2441results about "X-ray apparatus" patented technology

A non-transitory computer readable medium (26) stores instructions executable by at least one electronic processor (20) to perform a method (100) of monitoring a component (10) of a medical device (1). The method includes retrieving information about a correction factor (40) applied during operation of the component from the medical device; deriving a wear metric indicative of wear of a portion of the component from the retrieved information about the correction factor applied during the operation of the component; estimating a time remaining until end-of-life (EOL) of the component; and outputting an alert (30) indicating estimated time remaining until EOL of the component.

The invention relates to the technical field of power supply control, in particular to a power supply control method and system of an X-ray generating device. According to the method, working state parameters of an X-ray tube are detected in real time, and corresponding voltage / current deviation correction is generated according to a preset voltage-current characteristic curve; dynamically adjusting the driving frequency of the high-frequency inverter based on the voltage / current deviation correction, and collecting the ripple characteristic quantity fed back by the output end of the power supply to form a closed-loop correction factor; carrying out coupling analysis on the closed-loop correction factor and the X-ray tube cathode emission current change rate; reconstructing a trigger time sequence graph of the power switch device according to the phase compensation instruction, and synchronously injecting thermodynamic parameters of a pipe body to carry out duty ratio secondary correction; and generating a multi-parameter cooperative control instruction by iteratively optimizing the matching relationship between the trigger time sequence map and the duty ratio correction value. The self-adaptive precise adjustment of the power supply system is realized, so that the X-ray tube can obtain optimized power supply under different working conditions.

To provide a light source device and an optical device which can improve stability of light generated from a light source.SOLUTION: A light source device 100 includes: a target holding part 110 having a holding region for holding a target material TM for generating light L0 by giving excitation light LR thereto; a rotation shaft 120 for supporting the target holding part 110; and an axial rotation driving part 130 connected to the rotation shaft 120, and rotating the target holding part 110 around a central axis C of the rotation shaft 120 through the rotation shaft, wherein the target holding part 110 is rotated at a predetermined target rotation angular velocity, and the target holding part 110 has a mass such that a dangerous angular velocity in rotation becomes 85% or less of the target rotation angular velocity.SELECTED DRAWING: Figure 1

An X-ray generator is presented comprising: an electron source generating an accelerated electron beam propagating along a first propagation path with a first general propagation direction; a first crystalline structure located in the first propagation path, and defining a first crystal plane oriented at a predetermined non-zero angle with the first propagation path, and configured to transmit the electron beam therethrough and generate parametric x-ray (PXR) emission being first directional emission along a second propagation path tilted with respect to the first general propagation direction; and a second crystalline structure located in the second propagation path and configured as a monochromator with respect to the PXR emission, and defining a second crystal plane oriented at the predetermined non-zero angle with respect to the second propagation path to thereby provide second directionality for the PXR emission.

The invention relates to the technical field of X-ray tube control, and discloses a control method and device for a controllable flying focus X-ray tube, and the method comprises the steps: building an orthogonal electromagnetic deflection system based on an electron beam flight path of the X-ray tube, and the orthogonal electromagnetic deflection system comprises an X-direction electromagnetic coil and a Y-direction electromagnetic coil; creating a conversion relation for converting the target focus position function into an electromagnetic coil current value; executing nonlinear magnetic field response compensation to obtain high-speed switching control signals of the X-direction electromagnetic coil and the Y-direction electromagnetic coil; and performing focus trajectory prediction based on the high-speed switching control signal to obtain a focus motion trajectory formed by the electron beam on the target material, and performing thermal load distribution optimization on the focus motion trajectory to obtain a focus position control scheme for uniform distribution of the surface temperature of the target material. Accurate positioning control of the electron beam on the target material is achieved, and the X-ray imaging quality is improved.

