1560 results about "Sputtering" patented technology

The invention discloses a cross-source data three-dimensional reconstruction method and system based on improved Gaussian sputtering, and the method comprises the steps: collecting an unmanned plane inclined image and a ground panoramic image of a target region, and constructing a time-space correlation data set; based on multi-view geometric constraints, space-time coding matching point pairs are established through an adaptive feature pyramid, intelligent incremental cross-source data sparse reconstruction is carried out, and point cloud and camera parameters are output; adopting improved Gaussian sputtering, compressing a three-dimensional Gaussian kernel into a two-dimensional Gaussian primitive through double tangent vector constraint, and fitting surface geometry to realize multi-scale reconstruction; and optimizing primitive parameters by using a differentiatable renderer, completing multi-scale fine reconstruction through gradient back propagation, and generating a high-precision three-dimensional model. According to the method, multi-scale accurate geometric prior input and accurate camera poses are provided for three-dimensional reconstruction, the dependence on professional manual operation in a traditional three-dimensional reconstruction method is greatly reduced, and meanwhile, the geometric accuracy and visual fidelity of a reconstruction result are remarkably improved.

The invention relates to a multi-layer composite black film and a preparation method thereof. The multi-layer composite black film is formed by sequentially stacking a base material layer, a multi-layer film system and a top covering layer, the multi-layer film system is formed by alternately stacking a plurality of absorption layers and a plurality of oxide layers, the number of the layers is 7-30, an initial layer is an oxide layer, the refractive indexes of the oxide layers are the same (1.4-1.5), the thickness ratio of the oxide layers to the absorption layers is larger than 2, and the thickness ratio of the top covering layer to the absorption layers is larger than 1. And the thicknesses of the two layers are increased and then reduced from the substrate layer to the top covering layer. A buffer layer with gradually changed oxygen content is arranged between the oxide layer and the absorption layer, and both the oxide layer and the top covering layer are made of silicon dioxide. The preparation method comprises the following steps: providing the substrate layer, alternately depositing the absorption layer and the oxide layer by using a magnetron sputtering or electron beam evaporation process to form a multilayer film system, then forming the top covering layer, controlling parameters such as vacuum degree, power, temperature and the like during deposition, and forming the buffer layer in the same cavity. The multilayer composite black film has the inner surface reflectivity of less than 1% and the appearance surface reflectivity of less than 5%, and is simple in structure and low in preparation cost.

The invention relates to the technical field of aluminum-based thin film preparation, and discloses an aluminum-based thin film uniform deposition system based on magnetron sputtering. The system comprises a substrate state detection module, a magnetic field dynamic regulation and control module, a sputtering power regulation module, a deposition process monitoring module and a central control terminal. The substrate state detection module collects and transmits surface flatness data of the substrate in real time, and the central control terminal carries out visual display. The magnetic field dynamic regulation and control module obtains magnetic field intensity correction through a magnetic field gradient algorithm according to the deviation value of the real-time flatness parameter and the standard parameter and sends the magnetic field intensity correction to the sputtering power regulation module. And the sputtering power adjusting module adjusts the sputtering rate of the target material accordingly. The deposition process monitoring module tracks the adjusting process, evaluates the dynamic response performance, generates a stable or fluctuation signal and sends the stable or fluctuation signal to the central control terminal, and the central control terminal triggers sound-light alarm when receiving the fluctuation signal. The system can improve the deposition uniformity and process stability of the aluminum-based thin film.

The invention relates to a magnetron sputtering system and a coating method thereof, the system comprises a pair of twin silicon target material and aluminum target material which are arranged in a coating chamber, the aluminum target material is located in the middle of a horizontal line where the twin silicon target material is located, the twin silicon target material is electrically connected with a medium-frequency power supply, and the aluminum target material is electrically connected with a direct-current power supply. According to the structural design, on one hand, the uniform deposition range can be expanded, the deposition difference of wide workpieces can be reduced, and the whole surface insulation consistency can be ensured, and on the other hand, the aluminum target realizes uniform doping of the aluminum element and stable control of the content, so that the toughness and binding force of the coating are improved, the influence on insulation is avoided, and the comprehensive performance of the non-conductive coating is remarkably improved.

