6643results about "Optical filters" patented technology

To provide a composition for forming a green coating film which exhibits excellent dispersibility and demonstrates excellent brightness and contrast ratio upon formation of the green coating film.SOLUTION: A composition for forming a green coating film of the present invention comprises: C.I. Pigment Yellow 150 and / or a derivative thereof; a phthalocyanine-based green pigment; a derivative represented by formula 1; an acidic dispersant having an acid value of 40 mgKOH / g or more and 90 mgKOH / g or less; and a solvent. R1 and R2 are independently hydrogen, an alkyl group, a benzyl group, a phenyl group, or the like.SELECTED DRAWING: None

A display apparatus with high display quality is provided. The display apparatus includes a first light-emitting device, a second light-emitting device, a first coloring layer, a second coloring layer, and a first insulating layer. The first light-emitting device includes a first pixel electrode over the first insulating layer, a first EL layer over the first pixel electrode, and a common electrode over the first EL layer. The second light-emitting device includes a second pixel electrode over the first insulating layer, a second EL layer over the second pixel electrode, and the common electrode over the second EL layer. The first coloring layer is provided to overlap with the first light-emitting device. The second coloring layer is provided to overlap with the second light-emitting device. The first coloring layer and the second coloring layer transmit light of different wavelength ranges. The first insulating layer includes a depressed portion between the first pixel electrode and the second pixel electrode. A third EL layer is provided in the depressed portion of the first insulating layer. The first EL layer, the second EL layer, and the third EL layer contain the same material. The sum of the thickness of the first pixel electrode and the depth of the depressed portion is larger than the thickness of the third EL layer.

Changing environmental characteristics of an enclosure are controlled to promote thermal comfort, health, wellness, and / or performance for occupant(s) of the enclosure using sensor data, three-dimensional modeling, physical properties of the enclosure, and machine learning (e.g., Artificial Intelligence).

Provided is a light source device, including a first laser light source group, a second laser light source group, a dichroic mirror, a fluorescence converter, and an emission component. The first laser light source group emits laser light of a first waveband, and the second laser light source group emits laser light of a second waveband and laser light of a third waveband. The dichroic mirror is disposed on light-output sides of the first laser light source group and the second laser light source group, and the fluorescence converter and the emission component are respectively disposed on light-output sides of the dichroic mirror. The dichroic mirror is configured to emit laser light of various wavebands, and the fluorescence converter generates target fluorescence under the excitation of the laser light of the first waveband, and the target fluorescence is reflected by the dichroic mirror to the emission component.

A window for a sensing system is provided that includes: a substrate comprising an outer and an inner primary surface; an outer layered film disposed on the outer primary surface; and an inner layered film disposed on the inner primary surface. Each of the outer and inner layered films comprises alternating high index and low index layers. The outer layered film comprises a scratch resistant layer having a thickness from about 0.5 μm to about 10 μm, and exhibits a hardness of at least 11 GPa, as measured with a Berkovich Indenter Hardness Test. The window exhibits an average transmittance of greater than 85% within ±25 nm of at least one wavelength within the infrared spectrum from 900 nm to 1600 nm and an average transmittance of less than 5% in the visible spectrum from 420 nm to 650 nm, each at an angle of incidence<15°.

The invention discloses a far-infrared band optical thin film, a preparation method thereof and an optical element, and relates to a far-infrared band optical thin film technology, the far-infrared band optical thin film comprises a substrate, a front band-pass film system and a back cut-off film system; wherein the front band-pass film system is located on one side of the substrate, and the back cut-off film system is located on the other side of the substrate; the far infrared band optical thin film is prepared by alternately depositing lead telluride serving as a high-refractive-index thin film material and cadmium telluride serving as a low-refractive-index thin film material. The far infrared band optical thin film can cut off the band with the wavelength smaller than 4 microns, and the average transmittance is 0.23%; anti-reflection is carried out at the wave band of 5-50 microns; the moisture-resistant performance is excellent.

