32 results about "Vacuum deposition" patented technology

To enable suppressing arrival of a vacuum deposition material discharged from a discharge opening at a shielding position of a shutter to an object to be deposited in a vapor deposition source of a vacuum evaporation system having: a crucible 2 that accommodates a vapor deposition material Em and has the discharge opening 21 arranged on an upper surface; heating means for heating the vapor deposition material in the crucible; and a shutter Sn for selectively shutting off a scattering path of the vapor deposition material discharged from the discharge opening.SOLUTION: In a vacuum deposition source according to the invention: a shutter comprises a shutter body 4 including a base end 41 and a skirt 42 hanging down from the base end, with a first attenuation plate 43 extending in a circumferential direction orthogonal to a vertical direction being provided on a lower edge of the skirt; and the shutter further comprises a second attenuation plate 6 having an opening facing an upper edge part of the crucible, arranged around the crucible, and forming a space extending in a circumferential direction between the first attenuation plate and the second attenuation plate.SELECTED DRAWING: Figure 2

An arrangement of vapor deposition sources for coating a substrate is described. The vapor deposition source arrangement includes: a vapor deposition source (101) having a first vapor distribution conduit (110) having a first row of nozzles (111) for depositing a first material on the substrate; a rotary driver (113) for rotating the vapor deposition source about a rotation axis (R1); and a shielding arrangement (200) partially surrounding the vapor deposition source and including an idle shielding member (202) and a shaper shielding member (201). The rotary driver is configured to rotate the vapor deposition source relative to the shielding arrangement between an idle position and a first deposition position, in which the first row of nozzles is guided toward the idle shielding member (202), and in the first deposition position, the first row of nozzles is aligned with a first slit (211) disposed in the shaper shielding member (201), the first slit (211) being configured to limit a first opening angle (β1) of the vapor plume ejected by the first row of nozzles. A vacuum deposition system and a method for coating a substrate are further described.

To provide a vapor deposition source for a vacuum deposition apparatus which enables direct replenishment of a deposition material without atmospheric exposure of a vacuum chamber, where the deposition is performed, while maintaining stable deposition rates even after replenishment.SOLUTION: The present invention provides a vapor deposition source DS1 for a vacuum deposition apparatus Dm1 that causes a deposition material Ms within a storage box 4, vaporized or sublimated by heating means Mt, to be released from a release part 42 and then deposited onto a target to be deposited Sw in a vacuum chamber 1. Above the storage box, a communication room 2a, 31 with a first opening-closing door 5a and a material storage room 6a are provided to enable the formation of a vacuum atmosphere. The material storage room is provided with a chute 71 with a part 71a projecting into the communication room, an input port 61 that enables the injection of the deposition material into the material storage room, a second opening-closing door 5b that closes the input port in a freely openable manner, and a delivery screw 72 that extends vertically, passing through the chute. The portion of the delivery screw projecting from the chute is provided with a diffuser 8a which extends slanting downwards in the vertical direction.SELECTED DRAWING: Figure 1

This invention discloses a solar-blind ultraviolet photodetector and its fabrication process, belonging to the field of photoelectric detection technology. The detector comprises a substrate, a bottom electrode, an electron transport layer, a lead-free low-dimensional metal halide active layer, a hole transport layer, and a top electrode arranged sequentially. The lead-free low-dimensional metal halide active layer is a Cs-Cu-I system with a zero-dimensional unit or one-dimensional chain-like crystal structure. The lead-free low-dimensional metal halide active layer is prepared by vacuum deposition of CsI and CuI. The detector of this invention exhibits high detectivity, fast response speed, low dark current, and high spectral selectivity. It achieves controllable fabrication of a high-phase-purity low-dimensional active layer, avoiding solvent residue and phase purity fluctuations problems associated with solution methods. Furthermore, its fabrication process is compatible with flexible substrates, showing significant application prospects in fields such as space communication, environmental monitoring, safety early warning, and wearable devices.

