4026results about "Mirrors" patented technology

An optical device for an aerial display apparatus includes: a planar base member; a plurality of optical elements provided below the base member, each extending in a first direction and aligned in a second direction orthogonal to the first direction; a reflection layer provided in each of the optical elements and configured to reflect light; and an absorption layer provided on the reflection layer and configured to absorb light. Each of the optical elements has an incident surface and a reflection surface which are inclined with respect to a normal direction of the base member and are in contact with each other. The reflection layer is provided on the reflection surface. The optical device is arranged in such a manner as to receive external light on the incident surface.

The invention discloses a laser weld joint welding system based on diffuse reflection material preheating, and belongs to the technical field of laser welding. The system comprises a preheating welding system and a welding workbench, the preheating welding system is composed of a welding laser generator and a preheating device, the welding laser generator is provided with a first laser welding head and a second laser welding head which are used for main welding and auxiliary preheating respectively, and the focusing and working distance can be accurately adjusted; proper sizes of welding light spots and preheating light spots are ensured; the preheating device effectively reflects laser beams and evenly distributes preheating light spots to a welding area through a mirror reflection plate and a U-shaped diffuse reflection light reflection baffle. The system further has an intelligent control function, the laser light source power, the welding parameters and the angle and position of the preheating device can be automatically adjusted according to feedback of the temperature sensor, the laser power and the preheating parameters are automatically adjusted, and the safety of the welding process and the consistency of welding seams are guaranteed.

The invention discloses a laser film structure and a preparation method thereof. Wherein the thin film structure comprises a first dielectric layer, a metal layer, a second dielectric layer and a base material layer, and the second dielectric layer is formed by alternately depositing a dielectric material with a low refractive index and a dielectric material with a high refractive index; the structural expression of the second dielectric layer is H (LH) s, H represents a high-refractive-index dielectric material with the optical thickness of lambda / 4, L represents a low-refractive-index dielectric material with the optical thickness of lambda / 4, and s represents the number of cycles of the film system. According to the invention, the camouflage capability is improved, and the excellent laser protection performance is ensured.

A method for incorporating tempering hollow structures (22) into a substrate (12) of a mirror (10) for an EUV projection exposure system is described, comprising the following steps: (A) providing a substrate (12) consisting of a substrate material 12a; (B) successively focusing a processing light beam (46) onto processing sites (54) where tempering hollow structures (22) are to be formed, such that the substrate material 12a is removed at the processing sites (54), leaving adjacent modified substrate material (58) that has an increased susceptibility to etching relative to the substrate material 12a; (C) applying a rinsing fluid (82; 82.1) to the processing sites (54) while step (B) is carried out, thereby rinsing away the removed substrate material.In step (D), the processing locations (54) are treated with an etching medium (80) while step (B) is carried out, whereby the etching medium (80) exerts an etching effect at the processing locations (54) and any modified substrate material (58) present there is removed by an etching process. A processing system (40) for carrying out the process, as well as a method and a substrate (12) for producing an optical element (8) and an optical element (8) are also specified. Furthermore, a semiconductor technology system (6) and a structured electronic component (224) are specified.

A component is described with a hollow structure (21) formed in a component material (6a) for guiding fluids (64), wherein the hollow structure (21) defines a longitudinal direction (60) and an inner surface (66). The inner surface (66) is formed, at least in some areas, by a surface structure (68) with a radial dimension relative to the longitudinal direction (60), which includes flow structures (72) that reduce the flow resistance in at least one partial cross-sectional area of ​​the hollow structure (21) towards a fluid (64).

Provided is a light source device, including a first laser light source group, a second laser light source group, a dichroic mirror, a fluorescence converter, and an emission component. The first laser light source group emits laser light of a first waveband, and the second laser light source group emits laser light of a second waveband and laser light of a third waveband. The dichroic mirror is disposed on light-output sides of the first laser light source group and the second laser light source group, and the fluorescence converter and the emission component are respectively disposed on light-output sides of the dichroic mirror. The dichroic mirror is configured to emit laser light of various wavebands, and the fluorescence converter generates target fluorescence under the excitation of the laser light of the first waveband, and the target fluorescence is reflected by the dichroic mirror to the emission component.