The invention discloses a point cloud reconstruction method and system based on three-dimensional Gaussian sputtering, and is used for solving the technical problem that the structural stability of a final three-dimensional point cloud model is not good enough due to the fact that a traditional point cloud reconstruction method causes gradient propagation abnormity, and the optimization process is not convergent or falls into a local minimum value. The method comprises the following steps: firstly, acquiring a multi-view image and a reference view image, and constructing a covariance degradation risk probability graph; generating a plurality of Gaussian three-dimensional points to be regulated and controlled, performing three-dimensional point screening and fitting credibility score calculation, outputting secondary regulation three-dimensional points and corresponding scores, and constructing an initial three-dimensional point cloud model; performing secondary adjustment on the three-dimensional point by combining the multi-view image and fractional optimization to obtain a target Gaussian three-dimensional point, and updating the initial model into an intermediate model; and updating the intermediate model through a covariance updating gating mechanism based on gradient convergence dynamic monitoring, and outputting a target three-dimensional point cloud model.

The invention discloses a layered densification Gaussian sputtering method based on visibility, and relates to the technical field of artificial intelligence and computer vision. According to the scheme, an initial three-dimensional Gaussian primitive set is generated based on sparse multi-view observation data, and initial scene representation is established by extracting spatial distribution parameters, morphological parameters and radiation parameters; performing fusion analysis on the Gaussian primitives based on the multi-dimensional observability parameter set to obtain comprehensive observability index data; executing hierarchical clustering according to the index data, and constructing a multi-layer Gaussian structure of a significant layer, a transition layer and a background layer; performing density enhancement, geometric continuity constraint and parameter update processing on different levels of Gaussian structures, and generating a rendered image of a target view angle under a volume light traveling and transparency hybrid mechanism; according to the method, continuous reconstruction of a scene structure and accurate expression of radiation characteristics can be realized under the sparse view condition, and the geometric fidelity and rendering consistency of new view angle synthesis are improved.

The invention discloses a TiSiN / TiBC multilayer hydrogen-resistant wear-resistant coating as well as a preparation method and application thereof, and belongs to the technical field of material preparation. The TiSiN / TiBC multi-layer structure composite hydrogen-resistant wear-resistant coating is prepared on the surface of the steel substrate through the high-frequency pulse magnetron sputtering technology, the middle transition layer is designed between the steel substrate and the hydrogen-resistant coating, and the transition layer has good toughness and the thermal expansion coefficient (8 * 10 <-6 >-12 * 10 <-6 > / DEG C) matched with the substrate; the residual stress between the coating and the steel substrate is effectively reduced, the fracture toughness and binding force of the hydrogen-resistant coating are improved, the binding force of the coating is improved, and then the wear resistance of the coating is remarkably improved. And meanwhile, a large number of vacancy bonds such as Si-bonds, B-bonds, C-bonds and N-bonds contained in the hydrogen-resistant coating can be used for capturing hydrogen atoms, so that the capturing capacity on the hydrogen atoms is improved, the permeation effect of hydrogen is further inhibited, and the hydrogen-resistant efficiency of the coating is remarkably improved.

The invention relates to the technical field of metal wire processing, and discloses a high-performance metal wire plastic coating process for aerospace engineering, which comprises the following steps: carrying out base material type selection on a metal wire, and carrying out surface treatment of precise cleaning, etching and depth gradient activation; a Ti-Cr alloy and graphene-copper composite transition layer is deposited through a magnetron sputtering technology, and a multi-layer coating structure is formed through electrostatic spraying of a base coating, a fluidized bed dipping function layer and high velocity oxy-fuel spraying of a nano composite coating in sequence; the molybdenum-gold composite sealing layer is prepared by adopting an electric arc spraying technology, and is subjected to vacuum ultraviolet curing enhancement, high-temperature gradient annealing, gradient sintering and vacuum curing treatment; and heat radiation on the surface of the coating is enhanced through laser-induced micro-nano structure regulation and silicon nitride film sputtering. Through collaborative optimization of base material treatment, coating construction, function strengthening and quality control, the interface bonding strength, the comprehensive performance and the environmental adaptability of the spaceflight metal wire coating are remarkably improved, and the service life of the spaceflight metal wire coating is remarkably prolonged.

