamically segmenting the power curve, adaptively selecting an integral method, and completing electric energy calculation; and marking abnormal candidate switches through consistency judgment of the electric energy data of the measuring switches, and completing measurement condition judgment in combination with an electric energy error threshold and an allowed floating upper and lower limit. The application solves the problems of large integral error and distorted data caused by traditional fixed cycle collection, accurately distinguishes whether the error is caused by measurement abnormality of the measuring switch itself or normal measurement error caused by non-fault factors such as load fluctuation, and realizes rapid positioning of the abnormal measuring switch.

Disclosed is a method for determining a spectral weighting for configuring spectral characteristics of broadband measurement illumination. The method comprises obtaining first metrology data comprising metrology data from at least a first proper subset of a plurality of targets on a substrate, respectively for each of a plurality of different illumination conditions; determining a respective first spectral weighting component for each target of at least a second proper subset of targets from said first metrology data, said first spectral weighting component being determined to provide a substantially wavelength independent mean intensity from each respective said target; determining a respective second spectral weighting component for each target of at least the second proper subset of targets from said first metrology data; and determining a respective spectral weighting for each target of at least the second proper subset of targets from said first spectral weighting component and said second spectral weighting component.

A system for target centering detection may be configured receive one or more acquisition images of a sample from an overlay metrology sub-system and determine, using a machine learning-based centering model, one or more stage correctables based on the received one or more acquisition images. The system may be configured to cause a sample stage of the overlay metrology sub-system to adjust a stage position based on the determined one or more stage correctables and receive one or more measurement images of the sample from the overlay metrology sub-system based on the adjusted stage position of the sample stage. The system may then be configured to determine one or more overlay measurements based on the received one or more measurement images.

This invention relates to the field of metrology calibration, and more particularly to an adaptive calibration method, apparatus, device, and storage medium for a metrology box. The method includes the following steps: powering on the metrology box normally, performing self-operating noise detection, and constructing a self-operating noise feature set; performing initial calibration and real-time metrological detection on the metrology box based on the self-operating noise feature set, outputting multiple metrological data sequences; performing sequence-by-sequence feature analysis and differential calculation of adjacent time periods based on the multiple metrological data sequences to obtain a feature difference value sequence; synchronously acquiring environmental monitoring parameters of the metrology box; tracing environmental interference sources based on the environmental monitoring parameters and marking interference sources; performing offset calibration based on the interference sources to obtain offset calibration reference parameters; and performing real-time operating condition metrological detection based on the offset calibration reference parameters. This invention achieves accurate and efficient metrology box detection and calibration.

A metrology system includes an imaging system. The imaging system may include an objective lens. The metrology system may include one or more detectors. The metrology system may include an objective positioning stage structurally coupled to the objective lens and configured to adjust a focal plane of at least one of the one or more detectors via movement along an optical axis of the metrology system. The metrology system may include one or more proximity sensors configured to measure lateral positions of a stage element as the objective positioning stage moves along the optical axis. The metrology system may be configured to determine a metrology measurement associated with a target on a sample using the images and lateral positions of the stage element when implementing a metrology recipe.

A metrology method includes: performing a first exposure on a substrate to form a first patterned layer including a plurality of first target units, each first target unit including first target features; performing a second exposure on the substrate to form a second patterned layer including a plurality of second target units that are overlayed with respective ones of the first target units, each second target unit having second target features, wherein ones of the plurality of second target units have the second target features positioned at different offsets, respectively, relative to a reference location; imaging the second target units overlayed on the first target units; and determining edge placement errors based on positions of edges of the second target features in the second target units relative to edges of the first target features of the underlying first target units.