The invention relates to a projection exposure system (1,101) for semiconductor lithography with an element (40,50,70,90,120,140), wherein the element (40,50,70,90,120,140) comprises an elastic material. The projection exposure system is characterized in that the element (40,50,70,90,120,140) has a core area (48,58,78,98,128,148) comprising the elastic material and a shell area (49,59,79,99,129,149) at least partially surrounding it, wherein the shell area (49,59,79,99,129,149) comprises at least one barrier layer (81,141,143) and wherein the core area (48,58,78,98,128,148) comprises an elastomer and / or a thermoplastic.

The invention belongs to the technical field of camouflage materials, and particularly relates to a natural vegetation imitating visible light-laser-infrared compatible camouflage film. Comprising a substrate, a thermal infrared dual-band camouflage and near infrared spectrum regulation and control layer and a visible light-laser-near infrared regulation and control layer which are arranged in sequence. The upper-layer natural vegetation imitating structure is mainly used for simulating spectral characteristics of natural vegetation, and meanwhile, the extremely low reflectivity at the position of 1.06 mu m near-infrared laser wavelength is achieved by controlling the thickness of a film layer; the thermal infrared camouflage structure in the middle realizes low emissivity of medium-wave infrared and long-wave infrared; the substrate provides a bearing function. The multilayer film not only can realize refined simulation of a reflection spectrum of natural vegetation in a visible light-near infrared wavelength range, but also has the functions of adjusting different visible light spectrum colors and resisting an infrared detector and a 1.06 [mu] m laser detector; and a visible light-laser-infrared multi-band compatible camouflage performance covering a wide wavelength range of 0.4-14 microns can be realized.

The present disclosure relates to a mirror assembly having a housing, a first mirror, a second mirror, a light source, and a sensor assembly. The first mirror can be positioned within an opening of the housing. The front surface of the second mirror can be coupled to a rear surface of the first mirror. The light source can be disposed on or at least partially around the first mirror. The sensor assembly can be positioned between a rear surface of the second mirror and the housing. The sensor assembly can include a transmitter positioned behind the rear surface of the second mirror and a receiver positioned behind the rear surface of the second mirror. The light source can be activated when the sensor assembly detects a user's presence.

Backlight display equipped with off-axis dual-mirror focusing, comprising a light set consisting of multiple light sources and also providing a backlight source, a conical light cup set consisting of several conical light cups and for extending the backlight source orto reduce the diffusion angle of the backlight source, wherein the lamp assembly is located at the light input of the conical lamp cup assembly and the individual light sources are each assigned to a conical lamp cup, a diffusion disk which is expediently attached to the light output of the conical lamp cup assembly to increase the uniformity of the backlight source, a first curved mirror which acts to receive the backlight source and then to reflect it, a second curved mirror which acts to receive and reflect the backlight source reflected by the first curved mirror, and a display module which acts to receive the backlight source reflected by the second curved mirror, wherein the first and / or the second curved mirror is designed as a concave mirror.

A radiative cooling device that is in a state in which a radiative surface is colored is provided. A radiative cooling device CP includes an infrared radiative layer A that radiates infrared light IR from a radiative surface H, a light reflective layer B that is disposed on the side opposite to the radiative surface H with respect to the infrared radiative layer A, and a color portion X. The infrared radiative layer A is a resin material layer J that has a thickness adjusted so as to emit a heat radiation energy greater than an absorbed solar energy in a wavelength range from 8 μm to 14 μm, and the color portion X contains a colorant that absorbs light in the visible range.