The invention discloses a high-fidelity three-dimensional Gaussian sputtering (3DGS) lightweight method for resource-constrained equipment. The method aims at solving the problems of high storage and computing resource consumption caused by the fact that a large number of parameters are stored in an existing 3DGS technology, and geometric distortion possibly occurring when details of a scene center are processed is overcome. The core of the method lies in a multi-stage progressive optimization framework, and the framework cooperatively applies four key technologies of Gaussian cutting and opacity regularization, dynamic spherical harmonic function adjustment, entropy constraint vector quantization and coordinate space shrinkage. Wherein in Gaussian clipping, redundant gauss are eliminated by quantifying the contribution degree of a Gaussian unit; the dynamic spherical harmonic function adjustment adaptively adjusts the order of color coding according to the scene complexity; the entropy constraint vector quantization is used for compressing a plurality of Gaussian attributes so as to realize more compact representation; and the coordinate space shrinkage is realized through nonlinear transformation, so that the rendering precision of details of the center of the scene is remarkably improved. According to the method, while the rendering precision and quality are kept, remarkable storage compression is realized, and the method is particularly suitable for deployment of resource-limited platforms such as mobile equipment.

The invention relates to the technical field of feed circular mold cleaning, in particular to a feed circular mold efficient cleaning device which comprises a second cylinder, a light block, a spraying assembly, a driving assembly and a lifting assembly. A cylinder II is fixedly connected in the cylinder I; a plurality of light blocks are connected to the outer ring face of the second cylinder in an annular array mode. The sections of the light blocks are isosceles triangles; the cylinder I is connected with a spraying assembly; clean water is blocked through a second cylinder, so that the clean water can be prevented from carrying impurities to be sprayed into a through hole in the other side of the feed circular mold, the cleaning efficiency is improved, meanwhile, the clean water splashed after making contact with the second cylinder is intercepted through a light block, the clean water is prevented from carrying impurities to be splashed back to the inner side face of the feed circular mold, and the cleaning effect is ensured. And the side, close to the feed circular mold, of the light block is arranged to be a long inclined face, so that when the clear water impacts the long inclined face of the light block, the clear water can flow towards the second cylinder along the long inclined face, the clear water sputtering phenomenon can be reduced, and the cleaning effect is further ensured.

The invention discloses an underwater scene three-dimensional reconstruction system and method based on 3D Gaussian sputtering, and belongs to the technical field of computer vision and three-dimensional reconstruction. The invention provides a feature extraction and enhancement method based on an AWDesc descriptor and a lightweight FeatureBooster network, and supports detection and description of key points of a fuzzy and weak texture area in a multi-view underwater image. According to the method, the self-enhancement and cross-enhancement strategies are combined, the discriminability and context consistency of descriptors are improved, and the mutual nearest neighbor and RANSAC algorithm are utilized to construct stable feature matching pairs, so that the mismatching rate is effectively reduced, and the accuracy of camera attitude estimation and sparse point cloud construction is improved. According to the method, the image enhancement network based on the cross Transform and the mixed contrast learning mechanism is adopted, and the ubiquitous problems of color distortion, fuzzy degradation and insufficient contrast of underwater images are effectively relieved. According to the method, a covariance correction mechanism and an underwater perception loss function are introduced into a 3D Gaussian sputtering three-dimensional modeling framework, and adaptive adjustment of Gaussian kernel scale, density and structural directivity is realized.

The utility model discloses coating equipment for improving the uniformity of a magnetron sputtering film, and belongs to the technical field of semiconductor production equipment.The coating equipment comprises a substrate table, the substrate table is provided with a cooling channel and a cooling air hole, and a supporting part is arranged at the upper end of the substrate table in a protruding mode; the air hole plug is arranged on the substrate table in a lifting adjusting manner; and the base plate is placed on the supporting part. Opening and closing of the cooling air holes in the corresponding positions can be adjusted according to the temperature distribution condition of the substrate in the debugging stage, the cooling air holes are opened in the high-temperature area to be communicated with the cooling channel, cooling air is used for cooling, and when the cooling air is sent out from the cooling air holes, the air uniformizing space can be used for uniformizing the cooling air in a small range, so that the cooling efficiency is improved. Regional cooling is achieved, the purpose of temperature regulation and control is achieved, the temperature of the surface of the substrate is uniform and consistent, and then the uniformity of coating is improved.

The invention discloses a bridge pier structure surface crack detection and quantification method based on Gaussian sputtering. The method comprises the following steps: acquiring image data of a bridge pier structure; obtaining a dense point cloud based on the image data; constructing a bridge pier Gaussian model by using the dense point cloud, and obtaining a rendering crack region through the bridge pier Gaussian model; and utilizing a semantic segmentation neural network to extract crack pixels of the rendering crack area and performing parameter quantization. According to the method, the unmanned aerial vehicle inspection operation difficulty is remarkably reduced, the limitation of crack detection under a limited visual angle is made up, high-precision quantification of crack parameters is realized, and the method has important reference value for bridge structure health monitoring.

