191 results about "Exposure control" patented technology

The invention discloses an internal combustion engine in-cylinder transient self-adaptive exposure control method based on FPGA acceleration, and belongs to the technical field of internal combustion engine endoscopic visualization. In order to solve the technical problem of image overexposure or underexposure caused by violent illumination change in the combustion process in an internal combustion engine cylinder, a real-time exposure detection unit is fused with a camera built-in sensor and an endoscope added sensor to monitor light intensity data; the adaptive exposure control unit accelerated by the FPGA adopts adaptive PID control and fuzzy logic control to generate a parameter adjustment direction, the adaptive PID dynamically adjusts gain based on a machine learning model, and the fuzzy logic outputs a decision according to a fuzzy rule base of brightness, light intensity and errors; the parameter adjusting unit adjusts the aperture size, the shutter speed and the light sensitivity in a linkage mode according to the target and actual gray scale difference value, and millisecond-level multi-parameter exposure control is achieved. Overexposure of a highlight area and loss of details of a low-light area are effectively avoided, and stable and clear images are obtained in the whole combustion process.

The invention discloses a scanning type exposure method and system adopting a parallel digital micromirror array, and relates to the technical field of photoetching exposure and maskless direct writing of mask.The scanning type exposure method comprises the steps that parallel digital micromirror initial mapping is established through a reference target exposure detection registration method; generating a block distortion field parameter table according to the initial mapping of the parallel digital micromirror, determining a micro-mark insertion position based on the block distortion field parameter table, and generating an expected coordinate; performing micro-mark exposure on the expected coordinate position, acquiring imaging data of the inserted micro-mark position, extracting an actual measurement coordinate from the imaging data of the micro-mark position, calculating a residual error by taking the expected coordinate and the actual measurement coordinate as an input difference, and writing the residual error into a residual error set; incremental fitting is carried out according to the residual set, the block distortion field parameter table is updated, and the exposure controller controls the parallel digital micromirror array to remap the pattern according to the updated block distortion field parameter table and triggers exposure. The method provided by the invention has better effects in coordinate mapping consistency and block parameter manageability.

An auto-exposure control is proposed for high dynamic range images, along with a neural network for exposure selection that is trained jointly, end-to-end with an object detector and an image signal processing (ISP) pipeline. Corresponding method and system for high dynamic range object detection are also provided.

An auto-exposure control is proposed for high dynamic range images, along with a neural network for exposure selection that is trained jointly, end-to-end with an object detector and an image signal processing (ISP) pipeline. Corresponding method and system for high dynamic range object detection are also provided.

The invention discloses a photoetching machine multi-light-source cooperative high-precision exposure control system, and relates to the technical field of photoetching machine control. Initial energy parameters of all light sources are obtained, a coupling feature set of energy change and light spot morphology change is constructed, and light intensity errors, phase errors and light spot distortion errors are used as input, so that a multi-light-source cooperative high-precision exposure control system is constructed; respectively generating an inter-light-source time sequence offset matrix and a light source energy compensation matrix, constructing a light source collaborative error model through matrix superposition and eigenvalue decomposition, inputting exposure disturbance obtained by real-time monitoring of a photoetching machine into the error model, and obtaining a primary compensation amount; a final target exposure compensation parameter is obtained by adopting a quadratic optimization algorithm under a constraint condition, and light source energy output, a light path phase and a pulse trigger time sequence are cooperatively adjusted according to the target exposure compensation parameter, so that energy deviation, phase drift and time sequence mismatch can be reduced at the same time, the exposure stability and the pattern forming precision are remarkably improved, and the image forming precision is improved. The method is suitable for high-resolution and multi-light-source photoetching equipment.

The embodiment of the invention provides an automatic exposure control method and device and electronic equipment, and relates to the technical field of image processing. The method comprises the steps that when it is detected that the shooting environment of a first camera changes, the exposure parameter of the first camera is adjusted according to the first exposure adjustment amplitude, and the exposure parameter of a second camera is adjusted according to the second exposure adjustment amplitude; the second exposure adjustment amplitude is greater than the first exposure adjustment amplitude; when the brightness of a second image acquired by the second camera is in a second target brightness stable interval, determining a first exposure amount required by the first camera according to the brightness of the second image at the current moment and the exposure amount of the second camera; and according to the first exposure quantity, adjusting an exposure parameter of the first camera, so that the brightness of a first image acquired by the first camera is in a first target brightness stable interval. According to the technical scheme provided by the embodiment of the invention, the convergence speed of the exposure parameter of the first camera can be improved.

