6739 results about "Exposure" patented technology

In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for printing a specific marker onto a substrate. This marker is then measured by an inspection apparatus, such as a scatterometer, to determine whether there are errors in focus and dose and other related properties. The test pattern is configured such that changes in focus and dose may be easily determined by measuring the properties of a pattern that is exposed using the mask. The test pattern may be a 2D pattern where physical or geometric properties, e.g., pitch, are different in each of the two dimensions. The test pattern may also be a one-dimensional pattern made up of an array of structures in one dimension, the structures being made up of at least one substructure, the substructures reacting differently to focus and dose and giving rise to an exposed pattern from which focus and dose may be determined.

An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between the reticle and the object, a first fluid that has a refractive index of 1 or greater, and fills a space between at least part of the projection optical system and the object and a space between at least part of the projection optical system and the reference mark, and an alignment mechanism for aligning the object by using the projection optical system and the first fluid.

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.

An exposure method includes the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.

When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in the X-axis direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Accordingly, the time from the completion of exposure operation on one stage side until the exposure operation begins on the other stage side can be reduced, which allows processing with high throughput. Further, because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.

A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

Methods, image processors and imaging devices for capturing a high dynamic range (HDR) image. Multiple images of a scene are captured at respectively different exposure settings. A further image of an object placed in the scene is captured at one exposure setting. A first radiance image is formed from the multiple images. A second radiance image is formed from the further image. The first radiance image and the second radiance image are merged to form the HDR image.

An apparatus and the method of its operation for rapid prototyping of a three-dimensional object which includes a radiant energy source of a wide beam of radiant energy of suitable intensity and wavelength for curing a layer of photo-curable resin contained in an open vat, a spatial light modulator (SLM) having an array of pixel elements which are individually digitally controllable by a computer, for modulating the radiant energy beam projected from the radiant energy source on a pixel by pixel basis, to form a series of time sequential images of the cross-sectional laminae of the object, an optical system for focusing each image formed by the SLM, one at a time, onto successive layers of photo-curable resin for predetermined exposure times to thereby form stacked laminae of cured resin, each lamina of cured resin being in the shape of a different one of the cross-sectional laminae, and a piston support for lowering each lamina of cured resin after it is formed by the SLM and for depositing a layer of resin corresponding to the thickness of one cross sectional lamina of the three-dimensional object before the step of projecting a new image by the SLM. The SLM, the piston support for lowering, and the optical system operate repeatedly and sequentially until a complete copy of the object is thereby produced.

A scanning device for: scanning coded data disposed on a surface; and generating interaction data based on the sensed coded data, the interaction data being indicative of interaction of the scanning device with the surface; the coded data including, at a plurality of locations on the interface surface, a corresponding plurality of coded data portions, the scanning device comprising: (a) a laser source and scan optics configured to emit a scanning beam through an aperture in a housing of the scanning device, the scanning beam being directed in first and second orthogonal directions to thereby generate a raster scan pattern over a scanning patch, the scanning patch being positioned to cause the exposure of the at least one coded data portion when the surface and the sensing device are positioned operatively with respect to each other; (b) a photodetector for detecting reflection of the scanning beam from the surface, thereby to capture sample information; (c) at least one analog to digital converter for converting the captured sample information into sample data; (d) a first framestore for storing successive sample data as image data; (e) an image processor for processing the image data to generate processed image data; (e) a host processor for generating the interaction data based at least partially on the processed image data.

A system for energy upconversion and / or down conversion and a system for producing a photostimulated reaction in a medium. These systems include 1) a nanoparticle configured, upon exposure to a first wavelength λ1 of radiation, to generate a second wavelength λ2 of radiation having a higher energy than the first wavelength λ1 and 2) a metallic structure disposed in relation to the nanoparticle. A physical characteristic of the metallic structure is set to a value where a surface plasmon resonance in the metallic structure resonates at a frequency which provides a spectral overlap with either the first wavelength λ1 or the second wavelength λ2, or with both λ1 and λ2. The system for producing a photostimulated reaction in a medium includes a receptor disposed in the medium in proximity to the nanoparticle which, upon activation by the second wavelength λ2, generates the photostimulated reaction.

A system and method for determining and correcting for imaging device motion during an exposure is provided. According to various embodiments of the present invention, multiple sets of image pixels are defined on an image sensor, where each set of pixels is at least partially contained in the output image area of the image sensor. Signals from each set of image pixels are read out once or more during an exposure, motion estimates are computed using signal readouts from one or more sets of image pixels, and signal readouts from one or more sets of the image pixels are processed to form the final output image.

Some embodiments of the invention provide a mobile device that captures and produces images with high dynamic ranges. To capture and produce a high dynamic range image, the mobile device of some embodiments includes novel image capture and processing modules. In some embodiments, the mobile device produces a high dynamic range (HDR) image by (1) having its image capture module rapidly capture a succession of images at different image exposure durations, and (2) having its image processing module composite these images to produce the HDR image.

There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).

An apparatus and method for measuring perfusion in a tissue. The method comprising the steps of recording images of the tissue under laser light, calculating a plurality of contrast images from the plurality of images of the tissue, determining a power spectrum of scattered light from the plurality of contrast images, and determining perfusion from the power spectrum. The apparatus comprises a digital video camera, a laser light source, and a processor arranged to operate the camera to produce a plurality of images with different exposure times, receive the plurality of images from the camera and process the images to determine a power spectrum and determine perfusion from the power spectrum.