The application discloses a kind of angle adjustment geometric metrology equipment for geological mapping, it is related to geometric metrology field, including metrology main body, metrology main body is by column and is set to the adjusting platform of column top end, adjusting platform upper surface is integrated with data acquisition end, the top center of column is fixed with vertical rod, the top of vertical rod is integrally provided with spherical reference head, the bottom center of adjusting platform is fixed with the articulation sleeve matched with spherical reference head, for adjusting the horizontal and deflection angle adjustment of platform, the outer wall of adjusting platform is provided with circumferential angle measurement scale, the deflection angle value of reference surface adjustment can be directly read;The application can complete the angle adjustment of reference surface and data reading without additional auxiliary tools, significantly improve the accuracy of geometric metrology, provide stable and reliable reference support for the accurate collection of core geometric quantities such as measurement point angle and flatness, reduce the measurement error caused by unstable reference and inconvenient angle reading.

The measurement target includes a first target structure set having one or more first target structures formed within at least one of a first work zone or a second work zone of the sample. The measurement target includes a second target structure set having one or more second target structures formed within at least one of the first work zone or a second work zone. If there is no overlay error in one or more layers of the sample, the first work zone may include a center of symmetry that overlaps with the center of symmetry of the second work zone. The measurement target may additionally include a third target structure set, a fourth target structure set, or a fifth target structure set.

A method of simulating an electromagnetic response of a metrology target comprising first and second gratings, wherein the second grating is below the first grating, the method comprising: receiving a model defining (i) the first grating as having a first number of grating lines within a pitch, each of the first number of grating lines separated by a first pitch; and (ii) the second grating as having a second number of grating lines within the pitch, each of the second number of grating lines separated by a second pitch; using the model and the first pitch to simulate properties of the first grating and generate a first scattering matrix; using the model and the second pitch to simulate properties of the second grating and generate a second scattering matrix; generating a scattering matrix defining properties of the metrology target by combining the first scattering matrix and the second scattering matrix.

Disclosed is a method of metrology, comprising: obtaining first metrology data relating to a respective measurement of one or more marks on a substrate; obtaining intra-mark position dependent metrology data relating to a plurality of intra-mark locations within each of said one or more marks; determining, from said intra-mark position dependent metrology data, intra-mark variation metric data describing an intra-mark variation for each of said one or more marks; and determining corrected metrology data from said first metrology data and said intra-mark variation metric data.

The invention belongs to the technical field of underwater irregular surface or contour metering, and particularly relates to a metering device and method for an underwater irregular contour earth surface. The metering equipment comprises a controller, a rectangular frame and a supporting rod, the top end of the supporting rod is connected with the rectangular frame through an electric control telescopic mechanism, a plurality of measuring units are arranged on the inner side of the rectangular frame side by side, each measuring unit comprises a linear driving mechanism, a movable seat, a fixed seat, a fixed block, a measuring module and a distance measuring module, and the controller is electrically connected with a power supply. And the data collection module is configured to collect data of the distance measurement module and calculate a surface appearance measurement result through software. On the basis of mechanical measurement, manual operation is not needed, the measurement method is simple, the influence of signal interference on a measurement result can be avoided to the greatest extent, the measurement process can be implemented on duty, the efficiency is high, and the measurement result can meet engineering requirements; meanwhile, the device can also be used for measuring the irregular profile of the overwater earth surface.

The invention discloses a metering device adaptive calibration method and system based on offset error compensation, and the method comprises the steps: selecting n sampling points in a measurement range, and obtaining a true value set S and a measurement value set C of the sampling points; based on S and C, constructing a mapping model M taking a measured value as input and a true value as output; during actual measurement, a target measurement value is input into the model, a calibration value is calculated and output through Lagrange interpolation, and offset error compensation is achieved. According to the method, the measurement value-true value mapping model is established by adopting the Lagrange interpolation method, complex nonlinear system errors can be approximated with high precision, and the defect that traditional linear calibration is insufficient in precision is effectively overcome. Only instrument self-measurement data is needed, complex auxiliary equipment is not needed, the system structure is simple, and the cost is low; the precision is flexibly configured by adjusting the number of sampling points, and different application scenes are adapted; the device can be widely applied to calibration of various metering instruments for temperature, pressure, flow and the like, and is high in practicability.