An auto-exposure control is proposed for high dynamic range images, along with a neural network for exposure selection that is trained jointly, end-to-end with an object detector and an image signal processing (ISP) pipeline. Corresponding method and system for high dynamic range object detection are also provided.

In various embodiments, enhancements for low-touch biometric systems include obtaining winnowing information when a biometric probe unsuccessfully matches against a subset gallery. The winnowing information is used to obtain biometric data from an associated group of people and the biometric probe is then compared against the biometric data. If this also fails, identity information may be obtained and used to obtain a corresponding biometric template to match the biometric probe against. In some embodiments, enhancements for low-touch biometric systems determining a dominant by selecting the largest live face in an image then performing one or more actions using the dominant. Such one or more actions may include selecting the dominant for capture, performing exposure control and / or gain control on the dominant as opposed to the rest of an image, determining guidance to provide for biometric capture based at least on a position of the dominant, providing such guidance, etc.

An image capturing apparatus includes an image sensor, a determination unit, and a control unit. The image sensor is rotatable in a plane intersecting an optical axis, and accumulates electric charges at a different timing for each area. The determination unit is configured to determine an exposure time of the image sensor. The control unit is configured to select and execute one of first control to start exposure of the image sensor in response to movement of a first light shielding member and terminate the exposure in response to movement of a second light shielding member and second control to start exposure of the image sensor and terminate the exposure in response to movement of the second light shielding member. The control unit selects one of the first control and the second control based on information about the rotation of the image sensor and the determined exposure time.

The invention belongs to the technical field of photoelectric imaging, and particularly relates to an image quality simulation calculation method for a space telescope comprising a shutter. The method comprises the following steps: firstly, establishing a space telescope optical system model containing a shutter; next, calculating simulation image quality of the space telescope optical system model for controlling the whole exposure process, establishing a change relation of a shutter opening angle along with time according to a shutter driving curve, constructing a change relation of a field-of-view position and the shutter opening angle, and finally setting the working time length for controlling the whole exposure process, and selecting an observation view field needing to be calculated to carry out image quality simulation analysis. According to the method, the image quality result of each view field position is calculated by simulating the complete process of exposure control of the space telescope, and theoretical reference is provided for processing actual observation data; the influence of the shutter opening and closing process on telescope control exposure is calculated through a simulation result, and a theoretical basis is provided for optimization design of a shutter mechanism.

The present invention has an exposure control unit that generates a signal defining a plurality of second exposure periods that are included in a first exposure period corresponding to one frame and that are each shorter than the first exposure period. The present invention has a timing generation unit that generates a pulse signal defining time information within each of the second exposure periods. The present invention has a measurement unit that measures the number of pulse signals from initial detection of photons in each of the second exposure periods on the basis of the pulse signals generated by the timing generation unit.

The invention discloses a visual monitoring method for internal defects of a switch cabinet, and relates to the technical field of electrical equipment monitoring, and the method comprises the following steps: carrying out image distortion correction and real-time distortion correction; the method comprises the following steps: dividing a whole image into blocks according to the characteristics of high light and short time generated by arc discharge of a high-voltage switch, analyzing the brightness mean value of each block region, determining the exposure state of the current image, highlighting the concentrated brightness value of the region, and obtaining the brightness mean value, the maximum brightness value and the image overexposure proportion information required by subsequent exposure control; and the overexposure pixel proportion xi divides the overexposure state into five grades. By considering the characteristics of high strong light and short time generated by arc discharge of the high-voltage switch, the brightness statistics module and the exposure control module are adopted, so that clear and available images can be obtained in complex illumination scenes such as arc discharge, and the situation that internal details of the switch cabinet cannot be seen clearly due to overexposure or insufficient exposure of the images caused by factors such as strong light is avoided.