This application relates to the field of contact terminal coating, and more specifically, to a vacuum deposition method for a gradient composite coating on contact terminals. The coating is prepared by the following steps: S1, cleaning and activation: The contact terminal blank is cleaned and activated with an activating cleaning agent to obtain blank A; S2, spray coating and pre-curing: A silane-oxygen-containing conductive liquid is sprayed onto the surface of the activated blank and pre-cured to obtain blank B; S3, PVD chromium plating: A chromium target is used to vacuum deposit a coating on the surface of blank B to form blank C; S4, shaping: Blank C is sintered to obtain a contact terminal containing a composite coating. By sequentially performing cleaning and activation, spray coating and pre-curing, PVD chromium plating, and shaping, a gradient composite layer is formed, giving the contact terminal excellent corrosion resistance and anti-detachment properties.

This utility model discloses a nano-self-cleaning cashmere sweater fabric, comprising a cashmere fabric layer, a nano-level antibacterial film layer, and a nano-level protective film layer. The nano-level antibacterial film layer is generated by sputtering on the surface of the cashmere fabric layer using vacuum deposition technology, and silver or zinc oxide is used. The nano-level protective film layer is titanium dioxide. The nano-self-cleaning cashmere sweater fabric of this utility model improves the wearing comfort of the cashmere sweater by using a cashmere fabric layer. Furthermore, the nano-level antibacterial layer formed by vacuum deposition technology is thin and composed of particles with gaps between them, allowing gaseous water molecules to pass through, which improves the waterproof and self-cleaning effects, and also enhances the breathability of the fabric.

The object of the present invention is to provide a method for manufacturing plastic lenses that offers excellent adhesion and productivity of the optical functional layer, as well as improved durability. [Solution] A method for manufacturing a plastic lens, comprising a forming step of forming an undercoat layer and an optical functional layer in that order on at least one surface of a resin lens body, wherein the lens body is made of a thermoplastic acrylic resin having a glass transition temperature of 116°C or higher, the undercoat layer is formed by a resistance heating type vacuum deposition method, SiO is used as the deposition material for the undercoat layer, and the amount of O2 gas is controlled to 3.0 × 10 -2 A method for manufacturing plastic lenses, characterized by forming the optical functional layer at a pressure of less than Pa, forming the optical functional layer by an electron beam heated vacuum deposition method, and performing pre-melting of the deposition material for the optical functional layer both before and after the formation of the undercoat layer.

This invention provides a negative electrode sheet for solid-state batteries, its preparation method, and its application, relating to the field of lithium-ion battery technology. Specifically, an active slurry is prepared and coated onto the surface of at least one side of a metal current collector, and dried to obtain an active layer. A transition layer is prepared on the surface of the active layer by at least one of coating, spraying, roll transfer, or vacuum deposition. The transition layer comprises a specific metallic or non-metallic element. A lithium replenishment layer is obtained on the surface of the transition layer by roll transfer, followed by heat treatment to obtain the negative electrode sheet. This invention can achieve efficient and stable lithium replenishment on the negative electrode side of all-solid-state batteries while improving initial efficiency and energy density, and enhancing cycle performance, showing promising application prospects.

This invention relates to a layer deposition system, particularly for depositing at least one localized layer in a plasma-assisted deposition system via a mask that partially shields a substrate on a substrate carrier, particularly a solar cell wafer. The invention also relates to a method and system for depositing a localized layer pattern on a wafer-like substrate in a vacuum deposition process. The invention includes a layer deposition system, particularly designed for depositing at least one localized layer in a plasma-assisted deposition system, wherein the layer deposition system includes a movable substrate carrier for receiving at least one solar cell wafer substrate, the movable substrate carrier being designed for transporting at least one substrate and at least one mask for shielding the substrate between a loading station and a deposition station, wherein the movable substrate carrier and / or the mask are magnetically positioned, wherein the substrate and the mask on the substrate carrier can be arranged to be precisely aligned with each other, and wherein the mask is magnetically attached by the magnetic field.