The invention relates to a component, in particular an optical element (Mi) or a structural component, comprising: a base body (25) having a hollow structure through which a fluid can flow, which has a plurality of cooling channels (31), a fluid distributor (33) and a fluid collector, wherein the fluid distributor (33) has connecting channels (33b) for supplying the fluid to the cooling channels (31) which open into a common inlet channel (33a) which is connected to an inlet opening (29), and / or wherein the fluid collector has connecting channels for discharging the fluid from the cooling channels (31) which open into a common outlet channel which is connected to an outlet opening.In one aspect of the invention, the inlet channel (33a) has a flow cross-section (A) that decreases from one of the connecting channels (33b') adjacent to the inlet opening (29), and / or the outlet channel has a flow cross-section that decreases from one of the connecting channels adjacent to the outlet opening.

The invention provides an ultra-wideband low-absorption low-stress high-reflection thin film based on a gradual change chirp structure, and belongs to the technical field of optical thin films. Different from a mode of mutually combining and superposing high and low refractive index materials of a traditional structured film system to control the reflection bandwidth, the invention provides a logarithmic function gradient chirp structure, the reflectivity index is adjusted by adjusting the total number of film layers, and the reflection bandwidth is adjusted by adjusting head and tail optical thickness coefficients. The problem that the reflectivity is suddenly reduced in a multi-reflection-band superposition reflection gap area when the broadband high-reflection dielectric film is designed is effectively avoided, and the problem of surface distortion caused by thin film stress is reduced by adjusting the film thickness ratio of the stress regulation and control layer to the gradual change main reflection layer. From the perspective of membrane system design, the thickness of the membrane layer is reduced, the preparation period and difficulty are reduced, problems and risks caused by stress are reduced, membrane layer absorption is effectively reduced, and the absorption and stress can be controlled within a proper range in combination with a post-treatment means to effectively support safe and stable operation of the system.

An illumination optic (11) for projection lithography has a transmission facet mirror (6), an illumination specification facet mirror (7), and a monitoring device (28). The latter has at least one spatially resolving monitoring sensor (29) and a satellite facet (30), which belongs to the transmission facet mirror (6) and is each assigned to exactly one monitoring transmission facet (21). The satellite facet (30) is oriented such that monitoring light (3) from a monitoring light source (2) is guided via the satellite facet (30) and a monitoring illumination control facet (25), which is assigned to the monitoring transmission facet (219) via an illumination channel (27), along a monitoring light channel (31) to the monitoring sensor (29). This results in an illumination optic in which a tilting of illumination control facets of an illumination control facet mirror can be effectively monitored.

The invention relates to a method for mounting a MEMS micromirror unit (100) in a higher-level assembly (200) with at least one receptacle (210) for a MEMS micromirror unit (110), as is used, for example, in projection exposure systems (1) for photolithography. The invention further relates to a MEMS micromirror unit (100) advantageously designed for this purpose. The process is characterized by the following steps: a) Inserting the MEMS micromirror unit (100) into the receptacle (210); b) Aligning the MEMS micromirror unit (100) with the recording (210); c) Applying an axial tensile force to an interface element (120) of the MEMS micromirror unit greater than the subsequent preload force, resulting in a longitudinal elongation of the interface element (120); d) Attaching the prestressing element (300) to a predetermined longitudinal position on the interface element (120); and e) Reducing and removing the axial tensile force. At the latest during the reduction of the axial tensile force, the preload element (300) comes into contact with the receptacle (210) and prevents a complete reversal of the longitudinal strain of the interface element (120), thus leaving a preload force on the interface element (120) with which the MEMS micromirror unit (100) can be fixed in the receptacle (210).

Method for compensating liquid-transmitted acoustic disturbances of a liquid-tempered optical component (110) of a lithography system (1), wherein the disturbances of the optical component (110) as a first optical component (110) are compensated by means of a non-liquid-tempered second optical component (112) of the lithography system (1), comprising the steps: a) Receiving (S1) a first and second actual value (y 1 , y 2 ) of a position (P 1 , P 2 ) corresponding to the first and second optical components (110, 112), and b) Rules (S3) of the position (P 2 ) of the second optical component (112) to an adjusted target value (r 2 ) of the position (P 2 ) of the second optical component (112), which is set to an initial target value (r i ) of the position (P 2) of the second optical component (112) and the first actual value (y 1 ) of the position (P 1 ) of the first optical component (110).