A metrology system may include a controller coupled to a scanning metrology tool that images a sample in motion along a scan direction. The controller may receive an image of a metrology target on the sample from the scanning metrology tool, where the metrology target comprises a first measurement group including cells distributed along a transverse direction orthogonal to the scan direction, and a second measurement group separated from the first measurement group along the scan direction including cells distributed along the transverse direction. The controller may further generate at least a first metrology measurement based on at least one of the cells in the first measurement group, and generate at least a second metrology measurement based on at least one of the cells in the second measurement group.

Disclosed is a method of metrology comprising: illuminating a periodic structure with measurement illumination, the periodic structure comprising a pitch greater than 17 nm and detecting resultant scattered radiation comprising a plurality of diffraction orders. The measurement illumination comprises an illumination profile configured to either: substantially prevent overlap of the diffraction orders while providing a plurality of angles of incidence on the periodic structure which span a range greater than 10 degrees in at least one direction; or impose discontinuities in a measurement signal described by the scattered radiation as represented in pupil space, the discontinuities enabling the diffraction orders to be distinguished at least at respective locations in the pupil space of a plurality of illumination edges of the illumination profile.

A new metrology target configured for measuring a parameter of a patterning process comprises first and second portions. The first and second portions comprise substantially the same pattern in a first direction, are each periodic in a first direction, have a first pitch (p1) in the first direction and have a unit cell in the first direction comprising a set of at least two gratings. The first and second portions are generally mutually interleaved such that at least in a central portion of the metrology target, each set of at least two gratings of one of the first and second portions is positioned between two adjacent sets of at least two gratings of the other one of the first and second portions. The first and second portions have a different pattern in a second direction that is generally perpendicular to the first direction.

A method of improving the measurement of a parameter of interest is disclosed. The method comprises obtaining metrology data comprising a plurality of measured values of the parameter of interest relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of the one or more targets and a measurement condition of the target, and asymmetry metric data relating to an asymmetry of the one or more targets. Based on an assumption that there is a common true value of the parameter of interest across the measurement combinations, a respective relationship is determined for each of the measurement combinations relating the true value of the parameter of interest to the asymmetry metric data. The relationships are used to improve the measurement of the parameter of interest.

A metrology system for use with a movement system of a mobile end tool (e.g., a probe) is provided. The metrology system includes a sensor structure, a beam source structure, and a processing portion. The sensor structure includes a plurality of beam sensors. The beam source structure directs a beam to the beam sensors of the sensor structure. One of the beam source structure or the sensor structure is coupled to an end tool mounting structure of the end tool and / or the movement system that moves the end tool. The beam directed to the beam sensors causes the beam sensors to produce corresponding measurement signals. The processing portion processes the measurement signals from the beam sensors, which are indicative of a position and orientation of the end tool.

The invention belongs to the technical field of measurement, detection and calibration, and particularly relates to a taper gauge calibration method, which comprises the following steps of: 1, early-stage preparation: operating, controlling temperature and humidity, balancing gauge temperature, checking and filling gauge information, recording environmental parameters and preparing calibration equipment by a certificate holder; 2, observing the appearance and identification of the detection gauge with eyes; 3, detecting the Ra value of the working surface of the newly manufactured / repaired gauge by using a sample plate or measuring equipment; 4, detecting basic dimensions and form and location tolerances such as external / internal conicity, large / small end diameter and the like of the gauge; 5, performing size transfer pairing calibration by combining a coloring method with a comparative measurement method according to a standard-proofreading-workload rule level; 6, detecting other technical requirements of the newly-manufactured / repaired gauge by using the three-coordinate measuring machine; and 7, determining a calibration result and recording data in the whole process to form a traceable record. According to the invention, the calibration specifications of various taper gauges are unified, the standardization of the whole calibration process is realized, and the standardization and consistency of the calibration work are improved.