The present application relates to the technical field of vacuum deposition. Disclosed are a scanning magnetron device for a PVD rectangular planar target, and a thin film deposition apparatus. The magnetron device comprises: a magnetron; and a driving device, used to drive the magnetron to move relative to a rectangular planar target along a first direction and a second direction, such that the magnetron reaches limit positions corresponding to corners of the rectangular planar target. A movement stroke of the magnetron comprises a first stroke and a second stroke that are successively performed. During the first stroke, the magnetron moves between a first limit position and a second limit position; during the second stroke, the magnetron moves between the first limit position and a third limit position, or moves between the second limit position and the third limit position; the first limit position, the second limit position and the third limit position are different limit positions. In the present embodiment, a limit position reached by the magnetron after the second stroke is completed is different from a limit position from which the magnetron departs or which the magnetron reaches during the first stroke, thus improving the etching uniformity.

The present application relates to the technical field of passive radiation cooling, and discloses a passive radiation cooling coating and a preparation method thereof, wherein the coating is prepared by applying paint on a flexible substrate, and the paint formula comprises CuFe2O4, graphene powder, a binder and a solvent. The prepared coating has infrared emission frequency bands of 2-16 microns; has very strong emission in the atmospheric transparent window of 7-14 microns, and has excellent radiation cooling effect; meanwhile, the problem that infrared emission materials prepared by vacuum deposition are rigid and limit their application in wearable devices is avoided; the coating can be integrated into smart clothing, medical textiles and daily wearable devices, and provides comfortable use experience for wearers through radiation cooling, thereby widening the application of the material in daily life and the medical field.

The purpose of the present invention is to provide an optical sensor material that has sensitivity in a green light region and a red light region, and is suitable for a vacuum deposition process. The present invention is an optical sensor material having a structure that is represented by general formula (1). In general formula (1), R1-R8 are each independently selected from the group consisting of a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, a heteroaryl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, a silyl group, and a boryl group. R9-R12 are each independently an alkyl group that has fewer than 6 carbon atoms. X is an oxygen atom, a sulfur atom, or a selenium atom. Y1-Y4 are each independently selected from the group consisting of NR13, an oxygen atom, and a sulfur atom. R13 is a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group. Z1 and Z2 are each independently selected from the group consisting of a carbon atom, a silicon atom, and a germanium atom.

The present application relates to the technical fields of semiconductor processing, and specifically relates to a semiconductor wafer processing device, which comprises a cracking furnace, a material sublimation chamber and a vacuum deposition chamber. A rotating cylinder is arranged in the material sublimation chamber, and helical blades with gradually increasing outer diameters are arranged on the outer wall of the rotating cylinder near the half section of the feeding port, so as to realize gradient pushing of raw materials in cooperation with a tapered cylinder with gradually increasing inner diameters. A preheating assembly is arranged in the rotating cylinder, and the heating temperature of the heating cylinder gradually increases in the direction away from the feeding port, so as to realize gradient precise heating. A collecting mesh frame is detachably inserted into the guide frame at the bottom of the discharging port. A heating plate with heating holes and a V-shaped concave collecting plate are arranged in the cracking furnace. The elastic mounting ring and the elastic placing net are vibrated by a plurality of driving elements in the vacuum deposition chamber. The present application solves the problems of high cost, large size or uneven coating, poor adhesion and difficult maintenance of the existing equipment, and has the advantages of uniform coating, strong adhesion, high raw material utilization rate, simple operation and adaptation to small workpieces.

A highly transparent one-dimensional photonic crystal thin film with dual UV-blue light blocking and its preparation method are disclosed. This film achieves dual-band blocking of harmful blue light (290-380 nm UV and 385-445 nm) while maintaining high transmittance in other visible light bands. By placing the UV-blocking and blue-blocking one-dimensional photonic crystal film systems above and below the substrate, respectively, it helps to delay the UV irradiation degradation of the transparent polymer substrate, avoiding performance degradation issues such as yellowing and embrittlement under outdoor service conditions. Furthermore, it prevents stress cracking caused by excessive thickness of the multilayer film on one side, thereby improving the stability of the film-substrate system. In addition, using nano-hybrid polysiloxanes with good wear resistance and weather resistance as the construction material for the multilayer optical thin film offers better compatibility with the polymer substrate compared to traditional inorganic optical materials. Moreover, it eliminates the need for vacuum deposition, making wet preparation more economical and efficient.