An imaging device according to one embodiment of the present disclosure includes a multispectral sensor section, a narrowband signal generator, and a controller. The multispectral sensor section outputs a plurality of (N) wavelength signals as pixel signals. The narrowband signal generator uses a coefficient matrix to generate, from the plurality of wavelength signals output from the multispectral sensor, a plurality of M (M>N) narrowband signals that is narrower in bandwidth than the wavelength signa. The controller calculates an evaluation value by performing weighted average processing on the plurality of wavelength signals or a plurality detection values generated using the plurality of wavelength signals, and performs exposure control of the multispectral sensor section on the basis of the calculated evaluation value.

The invention discloses a write-through lithography machine and a scanning exposure method, and the write-through lithography machine scanning exposure method comprises the following steps: calculating to obtain a trigger period of a position synchronization signal as a theoretical trigger period according to a theoretical motion speed and a theoretical trigger interval of a lithography machine motion platform; determining the expansion and contraction coefficient of the position synchronization signal according to the demand trigger spacing and the actual trigger spacing of the exposure resolution demand of the exposure pattern area; obtaining an actual trigger period of the position synchronization signal according to the theoretical trigger period and the expansion coefficient; and performing synchronous exposure control according to the actual triggering period. According to the method, the expansion and contraction coefficient of the position synchronization signal can be subjected to expansion and contraction processing through the demand trigger interval and the actual trigger interval of the exposure resolution demand of the exposure pattern area, so that the actual trigger period of the position synchronization signal meeting the exposure resolution demand of the exposure pattern area is obtained, and the exposure resolution is changed; and the exposure resolution switching of different exposure pattern areas is realized.

An exposure control unit, a timing generator unit, a metering unit, and a pulse control unit are provided. The exposure control unit generates a signal defining multiple second exposure periods contained within a first exposure period, which corresponds to a frame, each of which is shorter than the first exposure period. The timing generator unit generates a pulse signal defining the timing information within each second exposure period. The metering unit counts the pulse signal at or after the first photon capture in the second exposure period, based on the pulse signal generated by the timing generator unit. The pulse control unit performs pulse counting in a second exposure period following the first, based on a value from the metering unit.

This disclosure provides systems, methods, and devices for image signal processing that support controlling image capture based on movement and / or lighting conditions. In a first aspect, a method of image processing includes determining lighting and movement conditions for an image scene and determining exposure settings for an image sensor based on these conditions. An exposure overlap setting may also be determined based on the movement and lighting conditions and the exposure settings. The image sensor may then capture one or more initial image frames guided by these parameters. Finally, an output image frame may be determined from these initial frames, such as with a blending process. Other aspects and features are also claimed and described.

A photoelectric conversion apparatus and a photoelectric conversion system including the same are disclosed. An exposure controller, a timing generator, a measurer, and a pulse controller are provided. The exposure controller generates a signal defining a plurality of second exposure periods, the plurality of second exposure periods being included in a first exposure period corresponding to one frame and each second exposure period being shorter than the first exposure period. The timing generator generates a pulse signal defining time information within each second exposure period. The measurer counts the pulse signal at or after a first photon detection in the second exposure period based on the pulse signal generated by the timing generator. The pulse controller performs count control of the pulse signal in a subsequent second exposure period of the second exposure periods based on a value of the measurer.

It ensures a wide dynamic range for light metering and suppresses image flicker near the maximum aperture setting of the electronic shutter. [Solution] The endoscope device includes a processor that processes the image signal output from the image sensor. The processor acquires exposure correction information based on a target value for exposure time and the amount of exposure control actually applied to the image sensor, and adjusts the gain of the image signal acquired from the image sensor based on the exposure correction information.

This inspection system provides a simple and appropriate adjustment of the light emission start timing of the light-emitting device and the exposure start timing of the imaging device. [Solution] An inspection system comprising a light irradiation device for irradiating a workpiece with light and an imaging device for imaging the workpiece, the inspection system comprising: a trigger control unit that outputs a trigger signal to command the light irradiation device to start emitting light and the imaging device to start exposure; a light emission control unit that, upon receiving the trigger signal, supplies power to the light irradiation device to start emitting light for a predetermined time; an exposure control unit that, upon receiving the trigger signal, outputs a control signal to the imaging device to start exposure for a predetermined time; an image analysis unit that analyzes the image captured by the imaging device and outputs image information indicating the brightness of the captured image; and a timing adjustment unit that, based on the outputted image information, automatically adjusts by relatively moving the light emission start timing, which is when the light emission control unit receives the trigger signal and starts emitting light, and the exposure start timing, which is when the exposure control unit receives the trigger signal and starts exposure.