An EUV light source includes a chamber that defines a plasma confinement region. A magnetic core is positioned around the chamber and is configured to generate a plasma in the plasma generation region so that the plasma converges in the plasma confinement region. A power delivery section is positioned around the magnetic core. A power supply includes a charging circuit, a pre-ionization circuit, and a solid state switching circuit having an output coupled to the magnetic core. The power supply is configured to isolate the charging circuit from the power delivery section and to generate a pre-ionization pulse through inductive coupling that causes ionization of gas in the plasma generation region. The solid state switching circuit is configured to discharge a capacitance through inductive coupling to form a plasma in the plasma generation region.

A plasma chamber for a UV light source includes a plasma generation region that defines a plasma confinement region. A port is positioned adjacent to a side of the plasma generation region that allows generated light to pass out of the chamber. A high voltage region is coupled to the plasma generation region. A grounded region is coupled to the high voltage region that defines an outer surface configured to be coupled to the ground and is dimensioned for receiving a surrounding inductive core. A width of the high voltage region is greater than the width of the grounded region.

The embodiment of the present disclosure provides a method for generating an extreme ultraviolet light, an extreme ultraviolet light source assembly, and an optical system. The method for generating an extreme ultraviolet light includes: generating a plasma by using a magnetic confinement device; controlling, if the plasma meets a preset injection condition, a heavy metal injection device to inject a designated heavy metal into the magnetic confinement device, so that the designated heavy metal interacts with the plasma in the magnetic confinement device to generate an extreme ultraviolet light; controlling an optical device to collect the extreme ultraviolet light. As the magnetic confinement device that meets the requirements of generating an extreme ultraviolet light has a low cost, simple and stable operation, and a high electro-optic conversion efficiency, with the above method for generating an extreme ultraviolet light, the stability of an extreme ultraviolet light is improved and the cost of generating an extreme ultraviolet light is reduced.

The embodiment of the invention provides an extreme ultraviolet light generation method, an extreme ultraviolet light source assembly and an optical system. The extreme ultraviolet light generation method comprises the following steps: generating plasma by using a magnetic confinement device; under the condition that the plasma meets the preset injection condition, the heavy metal injection device is controlled to inject specified heavy metal into the magnetic confinement device, so that the specified heavy metal acts with the plasma in the magnetic confinement device to generate extreme ultraviolet light; the optical device is controlled to collect the extreme ultraviolet light. The magnetic confinement device meeting the extreme ultraviolet light generation requirement is low in cost, simple and stable in operation and high in electro-optical conversion efficiency, so that the extreme ultraviolet light generation method improves the stability of the extreme ultraviolet light and reduces the extreme ultraviolet light generation cost.

The invention relates to a device 1 for the linear movement of a gantry of a computed tomography scanner. The device comprises a carriage 2 with a first part 4 of a measuring system and a guide rail 5 received in a recess 11 in the floor 12. The guide rail 5 has a second part 8 of a measuring system in a recess 7, the recess 7 being covered by a cover plate 9. The carriage 2 has a friction roller 3 which rolls on a guide shaft 10 projecting from the floor 12 and received in a groove of the guide rail for linear movement.

An X-ray fluorescence analyzer is provided with an X-ray tube that irradiates primary X-rays, a first power supply that supplies a filament current, a second power supply that applies a tube voltage, a first diode connected to a power line, a Zener diode connected to the ground terminal, and an operational amplifier having an inverting input terminal, and a non-inverting input terminal. The non-inverting input terminal is connected to the power line, and the output terminal is connected to the second terminal and the inverting input terminal.

The invention discloses a complex metal product internal defect analysis method and system based on radiographic inspection, a spiral track scanning path is generated through a workpiece three-dimensional model, a six-axis cooperative mechanical arm is utilized to drive a miniature X-ray source to move along the path, and + / -5 [mu] m positioning compensation is realized in combination with a piezoelectric ceramic driving mechanism. And the detector array module is matched to carry out multi-mode ray scanning and real-time data acquisition. Collected data are transmitted to a real-time data processing module through an LVDS differential interface, an FDK algorithm is executed by a JetsonTX2 embedded GPU to complete tomographic image reconstruction, a 3D-ResNet neural network model is loaded through a TensorRT inference engine to achieve intelligent defect recognition, and finally a detection report is generated and uploaded to an MES system. The system comprises a ray generation module, a multi-degree-of-freedom mechanical arm bearing module and the like, a high-voltage generator circuit comprises a ZVS resonance circuit, and a motion control module adopts an FPGA + ARM dual-core architecture.