The invention discloses a magnetron sputtering coating method with uniform coating and high target material utilization rate, and belongs to the technical field of film preparation, and the method realizes high-precision coating through whole-process collaborative optimization of pretreatment, sputtering, deposition and post-treatment. The substrate is cleaned in cooperation with radio-frequency pulse focusing bombardment; an electromagnetic coil group containing a temperature compensation coil is used for target sputtering, a magnetic field is dynamically adjusted in combination with laser profile sensing and a PID self-adaptive algorithm, and a direct current pulse-radio frequency composite power supply is matched to solve the target problem; in the deposition stage, a quartz crystal instrument is used for closed-loop film thickness control, metal film pulse gas supply and compound film reaction gas phase adjustment; gradient temperature rise is carried out according to data of an X-ray stress meter in post-treatment, and argon is used for dynamic protection and impurity prevention. According to the magnetron sputtering coating method with uniform coating and high target material utilization rate, the uniformity of coating and the target material utilization rate are improved, and the technological adaptability and stability of coating are improved.

The invention belongs to the technical field of flexible transparent film electrodes, and particularly relates to a flexible indium tin oxide film electrode, a preparation method and a flexible solar cell. According to the flexible indium tin oxide thin film electrode provided by the invention, after the processes of pre-treating substrates such as PET, covering an acrylic resin hard coating, depositing a SiO2 transition layer and the like, the adhesive force of the indium tin oxide conductive thin film is improved through the indium tin oxide conductive thin film deposited through alternate radio frequency magnetron sputtering and direct current pulse magnetron sputtering; the bottom layer deposited by radio frequency magnetron sputtering is used for providing an interface seed layer for the fluorine-doped indium tin oxide conductive thin film layer deposited by direct current pulse magnetron sputtering and having high carrier concentration and low resistance, and the top layer is used for providing protection, so that the conductivity, environmental stability and other properties of the flexible indium tin oxide thin film electrode are improved; the conductive performance is not easy to attenuate, the long-term use stability is good, and the technical problem that in the prior art, a flexible transparent film electrode is low in performance is solved.

The invention belongs to the technical field of microwave plasmas, and particularly relates to a magnetized atmospheric pressure pulse microwave plasma jet discharger. The discharger is reasonable in design, microwave energy is fed into the discharge chamber through the SMA interface, high electric field intensity is formed at the tip of the hollow needle electrode, and fed working gas is disrupted and discharged; a magnet exciting coil outside the quartz tube generates an axial magnetic field inside the quartz tube through direct current, electrons do spiral cycloid motion in an electromagnetic field, and electron cyclotron resonance can be achieved under the field. Through magnetic field constraint, high-energy electrons are constrained in a core area, a motion path is prolonged, effective collision times are increased, gas dissociation efficiency and ionization degree are improved, and collision loss of the electrons and a wall surface is reduced; the plasma jet performance is improved; the device works in an atmospheric pressure environment, does not need a vacuum system, reduces equipment cost and maintenance difficulty, reduces electrode sputtering and cavity corrosion, and prolongs the service life of core components.

The invention discloses a radar camera external parameter calibration method and system based on 3D Gaussian sputtering, and the method comprises the steps: enabling a laser radar and a camera system to stand, and accumulating laser radar point clouds of a collection scene; secondly, carrying out voxel segmentation on the point cloud density according to the point cloud density, constructing a covariance and a mean value of an initial Gaussian ellipsoid, expressing a three-dimensional scene by using a 3D Gaussian ellipsoid, and obtaining a rendering result; then, constructing a covariance change loss function and a total loss function, and performing coarse optimization and fine optimization on external parameters of the camera and the radar through back propagation of the loss functions; and finally, programming the calibration method, and finishing external parameter adjustment of the laser radar and the camera by using a computer processor. According to the invention, efficient and accurate external parameter calibration is carried out on the laser radar and the camera, the calibration precision of the camera and the radar in a non-structural environment can be effectively improved, and the problem of external parameter calibration in multi-sensor data fusion can be solved.