A photographing system includes an image capturing device and a sensor device worn on a subject. The image capturing device includes an image sensor, a subject motion detector, a receiver, and an exposure controller. The image sensor is configured to capture an image of the subject. The subject motion detector is configured to detect a motion of the subject using the captured image. The receiver is configured to receive a sensing result transmitted from an external device. The exposure controller is configured to control exposure of the image sensor. The sensor device includes a sensor and a transmitter. The sensor is configured to acquire information on the subject. The transmitter is configured to transmit the sensing result of the sensor to the image capturing device. The exposure controller receives the sensing result and controls the exposure using the sensing result and a detection result of the motion.

This invention provides a cathode-unitized X-ray source, a static CT imaging system, and an image enhancement method, comprising: a vacuum tube; a cathode end for emitting electron beams, the cathode end including an exposure control module and multiple electron emission units arranged in a matrix on the same side of the exposure control module, all electron emission units being independent and electrically connected to the exposure control module; an anode target bombarded by the electron beam, the anode target including an anode body and a target surface formed on the anode body, the target surface being located on the emission path of the electron emission units; when the exposure control module receives an external control signal, it establishes a voltage line between the selected electron emission unit and the exposure control module, the electron emission units emitting electrons one by one or row by row toward the target surface, and the target surface reflecting X-rays to a window under the bombardment of electrons. This invention can increase the scanning range, improve the image quality of static CT, and extend the lifespan of the X-ray source.

This application provides an exposure control method, apparatus, camera, device, medium, and product. The method includes: extracting scene features of the current scene based on real-time image data acquired by a camera sensor; determining multi-factor triggering conditions corresponding to the current scene based on the scene features; and then determining a parameter set corresponding to the current scene to achieve camera exposure control based on the parameter set. The solution in this example, by fusing multi-dimensional scene features such as ambient light intensity, image overexposure, image content information, and motion state to establish a dynamic parameter set, can enhance adaptability to complex lighting conditions. Adjusting parameter sets such as metering weight position, exposure gain, exposure time, exposure convergence speed, and target brightness can improve the targeting and accuracy of adjustments, thereby improving the reliability of exposure control.

This invention provides a scene-adaptive fast automatic exposure adjustment method, comprising: S1. Acquiring a frame image and the exposure parameters of the previous frame, denoted as E_pre; S2. Calculating the average brightness Y_cur, the proportion of overexposed pixels P_sat, and the proportion of underexposed pixels P_dark of the current frame image using the current frame image; S3. Calculating the slope between the target brightness and the average brightness of the current frame, denoted as k1: k1=Y_target / Y_cur; S4. Determining whether the current brightness meets the expectation. If k1_th_dark≤k1≤k1_th_sat, where k1_th_dark is the lower limit of the k1 tolerance threshold and k1_th_sat is the upper limit of the k1 tolerance threshold, the exposure parameters remain unchanged, and the next loop is performed, returning to step S1; otherwise, if the expectation is not met, the exposure parameters are updated and the process proceeds to step S5; S5. Selecting the corresponding convergence parameters; S6. Calculating and acquiring the exposure parameters, and updating the exposure parameters. This method can quickly achieve automatic exposure control in bright, dark, or scenes with drastic brightness changes, allowing the image to converge to a reasonable brightness quickly.

An image pickup apparatus includes an imaging unit configured to image a captured image, and a processor configured to control exposure of the captured image. The processor is configured to control the exposure of the captured image in a first mode in a case where the processor has not acquired first information indicating that the captured image will be streamed next, and the processor is configured to control the exposure of the captured image in a second mode for controlling at least one of parameters that are used in the first mode, using a fixed value in a case where the processor has acquired the first information.

This application provides an exposure control method, apparatus, device, medium, and product for a stereo camera. It can determine a reference camera from the first and second cameras based on the correlation characteristics between the brightness statistics of a first image acquired by a first camera and a second image acquired by a second camera in a stereo image acquired by the stereo camera. This allows for the adjustment of the exposure parameters of non-reference cameras based on the exposure parameters of the reference camera. This application enables more effective determination of a more suitable reference camera during stereo camera exposure processing, thereby improving the processing effect of exposure processing on stereo images and enhancing the subsequent display effect of the stereo images.