A method for incorporating tempered hollow structures (22) into a substrate (12), in particular a substrate for an optical element, especially a mirror (10) for an EUV projection exposure system, comprises the following steps: (A) providing a substrate (12) consisting of a substrate material (12a); (B) successively focusing a processing light beam (46) onto ablation sites (56) where tempered hollow structures (22) are to be formed, such that the substrate material (12a) is modified or ablated at the ablation sites (54), wherein the side of the tempered hollow structure (22) first reached by the processing light beam (46) is the top side of the tempered hollow structure (22) and the upward direction is defined as the positive z-direction of a coordinate system that is rotationally fixed to the substrate (12); wherein (C) a scanning process is performed,in which the processing light beam (46) is guided with a focus (48) such that an ablation focus (48A) is moved along a scan path (78) through the substrate (12), wherein the processing light beam (46) introduces energy at the ablation focus (48A) into the substrate material (12a) with an energy density H such that the substrate material (12a) is modified or ablated. (D) The scan path (78) comprises several scan patterns (64, 116, 120), each defining a pattern scan path and being scanned in scans (74) such that in each scan (74(n)) an ablation volume is removed, which forms a slice (62, 114,166). (E) The scan lines (74) are spaced apart from each other in a longitudinal direction (60) of the temperature hollow structure (22) to be produced. (F) The scan path (78) also includes pattern jump paths (76) between a scan pattern (64) of a first scan line (74(n)) and a scan pattern (64) of a second scan line (74(m)). In addition, a method and a substrate (12) for producing an optical element (8), an optical element (8), a processing system (40), and a semiconductor technology system (6) are specified.

Method for producing a mirror substrate (201, 301, (401), (501)) of an optical element for a projection exposure system, in particular an EUV projection exposure system (100), comprising a first (202, (402), (502)) and at least one second component (204, 304, (404), (504)), wherein the first component (202, (402), (502)) and the at least one second component (204, 304, (404), (504)) consist of silicon at least on one side facing a connection (211, 308, (408), (508)), and the method comprises the steps of: providing / producing the at least two components (202, (402), (502), (204), 304, (404), (504)) of the mirror substrate (201, 301, (401), (501)), and joining the at least two components (202, (402), (502), (204), 304, (404), (504)) by heating to a joining temperature and applying a joining pressure, preferably perpendicular to a joining surface (203, (205), (403), (405), (503), (505)).

A wide-angle, retroreflective real image display system that produces real images that can be viewed and interacted with by a group of people who can move about a space to view the real image. In one embodiment, the display system includes two or more stations each having their own retroreflector, beamsplitter, and displayed image or illuminated object. The stations, and their beamsplitters and retroreflectors are positioned adjacent at angular offsets or rotation angles, e.g., each neighboring or adjacent beamsplitter and retroreflector is rotated about an axis extending through the joining seam. The displayed images or illuminated objects are rotated at similar angles from each other to provide a retroreflective pyramid with co-located real images. In other embodiments, the display system uses a single retroreflector, beamsplitter, and displayed image or illuminated object but adds a pair of curved reflectors with matching shapes and sizes to provide an undistorted retroreflective real image.

A reflective module disclosed in an embodiment of the invention includes a holder having an inclined bottom surface and first and second guide portions disposed on both sides of the inclined bottom surface, a reflective mirror disposed on the holder, and an adhesive that adheres the reflective mirror to the holder, wherein the first guide portion and the second guide portion extend along both side surfaces of the reflective mirror, the first guide portion includes a plurality of first recesses, each of which faces one side surface of the reflective mirror; the second guide portion includes a plurality of second recesses, each of which faces the other side surface of the reflective mirror; and the adhesive may be respectively disposed in the plurality of first and second recesses and adhered to one side surface and the other side surface of the reflective mirror.