The object of the present invention is to provide a method for manufacturing plastic lenses that offers excellent adhesion and productivity of the optical functional layer, as well as improved durability. [Solution] A method for manufacturing a plastic lens, comprising a forming step of forming an undercoat layer and an optical functional layer in that order on at least one surface of a resin lens body, wherein the lens body is made of a thermoplastic acrylic resin having a glass transition temperature of 116°C or higher, the undercoat layer is formed by a resistance heating type vacuum deposition method, SiO is used as the deposition material for the undercoat layer, and the amount of O2 gas is controlled to 3.0 × 10 -2 A method for manufacturing plastic lenses, characterized in that the lenses are formed at a pressure of less than Pa, the optical functional layer is formed by an electron beam heated vacuum deposition method, and the pre-melting of the deposition material for the optical functional layer is performed for the first time after the formation of the undercoat layer.

This invention discloses a food heating machine, comprising a housing, a first heating element, and a second heating element, which are disposed on opposite sides of the housing. Each heating element includes a substrate, a heating coating, electrodes, and a protective layer. The heating coating is a conductive coating formed on the substrate by vacuum deposition of a semiconductor metal oxide. Electrodes are disposed on opposite sides of the heating coating and connected to a power source. The heating coating generates heat when the electrodes are energized, transferring the heat to the substrate. The protective layer provides a waterproof enclosure for the heating coating and electrodes. The substrates of the first and second heating elements are positioned opposite each other, with the space between them serving as the heating space. This invention can quickly heat and bake food (bread) using indirect electric heating, making it safe and convenient.

This invention proposes an organic field-effect transistor (OFET) biosensor based on interface topology engineering, its fabrication method, and its application, belonging to the field of biosensor technology. The OFET biosensor comprises a substrate, electrodes, an organic semiconductor layer, an interface topology modification layer, and a biorecognition probe. Through a kinetically controlled vacuum deposition process, an interface topology modification layer with a nanoscale uniform rough morphology is constructed on the semiconductor surface. This topology induces double-layer overlap at the solid-liquid interface, significantly reducing interface capacitance and physically stretching the effective Debye length, thereby overcoming the Debye shielding effect in the high ionic strength environment of physiological fluids. Simultaneously, the aldehyde groups on the surface of the modification layer achieve covalent fixation of the probe without connecting arms and provide encapsulation protection. This sensor achieves ultrasensitive detection of allergen-specific IgE and exhibits excellent stability and signal-to-noise ratio in undiluted human serum, providing a universal physical sensitization strategy for the point-of-care testing of complex clinical samples.

A deposition source for a vacuum deposition apparatus is provided, in which, when a crucible filled with a deposition material is heated in an induction heating manner, the entire crucible including a lid is in a top heating state. The deposition source (DS1) includes a crucible (4) filled with a deposition material (Vm), a lid (5) that blocks an upper surface opening (4a) of the crucible, and an induction heating coil (6) disposed around the crucible and the lid. An outlet portion (51a) that allows the deposition material vaporized or sublimated by heating to pass through is provided on the lid. A protrusion (52b) having a corner portion is provided on an outer surface of the lid.

The present invention relates to an article comprising a substrate having at least one first main surface coated with an organic-inorganic layer of a material obtained by vacuum deposition of at least one metal oxide B and at least one organic compound, wherein the at least one metal oxide B preferably has a refractive index not higher than 1.53, the layer has a refractive index not higher than 1.45, and the metal oxide has been deposited by grazing angle deposition.