To improve designability when a light source is turned on / off.SOLUTION: An exterior component for a vehicle includes a light source 81, and a decorative body part arranged on a vehicle outside (front side) of the light source 81. The decorative body part includes decorative layers 60 between an inner base material and an outer base material composed of transparent materials. The decorative layer 60 includes a first colored layer 61 which is formed of a color pigment and has light permeability, and a second colored layer 62 which is stacked on a vehicle inside of the first colored layer 61, has a filler 65 dispersed in a coating material, and has light permeability. The filler 65 includes a filler body 66, and a film 68 coating the filler body 66. The film 68 is formed of a color pigment having a color difference ΔE between the color pigment of the first colored layer 61 and the color pigment of 30 or less.SELECTED DRAWING: Figure 5

The utility model discloses a three-color micro-projection optical system, the three-color micro-projection optical system is provided with an object side and an image side which are correspondingly arranged along an optical axis direction, the three-color micro-projection optical system comprises a diaphragm, a lens group and a color combination prism assembly which are sequentially arranged from the object side to the image side; the color combination prism assembly comprises a color combination prism, a red light-emitting chip, a green light-emitting chip and a blue light-emitting chip; the focal length of the three-color micro projection optical system is f, 5.9 mlt; flt; the thickness is 6.4 mm; the distance from the diaphragm to the image surface is the total optical length TTL and TTLlt of the three-color micro-projection optical system; and the thickness is 10.2 mm. By means of the arrangement, in the environment temperature range of 20-60 DEG C, the optical system does not defocus during working, the MTF full frequency is higher than 0.5, the total length of the optical system can be controlled within 10.2 mm, and the working performance is more stable.

The present invention is a color filter provided with at least a substrate and a colored layer provided on the substrate, the colored layer including: a green colored layer containing a halogenated zinc phthalocyanine pigment to which a substituent is bonded via an ether bond; and a blue colored layer containing a lake pigment having a specific structure.

The invention relates to the technical field of optical protective materials, in particular to an anti-dazzle full-ultraviolet-proof optical protective material and a preparation method thereof.The anti-dazzle full-ultraviolet-proof optical protective material is formed by sequentially compounding a scratch-resistant hardened layer, a PET film layer a, a composite adhesive layer, a PET film layer b, an installation adhesive layer and a PET release film layer from top to bottom; the preparation method comprises the following steps: mixing organic silicon modified polyurethane acrylate, a pigment, a reactive diluent, a flatting agent, a photoinitiator, a solvent and modified nano silicon dioxide to prepare a photocurable scratch-resistant hardening coating liquid; in order to endow the optical material with excellent infrared barrier property and heat insulation property, cesium tungsten bronze is introduced into a composite adhesive layer as a filler, and in order to improve the adhesive power and water resistance of a composite adhesive solution, epoxy resin is taken as a base material, organic silicon modified polyurethane acrylate is introduced as a water-resistant component, acrylic acid is taken as tackifying resin, and a curing agent is taken as a curing agent. And bisphenol A ethoxylate dimethacrylate is used as a diluent.

The preparation method of the short-wave-pass ultraviolet optical filter comprises the following steps: S1, cleaning a product serving as a glass substrate of a lens; s2, putting the lens into a tool clamp, and hanging the lens into a coating machine; s3, vacuumizing and radio frequency ion source cleaning are carried out; s4, a short-wave pass film system 80.04 H, 90.05 L, 75.25 H, 79.63 L, 66.91 H, 101.42 L, 52.56 H, 105.14 L, 59.19 H, 92.56 L, 62.15 H, 98.59 L, 55.4 H, 102.89 L, 63.02 H, 95.45 L, 60.9 H, 107.93 L, 58.64 H and 55.22 L is plated on the first face of the lens, electron beam evaporation and radio frequency ion source assistance are used for evaporation, the Ta2O5 deposition rate is 0.4 nm / s, and the SiO2 deposition rate is 1 nm / s; s5, cooling and taking out; s6, repeating the steps S1 to S3; s7, plating the second surface of the lens with an antireflection film system of 16.53 H, 26.98 L, 28.44 H and 76.55 L; and S8, cooling and taking out.