A method for constructing a final image using adaptive exposure control in multiple exposure photography, comprising: (a) capturing an exposure; (b) analyzing the exposure at least to determine deficiencies in the exposure; (c) setting exposure parameters for at least one next exposure adapted to construct the final image with ameliorated deficiencies; (d) capturing the at least one next exposure using the set exposure parameters; and, (e) constructing a final image utilizing portions of at least the two exposures.

An electronic imaging sensor. The sensor includes an array of photo-sensing pixel elements for producing image frames. Each pixel element defines a photo-sensing region and includes a charge collecting element for collecting electrical charges produced in the photo-sensing region, and a charge storage element for the storage of the collected charges. The sensor also includes charge sensing elements for sensing the collected charges, and charge-to-signal conversion elements. The sensor also includes timing elements for controlling the pixel circuits to produce image frames at a predetermined normal frame rate based on a master clock signal (such as 12 MHz or 10 MHz). This predetermined normal frame rate which may be a video rate (such as about 30 frames per second or 25 frames per second) establishes a normal maximum per frame exposure time. The sensor includes circuits (based on prior art techniques) for adjusting the per frame exposure time (normally based on ambient light levels) and novel frame rate adjusting features for reducing the frame rate below the predetermined normal frame rate, without changing the master clock signal, to permit per frame exposure times above the normal maximum exposure time. This permits good exposures even in very low light levels. (There is an obvious compromise of lowering of the frame rate in conditions of very low light levels, but in most cases this is preferable to inadequate exposure.) These adjustments can be automatic or manual.

The present invention relates to a method and a system for predicting and correcting geometrical errors in lithography using masks, such as large-area photomasks or reticles, and exposure stations, such as wafer steppers or projection aligners, printing the pattern of said masks on a workpiece, such as a display panel or a semi-conductor wafer. The method according to the invention comprises the steps of collecting information about a mask substrate, a mask writer, an exposure stati n, and / or about behavior of a processing step that will occur after the writing of the mask. Further the method comprises predicting from the combined information distorsions occuring in the pattern, when it is subsequently printed on the workpiece; calculating from said prediction a correction to diminish said predicted distorsion, and exposing said pattern onto said mask substrate while applying said correction for said distorsions.

A method and a device for processing a light-polymerizable material (5, 55) for building up an object (27) in layers, using a lithography based generative manufacture having a construction platform (12) for building up the object (27), a projecting exposure unit (10, 60) that can be controlled for locally selected exposing of a surface on the construction platform (12, 62) to an intensity pattern having a prescribed shape, and a control unit (11, 61) prepared for polymerizing overlapping layers (28) on the construction platform (12, 62) in successive exposure steps, each having a prescribed geometry, by controlling the projecting exposure unit (10, 60), in order to thus successively build up the object (27) in the desired shape, said shape resulting from the sequence of layer geometries. The invention is characterized in that a further exposure unit (16, 66) for exposing the surface of the construction platform (12, 62) is provided on the side opposite the projecting exposure unit (10, 60), and that the construction platform (12, 62) is designed to be at least partially transparent to light, and that the control unit (11, 61) is designed for controlling the further exposure unit (16, 66) at least while building up the first layer (28), said layer adhering to the construction platform (12, 62), for exposing in the prescribed geometry.

A heat mode type negative image recording material is provided which comprises (A) a polymer compound that is insoluble in water but is soluble in an alkali aqueous solution and has at least one of groups represented by general formulae (1) to (3) on a side chain; (B) a photothermal conversion agent; and (C) an onium salt compound forming radicals by heat mode exposure with light that is capable of being absorbed by said photothermal conversion agent (B), said heat mode type negative image recording material being capable of recording an image by heat mode exposure. The general formulae are defined in the specification.

A system and related techniques generate and present a set of linked, dynamically interactive image processing controls for image editing and optimization tasks. In embodiments a user interface may present a set of global editing modes such as color manipulation, exposure correction or others. Each mode may contain a hierarchical set of basic, intermediate and advanced controls such as one-button automatic fixes, color or saturation sliders or editable histograms or other curves. When a user wishes, for instance, to achieve a warmer color balance or perform other color-correction tasks, the system may automatically detect adjustments in one or more parameters, such as CMYK values, and automatically adjust the values of other parameters to enhance the intended correction or action. For instance when the magenta content on a CMYK slider is increased, the color saturation may be slightly increased or color temperature may be slightly raised, to create a warmer appearance in the color cast of the image. Other combinations of image parameters may be linked. According to embodiments, a set of editable curves such as histograms or gamma curves may be dragged or otherwise adjusted or manipulated by users, and saved for re-application to other images or at other times.

System and Method pertaining to the modification and integration of an existing consumer digital camera, for example, with an optical imaging module to enable point and shoot fundus photography of the eye. The auto-focus macro capability of existing consumer cameras is adapted to photograph the retina over an extended diopter range, eliminating the need for manual diopter focus adjustment. The thru-the-lens (TTL) auto-exposure flash capability of existing consumer cameras is adapted to photograph the retina with automatic flash exposure eliminating the need for manual flash adjustment. The consumer camera imaging sensor and flash are modified to allow the camera sensor to perform both non-mydriatic focusing of the retina using infrared illumination and standard color flash photography of the retina without the need for additional imaging sensors or mechanical filters. These modifications and integration of existing consumer cameras for fundus photography of the eye significantly improve ease of manufacture and usability over existing fundus cameras.

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.