The invention relates to a method for accurately calibrating the quarter-wavelength layer thickness of a DBR (Distributed Bragg Reflector). The distributed Bragg reflector (DBR) is formed by alternately growing two materials with the optical thickness of 1 / 4 wavelength. The deviation of the thickness of the DBR enables the reflectivity of the DBR to be reduced, the bandwidth to be reduced and the reflection phase shift to be deviated. In order to accurately control the optical thickness of each layer of the DBR to be 1 / 4 wavelength, the invention provides two complementary resonant cavity comparison structures. By comparing the relative sizes of the cavity mode wavelengths of the two structures, whether the thickness of each layer of the DBR is 1 / 4 of the standard wavelength or not can be judged, and the thickness of each layer can be corrected to be 1 / 4 of the wavelength. The method makes up the defect that the conventional DBR reflection spectrum cannot accurately measure the thickness of each layer of the DBR, has the advantages of simplicity, accuracy and no damage compared with other thickness detection methods, is not only suitable for accurate calibration of the 1 / 4 layer thickness of the DBR, but also can be used for accurate characterization of the thickness of optical thin films made of other materials.

The present application discloses a head-up display glass and a head-up display system. The head-up display glass includes laminated glass and a reflective film layer; the laminated glass includes an outer glass plate, a polymer interlayer, and an inner glass plate; the reflective film layer includes an inner barrier layer, an improvement layer, and at least one laminated structure arranged in a stacked manner. The inner barrier layer can block the damage of alkali metal ions on the glass surface to the improvement layer during the heat treatment process and block the oxidation of the improvement layer caused by the diffusion of oxygen. The improvement layer can further improve the reflectivity of the reflective film layer to P-polarized light while maintaining a low reflectivity of the reflective film layer to visible light, so that when the driver inside the vehicle visually observes the reflective image of the head-up display glass, only the reflective image of the reflective film layer can be observed, thus eliminating the visual ghosting phenomenon; moreover, the reflectivity of the head-up display glass in the present application to visible light is less than or equal to 15%, and no obvious reflection phenomenon can be observed inside the vehicle.

The invention provides a diffuse reflection target plate. The diffuse reflection target plate comprises a substrate; a plurality of microstructures; wherein the plurality of microstructures are distributed on the substrate; the substrate has a first reflectivity, and the microstructure has a second reflectivity; the first reflectivity is different from the second reflectivity; the target reflectivity of the diffuse reflection target plate is related to the first reflectivity and the second reflectivity. According to the diffuse reflection target plate, reliable large-range reflectivity can be achieved, and the test requirement is met. By changing the specification and / or distribution mode of the microstructure, the duty ratio of the substrate can be adjusted, then the target reflectivity of the diffuse reflection target plate is adjusted, the reflectivity range from 0% to 100% is covered, and flexibility and reliability are achieved.

The invention relates to a projection exposure system (1,101) for semiconductor lithography with at least one component (M3) having a fluid channel (31) and a device (41) for providing a fluid (90) for flowing through the fluid channel (31), wherein the fluid channel (31) is connected to the device (41) by a supply line (45) and a discharge line (49) and is characterized in that the supply line (45) and the discharge line (49) are connected to each other in parallel to the fluid channel (31) via an acoustic short circuit (38, 69).

The invention discloses a coated reflecting film based on an organic fluorescent coating and a preparation method of the coated reflecting film, tetra (4-aminophenyl) methane and tetra-(4-formyl-(1, 1-biphenyl)) ethylene are used as reaction monomers to prepare a novel topological structure [4 + 4] COF (3D-TPE-COF) with a tetraphenylethylene (TPE) unit, and the novel topological structure [4 + 4] COF (3D-TPE-COF) is used for preparing the reflective film based on the organic fluorescent coating. The covalent organic framework material 3D-TPE-COF is added into coating liquid as a fluorescent material to prepare a coating reflecting film based on an organic fluorescent coating, and the obtained reflecting film can convert high-energy blue light, so that the brightness of light emitted by a backlight module is higher and closer to white; meanwhile, the 3D-TPE-COF fluorescent material and the polymer particles can form hydrogen bonds in the coating liquid to avoid aggregation of the polymer particles, so that the wear resistance and scratch resistance of the coating reflecting film are improved.