This invention relates to an article comprising a substrate having at least one main surface coated with a layer L of a material M obtained by vacuum deposition of at least one metal compound A selected from alkaline earth metal fluorides and at least one organosilicon compound B via co-evaporation, the material M having a refractive index in the range of 1.38 to 1.47 at a wavelength of 632.8 nm. According to the invention: - the organosilicon compound B comprises an organosilicon compound or a mixture of organosilicon compounds; and - the compound B is deposited in gaseous form in the presence of ion bombardment.

This invention relates to the field of coating technology, specifically to a PVD coating process for stamping dies of galvanized steel sheets. The method includes: pre-treating the die by wet cleaning the die surface and then placing it in a vacuum deposition chamber for vacuuming, followed by heating to a predetermined temperature under an inert gas environment; performing plasma pre-treatment on the die surface by using a high-power pulsed magnetron sputtering cathode with a chromium target to generate chromium-rich plasma under an argon atmosphere, and applying a negative bias voltage to the die; activating at least one unbalanced magnetron sputtering cathode, which gradually increases the target current in a ramp-up mode to improve the target voltage, while simultaneously introducing nitrogen as a reactive gas, thereby depositing a nitride transition layer on the die surface; and performing multi-source reactive sputtering deposition on the transition layer using a high-power pulsed magnetron sputtering cathode and an unbalanced magnetron sputtering cathode working synchronously to form a multilayer hard coating composed of alternating titanium aluminum vanadium and chromium nitrides. This invention solves the problems of poor coating adhesion and insufficient high-temperature resistance in existing technologies by combining high-power pulsed magnetron sputtering and unbalanced magnetron sputtering technologies.

A deposition source arrangement for depositing at least two layers onto a substrate is described. The deposition source arrangement (100) comprises a deposition source (101) comprising: a first vapor distribution pipe (110) having a first row of nozzles (111) with a first main deposition direction (M1) for depositing a first material onto a substrate; a second vapor distribution pipe (120) having a second row of nozzles (121) with a second main deposition direction (M2) for depositing a second material onto a substrate; and a third vapor distribution pipe (130) having a third row of nozzles (131) with a third main deposition direction (M3) for depositing a third material onto a substrate. The deposition source arrangement further comprises a rotary drive (113) for rotating the deposition source about a rotation axis. The first main deposition direction (M1) and the second main deposition direction (M2) are tilted towards each other to enable co-deposition of a mixed material layer onto a substrate, and the third row of nozzles is configured to simultaneously deposit a further one of the layers containing the third material onto the substrate above or below the mixed material layer.

This invention discloses a food heating machine, comprising a housing, a first heating element, and a second heating element, which are disposed on opposite sides of the housing. Each heating element includes a substrate, a heating coating, electrodes, and a protective layer. The heating coating is a conductive coating formed on the substrate by vacuum deposition of a semiconductor metal oxide. Electrodes are disposed on opposite sides of the heating coating and connected to a power source. The heating coating heats up when the electrodes are energized. The protective layer provides a waterproof enclosure for the heating coating and electrodes. The substrates of the first and second heating elements are positioned opposite each other, with the space between the substrates serving as the heating space. This invention can quickly heat and bake food (bread) using indirect electric heating, making it safe and convenient.

The present invention addresses the problem of providing: a laminate which has high productivity and exhibits good gas barrier properties even in a thin-film configuration; and a method for producing a laminate. Disclosed is a laminate which has an inorganic oxide layer on at least one surface of a polyolefin-based resin film, wherein: the inorganic oxide layer contains aluminum and oxygen; and the surface density of the inorganic oxide layer is 50 × 1015 atoms / cm2 to 65 × 1015 atoms / cm2 inclusive. It is preferable that the element ratio O / Al of the oxygen to the aluminum contained in the inorganic oxide layer is 1.50 to 2.20 inclusive. With this method for producing a laminate, an inorganic oxide layer is formed on the surface of a polyolefin-based resin film by evaporating aluminum by a vacuum deposition method and introducing oxygen into the aluminum vapor.