The invention provides a target poisoning resisting method and system based on multi-stage pulse reactive sputtering, and belongs to the technical field of magnetron sputtering. According to the method, air serves as reaction gas, a pulse direct-current power source is adopted, and reactive sputtering treatment is conducted on a metal target material; the reactive sputtering treatment comprises a first stage, a second stage and a sputtering voltage feedback control stage in sequence. The sputtering power and the duty ratio are adjusted in three stages, the first stage can stabilize luminance build-up and preliminarily clean the surface of the target material, and the second stage can improve the nitrogen ionization rate (gt; 50%) and suppresses the oxygen ionization rate (lt; and in the sputtering voltage feedback control stage, the sputtering power and the duty ratio are adjusted according to the drop amplitude of the sputtering voltage, an insulating compound layer on the surface of the target material can be efficiently sputtered and stripped, and the poisoning state of the target material is effectively inhibited, so that the method can effectively inhibit target material poisoning, the service life of the target material is prolonged, complex equipment is not needed, and the cost is relatively low.

The invention relates to a shield tunnel digital twin geometric model construction method based on a Gaussian sputtering technology. The method comprises the following steps: acquiring image sequence data of a shield tunnel; sparse point clouds and camera pose parameters of the shield tunnel are obtained; based on the sparse point cloud and the camera pose parameters, constructing a shield tunnel Gaussian model by using a two-dimensional Gaussian sputtering technology; based on a shield tunnel Gaussian model, rendering a depth image at each view position by using camera pose parameters; and fusing the depth images rendered at each view position, and extracting a three-dimensional grid model of the shield tunnel. According to the method, the Gaussian sputtering technology and the TSDF fusion method are combined, high-fidelity and high-efficiency construction of the shield tunnel three-dimensional grid model is achieved, compared with a mainstream image three-dimensional reconstruction method, the model geometric accuracy error is low, the modeling time is short, meanwhile, higher noise robustness and surface smoothness are shown in the dark area of the tunnel, and the method has the advantages of being high in robustness and high in reliability. And an important reference is provided for geometric model construction of the digital twin technology in the shield tunnel.

The invention discloses a low-illumination blurred image 3D scene reconstruction method based on Gaussian sputtering, and the method comprises the steps: S1, building a progressive iteration enhancement frame, and setting a middle brightness anchor point between low-light observation and target brightness; s2, generating a plurality of enhanced images based on the intermediate brightness anchor points in combination with histogram equalization and gamma correction technologies; s3, carrying out rapid deblurring processing on the enhanced image; s4, constructing a scene representation model based on 3D Gaussian sputtering, and performing explicit estimation and noise suppression in combination with a noise sensing module; s5, taking the reconstructed rendered image as the deblurring prior of the enhanced image of the next brightness level so as to execute deblurring processing operation, and performing iterative optimization until the target brightness is reached; and S6, generating a high-quality new view angle image based on the finally reconstructed 3D scene. According to the method, the rendering speed is greatly improved while the reconstruction quality is ensured, real-time three-dimensional reconstruction is realized, and the problem of noise amplification in a low-light environment is effectively solved.

The invention relates to a preparation method of a visible and near-infrared dual-band high-transmittance transparent conductive film, which is characterized by comprising the following steps of: (1) preparing an ITO (Indium Tin Oxide) film on a transparent substrate by adopting a magnetron sputtering process, and sputtering and depositing the ITO film with the thickness of 200-1000nm; and (2) placing the substrate on which the ITO film is deposited in a high-temperature furnace for rapid heating heat treatment, and cooling after heat treatment. The preparation method has the advantages that the preparation method is simple, and rapid batch production can be realized in combination with an existing magnetron sputtering system; the average transmittance of the transparent conductive thin film prepared by the method reaches 70%-75.1% at the wave band of 1.1-2.5 microns, the average transmittance of the visible light wave band is not lower than 84%, and the sheet resistance is 20-35 omega / sq.

The invention is applicable to the field of cover plate glass processing, and provides a method for processing and preparing a cover plate glass with a superhard optical coating, which comprises the steps of glass substrate pretreatment, multi-layer superhard coating layer preparation, AF anti-fingerprint film preparation and post-treatment detection. According to the invention, the glass substrate is subjected to basic pretreatment (cleaning and plasma treatment), the Mohs hardness of the superhard coating layer can reach 5 when an evaporation process is adopted, and the Mohs hardness can reach 6 when a sputtering process is adopted; the initial water drop angle is larger than or equal to 115 degrees, the water drop angle is still larger than or equal to 102 degrees after 2500 times of friction tests, and the rubber friction tests can reach more than 6300 times; the total thickness of the film layer is controlled to be 30-100 nm, the film layer is adaptive to cover plate glass with different sizes of more than 1-20 inches (small-size adaptive evaporation / sputtering and large-size adaptive magnetron sputtering), the process is compatible with a continuous film coating line, and the film layer is suitable for processing of intelligent watch glass, intelligent mobile phones and small-size touch screen cover plate glass and has good practicability and mass production potential.