The invention belongs to the technical field of endoscope lens coating, and particularly relates to a lens shading film and a preparation method and application thereof. The lens shading film provided by the invention comprises a light absorbing layer, a reflecting layer and an insulating layer which are sequentially stacked, and the light absorbing layer is in contact with a lens substrate; the material of the light absorption layer comprises chromium and / or titanium; the reflecting layer is made of aluminum and / or silver; and the material of the insulating layer comprises silicon dioxide and / or silicon nitride. Through the synergistic effect of the light absorbing layer and the reflecting layer, the shading performance of the shading film is remarkably improved; meanwhile, the lens shading film provided by the invention is good in uniformity, so that the optical performance of the lens is not influenced. In conclusion, the coating of the lens shading film provided by the invention is compact and uniform and can reach over OD2, and the average transmittance in a visible light range has a shading effect of less than 0.5%.

In a method for generating a thermal hollow structure in a substrate, particularly in a mirror substrate of an EUV projection exposure system or other semiconductor technology equipment, a substrate (12) consisting of a substrate material is first provided. The substrate (12) is measured to determine the location of gas bubbles or other inclusions (52) within the substrate (12). Then, a thermal hollow structure, which may be, for example, a cooling channel (22), is incorporated into the substrate (12) by successively focusing a processing light beam (34) with a beam axis (48) aligned along a standard direction onto processing locations (44) where the thermal hollow structure (22) is to be formed. This modifies or ablates the substrate material at the processing locations (44).If an inclusion (52) were located on the beam axis (48) oriented along the standard direction, the direction of the beam axis (48) relative to the mirror substrate (12) is changed so that the beam axis (48) does not intersect the inclusion (50). Any residue (74) can be removed by inserting a lance (76) into the cooling channel to break off the residue.

The invention relates to an optical system and a method for operating an optical system, particularly in a microlithographic projection exposure system, wherein the optical system comprises at least one mirror (100) with an optical surface (101) and a mirror substrate (110) made of a mirror substrate material, wherein at least one cooling channel (131-136) through which a cooling fluid with a variably adjustable cooling fluid temperature flows is provided in the mirror substrate. In a method according to the invention, the cooling fluid temperature is set based on an existing deviation between an actual value (ZCT2) of the mean zero-crossing temperature of the coefficient of thermal expansion of the mirror substrate material and a predetermined setpoint value (ZCT1) of this mean zero-crossing temperature.

The embodiment of the invention provides head-up display glass, a head-up display system and a vehicle, which can improve the permeability of a function display area of the head-up display glass and improve the visibility of a driver and passengers to the outside of the vehicle. The head-up display glass comprises a glass substrate and a functional reflecting layer, wherein the functional reflecting layer is arranged on the inner surface of the glass substrate; the head-up display glass comprises a visual field area, a function display area and a shielding area, the function display area comprises at least one semitransparent display area located between the visual field area and the shielding area, and the total visible light transmittance of the semitransparent display area is smaller than or equal to the total visible light transmittance of the visual field area and larger than the total visible light transmittance of the shielding area. At least part of the semitransparent display area is covered by the functional reflecting layer, the part, covered by the functional reflecting layer, of the semitransparent display area has main image reflectivity RL1 and auxiliary image reflectivity RL2 for projection light, and the ratio RR12 of the main image reflectivity RL1 to the auxiliary image reflectivity RL2 is larger than or equal to 15.

A mirror system comprising an EUV mirror (M1-M6), wherein the EUV mirror (M1-M6) includes a mirror body (38) and an optical surface (32) formed on the mirror body (38) with high reflectivity for EUV radiation. The mirror system comprises a frame structure (31) supporting the mirror body (38), a fluid channel (37, 58) for a temperature control fluid extending within a structural body (31, 38) of the mirror system, and a supply line (35) for delivering the temperature control fluid to the fluid channel (37, 58). The supply line (35) is provided with a temperature sensor (42) for the temperature of the temperature control fluid. The temperature sensor (42) is arranged outside the cross-section of the supply line (35). The invention also relates to a method for operating a mirror system and a projection lens of a microlithographic projection exposure system.