The invention relates to the technical field of optical elements, in particular to an optical filter applied to a medical communication sapphire window. The optical filter comprises a substrate, a main film system, a secondary film system and a metal film system, the main film system is located on one side of the substrate, the secondary film system is located on the other side, opposite to the main film system, of the substrate, the metal film system is located on the upper side of the main film system, the secondary film system is located on the other side, opposite to the main film system, of the substrate, and the metal film system is located on the lower side of the main film system. The main film system comprises four high-refractive-index film layers and four low-refractive-index film layers which are sequentially and alternately overlapped from the substrate to the outside according to the structure of the main film system, and the secondary film system comprises four high-refractive-index film layers and four low-refractive-index film layers which are sequentially and alternately overlapped from the substrate to the outside according to the structure of the secondary film system. The metal film system comprises three layers of Ti, Ni and Au metal film layers which are sequentially and alternately overlapped from the main film system to the outside according to the structure of the metal film system, and the optical filter can realize high transmittance and uniform signal intensity within the wavelength range of a communication channel of 1200-1700 nm, so that high communication efficiency is realized.

The invention discloses a visible infrared dual-band stealth material and a preparation method thereof. The material structurally comprises a metal Mo layer, a Ge dielectric layer and an Al2O3 dielectric layer, and the metal Mo layer, the Ge dielectric layer and the Al2O3 dielectric layer are sequentially laid from bottom to top. According to the method, the absorptivity, the refractive index and the transmittance of the thin film structure in visible light and infrared bands are calculated through combination of a transmission matrix and simulation software, and simulated absorption spectrums of the thin film structure in the visible light and infrared bands under the normal incidence condition are obtained; by changing the thickness of each layer of material in the thin film structure, different thickness absorption spectrums of the thin film structure in visible light and infrared bands are obtained through calculation; comparing the different thickness absorption spectrums with the simulated absorption spectrums to obtain an optimal thin film structure and the thickness of each layer of material; and according to the thickness of each layer of material of the optimal thin film structure, a target thin film structure is prepared by setting a preparation mode. The structure is simple, the manufacturing process is simplified, and preparation and large-scale integration are easy.

Provided is a light detection device that suppresses light interference. The light detection device includes: a semiconductor layer having a photoelectric conversion unit; a first insulating film layered on a light incidence surface side of the semiconductor layer; an optical element having a metal film layered on the first insulating film and an opening array formed in a region, of the metal film, that overlaps with the photoelectric conversion unit in plan view, the optical element being capable of selecting a specific light; a second insulating film layered on the optical element; and a third insulating film layered on the second insulating film. One of a surface of the metal film on the second insulating film side thereof or a surface of the second insulating film on the third insulating film side thereof has unevenness that is greater than unevenness in a surface of the metal film on the first insulating film side thereof or a surface of the first insulating film on the semiconductor layer side thereof.

An optical imaging system includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens, and an eighth lens, sequentially disposed from an object side to an imaging plane. The optical imaging system satisfies the expression BFL / f<0.15, where BFL represents a distance from an image-side surface of the eighth lens to an imaging plane of an image sensor and f represents an overall focal length of the optical imaging system.

The present invention is a photosensitive resin composition including: (A) a (meth)acryloyl group-containing resin; (B) a photo-radical generator; and (C) a quantum dot, wherein the quantum dot has a surface coating layer containing siloxane. This can provide: a photosensitive resin composition capable of easily forming a film having high lithography resolution and favorable luminous properties; a photosensitive resin film obtained by using the photosensitive resin composition; patterning processes using these; and a light emitting device obtained by using the photosensitive resin composition.

Devices configured to emit colored light when illuminated with ultraviolet light and color-shifting displays containing the same are disclosed.

An image sensor may include pixel groups arranged in a Bayer pattern and a color separating lens array that separates incident light by wavelengths and concentrates the separated incident light on the pixels. The color separating lens array may include pixel corresponding groups, with each group having regions containing nanoposts in two layers. In each of the pixel corresponding groups in each of the two layers, there are a central group and a plurality of peripheral groups. The displacements of arrangement centers of the nanoposts in at least two of the peripheral groups have variations.