This invention discloses a method for preparing a high-strength, ultrathin tin protective layer on copper wire using magnetron sputtering, and the copper wire with the high-strength, ultrathin tin protective layer. The method includes the following steps: installing copper wire in an unwinding chamber; installing a Ni target and a Sn target in a vacuum deposition chamber; and evacuating the vacuum chamber until the vacuum range reaches 1~5×10⁻⁶. ‑3 Pa; Turn on the heating power and wait for the temperature to reach the set temperature; Start the conveyor belt and simultaneously clean the copper wire with plasma; Pre-sputter for 5-15 minutes; Sputter on the copper wire to obtain a nickel transition layer; Sputter on the copper wire to obtain a tin protective layer on the nickel transition layer; The coating process is complete. This invention uses radio frequency magnetron sputtering to deposit a nanoscale nickel transition layer and a tin protective layer sequentially on a copper wire, which can effectively improve the bonding force between the copper wire and the Sn layer, prevent the Sn layer from cracking and peeling off, improve the oxidation resistance of the copper wire, and thus extend the service life of the copper wire.

A method for in-situ inspection of a plurality of layers deposited on a substrate in a vacuum deposition system is described. The method includes: (1a) moving the substrate (10) and a first edge exclusion shield (100) past a first deposition source (51) to deposit a first material layer on the substrate, wherein the first edge exclusion shield (100) is moved in front of the substrate (10) on a first shield track (12) so that a first shielded region (121) of the substrate is shielded by the first edge exclusion shield (100); (1b) inspecting the first material layer (31); (2a) moving the substrate (10) and a second edge exclusion shield (100') past a second deposition source (52) to deposit a second material layer (32) on the substrate at least partially over the first material layer (31), wherein the second edge exclusion shield (100') is moved in front of the substrate (10) so that a second shielded region (122) of the substrate is shielded by the second edge exclusion shield (100'), the second shielded region being displaced relative to the first shielded region toward a first substrate edge (131) to expose a first substrate area (125) that is free of the first material layer; and (2b) inspecting the second material layer in the first substrate area (125). Further, a vacuum deposition system configured to carry out the in-situ inspection method is described.

This invention relates to a seamless laser carrier film, a seamless laser film, its preparation method, and its application. The preparation method of the seamless laser film includes: S1. Composite a PE film and a PET film to obtain a composite base film; S2. Imprinting a laser pattern onto the PE film using a double-plate seamless molding machine, followed by vacuum deposition to form a dielectric layer, thus obtaining a seamless laser carrier film; S3. Coating the dielectric layer with an aqueous resin to form an aqueous protective layer, thus obtaining a seamless laser film. This invention, through the synergistic combination of the composite base film structure and special process steps, completely solves the industry pain point that conventional aluminum transfer technology still struggles to eliminate seams even with the application of infinitely cyclic nickel plates. The stress buffering capacity of the PE layer ensures the physical continuity of the molding structure, while the subsequent continuous deposition of the dielectric layer achieves seamless reconstruction of the optical surface. Together, these two processes eliminate periodic seam lines caused by substrate deformation, uneven release, or mechanical tolerances.

The present invention relates to a vacuum deposition device capable of adjusting a process gas flow inside a reaction chamber. The vacuum deposition device comprises: a reaction chamber (100) dividing a reaction space part (110); a stage (200) in which objects (W) to be deposited are arranged to be spaced apart from each other and stacked in the height direction in the reaction space part (110); a gas supply unit (300) which is disposed on the outer circumferential part of the stage (200) in the height direction and supplies process gas to the objects (W) to be deposited through a plurality of supply holes (310) formed to be spaced along the height direction; and a gas discharge unit (400) in which at least one gas discharge tower (410) formed in a hollow structure is disposed on the outer circumferential part of the stage (200), a plurality of discharge holes (411) being formed in the gas discharge tower (410) to be spaced apart from each other along the height direction, wherein the supply holes (310) of the gas supply unit (300) and the discharge holes (411) of the discharge tower (410) are arranged to face each other.