A laser-sustained broadband light source is disclosed. The light source may include a gas containment structure for plasma generation. The gas containment structure may include a first portion formed from a first grade of sapphire and a second portion formed from a second grade of sapphire. The first portion is coupled to one or more sections of the second portion of second grade sapphire. The light source may include sapphire-to-sapphire bonding between the first-grade sapphire of the first portion and the second-grade sapphire of the second portion, thereby eliminating metal-to-sapphire brazing and avoiding exposure of metal components to destructive UV and / or VUV light. The light source may include a primary laser pump source configured to direct a primary pump beam into the gas containment structure to sustain a plasma and a light collector element configured to collect broadband light emitted from the plasma.

Methods and systems for controlling a voltage of an X-ray imaging system and X-ray imaging systems are provided. A method includes: obtaining an initial tube voltage and a target tube voltage; and adjusting an actual tube voltage of the X-ray imaging system by controlling a working state of one or more devices of the X-ray imaging system based on the initial tube voltage and the target tube voltage in an inter-frame period of time. An output voltage of a high voltage generator is changed to the target tube voltage required when the X-ray imaging system starts imaging to obtain the target frame in the inter-frame period of time, so that the actual tube voltage is equal to or close to the target tube voltage when the target frame is loaded.

A ray generating device and a control method thereof are provided. The ray generating device includes: an electronic beam generating device; a microwave generating device; a microwave circulator, having a power input port and at least two power output ports, the power input port being connected to the microwave generating device; a plurality of accelerating tubes respectively connected to at least two power output ports, configured to respectively receive a plurality of electronic beams, and accelerate electronic beams respectively through microwaves received from the at least two power output ports, and to respectively generate a plurality of rays having at least two different energies; and a controller, configured to perform chronological control on microwave power of the microwave generating device, and chronological control on beam loadings of the electronic beams generated by the electronic beam generating device and respectively corresponding to accelerating tubes.

The invention relates to a method for manufacturing a MEMS micromirror unit (100) for use in projection exposure systems (1) for photolithography, and to a MEMS micromirror unit (100) manufactured according to this method. The invention also relates to a system for semiconductor technology with a corresponding MEMS micromirror unit (100), and to an electronic component manufactured with such a system. The MEMS micromirror unit (100) comprises a MEMS mirror array assembly (110) with a MEMS mirror array structure (111), a joining structure (115), and an interface element (120) for attaching the MEMS micromirror unit (100) to a higher-level assembly, with a joining structure (125) that interacts with it in a form-fitting manner, and at least one stop surface (121, 121'). The manufacturing process comprises the following steps: a) Measuring the relative position and location of the MEMS mirror array structure (111) to the joining structure (115); b) Adjusting the relative position and / or location of the joining structure (125) of the interface element (120) and the at least one stop surface (121, 121') such that the relative position and location of the MEMS mirror array structure (111) and the at least one stop surface (121, 121') after joining the MEMS mirror array assembly (110) and interface element (120) via the joining structures (115, 125) corresponds to a predetermined position and location.

Integrated backscatter X-ray assemblies for detecting backscatter X-rays reflected by a target area of an article under test are disclosed. The integrated backscatter X-ray assembly includes an enclosure, an X-ray power supply, an X-ray tube, a backscatter X-ray detector and a cooling fluid. The X-ray power supply disposed within the enclosure. The X-ray tube disposed within the enclosure and operatively coupled to the X-ray power supply. The backscatter X-ray detector is disposed within the enclosure. The cooling fluid disposed within the enclosure such that the X-ray power supply, the X-ray tube and the backscatter X-ray detector are immersed in the cooling fluid. In various examples, integrated backscatter X-ray assemblies may also include a movable base and / or a mobile platform. Methods for detecting backscatter X-rays reflected by a target area of an article under test are also disclosed.

