9 results about "Off-axis illumination" patented technology

The invention provides an off-axis illumination photoetching mask, a preparation method thereof and a photoetching system, which can be applied to the technical field of micro-nano machining and advanced photoetching, and the photoetching mask comprises a mask substrate comprising a first surface and a second surface which are oppositely arranged; the photoetching mask pattern structure is located on the second surface of the mask substrate; the light incident part is located on the first surface of the mask substrate, and the light incident part comprises a plurality of light incident units which are periodically arranged; wherein the light incident unit is provided with a V-shaped structure in the direction perpendicular to the first surface, the V-shaped structure gradually shrinks inwards from the first surface to the second surface, and each V-shaped structure comprises two slope surfaces which are connected with each other; the light incident part further comprises a band-pass filtering film which at least covers the two slope faces of the V-shaped structure.

The invention provides an off-axis illumination light machine device which can be applied to the technical field of optical measurement. The device comprises a fixed disc; the m sets of off-axis illumination light paths are installed on the fixed disc, and each set of off-axis illumination light path comprises an illumination light source unit used for providing an input light beam; the light homogenizing coupling unit is used for homogenizing the input light beam; the view field adjusting unit is used for limiting the shape and the size of the illumination area; the off-axis illumination angle adjusting unit comprises a first reflecting mirror, and the light path emitting direction is changed by adjusting the pitching angle of the first reflecting mirror; the imaging detection unit is used for acquiring image information of a target area which is jointly covered by the illumination light fields of the m sets of off-axis illumination light paths; the control unit is used for generating a control instruction based on the image information so as to cooperatively drive the off-axis illumination angle adjusting unit, and the incident angles of the m sets of off-axis illumination light paths are synchronously adjusted to target values; wherein m is an integer greater than or equal to 2.

The application relates to the technical field of photoetching equipment and discloses a non-imaging photoetching illumination system of an i-line photoetching machine, which comprises a light source module that provides an i-line exposure light beam by using an LED light source, a zoom module that adjusts an illumination coherence factor to generate an off-axis illumination pupil, a pupil monitoring module that collects an illumination pupil image, extracts a pupil characteristic value and forms a pupil characteristic time sequence, a homogenization module that performs homogenization shaping on the light beam, a mask surface monitoring module that collects an exposure surface uniformity distribution image, extracts a uniformity index and forms a uniformity characteristic time sequence, an empirical mode decomposition module that decomposes the pupil characteristic time sequence and the uniformity characteristic time sequence, an identification module that identifies intrinsic mode function components with matched center frequencies, a calculation module that calculates an instantaneous phase difference time sequence, a correction loop selection module that selectively activates correction loops of the zoom module and the homogenization module according to the fluctuation range of the instantaneous phase difference, and an online separation and independent correction module that realizes online separation and independent correction of the pupil distribution and the illumination uniformity and improves the stability and process adaptability of photoetching illumination.

An illumination device compatible with both coaxial and off-axis configurations, comprising: a coaxial illumination unit; multipole off-axis illumination units; a substrate, configured to mount the coaxial illumination unit and the multipole off-axis illumination units; and a motion mechanism, configured to drive the off-axis illumination units to move backward and forward, so as to accommodate gratings of different sizes and pattern periods, thereby achieving illumination with varying numerical apertures.

The invention relates to the technical field of photoetching equipment, and discloses a non-imaging photoetching illumination system of an i-line photoetching machine, which comprises a light source module for providing an i-line exposure light beam by adopting an LED light source, and a zoom module for adjusting an illumination coherence factor to generate an off-axis illumination pupil, the pupil monitoring module is used for collecting an illumination pupil image and extracting a pupil characteristic value to form a pupil characteristic time sequence, the dodging module is used for dodging and shaping a light beam, and the mask surface monitoring module is used for collecting an exposure surface uniformity distribution image and extracting a uniformity index to form a uniformity characteristic time sequence. Empirical mode decomposition is carried out on a pupil characteristic time sequence and a uniformity characteristic time sequence, an eigenmode function component matched with a center frequency is identified, an instantaneous phase difference time sequence is calculated, and correction loops of a zooming module and a light uniformizing module are selectively activated according to the fluctuation range of the instantaneous phase difference. On-line separation and independent correction of pupil distribution and illumination uniformity are realized, and the stability and process adaptability of photoetching illumination are improved.

In one embodiment, a sample surface of a biosensor includes pixel areas and holds a plurality of clusters during a sequence of sampling events such that the clusters are distributed unevenly over the pixel areas. In another embodiment, a biosensor has a sample surface that includes pixel areas and an array of wells overlying the pixel areas, the biosensor including two wells and two clusters per pixel area. The two wells per pixel area include a dominant well and a subordinate well. The dominant well has a larger cross section over the pixel area than the subordinate well. In yet another embodiment, an illumination system is coupled to a biosensor that illuminates the pixel areas with different angles of illumination during a sequence of sampling events, including, for a sampling event, illuminating each of the wells with off-axis illumination to produce asymmetrically illuminated well regions in each of the wells.

The invention provides an off-axis lighting system numerical aperture adjusting device which can be applied to the technical field of lighting mechanical structures. The device comprises an off-axis lens group which is fixedly installed at the Z-direction motion output end of a lens cone Z-direction driving system; the lens cone Z-direction driving system is configured to drive the m off-axis lens groups to move in the axial direction; the four-side displacement angle driving system comprises an annular plate and m reflector adjusting units; the reflector adjusting unit comprises a reflector group Z-direction driving module and a reflector group angle driving module; a reflector group is arranged at the output end of the reflector group angle driving module; the reflector set Z-direction driving module drives the reflector set to move in the axial direction, the reflector set angle driving module drives the reflector set to rotate around the circumference parallel to the annular plate, and adjustment of the numerical aperture is achieved by adjusting the spatial position and angle of the reflector set. M is an integer greater than or equal to 2.

A method includes illuminating a region of a choroid of an eye of a patient with off-axis illumination from a first imaging channel that is off-axis relative to an axis of focus of the eye. The method can also include capturing an image on the choroid with the off-axis illumination from the first imaging channel offset from an image sensor in the first imaging channel. A second off-axis illumination from a second imaging channel that is off-axis from the first imaging channel and the off-axis illumination can illuminate the same or a different region of the choroid. The captured image of the choroid can be provided to a machine learning system. An indicator associated with the image can be identified based on an output of the machine learning system.

A novel approach for an alignment system by using glass plates to create off-axis illumination beams is described. A pair of glass plates is inserted into an alignment system to create a pair of off-axis illumination beams. The off-axis illumination beams pass through an aperture stop. A transmissive optic with a plurality of fully reflective mirrors reflects the beams toward the objective. Thereafter, the objective focuses the beams onto the alignment mark on the substrate. The diffracted beam is then detected and analyzed to determine alignment of the substrate. The compact nature of the glass plate alignment system significantly reduces the optical system footprint.