The invention relates to a preparation method of a lead selenide room-temperature medium-wave infrared detector, which comprises the following steps of: (1) depositing a lead selenide film layer on a substrate by adopting a magnetron sputtering technology and taking oxygen as reaction gas; (2) placing the lead selenide film in a horizontal tube furnace, and realizing high-temperature oxidation in normal-pressure pure oxygen; and (3) putting the lead selenide film into a vertical tube furnace, and realizing high-temperature iodination in a normal-pressure environment. The lead selenide thin film is prepared through the magnetron sputtering technology, compared with chemical bath deposition, the quality of the thin film is effectively improved, and large-area and high-uniformity thin film preparation is achieved; the magnetron sputtering film is subjected to high-temperature oxidation-iodination treatment, the magnetron sputtering film has excellent photoresponse to infrared light, and the sensitization technology is specific and clear and good in repeatability; the sensitized lead selenide thin film layer and the top electrode form the photoconductive detector, the specific detection rate of the device is 7.6 * 10 < 9 > Jones at 4.3 microns at the room temperature of a medium-wave infrared band, and the performance is excellent.

The invention discloses an acid, alkali and salt corrosion resistant high-coercivity grain boundary diffusion neodymium-iron-boron magnet and a preparation method thereof, and the preparation method comprises the following steps: (1) selecting a sintered neodymium-iron-boron magnet as a base material, slicing the magnet, polishing the surface, and ultrasonically cleaning a coating surface; (2) preparing slurry by using absolute ethyl alcohol and PVB (Polyvinyl Butyral) glue by taking the heavy rare earth alloy as a diffusion source; uniformly coating a magnet with the slurry, and drying to obtain a magnet to be subjected to diffusion heat treatment; (3) performing diffusion heat treatment on the magnet to be subjected to diffusion heat treatment under a vacuum condition to obtain a grain boundary diffusion magnet; and (4) plating a layer of compact high-potential metal on the surface layer of the magnet by magnetron sputtering to prepare the high-coercivity grain boundary diffusion neodymium-iron-boron magnet with acid, alkali and salt corrosion resistance. According to the method, the coercive force of the magnet is remarkably improved, the influence on the residual magnetism of the magnet is small, and meanwhile, the negative influence on the corrosion resistance of the magnet after grain boundary diffusion is avoided; the prepared magnet has good acid, alkali and salt corrosion resistance.

The invention discloses a scene completion method based on Gaussian sputtering, and relates to the technical field of scene reconstruction. Obtaining an original video of a target scene collected by a camera device; performing Gaussian sputtering conversion on pixel points of each frame of image in the original video to obtain Gaussian distribution representation; the Gaussian distribution representation comprises spatial position and color information of a plurality of three-dimensional Gaussian points; inputting the spatial positions of all the three-dimensional Gaussian points into the improved point cloud completion model to obtain a complete Gaussian point cloud of the target scene; the improved point cloud completion model is constructed by introducing features extracted by a contrast language image pre-training CLIP model and a self-distillation visual converter DINO model as supervision information into a point cloud completion network PCN model; and according to the Gaussian distribution representation, performing color rendering on the complete Gaussian point cloud to obtain optimized Gaussian point cloud distribution. According to the method, a scene with a relatively vivid effect can be generated.

The invention relates to the technical field of magnetron sputtering, and provides a preparation method of a ruthenium sputtering target material. The method comprises the following steps: sequentially carrying out hydrogen introduction reduction treatment, crushing and sieving on ruthenium powder to obtain reduced ruthenium powder; and the reduced ruthenium powder is sequentially subjected to compression molding, cold isostatic pressing treatment and sintering treatment, and the ruthenium sputtering target material is obtained. According to the method, the technical problems that the ruthenium sputtering target material is high in oxygen content and random in grain orientation in a traditional powder metallurgy process are effectively solved by combining a dual deoxidization mechanism of'hydrogen feeding reduction-hydrogen sintering 'and cooperative regulation and control of cold isostatic pressing treatment and sintering process parameters. Results of the embodiment show that the ruthenium sputtering target material prepared by the method can realize the following performance indexes: the purity is greater than or equal to 99.95%, the oxygen content is less than or equal to 20 ppm, the average grain size is less than or equal to 2 microns, the density is greater than or equal to 99%, the required specific crystallographic orientation can be stably formed, and a foundation is laid for subsequent magnetron sputtering preparation of a high-performance film.