A target apparatus (300) for an extreme ultraviolet (EUV) light source includes a target generator, a sensor module (130), and a target generator controller (325). The target generator includes a reservoir (115) configured to contain target material (114) that produces EUV light in a plasma state and a nozzle structure (117) in fluid communication with the reservoir. The target generator defines an opening (119) in the nozzle structure through which the target material received from the reservoir is released. The sensor module is configured to: detect an aspect relating to target material released from the opening as the target material travels along a trajectory toward a target space (112), and produce a one-dimensional signal from the detected aspect. The target generator controller is in communication with the sensor module and the target generator, and is configured to modify characteristics of the target material based on an analysis of the one-dimensional signal.

The invention relates to an object X-ray device (10) comprising a radiation source (12) configured to generate and emit electromagnetic radiation for irradiating an object, and a detector device (16) arranged such that the emitted electromagnetic radiation, which at least partially passes through the object, is at least partially reflected by the detector device, and configured to generate an X-ray image of the object. In addition to the detector device (16), a sensor arrangement (20) is provided, which is configured to determine a radiation characteristic associated with the radiation source (12).An evaluation unit (26) is designed to determine or receive a quality parameter of the acquired radiographic image, to evaluate the radiation characteristic and to make a statement about the condition of the detector device and / or the radiation source based on the quality parameter and the radiation characteristic.

The invention relates to a Li-containing target material designed to form a plasma emitting EUV radiation. The target material can be a Li-based composition with at least one additional element. By way of example, the additional element is selected from the group consisting of Au, Ag, Bi, Ba, Sr. The composition is configured to increase the density of the target material by a factor of multiple compared to the density of Li. As a result, the velocity of the droplet portion of the debris particles can be rapidly reduced compared to a Li target, and the high target velocity allows the exit direction from the plasma to be controlled. The target material is preferably used for laser-produced plasma light sources. Such light sources can have a high speed rotating target (e.g. at least 100 m / s). The target material allows the creation of compact low-debris EUV light sources with high spectral brightness designed for a wide range of applications.

The invention provides an X-ray high-voltage generator. The X-ray high-voltage generator comprises a resonance module; wherein the resonance module comprises a first inductor, a first capacitor and a second inductor which are connected in series at a primary winding of the high-voltage transformer; the first inductor and the second inductor form a common mode inductor, and the common mode inductor is an annular hollow inductor. According to the X-ray high-voltage generator provided by the invention, the problems of magnetic saturation risk, temperature sensitivity, magnetic core eddy current loss and the like of an existing resonance circuit are solved.

X-ray imaging systems containing a quick disconnect feature for the X-ray head containing the X-ray source are described. The X-ray imaging systems comprise an X-ray head containing an X-ray source and supporting electronics including high-voltage electronics, a control device, an arm coupled to the X-ray head, and low voltage cabling disposed within the arm and configured to connect the supporting electronics to the control device, the electrical cabling comprising a disconnect between the supporting electronics and the control device, and where the X-ray head is removably attached to the arm so that when the electrical cabling is disconnected, the X-ray head can be removed from the X-ray system. These X-ray imaging systems offer an easier method for removing the X-ray head, such as for replacement, servicing, and / or repair. Other embodiments are described.

An extreme ultraviolet light generation system, generating extreme ultraviolet light by irradiating a target substance with laser light, includes a tank storing the target substance in a liquid state, a nozzle outputting the target substance stored in the tank, a piezoelectric element applying vibration to the target substance to be output from the nozzle to generate droplets of the target substance, a droplet detection device detecting a time interval of passage of the droplets output from the nozzle, and at least one processor. The processor acquires a first value of a vibration parameter relating to the vibration of the piezoelectric element, acquires a variation of the time interval corresponding to each of a plurality of values including the first value of the vibration parameter, and generates the droplets using a second value with which the variation of the time interval is smaller than that with the first value.