The invention relates to the technical field of image processing, in particular to a dynamic scene adaptive exposure regulation and control method for a visible light imaging product, which comprises the following steps: acquiring a motion vector of each macro block in a current frame image from a previous frame image to the current frame image; predicting a prediction position of each macro block in the next frame of image based on the motion vector; calculating the predicted brightness increment of each macro block according to the current brightness value of each macro block in the current frame image and the reference brightness value of each macro block at the predicted position in the next frame image; dividing the current frame image into a plurality of exposure regulation and control regions, and aggregating the predicted brightness increment of the macro block covered by each exposure regulation and control region to obtain the regional brightness increment of the exposure regulation and control region; when the regional brightness increment of any exposure regulation and control region exceeds a preset threshold value, executing an exposure moment determination process for any exposure regulation and control region; and in the exposure period of the next frame of image, performing line-level exposure termination based on the independent exposure termination time of each related pixel line through the time schedule controller.

An X-ray imaging system is presented that uses multiple pulsed X-ray source pairs in motion to perform efficient and ultrafast 3D radiography. The sources move simultaneously in constant speed as a group on an arc trajectory. Each individual source also moves fast around its static position in a small distance, but one source moves in the opposite direction to another to cancel linear momentum. The trajectories can also be arranged horizontally at a ring structure. In X-ray source pairs, each source part moves in the opposite angular direction to another to cancel angular momentum. The individual X-ray sources are triggered by an external exposure control unit when they have a speed equal to the group speed but in the opposite linear or angular direction. This allows the sources to remain relatively stationary during activation. 3D data can be acquired in a wider field of view in a shorter time, and image analysis is real-time.

The invention relates to a flash lamp exposure control method and device, a chip and computer equipment. The method comprises the following steps: controlling a flash lamp to pre-flash, and acquiring pre-flash exposure parameters and image brightness data corresponding to the pre-flash exposure parameters before and after the pre-flash; according to the pre-flashing exposure parameters and the image brightness data, determining the brightness influence degree of pre-flashing on the foreground region of the image; determining a main flash initial exposure parameter according to the brightness influence degree of the pre-flash on the foreground region of the image; and controlling the flash lamp to perform main flash according to the main flash initial exposure parameter. By setting the reasonable initial main flash exposure parameters, it is ensured that the brightness of the highlight area in the high dynamic scene is appropriate and the overall brightness of other areas is also appropriate, and the image quality is improved.

This application discloses an image sensor, including a pixel array and a control module. The pixel array includes multiple pixel rows, each containing pixel circuitry. The control module includes an inter-frame switching control circuit. The inter-frame switching control circuit determines, based on exposure information from a first exposure frame and exposure information from a second exposure frame, that there is an overlap between the first and second exposure frames. When this overlap is determined, the control module performs quantization control corresponding to the first exposure frame in each pixel row. Furthermore, during the execution of exposure control corresponding to the second exposure frame in each pixel row, the transmission transistors in the pixel circuitry of that pixel row remain off. Thus, this application enables the image sensor to avoid logic problems during multi-frame quantization, thereby allowing the image sensor to better complete quantization and obtain better images.

The application discloses a photolithography machine multi-light-source cooperative high-precision exposure control system and relates to the technical field of photolithography machine control. The initial energy parameters of each light source are acquired, a coupling characteristic set of energy variation and light spot appearance variation is constructed, light intensity error, phase error and light spot distortion error are taken as inputs, a time sequence offset matrix between the light sources and a light source energy compensation matrix are respectively generated, a light source cooperative error model is constructed through matrix superposition and eigenvalue decomposition, exposure disturbance obtained by real-time monitoring of the photolithography machine is input into the error model, the final target exposure compensation parameters are obtained by using a quadratic optimization algorithm under a constraint condition after the preliminary compensation amount is obtained, the light source energy output, the light path phase and the pulse trigger time sequence are cooperatively adjusted according to the target exposure compensation parameters, the energy deviation, the phase drift and the time sequence mismatch can be simultaneously reduced, the exposure stability and the pattern shaping precision are significantly improved, and the application is suitable for high-resolution and multi-light-source photolithography equipment.