A display apparatus with a high aperture ratio is provided. The display apparatus includes a first pixel, a second pixel, a first coloring layer, a second coloring layer, a first conductive layer, a second conductive layer, and a first insulating layer. The first pixel includes a first pixel electrode, a first EL layer over the first pixel electrode, and a common electrode over the first EL layer. The second pixel includes a second pixel electrode, a second EL layer over the second pixel electrode, and the common electrode over the second EL layer. The second pixel is placed to be adjacent to the first pixel. The first coloring layer is placed to overlap with the first pixel. The second coloring layer is placed to overlap with the second pixel. The wavelength range of light that the second coloring layer transmits is different from a wavelength range of light that the first coloring layer transmits. The first conductive layer is placed over the common electrode. The first insulating layer is placed over the first conductive layer. The second conductive layer is placed over the first insulating layer. One or both of the first conductive layer and the second conductive layer overlap with a region interposed between the first EL layer and the second EL layer. A side surface of the first EL layer and a side surface of the second EL layer are placed to face each other.

An optical filter includes: a substrate, an antireflection layer 1 including a dielectric multilayer film laminated on one main surface side of the substrate, and an antireflection layer 2 including a dielectric multilayer film laminated on the other main surface side of the substrate. The substrate includes a near-infrared ray absorbing glass and a resin film, the resin film includes a resin, a UV dye having a maximum absorption wavelength in 350 nm to 410 nm in the resin, and an IR dye having a maximum absorption wavelength in 700 nm to 850 nm in the resin, and the optical filter satisfies all of the characteristics (i-1) to (i-7).

The invention relates to a three-waveband medium-long wave infrared optical filter and a preparation method, the three-waveband medium-long wave infrared optical filter comprises a front film system, a substrate and a back film system, and the substrate is located between the front film system and the back film system; the front film system is formed by alternately overlapping germanium layers and zinc selenide film layers; and the back film system is formed by alternately overlapping germanium layers and zinc selenide film layers. According to the invention, the light energy of three wave bands of 3780-4000 nm, 4500-4900 nm and 7850-9500 nm is improved, the luminous flux of other wave bands is well inhibited, the technical problem of infrared filtering windows in some special infrared spectrum detection systems is solved, and a new scheme is provided for the application of the infrared spectrum detection systems.

Embodiments of a deadfront configured to hide a display when the display is not active are provided. The deadfront includes a substrate having a first major surface and a second major surface. The second major surface is opposite the first major surface. The deadfront also includes a neutral density filter disposed on the second major surface of the transparent substrate and an ink layer disposed on the neutral density filter. The deadfront defines at least one display region in which the deadfront transmits at least 60% of incident light and at least one non-display region in which the deadfront transmits at most 5% of incident light. A contrast sensitivity between each of the at least one display region and each of the at least one non-display region is at least 15 when the display is not active.

The present invention is a method for producing a blue cured film, comprising a step of forming a coating film of a blue photosensitive composition on a substrate, the blue photosensitive composition containing a colorant, an alkali-soluble resin, a photopolymerizable compound, and a photoinitiator, the photoinitiator comprises an oxime-based photoinitiator and a sensitizing agent which is different from the oxime-based photoinitiator and has a sensitizing effect at 400-420 nm; and curing the coating film by exposing the coating film to light using an LED light source having an emission peak wavelength in the range of 360 nm to 380 nm and in the range of 400 nm to 420 nm.

Devices, apparatuses, and methods are disclosed that include a glass or glass ceramic substrate with a bleached region and an unbleached region. Examples include a substrate with a region that transmits IR wavelength light, and a region that is substantially opaque to IR light. Examples include additional opacity in some or all regions to visible wavelength light and / or UV wavelength light.

An optical imaging system includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, and a sixth lens sequentially arranged from an object side to an imaging plane. An angle of view of the optical system is 82 degrees or more. A constant indicating brightness of the optical system, F-number, is less than 1.8.