Embodiments of the present disclosure provide an X-ray tube. The X-ray tube may include a cathode assembly. The cathode assembly may include: a cathode configured to emit an electron beam; a cathode adjustment window disposed at a periphery of the cathode; and a controller configured to adjust emittance of the electron beams emitted from the cathode at different tube voltages by adjusting a potential difference between the cathode adjustment window and the cathode, so that a size of an electron beam spot formed by the electron beam matches a target focal point size.

A multitube X-ray emitter housing according to the invention includes a housing, a high-voltage supply and a cooling device with an electrically insulating cooling medium. The high-voltage supply has a plurality of high-voltage contacts connected in parallel on a single high-voltage supply lead. A first of at least one side surface of the housing has a first electrically conductive housing portion with a temperature-dependent electrical conductivity. The multitube X-ray emitter housing further includes: a control unit having an interface to receive a measured value representing the electrical conductivity of the first electrically conductive housing portion and to compare the measured value with a threshold value; and a switching device to switch off the high voltage based on the comparison.

An EUV light source includes a chamber that defines a plasma confinement region. A magnetic core is positioned around the chamber and is configured to generate a plasma in the plasma generation region so that the plasma converges in the plasma confinement region. A power delivery section is positioned around the magnetic core. A power supply includes a charging circuit, a pre-ionization circuit, and a solid state switching circuit having an output coupled to the magnetic core. The power supply is configured to isolate the charging circuit from the power delivery section and to generate a pre-ionization pulse through inductive coupling that causes ionization of gas in the plasma generation region. The solid state switching circuit is configured to discharge a capacitance through inductive coupling to form a plasma in the plasma generation region.

An X-ray generating tube includes an insulating tube having a first open end and a second open end, a cathode including an electron emission source and arranged to close the first open end of the insulating tube, an anode including a target that generates an X-ray upon collision with electron from the electron emission source and arranged to close the second open end of the insulating tube, and a tubular electrical conductive member extending from the anode in an inner space of the insulating tube. The insulating tube includes a tubular rib at a position spaced apart from the first open end and spaced apart from the second open end, and the tubular rib is arranged in a radial direction when viewed from an end of the tubular electrical conductive member on a side of the cathode.

X-ray generation apparatus includes X-ray generation tube, driving circuit, and accommodating container. The X-ray generation tube includes insulating tube with first and second opening ends, cathode closing the first opening end and having electron emitting portion, and anode closing the second opening end and having target. The accommodating container has third opening end, and the X-ray generation tube closes the third opening end. The accommodating container defines first space storing the driving circuit, and second space protruding from the first space and storing at least part of the X-ray generation tube. The accommodating container includes protrusion portion surrounding the second space, and one end of the second space forms the third opening end.

An X-ray therapy method using an X-ray device includes arranging a cathode device of an X-ray source into an imaging mode to focus electrons on a focal area with a first size on an anode. The X-ray source in the imaging mode is actuated to emit an X-ray beam toward an X-ray detector to obtain a first X- ray image of a target. The X-ray source or object is adjusted to register the target with a diagnostic image thereof, and to direct the X-ray source toward the target, based on a comparison of the first X-ray image and diagnostic image. The cathode device is switched into a power mode to focus electrons on a second focal area, having a second size greater than the first size, on the anode. The X-ray source in the power mode is actuated to deliver a therapeutic X-ray dosage to the target.

A high harmonic radiation source and associated method of generating high harmonic radiation is disclosed. The high harmonic radiation source is configured to condition a gas medium by irradiating the gas medium with a pre-pulse of radiation, thereby generating a plasma comprising a pre-pulse plasma distribution; and irradiate the gas medium with a main pulse of radiation to generate said high harmonic radiation. The conditioning step is such that the plasma comprising a pre-pulse plasma distribution acts to configure a wavefront of said main pulse to improve one or both of: the efficiency of the high harmonic generation process and the beam quality of the high harmonic radiation. The high harmonic radiation source further may comprise a beam shaping device configured to shape said customized pre-pulse prior to said conditioning.