The invention discloses a preparation method of a high-hydrophobicity liquid lead bismuth alloy nitride coating capable of increasing a high-temperature contact angle, which comprises the following steps of: pretreating a substrate, depositing a FeCrAl coating on the surface of the substrate by adopting magnetron sputtering, and nitriding the FeCrAl coating to obtain a nitride coating; the invention further discloses the high-hydrophobicity liquid lead bismuth alloy nitride coating for improving the high-temperature contact angle. According to the preparation method, the FeCrAl coating is nitrided, so that the surface strength and corrosion resistance of the FeCrAl coating are improved, the formed FeCrAl nitride layer with a compact structure has high lyophobicity on the liquid lead bismuth alloy, the material surface is in a non-wetting state all the time, the liquid lead bismuth alloy can be effectively prevented from permeating into an alloy matrix, and the service life of the material is prolonged. The material is suitable for being used as a cladding material of a lead-cooled fast neutron reactor.

The invention provides an integrated color cover plate based on magnetron sputtering, a manufacturing process and a display module, and the integrated color cover plate comprises a glass substrate which is provided with a window area and a frame area; the integrated color film layer is arranged on the lower side face of the glass substrate and corresponds to the window area; the integrated color film layer is made of a colored metal oxynitride material, and the resistivity of the integrated color film layer is greater than or equal to 106 omega.cm; and the insulating layer is arranged on the lower side surface of the integrated color film layer. According to the integrated color film layer, the type of the colored metal oxynitride is determined according to the color of the frame area, and color integration of the window area and the frame area in the screen-off state is achieved; the resistivity of the integrated color film layer is larger than or equal to 106 omega.cm, it can be ensured that the integrated color film layer has high impedance insulativity, and interference to touch sensitivity is avoided; and the arrangement of the insulating layer can improve the environmental stability and the mechanical reliability.

The invention discloses a preparation method of a flexible infrared super-surface absorber based on MDM, and belongs to the field of micro-nano machining patterning. The method comprises the following steps: pretreating a polymer material; depositing a layer of bottom metal film on the pretreated substrate by adopting magnetron sputtering; a metal reflecting layer, a dielectric insulating layer and a metal surface functional layer are sequentially deposited through magnetron sputtering, a periodic nano microstructure is constructed on the surface of a flexible composite film, a nano round pit array is etched in situ on a surface metal layer of an MDM structure by using a femtosecond laser selective etching process, and an MDM laminated structure is formed. According to the invention, stable integration of the MDM structure and the flexible substrate can be realized, and meanwhile, high absorptivity and good flexibility of the device in an infrared band are ensured. The absorber prepared by the invention can generate resonance absorption on incident infrared electromagnetic waves through a surface plasmon and F-P cavity resonance coupling mechanism, and meanwhile, the characteristic size variation is changed through physical excitation, so that effective absorption and frequency regulation of the electromagnetic waves at the infrared band of 3-14 microns are realized.

The invention belongs to the technical field of coated glass, and particularly provides a deposition method of a metal seed layer in TGV metallization and magnetron sputtering equipment. The invention aims to solve the problem of serious surface discharge phenomenon caused by low adhesive force between a metal film and a glass substrate, low metal coverage rate and step rate in a through hole and high accumulated charge on the surface of glass in the existing TGV metallization process. The independent and controllable ion source is introduced to assist deposition, the ion source is started at different stages of metal film deposition, and directional and high-energy positive ion flow generated by the ion source is utilized to bombard the surface of the glass substrate so as to assist the magnetron sputtering process, so that the surface of the glass substrate is subjected to magnetron sputtering. Through shallow ion implantation, enhancement of surface migration energy of deposited metal atoms and neutralization of negative charges accumulated on the glass surface, the adhesive force between metal and a glass substrate is improved, the metal coverage rate and the step rate in a through hole are improved, surface discharge is inhibited, and therefore the process stability is improved.