A cover for an infrared detector and a method of fabricating the cover are disclosed. The cover comprises a wafer comprising a material such as silicon that transmits infrared radiation. The wafer has a first surface and a second surface opposite the first surface. An antireflective region is formed in the wafer to enhance transmission of infrared radiation through the cover. The antireflective region comprises a first plurality of antireflective elements such as moth-eyes formed in the first surface. The first plurality of antireflective elements are sized and shaped and arranged relative to one another to form a region of graded refractive index at the first surface so as to reduce the amount of infrared radiation reflected by the cover at the antireflective region. The cover comprises a wall extending from the first surface and surrounding the antireflective region. The wall comprises a plurality of layers of material deposited on the wafer so that, when the cover is bonded to a sensor substrate via the wall, a cavity is formed that encapsulates a sensor region of the sensor substrate. The depth of the cavity may be adjusted by depositing the plurality of layers of material with a combined thickness equivalent to the desired depth of the cavity. A second plurality of antireflective elements may be formed in the second surface to enhance the antireflective properties of the antireflective region.

The utility model discloses an infrared narrowband optical filter with a working wave band of 3900-4100nm, the infrared narrowband optical filter comprises a substrate, a main film system and a secondary film system, the main film system is arranged on a first side of the substrate, the secondary film system is arranged on a second side of the substrate, the second side is opposite to the first side, the main film system is arranged on the first side, and the secondary film system is arranged on the second side of the substrate. The main film system comprises 26 high-refractive-index film layers and low-refractive-index film layers which are alternately overlaid outwards from the substrate according to the structure of the main film system, and the secondary film system comprises 38 high-refractive-index film layers and low-refractive-index film layers which are alternately overlaid outwards from the substrate according to the structure of the secondary film system. The infrared narrow-band optical filter can have a good light transmission effect within the wavelength range of 3900-4100 nm, the average transmittance is larger than 94%, the infrared narrow-band optical filter is highly cut off within the wave bands of 1000-3700 nm and 4300-6500 nm, the average transmittance is smaller than 1%, stray light interference can be effectively reduced, and the sensitivity and the detection efficiency of an infrared detector are improved.

A display device includes: a light emitting element layer provided on a base; and a lens layer provided on a side opposite to the base across the light emitting element layer, the lens layer including a plurality of main lenses arranged in an array in a plane direction of the lens layer and an auxiliary lens provided on a side opposite to the light emitting element layer across the array of the plurality of main lenses, the auxiliary lens being located between adjacent main lenses among the plurality of main lenses in a plan view of the lens layer.

An apparatus includes, in some implementations, at least one image sensor, a plurality of metalenses, and readout and processing circuitry. The at least one image sensor includes a plurality of pixel arrays, each of the which is associated, respectively, with a different one of a plurality of optical channels configured for detection of incoming light rays of a particular wavelength or a particular range of wavelengths centered on the particular wavelength. Each of the metalenses is disposed, respectively, in a different one of the optical channels and is configured, respectively, to focus incoming light rays onto a different one of the pixel arrays. The readout and processing circuitry is operable to read out signals from the pixel arrays and to generate a respective lower-resolution image for each of the optical channels, and to process the lower-resolution images to obtain a higher-resolution monochromatic image. Methods of operation are described as well.

The invention provides a high-temperature-resistant optical filter and a preparation method thereof. The high-temperature-resistant optical filter comprises a substrate, a first high-temperature-resistant film layer, an optical filter film layer and a second high-temperature-resistant film layer, and the first high-temperature-resistant film layer and the second high-temperature-resistant film layer comprise a plurality of SiO2 thin film layers and Al2O3 thin film layers which are sequentially arranged in a staggered mode; the SiO2 thin film layers and the Al2O3 thin film layers are alternately arranged, expansion or contraction of each thin film layer can be mutually compensated by the adjacent layers when the temperature changes, thermal stress between single layers can be offset to a certain degree, and therefore the sensitivity of the whole film system to the temperature changes is reduced, the thin film with high thermal stability is formed, and the service life of the thin film system is prolonged. The phenomenon that the optical filter film layer is broken, warped and even falls off and fails due to high temperature can be avoided under the high-temperature test of 600-1000 DEG C; the problems of substrate deformation, film layer failure, falling and the like possibly existing in a traditional optical filter in a high-temperature environment are solved in a targeted manner.